JP2000182949A - Processing device and clean air supply method therefor - Google Patents
Processing device and clean air supply method thereforInfo
- Publication number
- JP2000182949A JP2000182949A JP10375585A JP37558598A JP2000182949A JP 2000182949 A JP2000182949 A JP 2000182949A JP 10375585 A JP10375585 A JP 10375585A JP 37558598 A JP37558598 A JP 37558598A JP 2000182949 A JP2000182949 A JP 2000182949A
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- Japan
- Prior art keywords
- air
- processing
- unit
- blowing
- processing unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、例えば液晶ディス
プレイ（Liquid Crystal Display：ＬＣＤ）に使われる
ガラス基板上にレジスト液を塗布し現像する塗布・現像
処理システム等の処理装置および該装置における清浄エ
アの供給方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a processing apparatus such as a coating / developing processing system for applying and developing a resist solution on a glass substrate used for, for example, a liquid crystal display (LCD), and clean air in the apparatus. Related to the supply method.
【０００２】[0002]
【従来の技術】ＬＣＤの製造工程においては、ＬＣＤ用
のガラス基板上にＩＴＯ（Indium TinOxide）の薄膜や
電極パターンを形成するために、半導体デバイスの製造
に用いられるものと同様のフォトリソグラフィ技術が利
用される。フォトリソグラフィ技術では、フォトレジス
トを基板に塗布し、これを露光し、さらに現像する。2. Description of the Related Art In an LCD manufacturing process, a photolithography technique similar to that used in the manufacture of semiconductor devices is used to form an ITO (Indium Tin Oxide) thin film and an electrode pattern on an LCD glass substrate. Used. In the photolithography technique, a photoresist is applied to a substrate, exposed, and further developed.
【０００３】このような塗布・現像処理システムにおい
ては、パーティクルが被処理体である基板に付着しない
よう、上方に清浄エアの吹き出し部を設け、常時、清浄
エアを供給し、ダウンフローの気流を形成している。そ
して、塗布・現像処理システムの下方の床面の開口部グ
リーチングより床下へ吸引されたエアーはリターンゾー
ンを通って再利用される。In such a coating / developing processing system, a clean air blowing section is provided at an upper portion so as to prevent particles from adhering to a substrate which is a processing target, and clean air is always supplied to reduce a downflow airflow. Has formed. Then, the air sucked below the floor from the opening leaching on the floor below the coating / developing system is reused through the return zone.
【０００４】[0004]
【発明が解決しようとする課題】ところで、塗布・現像
処理システムは、被処理体であるガラス基板の搬送路を
挟んで、複数のレジスト塗布装置や複数の現像装置等が
設置されて構成されているが、ガラス基板等の処理枚数
等によっては、このうちいくつかの装置しか使用しない
場合もある。このような場合、不要な装置を取り外した
上で処理が行われる。しかしながら、塗布・現像処理シ
ステムの上方に設置される清浄エアの吹き出し部や下方
に設置されるエア回収部は、各処理装置ごとに対応して
設けられているわけではないため、装置が設置されてい
ない箇所においても清浄エアの供給と吸引（回収）が行
われる。この装置が設置されていない個所において供給
される清浄エアは、被処理体であるガラス基板へのパー
ティクルの付着防止という観点からは、何ら役立ってい
ない余分なエアであるところ、このエアも一緒に吸引
（回収）され、再度吹き出されるために、吸引機構を構
成するブロワや吹き出し部を構成するファン等には全く
余分な負荷がかかっていることになる。The coating / developing processing system includes a plurality of resist coating devices, a plurality of developing devices, and the like, which are disposed with a conveyance path for a glass substrate to be processed interposed therebetween. However, depending on the number of processed glass substrates or the like, only some of these devices may be used. In such a case, the processing is performed after removing unnecessary devices. However, since the clean air blowing section installed above the coating / developing processing system and the air recovery section installed below are not provided for each processing apparatus, the apparatus is installed. The supply and suction (recovery) of the clean air are performed even in a place where no cleaning air is supplied. The clean air supplied at a place where this apparatus is not installed is unnecessary air from the viewpoint of preventing particles from adhering to the glass substrate to be processed. Since the air is sucked (recovered) and blown out again, an extra load is applied to the blower constituting the suction mechanism and the fan constituting the blowout section.
