JP2001053045A - Uniform paint film scattering system by moving shower nozzle in horizontal spin washing machine - Google Patents

Uniform paint film scattering system by moving shower nozzle in horizontal spin washing machine

Info

Publication number
JP2001053045A
JP2001053045A JP11264288A JP26428899A JP2001053045A JP 2001053045 A JP2001053045 A JP 2001053045A JP 11264288 A JP11264288 A JP 11264288A JP 26428899 A JP26428899 A JP 26428899A JP 2001053045 A JP2001053045 A JP 2001053045A
Authority
JP
Japan
Prior art keywords
liquid
shower nozzle
substrate
center
supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11264288A
Other languages
Japanese (ja)
Inventor
Daisuke Kusunoki
大輔 楠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sefa Technology Inc
Original Assignee
Sefa Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sefa Technology Inc filed Critical Sefa Technology Inc
Priority to JP11264288A priority Critical patent/JP2001053045A/en
Publication of JP2001053045A publication Critical patent/JP2001053045A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Spray Control Apparatus (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PROBLEM TO BE SOLVED: To instantaneously form a liquid film contributing to the reduction of the amount of the liquid and process time, and to make reaction of an entire substrate uniform by moving a movable shower nozzle toward the center of a substrate at appropriate speed while the liquid is scattered from the outside of the spinning substrate. SOLUTION: While liquid 1 is scattered, a shower nozzle 2 on a spinning substrate 5 is moved toward the center of the substrate 5, thus successively forming a liquid film from the outside of the substrate 5, and forming the uniform liquid film on the entire substrate 5 in an instant when the shower nozzle 2 reaches the center. A liquid supply port corresponds to the shower nozzle 2 for scattering the liquid with the area of a shower part rather than the nozzle diameter of the total area of a liquid scattering part small aperture, thus achieving superior efficiency. Furthermore, a supply amount of the liquid is set to merely primary supply on movement and secondary supply by replenishment on stop at the center, thus greatly reducing the amount of liquid to be used.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、半導体産業向スピン洗
浄装置、及び、回転体に液体を散布することを主眼とす
る諸装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a spin cleaning apparatus for the semiconductor industry, and to various apparatuses mainly for spraying a liquid on a rotating body.

【0002】[0002]

【従来の技術】従来、スピン洗浄機の液体散布法式は、
中心に固定されたノズル、又は、移動式ノズルから散布
するものがあった。
2. Description of the Related Art Conventionally, a liquid spraying method of a spin washer is as follows.
Some sprayed from nozzles fixed in the center or from mobile nozzles.

【0003】[0003]

【発明が解決しようとする問題】従来のものは、基板が
回転している状態で、ノズルによる液体の供給であるた
めに、筋状の流れが多数出来、それが順次連続して隙間
を埋めていき、基板全体が液体と完全に接触する状態に
達するのに時間がかかった。これらは、液体の使用量、
プロセスの時間がそれぞれ増加し、また、中心部分に液
体が接触してから、基板全体が液体と完全に接触するま
でに時間がかかり、中心側と円周側の反応時間に大きな
違いがあり、さらに、筋状に液体が広がるため、基板全
体の均一な反応が達成できかった。また、液体の種類に
は、強酸、強アルカリ溶液もあり、使用量が多ければ、
排出量も多いため、環境に対する影響も大きな問題とな
る。
In the prior art, since the liquid is supplied by a nozzle while the substrate is rotating, a large number of streak-like flows are generated, which successively fill the gap. It took time for the entire substrate to reach full contact with the liquid. These are the amount of liquid used,
The process time increases, and it takes time from the contact of the liquid to the central part to the complete contact of the entire substrate with the liquid, and there is a large difference in the reaction time between the central side and the circumferential side. Further, since the liquid spreads in a streak shape, a uniform reaction of the entire substrate could not be achieved. In addition, there are strong acid and strong alkali solutions in the type of liquid, and if the amount used is large,
Due to the large amount of emissions, the impact on the environment is a major problem.

【0004】請求項1記載の方式は、液供給口をシャワ
ーノズル形状にして、スピンしている基板に、シャワー
ノズルを移動させながら液体を散布することで、液体の
使用量、プロセス時間の低減に寄与する液膜の瞬時形
成、また、基板全体の均一な反応を達成することができ
る洗浄方式を目的とする。
In the method according to the first aspect, the liquid supply port is formed into a shower nozzle shape, and the liquid is sprayed onto the spinning substrate while moving the shower nozzle, thereby reducing the amount of liquid used and the processing time. It is an object of the present invention to provide a cleaning method capable of achieving instantaneous formation of a liquid film contributing to the above and a uniform reaction of the entire substrate.

