JP2001004932A5 - - Google Patents

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Publication number
JP2001004932A5
JP2001004932A5 JP1999173876A JP17387699A JP2001004932A5 JP 2001004932 A5 JP2001004932 A5 JP 2001004932A5 JP 1999173876 A JP1999173876 A JP 1999173876A JP 17387699 A JP17387699 A JP 17387699A JP 2001004932 A5 JP2001004932 A5 JP 2001004932A5
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JP
Japan
Prior art keywords
light
modulation device
piezoelectric element
light modulation
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1999173876A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001004932A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP11173876A priority Critical patent/JP2001004932A/ja
Priority claimed from JP11173876A external-priority patent/JP2001004932A/ja
Publication of JP2001004932A publication Critical patent/JP2001004932A/ja
Publication of JP2001004932A5 publication Critical patent/JP2001004932A5/ja
Withdrawn legal-status Critical Current

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JP11173876A 1999-06-21 1999-06-21 光変調デバイス及び表示装置 Withdrawn JP2001004932A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11173876A JP2001004932A (ja) 1999-06-21 1999-06-21 光変調デバイス及び表示装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11173876A JP2001004932A (ja) 1999-06-21 1999-06-21 光変調デバイス及び表示装置

Publications (2)

Publication Number Publication Date
JP2001004932A JP2001004932A (ja) 2001-01-12
JP2001004932A5 true JP2001004932A5 (enExample) 2004-08-26

Family

ID=15968773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11173876A Withdrawn JP2001004932A (ja) 1999-06-21 1999-06-21 光変調デバイス及び表示装置

Country Status (1)

Country Link
JP (1) JP2001004932A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4510429B2 (ja) * 2003-11-19 2010-07-21 財団法人国際科学振興財団 マスク描画手法、及びマスク描画装置
US7016014B2 (en) * 2004-02-27 2006-03-21 Asml Netherlands B.V Lithographic apparatus and device manufacturing method

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