【０００５】本発明は上記に鑑みなされたものであり、
必要な箇所のみに清浄エアを供給でき、上記のように不
要な処理装置を省いた場合に、ブロワやファン等にかか
る余分な負荷を除去し、ランニングコストを低減するこ
とができる処理装置および該装置における清浄エアの供
給方法を提供することを課題とする。別言すると、装置
を設置する部屋全体のエアを循環させるのに比べ、圧倒
的に「動かすエアの量」を減らすことができ、それによ
るブロア能力、冷凍能力、フィルタ数等を低減させるこ
とができる処理装置および該装置における清浄エアの供
給方法を提供することを課題とする。[0005] The present invention has been made in view of the above,
A processing apparatus and a processing apparatus capable of supplying clean air only to a necessary portion and eliminating an unnecessary load on a blower, a fan, and the like when the unnecessary processing apparatus is omitted as described above and reducing running costs. It is an object to provide a method for supplying clean air in an apparatus. In other words, compared to circulating the air in the entire room where the device is installed, it is possible to overwhelmingly reduce the "amount of air to move", thereby reducing the blower capacity, refrigeration capacity, number of filters, etc. It is an object of the present invention to provide a processing apparatus capable of performing the method and a method for supplying clean air in the processing apparatus.
【０００６】[0006]
【課題を解決するための手段】上記課題を解決するた
め、請求項１記載の本発明の処理装置は、被処理体に所
定の処理を行う複数の処理部と、前記各処理部に対応し
て、該処理部の上方に設けられ、清浄エアを直下に向け
て吹き出すエア吹き出し部と、前記各処理部に対応し
て、該処理部の下方に、前記エア吹き出し部に対向して
設けられ、エア吸引機構の吸引力により、リターンダク
トを通じて前記エア吹き出し部にエアを再供給するた
め、処理部を通過したエアを回収するエア回収部と、を
具備することを特徴とする。According to a first aspect of the present invention, there is provided a processing apparatus comprising: a plurality of processing units for performing a predetermined process on an object to be processed; And an air blowing section provided above the processing section and blowing clean air directly downward, and corresponding to each processing section, provided below the processing section and opposed to the air blowing section. An air collection unit that collects air that has passed through the processing unit in order to resupply air to the air blowing unit through a return duct by a suction force of an air suction mechanism.
【０００７】請求項２記載の本発明の処理装置は、被処
理体に所定の処理を行う処理部と、前記処理部を囲繞す
ると共に、側面部にエアを外部に吹き出すためのエア通
過部が形成された処理部保護用のカバー部材と、前記処
理部に対応して、該処理部の上方に設けられ、清浄エア
を直下に向けて吹き出すエア吹き出し部と、前記処理部
に対応して、該処理部の下方に、前記エア吹き出し部に
対向して設けられ、エア吸引機構の吸引力により、リタ
ーンダクトを通じて前記エア吹き出し部にエアを再供給
するため、処理部を通過したエアを回収するエア回収部
と、を具備することを特徴とする。According to a second aspect of the present invention, there is provided a processing apparatus, comprising: a processing section for performing a predetermined processing on an object to be processed; and an air passage section for surrounding the processing section and blowing air to the outside on a side portion. The formed processing unit protection cover member, corresponding to the processing unit, provided above the processing unit, and an air blowing unit that blows clean air directly downward, corresponding to the processing unit, The air passing through the processing unit is collected below the processing unit, facing the air blowing unit, and resupplying the air to the air blowing unit through a return duct by a suction force of an air suction mechanism. And an air recovery unit.
