JPS61296724A - High-pressure jet scrubber washer - Google Patents

Abstract

PURPOSE:To make scattering fine particles absorbed by a conical liquid curtain or exhausted along the conical liquid curtain by forming the conical liquid curtain in a space comprehending the outside of an object to be washed to which washing solution is applied by a high-pressure jet nozzle and the neighborhood of the high-pressure jet nozzle. CONSTITUTION:Washing solution spouted out of a high-pressure jet nozzle 1 forms a liquid column 12 and is applied to a target 9 to be washed continuously or intermittently. At that time, fine particles of the solution drops 13 scatter around the target 9. Air flow near the inside of a conical liquid curtain 14 which is spouted out of spouting outlets 7 of an annular nozzle main body 4 flow downward and some of the liquid drops 13 are guided downward along the liquid curtain 14 by that air flow and the liquid drops 13 which collide with the liquid curtain 14 are mostly absorbed by the liquid curtain 14. Further, the liquid drops 13 recoiling from the liquid curtain 14 are also guided downward. Therefore, quantity of the liquid drops 13 which scatter from the above of the target 9 to the outside of the curtain and recontaminate the target 9 is substantially reduced.

Description

[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to a cleaning device, particularly for cleaning semiconductor parts, electronic parts,
Regarding high-pressure jet scrubber equipment that is suitable for cleaning precision parts such as optical parts.

[Background of the invention]

Hitherto, this type of high-pressure jet scrubber device has been disclosed in the invention described in JP-A No. 56-67926 and the invention described in JP-A-56-67926.
The invention described in Japanese Patent No. 125842 is known.

The invention disclosed in Japanese Patent Application Laid-open No. 56-67926 is, as shown in FIG. In addition to projecting the fluid 110, the nozzle 102 is tilted so that the spread of the fluid 110 after the projecting is large in the radial direction toward the center of rotation and becomes small in the opposite direction, thereby preventing damage to the center of rotation. , the entire surface of the workpiece 108 is to be thoroughly cleaned.

Further, the invention of JP-A-56-125842 is as shown in FIG.
The moving speed of the cleaning liquid spray nozzle 204 relative to the sample 203 is changed in inverse proportion to the distance from the rotation center of the sample 203 by a drive device 210 having a control unit 211, thereby solving uneven cleaning and insufficient cleaning. That is.

However, in both of the above inventions, the fluid injected onto the object to be cleaned by a high-pressure jet is affected by the fluid pressure and spray angle, and after colliding with the object to be cleaned, some of the fluid becomes fine particles and is scattered into the cleaning atmosphere. There is a problem that the particles float in the air and re-adhere to the surface of the object to be cleaned after cleaning, or even contaminate the working atmosphere, and this problem has not been solved.

It is also known that in a spin coating device for forming a photoresist film on a silicon wafer, an envelope is provided to cover the object to be coated in order to prevent fine particles of photoresist that are discharged and coated from adhering again. However, when applied to high-pressure jet cleaning, sufficient effects were not obtained.

[Purpose of the invention]

The present invention has been made to solve the above problems,
It is an object of the present invention to provide a high-pressure jet scrubber cleaning device that suppresses the scattering of fine liquid particles generated by high-pressure jet cleaning and prevents re-contamination of objects to be cleaned and contamination of the cleaning atmosphere.

[Summary of the invention]

In order to achieve the above purpose, a conical fluid curtain is formed in a space encompassing the outside of the object to be cleaned that is sprayed by a high-pressure jet nozzle and the surroundings of the high-pressure jet nozzle, thereby removing the scattered fine particles. It is characterized in that it is configured to be absorbed into or discharged along the fluid curtain.

[Embodiments of the invention]

Embodiments of the present invention will be described below with reference to FIGS. 1 and 2.

At the center of the outer enclosures 16a, 16b in FIG.

An object 9 to be cleaned, such as a silicon wafer, is placed on a support stand 1o that is rotated by a shaft 11, and a moving arm is provided above the object 9 to be movable in a fixed direction. There is a high-pressure jet nozzle 1 with a liquid supply tube 3 fixed to 2 . There is also an arm 45 that moves above the object to be cleaned 9 during cleaning, and this arm 5 holds a ring-shaped nozzle body 4 having a liquid supply tube 8.

