JP2001013297A5 - - Google Patents

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Publication number
JP2001013297A5
JP2001013297A5 JP1999185696A JP18569699A JP2001013297A5 JP 2001013297 A5 JP2001013297 A5 JP 2001013297A5 JP 1999185696 A JP1999185696 A JP 1999185696A JP 18569699 A JP18569699 A JP 18569699A JP 2001013297 A5 JP2001013297 A5 JP 2001013297A5
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JP
Japan
Prior art keywords
reflective
reflective film
region
optical element
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1999185696A
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English (en)
Japanese (ja)
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JP2001013297A (ja
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Publication date
Application filed filed Critical
Priority to JP11185696A priority Critical patent/JP2001013297A/ja
Priority claimed from JP11185696A external-priority patent/JP2001013297A/ja
Publication of JP2001013297A publication Critical patent/JP2001013297A/ja
Publication of JP2001013297A5 publication Critical patent/JP2001013297A5/ja
Pending legal-status Critical Current

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JP11185696A 1999-06-30 1999-06-30 反射光学素子および露光装置 Pending JP2001013297A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11185696A JP2001013297A (ja) 1999-06-30 1999-06-30 反射光学素子および露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11185696A JP2001013297A (ja) 1999-06-30 1999-06-30 反射光学素子および露光装置

Publications (2)

Publication Number Publication Date
JP2001013297A JP2001013297A (ja) 2001-01-19
JP2001013297A5 true JP2001013297A5 (https=) 2006-03-30

Family

ID=16175277

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11185696A Pending JP2001013297A (ja) 1999-06-30 1999-06-30 反射光学素子および露光装置

Country Status (1)

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JP (1) JP2001013297A (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
DE10106605A1 (de) * 2001-02-13 2002-08-22 Zeiss Carl System zur Beseitigung oder wenigstens Dämpfung von Schwingungen
JP4667645B2 (ja) * 2001-05-30 2011-04-13 株式会社アマダ ミラー温度制御機構を有するレーザー加工機及びレーザー加工機のミラー温度制御方法
WO2004034447A1 (ja) * 2002-10-10 2004-04-22 Nikon Corporation 極短紫外線光学系用反射ミラー、極短紫外線光学系、極短紫外線光学系の使用方法、極短紫外線光学系の製造方法、極短紫外線露光装置、及び極短紫外線露光装置の使用方法
JP4532835B2 (ja) * 2003-02-13 2010-08-25 キヤノン株式会社 冷却装置、それを有する光学部材並びに露光装置
JP2005128238A (ja) * 2003-10-23 2005-05-19 Tadahiro Omi マスクリピータ、パターン描画装置、及びグレースケール手法
WO2004095549A1 (ja) 2003-04-11 2004-11-04 Ball Semiconductor Inc. パターン描画装置及びパターン描画方法
JP4262031B2 (ja) * 2003-08-19 2009-05-13 キヤノン株式会社 露光装置及びデバイスの製造方法
JP2005175187A (ja) * 2003-12-11 2005-06-30 Canon Inc 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス
JP2005302963A (ja) * 2004-04-09 2005-10-27 Canon Inc 露光装置
DE102006045075A1 (de) 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element
US8064151B2 (en) * 2007-08-14 2011-11-22 Asml Netherlands B.V. Lithographic apparatus and thermal optical manipulator control method
CN101784954B (zh) 2007-08-24 2015-03-25 卡尔蔡司Smt有限责任公司 可控光学元件以及用热致动器操作光学元件的方法和半导体光刻的投射曝光设备
DE102009054869B4 (de) 2009-04-09 2022-02-17 Carl Zeiss Smt Gmbh Spiegel zur Führung eines Strahlungsbündels, Vorrichtungen mit einem derartigen Spiegel sowie Verfahren zur Herstellung mikro- oder nanostrukturierter Bauelemente
JP2011222958A (ja) * 2010-03-25 2011-11-04 Komatsu Ltd ミラーおよび極端紫外光生成装置
NL2022915A (en) * 2018-04-24 2019-10-28 Asml Netherlands Bv Reflective optical element for a radiation beam
DE102020212743A1 (de) * 2020-10-08 2022-04-14 Carl Zeiss Smt Gmbh Adaptives optisches Element für die Mikrolithographie
CN113936840B (zh) * 2021-10-22 2023-08-25 中国科学院上海高等研究院 一种温控x射线变形镜

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