【０００８】請求項３記載の本発明の処理装置は、被処
理体に所定の処理を行う処理部と、前記処理部に対応し
て、該処理部の上方に設けられ、清浄エアを直下に向け
て吹き出し可能であると共に、前記処理部の外方におい
ても清浄エアを直下に向けて吹き出すことができる突出
した吹き出し部を有するエア吹き出し部と、前記突出し
た吹き出し部の外側縁に沿って設けられるカーテン部材
と、前記処理部に対応して、該処理部の下方に、前記エ
ア吹き出し部のうち、突出した吹き出し部を除いたエア
吹き出し部に対向して設けられ、エア吸引機構の吸引力
により、リターンダクトを通じて前記エア吹き出し部に
エアを再供給するため、処理部を通過したエアを回収す
るエア回収部と、を具備することを特徴とする。According to a third aspect of the present invention, there is provided a processing apparatus for performing a predetermined process on an object to be processed, and corresponding to the processing section, provided above the processing section and directing clean air directly below the processing section. An air blowout portion having a protruding blowout portion that can be blown out and that can blow out clean air directly below even outside the processing portion, and provided along an outer edge of the protruding blowout portion. A curtain member corresponding to the processing unit, and provided below the processing unit and opposed to the air blowing unit excluding the protruding blowing unit of the air blowing unit, and the suction force of the air suction mechanism. In order to resupply the air to the air blow-out unit through the return duct, an air collection unit that collects the air that has passed through the processing unit is provided.
【０００９】請求項４記載の本発明の処理装置は、請求
項１〜３のいずれか１に記載の処理装置であって、前記
エア吹き出し部が、送風ファンと、該送風ファンの吹き
出し側に設けられるフィルタとを有して構成されること
を特徴とする。According to a fourth aspect of the present invention, there is provided the processing apparatus according to any one of the first to third aspects, wherein the air blowing unit includes a blower fan and a blower side of the blower fan. And a filter provided.
【００１０】請求項５記載の本発明の処理装置は、請求
項１〜４のいずれか１に記載の処理装置であって、前記
エア吸引機構が、吸引されたエアを冷却する熱交換機
と、前記エア回収部を経由させてエアを吸引すると共
に、前記リターンダクトを経由させてエア吹き出し部に
回収されたエアを供給するブロワとを有して構成される
ことを特徴とする。A processing apparatus according to a fifth aspect of the present invention is the processing apparatus according to any one of the first to fourth aspects, wherein the air suction mechanism comprises: a heat exchanger for cooling the sucked air; It is characterized in that it comprises a blower that sucks air through the air collection unit and supplies the collected air to the air blowing unit through the return duct.
【００１１】請求項６記載の本発明の処理装置は、請求
項１〜５のいずれか１に記載の処理装置であって、前記
エア吸引機構に外部空気取り入れ口が付設されているこ
とを特徴とする。A processing apparatus according to a sixth aspect of the present invention is the processing apparatus according to any one of the first to fifth aspects, wherein an external air intake is provided to the air suction mechanism. And
【００１２】請求項７記載の本発明の処理装置は、請求
項１〜６のいずれか１に記載の処理装置であって、前記
エア吹き出し部とエア回収部との間に、ケミカルトラッ
プが配置されていることを特徴とする。According to a seventh aspect of the present invention, there is provided the processing apparatus according to any one of the first to sixth aspects, wherein a chemical trap is disposed between the air blowing section and the air collecting section. It is characterized by having been done.
【００１３】請求項８記載の本発明の処理装置は、被処
理体に所定の処理を行う複数の処理部と、前記各処理部
に対応して、該処理部の上方に設けられ、清浄エアを直
下に向けて吹き出すエア吹き出し部と、前記各処理部に
対応して、該処理部の下方に、前記エア吹き出し部に対
向してそれぞれ設けられ、前記各エア吹き出し部から吹
き出されて前記各処理部を通過した清浄エアを一旦蓄積
する箱形のエア回収部と、前記各エア回収部に蓄積され
た清浄エアを引力し、前記エア吹き出し部に再供給する
ためのエア吸引機構及びリターンダクトとを具備するこ
とを特徴とする。According to a further aspect of the present invention, there is provided a processing apparatus for performing a predetermined process on an object to be processed, and corresponding to each of the processing units, provided above the processing unit and provided with a clean air. An air blowout section that blows out directly below, and corresponding to each of the processing sections, provided below the processing section, opposite to the air blowout section, and blown out from each of the air blowout sections. A box-shaped air recovery unit for temporarily storing the clean air that has passed through the processing unit; an air suction mechanism and a return duct for attracting the clean air stored in each of the air recovery units and re-supplying the air to the air blowing unit And characterized in that:
【００１４】請求項９記載の本発明の処理装置は、請求
項８記載の処理装置であって、前記各エアー回収部は、
相互にエアの流出入が可能に連結自在であることを特徴
とする。A processing apparatus according to a ninth aspect of the present invention is the processing apparatus according to the eighth aspect, wherein each of the air collecting units is
It is characterized by being freely connectable so that air can flow in and out of each other.