As shown in FIG. 2, the ring-shaped nozzle main body 4 is constructed such that a gasket 4c is inserted between a jacket 4a and a discharge ring 4b, and is tightened with a bolt 4d to maintain liquid tightness. Further, the ring-shaped nozzle main body 4 is configured to form a hollow portion 6 and a discharge lower portion in a cross section.

A conical liquid curtain 14 is formed by ejecting the liquid sent through the liquid supply tube 8 from the discharge lower.

As shown in FIG. 1, the lower part of the outer enclosure 16b is preferably provided with a net-like or porous receiving plate 18 and a splash prevention plate 20 for water drainage.

When cleaning is performed with the above configuration, the ring-shaped nozzle body 4 reaches a specified position above the object 9 to be cleaned, either at the same time as the high-pressure jet nozzle 1 or with a slight time lag, and the high-pressure jet nozzle 1 is activated. At the same time or with a slight time lag, liquid is ejected from the ring-shaped nozzle body 4 to form a liquid curtain.

The cleaning liquid injected from the high-pressure jet nozzle 1 is a liquid column 12.
The spraying is repeated continuously or intermittently on the object 9 to be cleaned. At this time, fine droplets 13 are scattered around the object 9 to be cleaned.

The flow of air near the inside of the conical liquid curtain 14 ejected from the discharge lower of the ring-shaped nozzle body 4 is directed from above to below, and due to this flow, some of the droplets 13 are directed downward along the liquid curtain 14. Most of the droplets 13 that are guided to the liquid curtain 14 and collide with the liquid curtain 14 are absorbed by the liquid curtain 14.
Furthermore, since the splashing droplets 13 are also guided downward, the amount of droplets that scatter outward from above the object 9 to be cleaned onto the liquid curtain 14 or re-contaminate the object 9 to be cleaned is drastically reduced.

As described above, in this embodiment, fine particles generated when the liquid column 12 jetted from the high-pressure jet nozzle 1 collides with the object 9 to be cleaned are absorbed or guided downward by the liquid curtain 14, thereby moving them out of the cleaning area. It is designed to prevent splashing and leakage.

The form of the liquid curtain 14 changes depending on the shape and size of the discharge lower.

That is, in addition to this embodiment in which the discharge lowers are continuously provided around the entire circumference of the discharge ring 4b, when the discharge lowers are formed intermittently, an intermittent liquid curtain is formed, and the discharge lowers are continuously provided around the entire circumference of the discharge ring 4b. When a large number of small holes are provided in the pores, a shower-like curtain of fine fluid particles is formed.

What is ejected from the discharge lower may be high-pressure gas in addition to liquid, and the fluid curtain is formed by the high-pressure jet nozzle 1.
It may be formed so as to surround the injection area, and is not limited to a conical shape as in the embodiment.

〔Effect of the invention〕

As described above, by implementing the present invention, in a high-pressure jet scrubber device, the fine particles generated when the cleaning liquid jetted from the high-pressure jet nozzle hits the object to be cleaned are not scattered outside the cleaning area, and the It is possible to prevent redeposition and perform precise cleaning.

[Brief explanation of drawings]

FIG. 1 is a sectional view showing one embodiment of the present invention, and FIG.
3 is a sectional view of a conventional jet scrubber device, and FIG. 4 is a schematic diagram of another conventional jet scrubber device. 1... High pressure jet nozzle, 2... Moving arm, 3
...Liquid supply tube, 4...Ring-shaped nozzle body, 5
...Arm, 6.Hollow part, 7.Discharge port, 8.
...Liquid supply tube, 9...Object to be cleaned, 10...Support stand, 11...Shaft, 12...Liquid, 13.
...Droplet, 14...Liquid curtain, 16a, 16b.
...Envelope, 18...Socket board, agent patent attorney Katsuo Ogawa, Schiff rate 1 figure IQ I+ 20 Yu'2 figure

Claims (1)

[Scope of Claims] 1. A high-pressure jet scrubber device comprising a device for forming a fluid curtain by causing fluid to fall around the outside of an injection area of a high-pressure jet nozzle. 2. The high-pressure jet scrubber device according to claim 1, wherein the fluid curtain is formed in a continuous surround. 3. The high-pressure jet scrubber device according to claim 1, wherein the fluid curtain is formed intermittently in a surrounding manner. 4. The high-pressure jet scrubber device according to claim 1, wherein the fluid curtain is surrounded by fine fluid particles.