JP2001035907A5 - - Google Patents

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Publication number
JP2001035907A5
JP2001035907A5 JP1999210192A JP21019299A JP2001035907A5 JP 2001035907 A5 JP2001035907 A5 JP 2001035907A5 JP 1999210192 A JP1999210192 A JP 1999210192A JP 21019299 A JP21019299 A JP 21019299A JP 2001035907 A5 JP2001035907 A5 JP 2001035907A5
Authority
JP
Japan
Prior art keywords
electrodes
substrate
adsorption device
electrode
adsorption
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1999210192A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001035907A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP11210192A priority Critical patent/JP2001035907A/ja
Priority claimed from JP11210192A external-priority patent/JP2001035907A/ja
Priority to TW90101048A priority patent/TWI235448B/zh
Priority to US09/768,173 priority patent/US6781812B2/en
Publication of JP2001035907A publication Critical patent/JP2001035907A/ja
Publication of JP2001035907A5 publication Critical patent/JP2001035907A5/ja
Pending legal-status Critical Current

Links

JP11210192A 1999-07-26 1999-07-26 吸着装置 Pending JP2001035907A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP11210192A JP2001035907A (ja) 1999-07-26 1999-07-26 吸着装置
TW90101048A TWI235448B (en) 1999-07-26 2001-01-17 Absorption device
US09/768,173 US6781812B2 (en) 1999-07-26 2001-01-24 Chuck equipment

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11210192A JP2001035907A (ja) 1999-07-26 1999-07-26 吸着装置
US09/768,173 US6781812B2 (en) 1999-07-26 2001-01-24 Chuck equipment

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2005205730A Division JP2006054445A (ja) 2005-07-14 2005-07-14 吸着装置

Publications (2)

Publication Number Publication Date
JP2001035907A JP2001035907A (ja) 2001-02-09
JP2001035907A5 true JP2001035907A5 (enExample) 2005-12-02

Family

ID=26517905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11210192A Pending JP2001035907A (ja) 1999-07-26 1999-07-26 吸着装置

Country Status (2)