【００１５】請求項１０記載の本発明の処理装置は、複
数の処理部と、各処理部に清浄エアーを供給する供給手
段とを有する処理装置であって、前記処理部毎に、供給
される清浄エアーのクリーン度、温度、湿度のうち少な
くとも１つのコントロールの有無を設定可能としたこと
を特徴する。According to a tenth aspect of the present invention, there is provided a processing apparatus having a plurality of processing units and a supply unit for supplying clean air to each processing unit. It is characterized in that the presence / absence of at least one of the cleanness, temperature and humidity of the clean air can be set.
【００１６】請求項１１記載の本発明の処理装置は、複
数の処理部と、各処理部に清浄エアーを供給する供給手
段とを有する処理装置であって、当該処理装置に対する
メンテナンス時を検出する手段と、前記メンテナンス時
が検出されたとき、各処理部のうち所定の処理部に供給
される清浄エアーの風速をコントロールすることを特徴
とする。A processing apparatus according to an eleventh aspect of the present invention is a processing apparatus having a plurality of processing units and a supply unit for supplying clean air to each processing unit, and detects a maintenance time for the processing unit. Means for controlling the wind speed of clean air supplied to a predetermined processing unit among the processing units when the maintenance time is detected.
【００１７】請求項１２記載の本発明の処理装置におけ
る清浄エアの供給方法は、被処理体に所定の処理を行う
処理部ごとに対応させて、該処理部の上方にエア吹き出
し部を設け、該エア吹き出し部から清浄エアを直下に向
けて吹き出した後、処理部を通過したエアを、エア吸引
機構の吸引力により、前記処理部ごとに対応させて、前
記処理部の下方に設けたエア回収部を通じて回収し、リ
ターンダクトを介してエア吹き出し部に再度供給するこ
とを特徴とする。According to a twelfth aspect of the present invention, there is provided a method for supplying clean air in a processing apparatus according to the present invention, wherein an air blowing section is provided above the processing section so as to correspond to each processing section which performs a predetermined processing on the object to be processed. After the clean air is blown downward from the air blow-out section, the air passing through the processing section is caused to correspond to each processing section by the suction force of an air suction mechanism, and the air provided below the processing section. It is characterized in that it is collected through the collection unit and is supplied again to the air blowing unit through the return duct.
【００１８】請求項１３記載の本発明の処理装置におけ
る清浄エアの供給方法は、被処理体に所定の処理を行う
処理部の上方にエア吹き出し部を設け、該エア吹き出し
部から清浄エアを直下に向けて吹き出した後、処理部を
通過したエアを、エア吸引機構の吸引力により、前記処
理部ごとに対応させて、前記処理部の下方に設けたエア
回収部を通じて回収し、リターンダクトを介してエア吹
き出し部に再度供給する一方、前記処理部を囲繞する処
理部保護用のカバー部材の側面部にエア通過部を形成
し、該エア通過部を通じてエアを外部に吹き出すことに
より、外部パーティクルの侵入を防ぐ気流を形成するこ
とを特徴とする。According to a thirteenth aspect of the present invention, there is provided a method for supplying clean air in a processing apparatus according to the present invention, wherein an air blowing section is provided above a processing section for performing a predetermined processing on an object to be processed, and clean air is directly discharged from the air blowing section. After being blown out toward the processing unit, the air that has passed through the processing unit is collected by an air collecting unit provided below the processing unit, corresponding to each processing unit by the suction force of an air suction mechanism, and a return duct is provided. The air particles are supplied again to the air blow-out unit, and an air passage portion is formed on a side surface of a cover member for protecting the processing unit that surrounds the processing unit, and the air is blown out to the outside through the air passage portion, whereby external particles are discharged. It is characterized by forming an airflow that prevents intrusion of air.