【0005】請求項2記載の方式は、シャワーノズルへ
の液供給管を支持部とし、支持部を稼動させることで、
シャワーノズルに液体を供給しながら、シャワーノズル
が移動することで、請求項1の方式の実現を目的とする
装置。
According to a second aspect of the present invention, the liquid supply pipe to the shower nozzle is used as a support, and the support is operated,
An apparatus for realizing the method according to claim 1, wherein the shower nozzle moves while supplying liquid to the shower nozzle.

【0006】請求項3記載の方式は、上記請求項1の方
式と併せて、基板に対して超音波振動を付加すること
で、超音波振動との相乗効果により、さらに良好な基板
の洗浄を達成できる洗浄方法を目的とする。
According to a third aspect of the present invention, in addition to the method of the first aspect, by applying ultrasonic vibration to the substrate, a more favorable cleaning of the substrate is achieved by a synergistic effect with the ultrasonic vibration. The aim is to achieve a cleaning method that can be achieved.

【0007】[0007]

【課題を解決するための手段】請求項1記載の方式は、
スピンしている基板上を、移動可能なシャワーノズル
が、1次供給として、基板の外側から液体を散布しつ
つ、基板中心に向かって、適度な速度で移動する。中心
に達したシャワーノズルは、2次供給として、プロセス
終了までその流量で液体を散布、もしくは、流量を抑え
て散布し、プロセス終了後、中心から基板の外側に戻
る。
According to a first aspect of the present invention, there is provided a method comprising:
A movable shower nozzle moves at an appropriate speed toward the center of the substrate while spraying liquid from the outside of the substrate as a primary supply on the spinning substrate. The shower nozzle that reaches the center, as a secondary supply, sprays the liquid at the flow rate until the end of the process, or sprays the liquid at a reduced flow rate, and returns from the center to the outside of the substrate after the end of the process.

【0008】請求項2記載の方式は、シャワーノズルへ
の液供給管を支持部とし、支持部を稼動させることで、
シャワーノズルに液体を供給しながら、シャワーノズル
が移動することを特徴とする装置。
According to a second aspect of the present invention, the liquid supply pipe to the shower nozzle is used as a support, and the support is operated.
An apparatus characterized in that the shower nozzle moves while supplying the liquid to the shower nozzle.

【0009】請求項3記載の方式は、請求項1記載の方
式と併せて、被洗浄物の基板に対して超音波振動を付加
する方式であることを特徴とする。
The method according to a third aspect is characterized in that, in addition to the method according to the first aspect, an ultrasonic vibration is applied to the substrate to be cleaned.

【0010】[0010]

【発明の実施の形態】液体を散布しながら、スピンして
いる基板にシャワーノズルが基板中心に向かって移動す
ることで、基板の外側から順次液膜が形成されていき、
シャワーノズルが中心に達した瞬間に、基板全体に均一
な液膜が形成される。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A shower nozzle moves toward the center of a spinning substrate while spraying a liquid to form a liquid film sequentially from the outside of the substrate.
As soon as the shower nozzle reaches the center, a uniform liquid film is formed on the entire substrate.

【0011】[0011]

【実施例】均一な液膜が形成されたあとは、供給流量に
変化があっても、液膜は安定して保持され続けるので、
シャワーノズルを中心に固定して、円周部分から振り切
られる分だけを補充するだけで良く、この方法で、供給
液量の減少に寄与する。
[Embodiment] After a uniform liquid film is formed, the liquid film is kept stable even if the supply flow rate changes.
It is only necessary to fix the shower nozzle at the center and to replenish only the amount shaken off from the circumferential portion, and this method contributes to the reduction of the supply liquid amount.

【0012】乾燥工程時に、シャワーノズルは基板上の
外側で待機するため、ミスト等によりシャワーノズルに
付着した、基板への水滴落下がない。
During the drying process, the shower nozzle waits outside the substrate, so that there is no water droplet attached to the shower nozzle due to mist or the like and falling onto the substrate.

【0013】[0013]

【発明の効果】請求項1記載の方式により、基板と接触
する液体が、均一な液膜を形成するため、基板全体の均
一な反応が実現できる。また、シャワーノズルが移動す
る時間は、基板の半径分の距離であるため短時間であ
る。
According to the first aspect of the present invention, since the liquid in contact with the substrate forms a uniform liquid film, a uniform reaction of the entire substrate can be realized. Further, the time required for the shower nozzle to move is a short time because it is the distance corresponding to the radius of the substrate.

【0014】請求項1記載の方式により、液供給口がシ
ャワーノズルであるため、液体散布部分小口径の総面積
分のノズル径よりも、シャワー部の面積で液体を散布で
きるため効率が良く、さらに、液体の供給量が、移動時
の1次供給と、中心に停止時の補充による2次供給のみ
であるので、絶大な液体使用量の削減ができる。
According to the first aspect of the present invention, since the liquid supply port is a shower nozzle, the liquid can be sprayed in the area of the shower section more efficiently than the nozzle diameter corresponding to the total area of the small diameter of the liquid spraying portion. Further, since the supply amount of the liquid is only the primary supply at the time of movement and the secondary supply at the center by replenishment at the time of stop, the amount of liquid used can be greatly reduced.

