JP2000206685A5 - - Google Patents

Download PDF

Info

Publication number
JP2000206685A5
JP2000206685A5 JP1999004984A JP498499A JP2000206685A5 JP 2000206685 A5 JP2000206685 A5 JP 2000206685A5 JP 1999004984 A JP1999004984 A JP 1999004984A JP 498499 A JP498499 A JP 498499A JP 2000206685 A5 JP2000206685 A5 JP 2000206685A5
Authority
JP
Japan
Prior art keywords
ring
positive photosensitive
general formula
photosensitive composition
iiia
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999004984A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000206685A (ja
JP4006665B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP00498499A priority Critical patent/JP4006665B2/ja
Priority claimed from JP00498499A external-priority patent/JP4006665B2/ja
Publication of JP2000206685A publication Critical patent/JP2000206685A/ja
Publication of JP2000206685A5 publication Critical patent/JP2000206685A5/ja
Application granted granted Critical
Publication of JP4006665B2 publication Critical patent/JP4006665B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP00498499A 1999-01-12 1999-01-12 ポジ型感光性組成物及びポジ型感光性平版印刷版、並びにポジ画像形成方法 Expired - Fee Related JP4006665B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP00498499A JP4006665B2 (ja) 1999-01-12 1999-01-12 ポジ型感光性組成物及びポジ型感光性平版印刷版、並びにポジ画像形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP00498499A JP4006665B2 (ja) 1999-01-12 1999-01-12 ポジ型感光性組成物及びポジ型感光性平版印刷版、並びにポジ画像形成方法

Publications (3)

Publication Number Publication Date
JP2000206685A JP2000206685A (ja) 2000-07-28
JP2000206685A5 true JP2000206685A5 (enExample) 2006-11-02
JP4006665B2 JP4006665B2 (ja) 2007-11-14

Family

ID=11598882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP00498499A Expired - Fee Related JP4006665B2 (ja) 1999-01-12 1999-01-12 ポジ型感光性組成物及びポジ型感光性平版印刷版、並びにポジ画像形成方法

Country Status (1)

Country Link
JP (1) JP4006665B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070172758A1 (en) * 2006-01-20 2007-07-26 Konica Minolta Medical & Graphic, Inc. Planographic printing plate material and its manufacturing process
WO2007091683A1 (ja) * 2006-02-10 2007-08-16 Kyowa Hakko Chemical Co., Ltd. ビススクアリリウム化合物
WO2023037843A1 (ja) * 2021-09-07 2023-03-16 国立大学法人九州工業大学 新規ダブルスクアライン色素及びその製造方法
JP7812563B2 (ja) * 2021-09-07 2026-02-10 国立大学法人九州工業大学 新規ダブルスクアライン色素及びその製造方法

Similar Documents

Publication Publication Date Title
ATE362125T1 (de) Negativ-typ bildaufzeichnungsmaterial und prekursor für negativ-typ lithographische druckplatte
KR850004660A (ko) 감-방사선 조성물
DE60222310D1 (de) Negativfilm-Aufzeichnungsmaterial und Cyaninfarbstoff
ATE555421T1 (de) Lichtempfindliche zusammensetzung und negativ arbeitende flachdruckplatte
BR9101072A (pt) Mistura fotopolimerizavel e material de registro produzido a partir da mesma
KR920007839A (ko) 적외선 흡수 스쿠아릴륨 화합물을 함유하는 열 상형성을 위한 공여체 소자 및 그로 구성되는 열 전달 조립물
Crivello Benzophenothiazine and benzophenoxazine photosensitizers for triarylsulfonium salt cationic photoinitiators
EP0447544A1 (en) NEW ONIUM SALTS AND THEIR USE AS PHOTO-PRIMERS.
JP2005181991A5 (enExample)
JP2000206685A5 (enExample)
DE602004028127D1 (de) Cyaninverbindungen, optische aufzeichnungsmaterialien sowie optische aufzeichnungsträger
JP2005132055A5 (enExample)
JP2004525798A5 (enExample)
JPH11344808A5 (enExample)
DE3868975D1 (de) Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien.
JP2001166517A5 (enExample)
JP2004077810A5 (enExample)
ATE514753T1 (de) Indoliumverbindungen und optische aufzeichnungsmaterialien
JPH10307397A5 (enExample)
JP2000105476A5 (enExample)
DE3869470D1 (de) Photopolymerisierbare aufzeichnungsmaterialien sowie photoresist-schichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien.
JP3776532B2 (ja) レーザー色素除去型記録要素
Hayase et al. Application of Polysilanes to LSI Manufacturing Processes Their Antireflective Properties and Etching Selectivity toward Resists
JP2001194793A5 (enExample)
GB1158627A (en) Photographic Systems