【００１９】請求項１４記載の本発明の処理装置におけ
る清浄エアの供給方法は、被処理体に所定の処理を行う
処理部の上方に処理部の外方に突出した吹き出し部を有
するエア吹き出し部を設け、該エア吹き出し部から清浄
エアを直下に向けて吹き出した後、処理部を通過したエ
アを、エア吸引機構の吸引力により、前記処理部ごとに
対応させて、前記処理部の下方に設けたエア回収部を通
じて回収し、リターンダクトを介してエア吹き出し部に
再度供給する一方、前記突出した吹き出し部から処理部
の外方においても清浄エアを直下に向けて吹き出すこと
により、外部パーティクルの侵入を防ぐ気流を形成する
ことを特徴とする。According to a fourteenth aspect of the present invention, there is provided a method for supplying clean air in a processing apparatus, comprising: an air blowing part having a blowing part projecting outward from a processing part above a processing part for performing a predetermined processing on an object to be processed. Is provided, and after the clean air is blown out from the air blow-out section toward directly below, the air passing through the processing section is caused to correspond to each of the processing sections by a suction force of an air suction mechanism, and is provided below the processing section. While collecting through the provided air collecting unit and supplying it again to the air blowing unit via the return duct, the clean air is blown out directly from the protruding blowing unit to the outside of the processing unit, so that external particles are removed. It is characterized by forming an airflow that prevents intrusion.
【００２０】請求項１記載の本発明の処理装置は、被処
理体に所定の処理を行う処理部ごとに対応させて、該処
理部の上方にエア吹き出し部を設け、また、処理部ごと
に対応させて、該処理部の下方に設けたエア回収部を設
けている。したがって、エア吹き出し部から直下に向け
て吹き出された清浄エアは、当該装置内に設置された処
理部を通過した後、エア吸引機構による吸引力により、
該エア吹き出し部に対向するエア回収部を通じて回収さ
れ、リターンダクトを介してエア吹き出し部に再度供給
される。すなわち、処理装置ごとに対応してエア吹き出
し部およびエア回収部が設けられているため、例えば、
塗布・現像処理システム中、当該処理装置が不要で、当
該処理装置を省いた際には、当該処理装置に設けられた
エア吹き出し部、エア回収部等も一緒に除去される。こ
のため、塗布・現像処理システムにおいて、必要な箇所
（処理装置）においてのみ清浄エアを供給でき、不要な
処理装置を省いた場合には、ブロワやファン等に余分な
負荷がかからず、従来と比較してランニングコストを低
減することができる。In the processing apparatus according to the first aspect of the present invention, an air blowing section is provided above the processing section so as to correspond to each processing section for performing a predetermined process on the object to be processed. Correspondingly, an air recovery section provided below the processing section is provided. Therefore, the clean air blown directly downward from the air blowout unit passes through the processing unit installed in the apparatus, and then is suctioned by the air suction mechanism.
The air is recovered through the air recovery unit facing the air blowing unit, and is supplied again to the air blowing unit via the return duct. That is, since an air blowing unit and an air collecting unit are provided for each processing device, for example,
In the coating / developing processing system, the processing apparatus is unnecessary, and when the processing apparatus is omitted, the air blowing section, the air recovery section, and the like provided in the processing apparatus are also removed. For this reason, in the coating / developing processing system, it is possible to supply clean air only to necessary parts (processing equipment), and if unnecessary processing equipment is omitted, no extra load is applied to the blower, fan, etc. The running cost can be reduced as compared with the case of FIG.