【0015】請求項2記載の方式により、シャワーノズ
ルの液供給管を支持部とすることが出来、シャワーノズ
ルの稼動方法が容易となり、駆動部の構造が簡易となる
効果がある。
According to the second aspect of the present invention, the liquid supply pipe of the shower nozzle can be used as a support portion, so that the operation method of the shower nozzle becomes easy and the structure of the driving portion is simplified.

【0016】請求項3記載の方式により、上記請求項1
記載の発明の効果と併せて、被洗浄物の基板に対して、
超音波振動の効果が付加されるので、相乗効果により、
より良好な洗浄処理することができる効果がある。
According to a third aspect of the present invention, there is provided the first aspect of the present invention.
In addition to the effects of the invention described, for the substrate of the object to be cleaned,
Because the effect of ultrasonic vibration is added, by the synergistic effect,
There is an effect that a better cleaning process can be performed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明請求項1の構造図FIG. 1 is a structural view according to claim 1 of the present invention;

【図2】本発明請求項2の構造図FIG. 2 is a structural view according to claim 2 of the present invention;

【図3】本発明請求項3の構造図FIG. 3 is a structural view according to claim 3 of the present invention;

【符号の説明】[Explanation of symbols]

1 散布液体 2 シャワーノズル 3 液供給管 4 シャワーノズル移動方向 5 基板 6 回転軸 7 基板回転方向 8 稼動部 9 液供給管締具 10 稼動範囲 11 超音波振動機液供給部 12 超音波振動機液供給管 13 液供給部 14 超音波ノズル孔 15 シャワーノズル孔 16 超音波振動機 DESCRIPTION OF SYMBOLS 1 Spraying liquid 2 Shower nozzle 3 Liquid supply pipe 4 Shower nozzle moving direction 5 Substrate 6 Rotation axis 7 Substrate rotation direction 8 Operating part 9 Liquid supply pipe fastener 10 Operating range 11 Ultrasonic vibrator liquid supply part 12 Ultrasonic vibrator liquid Supply pipe 13 Liquid supply unit 14 Ultrasonic nozzle hole 15 Shower nozzle hole 16 Ultrasonic vibrator

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 液供給口をシャワーノズル形状にして、
液体を散布しながら、スピンしている基板にシャワーノ
ズルを基板中心に移動させる、水平式スピン洗浄機にお
ける均一塗膜散布方式。
1. A liquid supply port having a shower nozzle shape,
A uniform coating spraying method in a horizontal spin washer in which a shower nozzle is moved to the center of the spinning substrate while spraying liquid.
【請求項2】 シャワーノズルへの液供給管を支持部と
し、支持部を稼動させることで、シャワーノズルを移動
できる、請求項1の散布方式を可能とする洗浄装置。
2. The cleaning apparatus according to claim 1, wherein the shower nozzle can be moved by operating a liquid supply pipe to the shower nozzle as a support portion and operating the support portion.
【請求項3】 シャワーノズルに超音波振動機を付加す
る、請求項1の散布方式
3. The spraying method according to claim 1, wherein an ultrasonic vibrator is added to the shower nozzle.
JP11264288A 1999-08-12 1999-08-12 Uniform paint film scattering system by moving shower nozzle in horizontal spin washing machine Pending JP2001053045A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11264288A JP2001053045A (en) 1999-08-12 1999-08-12 Uniform paint film scattering system by moving shower nozzle in horizontal spin washing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11264288A JP2001053045A (en) 1999-08-12 1999-08-12 Uniform paint film scattering system by moving shower nozzle in horizontal spin washing machine

Publications (1)

Publication Number Publication Date
JP2001053045A true JP2001053045A (en) 2001-02-23

Family

ID=17401093

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11264288A Pending JP2001053045A (en) 1999-08-12 1999-08-12 Uniform paint film scattering system by moving shower nozzle in horizontal spin washing machine

Country Status (1)

Country Link
JP (1) JP2001053045A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012222237A (en) * 2011-04-12 2012-11-12 Tokyo Electron Ltd Liquid processing method and liquid processing device
CN113786944A (en) * 2021-08-24 2021-12-14 江门市安诺特炊具制造有限公司 Magnetic induction coating spraying system and method for cooking utensils

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012222237A (en) * 2011-04-12 2012-11-12 Tokyo Electron Ltd Liquid processing method and liquid processing device
CN113786944A (en) * 2021-08-24 2021-12-14 江门市安诺特炊具制造有限公司 Magnetic induction coating spraying system and method for cooking utensils

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