JP2001194793A5 - - Google Patents

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Publication number
JP2001194793A5
JP2001194793A5 JP2000310728A JP2000310728A JP2001194793A5 JP 2001194793 A5 JP2001194793 A5 JP 2001194793A5 JP 2000310728 A JP2000310728 A JP 2000310728A JP 2000310728 A JP2000310728 A JP 2000310728A JP 2001194793 A5 JP2001194793 A5 JP 2001194793A5
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JP
Japan
Prior art keywords
group
substituent
carbon atoms
formula
substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000310728A
Other languages
English (en)
Japanese (ja)
Other versions
JP4253430B2 (ja
JP2001194793A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000310728A priority Critical patent/JP4253430B2/ja
Priority claimed from JP2000310728A external-priority patent/JP4253430B2/ja
Publication of JP2001194793A publication Critical patent/JP2001194793A/ja
Publication of JP2001194793A5 publication Critical patent/JP2001194793A5/ja
Application granted granted Critical
Publication of JP4253430B2 publication Critical patent/JP4253430B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2000310728A 1999-10-28 2000-10-11 ポジ型フォトレジスト組成物及びパターン形成方法 Expired - Fee Related JP4253430B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000310728A JP4253430B2 (ja) 1999-10-28 2000-10-11 ポジ型フォトレジスト組成物及びパターン形成方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP30731899 1999-10-28
JP11-307318 1999-10-28
JP2000310728A JP4253430B2 (ja) 1999-10-28 2000-10-11 ポジ型フォトレジスト組成物及びパターン形成方法

Publications (3)

Publication Number Publication Date
JP2001194793A JP2001194793A (ja) 2001-07-19
JP2001194793A5 true JP2001194793A5 (enExample) 2006-01-12
JP4253430B2 JP4253430B2 (ja) 2009-04-15

Family

ID=26565059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000310728A Expired - Fee Related JP4253430B2 (ja) 1999-10-28 2000-10-11 ポジ型フォトレジスト組成物及びパターン形成方法

Country Status (1)

Country Link
JP (1) JP4253430B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100830868B1 (ko) 2006-08-10 2008-05-21 주식회사 동진쎄미켐 극자외선 및 심자외선용 감광성 고분자 및 이를 포함하는포토레지스트 조성물
JP5844613B2 (ja) * 2010-11-17 2016-01-20 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC 感光性コポリマーおよびフォトレジスト組成物

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