【００２１】請求項２記載の本発明の処理装置は、被処
理体に所定の処理を行う処理部ごとに対応させて、該処
理部の上方にエア吹き出し部を設け、また、処理部ごと
に対応させて、該処理部の下方に設けたエア回収部を設
けていると共に、処理部を囲繞する処理部保護用のカバ
ー部材の側面部にエア通過部を形成している。したがっ
て、エア吹き出し部から直下に向けて吹き出された清浄
エアは、当該装置内に設置された処理部を通過した後、
エア吸引機構による吸引力により、該エア吹き出し部に
対向するエア回収部を通じて回収され、リターンダクト
を介してエア吹き出し部に再度供給される一方、エア通
過部を通じてエアを外部に吹き出すことにより、外部パ
ーティクルの侵入を防ぐ気流を形成することができる。
このため、例えば、塗布・現像処理システムにおいて、
必要な箇所（処理装置）においてのみ清浄エアを供給で
き、不要な処理装置を省いた場合には、ブロワやファン
等に余分な負荷がかからず、従来と比較してランニング
コストを低減することができると共に、被処理体に対す
るパーティクルの付着をより効果的に防止できる。According to a second aspect of the present invention, an air blowing section is provided above the processing section so as to correspond to each processing section for performing a predetermined process on the object to be processed. Correspondingly, an air recovery section provided below the processing section is provided, and an air passage section is formed on a side surface of a cover member for protecting the processing section surrounding the processing section. Therefore, the clean air blown directly downward from the air blowout unit passes through the processing unit installed in the device,
By the suction force of the air suction mechanism, the air is recovered through the air recovery unit facing the air blowing unit, and is again supplied to the air blowing unit via the return duct. An airflow that prevents particles from entering can be formed.
For this reason, for example, in a coating and developing processing system,
Clean air can be supplied only to the necessary places (processing equipment), and if unnecessary processing equipment is omitted, no extra load is applied to the blower, fan, etc., and the running cost can be reduced compared to the past. And adhesion of particles to the object to be processed can be more effectively prevented.
【００２２】請求項３記載の本発明の処理装置は、被処
理体に所定の処理を行う処理部ごとに対応させて、該処
理部の上方にエア吹き出し部を設け、また、処理部ごと
に対応させて、該処理部の下方に設けたエア回収部を設
けている。また、前記処理部の外方においても清浄エア
を直下に向けて吹き出すことができる突出した吹き出し
部を設け、さらに、前記突出した吹き出し部の外側縁に
沿ってカーテン部材を設けている。したがって、エア吹
き出し部から直下に向けて吹き出された清浄エアは、当
該装置内に設置された処理部を通過した後、エア吸引機
構による吸引力により、該エア吹き出し部に対向するエ
ア回収部を通じて回収され、リターンダクトを介してエ
ア吹き出し部に再度供給される。その一方、突出した吹
き出し部を通じてカーテン部材と処理部との間にダウン
ブローの気流を形成することができる。このため、処理
部に対してメンテナンス処理を行う際に、作業者がカー
テン部材内に入ったときの、外部パーティクルの処理部
内への侵入を防止できる。According to a third aspect of the present invention, an air blowing section is provided above the processing section so as to correspond to each processing section for performing a predetermined process on the object to be processed. Correspondingly, an air recovery section provided below the processing section is provided. In addition, a protruding blow-out portion capable of blowing clean air directly below the processing portion is provided, and a curtain member is provided along an outer edge of the protruding blow-out portion. Therefore, the clean air blown directly downward from the air blowout section passes through the processing section installed in the apparatus, and then, by the suction force of the air suction mechanism, passes through the air recovery section facing the air blowout section. It is collected and supplied again to the air blowing section via the return duct. On the other hand, a down-blow airflow can be formed between the curtain member and the processing section through the protruding blowing section. For this reason, when performing maintenance processing on the processing unit, it is possible to prevent external particles from entering the processing unit when an operator enters the curtain member.
【００２３】請求項４記載の本発明の処理装置は、前記
エア吹き出し部を、送風ファンと、該送風ファンの吹き
出し側に設けられるフィルタとを有する構成としてい
る。したがって、吹き出し直前にフィルタにより清浄さ
れた清浄エアが各処理装置ごと供給される。According to a fourth aspect of the present invention, in the processing apparatus of the present invention, the air blowing section includes a blowing fan and a filter provided on a blowing side of the blowing fan. Therefore, clean air that has been cleaned by the filter immediately before blowing is supplied to each processing apparatus.
【００２４】請求項５記載の本発明の処理装置は、前記
エア吸引機構が熱交換機とブロワを有しているため、前
記エア回収部を経由させてエアを吸引して回収する際、
エアを冷却し、その上でリターンダクトを経由させてエ
ア吹き出し部に供給することができる。According to a fifth aspect of the present invention, since the air suction mechanism has a heat exchanger and a blower, when the air is sucked and recovered through the air recovery section,
The air can be cooled and then supplied to the air blowing section via a return duct.