Country Link
US (1) US6781812B2 (enExample)
JP (1) JP2001035907A (enExample)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100750835B1 (ko) * 2001-01-19 2007-08-22 가부시키가이샤 알박 흡착장치
JP2003037159A (ja) * 2001-07-25 2003-02-07 Toto Ltd 静電チャックユニット
KR100511854B1 (ko) 2002-06-18 2005-09-02 아네르바 가부시키가이샤 정전 흡착 장치
JP2004047912A (ja) * 2002-07-16 2004-02-12 Ulvac Japan Ltd 吸着装置及び真空処理装置
JP5020064B2 (ja) 2004-03-12 2012-09-05 エスアールアイ インターナショナル 機械的メタ材料
US20060012939A1 (en) * 2004-04-09 2006-01-19 Varian Semiconductor Equipment Associates, Inc. Clamp for use in processing semiconductor workpieces
JP2006066857A (ja) * 2004-07-26 2006-03-09 Creative Technology:Kk 双極型静電チャック
US7126091B1 (en) 2005-03-23 2006-10-24 Eclipse Energy Systems, Inc. Workpiece holder for vacuum processing
JP4522926B2 (ja) * 2005-08-16 2010-08-11 株式会社アルバック 吸着装置の製造方法
JP4763380B2 (ja) * 2005-08-25 2011-08-31 株式会社アルバック 吸着装置の製造方法
JP2007073892A (ja) * 2005-09-09 2007-03-22 Ulvac Japan Ltd 吸着装置、貼り合わせ装置、封着方法
US7551419B2 (en) * 2006-06-05 2009-06-23 Sri International Electroadhesion
US7554787B2 (en) * 2006-06-05 2009-06-30 Sri International Wall crawling devices
KR100763532B1 (ko) * 2006-08-17 2007-10-05 삼성전자주식회사 웨이퍼 지지장치, 웨이퍼 노광 장치 및 웨이퍼 지지방법
JP4890421B2 (ja) * 2006-10-31 2012-03-07 太平洋セメント株式会社 静電チャック
WO2008082978A2 (en) * 2006-12-26 2008-07-10 Saint-Gobain Ceramics & Plastics, Inc. Electrostatic chuck and method of forming
WO2008082977A2 (en) * 2006-12-26 2008-07-10 Saint-Gobain Ceramics & Plastics, Inc. Electrostatic chuck and method of forming
JP5279455B2 (ja) * 2008-11-10 2013-09-04 太平洋セメント株式会社 静電チャック
JP2010161319A (ja) * 2009-01-09 2010-07-22 Nikon Corp 静電吸着保持装置、露光装置及びデバイスの製造方法
WO2011081046A1 (ja) * 2009-12-28 2011-07-07 株式会社アルバック 成膜装置及び成膜方法
JP5685408B2 (ja) * 2010-09-08 2015-03-18 株式会社アルバック 薄膜形成方法、エッチング方法
JP5165078B2 (ja) * 2011-04-13 2013-03-21 株式会社アルバック 吸着装置
KR101923174B1 (ko) * 2011-05-11 2018-11-29 삼성디스플레이 주식회사 정전 척, 상기 정전 척을 포함하는 박막 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법
KR20140053323A (ko) * 2011-08-19 2014-05-07 울박, 인크 진공 처리 장치 및 진공 처리 방법
US10388493B2 (en) * 2011-09-16 2019-08-20 Lam Research Corporation Component of a substrate support assembly producing localized magnetic fields
JP5312549B2 (ja) * 2011-10-05 2013-10-09 株式会社アルバック 吸着装置
DE102012212465B3 (de) * 2012-07-17 2013-11-07 Trumpf Werkzeugmaschinen Gmbh + Co. Kg Elektroadhäsionsgreifer zum Halten von Werkstücken
WO2015013142A1 (en) 2013-07-22 2015-01-29 Applied Materials, Inc. An electrostatic chuck for high temperature process applications
WO2015020791A1 (en) 2013-08-05 2015-02-12 Applied Materials, Inc. In-situ removable electrostatic chuck
KR102139682B1 (ko) 2013-08-05 2020-07-30 어플라이드 머티어리얼스, 인코포레이티드 얇은 기판 취급을 위한 정전 캐리어
CN105408993A (zh) 2013-08-06 2016-03-16 应用材料公司 局部加热的多区域基板支撑件
JP2016539489A (ja) 2013-09-20 2016-12-15 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 集積静電チャックを備えた基板キャリア
US9460950B2 (en) 2013-12-06 2016-10-04 Applied Materials, Inc. Wafer carrier for smaller wafers and wafer pieces
JP6139449B2 (ja) * 2014-03-26 2017-05-31 株式会社アドバンテスト ステージ装置および電子線装置
JP6225055B2 (ja) * 2014-03-26 2017-11-01 株式会社アドバンテスト ステージ装置および電子線装置
JP2017516294A (ja) 2014-05-09 2017-06-15 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 基板キャリアシステム及びそれを使用するための方法
WO2015171226A1 (en) 2014-05-09 2015-11-12 Applied Materials, Inc. Substrate carrier system with protective covering
US9959961B2 (en) 2014-06-02 2018-05-01 Applied Materials, Inc. Permanent magnetic chuck for OLED mask chucking
JP2018518055A (ja) 2015-06-04 2018-07-05 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 透明な静電キャリア
KR102513443B1 (ko) 2016-03-15 2023-03-24 삼성전자주식회사 정전 척 및 그를 포함하는 기판 처리 장치
FR3054930B1 (fr) * 2016-08-02 2018-07-13 Soitec Utilisation d'un champ electrique pour detacher une couche piezo-electrique a partir d'un substrat donneur
US11562913B2 (en) * 2019-04-25 2023-01-24 Watlow Electric Manufacturing Company Multi-zone azimuthal heater
EP4041835A1 (en) * 2019-09-10 2022-08-17 OnRobot A/S Dual electrode electroadhesion and dust mitigation/cleaning system
KR20210089375A (ko) * 2020-01-08 2021-07-16 주식회사 미코세라믹스 정전척

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5103367A (en) * 1987-05-06 1992-04-07 Unisearch Limited Electrostatic chuck using A.C. field excitation
JP2535663B2 (ja) * 1990-10-02 1996-09-18 株式会社アビサレ 掲示装置
US5847918A (en) * 1995-09-29 1998-12-08 Lam Research Corporation Electrostatic clamping method and apparatus for dielectric workpieces in vacuum processors
US5751537A (en) * 1996-05-02 1998-05-12 Applied Materials, Inc. Multielectrode electrostatic chuck with fuses
JP3805134B2 (ja) 1999-05-25 2006-08-02 東陶機器株式会社 絶縁性基板吸着用静電チャック

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