【００２５】請求項６記載の本発明の処理装置は、前記
エア吸引吸引機構に外部空気取り入れ口が付設されてい
る。このため、装置外へ漏れたエア分を新鮮な外部空気
で補うことができる。According to a sixth aspect of the present invention, the air suction / suction mechanism is provided with an external air intake. For this reason, the air leaked out of the apparatus can be supplemented with fresh external air.
【００２６】請求項７記載の本発明の処理装置では、前
記エア吹き出し部とエア回収部との間に、ケミカルトラ
ップが配置されているので、より清浄なエアの供給が可
能である。In the processing apparatus according to the present invention, since a chemical trap is disposed between the air blowing section and the air collecting section, it is possible to supply cleaner air.
【００２７】請求項８記載の本発明の処理装置では、各
エア吹き出し部から吹き出されて各処理部を通過した清
浄エアを一旦蓄積する箱形のエア回収部がリターンダク
ト等とは別個に設けられているので、均一な吸引或いは
必要に応じて分布を変えた吸引を行うことができる。In the processing apparatus according to the present invention, a box-shaped air recovery section for temporarily storing clean air blown out from each air blowing section and passing through each processing section is provided separately from the return duct and the like. Therefore, it is possible to perform a uniform suction or a suction whose distribution is changed as required.
【００２８】請求項９記載の本発明の処理装置では、各
エアー回収部が相互にエアの流出入が可能に連結自在で
あるので、増設が容易である。In the processing apparatus according to the ninth aspect of the present invention, the respective air recovery sections can be connected to each other so that air can flow in and out of each other.
【００２９】請求項１０記載の本発明の処理装置では、
処理部毎に、供給される清浄エアーのクリーン度、温
度、湿度のうち少なくとも１つのコントロールの有無を
設定可能としたので、最適でかつ安価な装置構成をとる
ことが可能である。[0029] In the processing apparatus of the present invention described in claim 10,
Since it is possible to set at least one of the control of the degree of cleanness, temperature, and humidity of the supplied clean air for each processing unit, an optimal and inexpensive device configuration can be obtained.
【００３０】請求項１１記載の本発明の処理装置では、
当該処理装置に対するメンテナンス時を検出する手段を
有し、メンテナンス時が検出されたとき、各処理部のう
ち所定の処理部に供給される清浄エアーの風速をコント
ロールしているので、メンテナンス時に所定の処理部に
パーティクル等が進入するのを防止することができる。[0030] In the processing apparatus according to the eleventh aspect of the present invention,
It has means for detecting the maintenance time of the processing apparatus, and when the maintenance time is detected, the wind speed of the clean air supplied to a predetermined processing unit among the processing units is controlled. It is possible to prevent particles and the like from entering the processing section.
【００３１】請求項１２記載の本発明の処理装置におけ
る清浄エアの供給方法によれば、処理装置ごとに対応し
てエア吹き出し部およびエア回収部を設けて供給するた
め、必要な箇所（処理装置）においてのみ清浄エアを供
給でき、不要な処理装置を省いた場合には、ブロワやフ
ァン等に余分な負荷がかからず、従来と比較してランニ
ングコストを低減することができる。According to the method for supplying clean air in the processing apparatus of the present invention, since the air blowing section and the air recovery section are provided and supplied corresponding to each processing apparatus, a necessary portion (processing apparatus) is provided. 2), clean air can be supplied only when unnecessary processing equipment is omitted, and no extra load is applied to the blower, the fan, etc., and the running cost can be reduced as compared with the conventional case.
【００３２】請求項１３記載の本発明の処理装置におけ
る清浄エアの供給方法によれば、エア通過部を通じてエ
アを外部に吹き出すことにより、外部パーティクルの侵
入を防ぐ気流を形成することができる。このため、被処
理体に対するパーティクルの付着をより効果的に防止で
きる。According to the method for supplying clean air in the processing apparatus according to the thirteenth aspect of the present invention, by blowing air to the outside through the air passage portion, it is possible to form an airflow for preventing intrusion of external particles. Therefore, it is possible to more effectively prevent particles from adhering to the object.
【００３３】請求項１４記載の本発明の処理装置におけ
る清浄エアの供給方法によれば、突出した吹き出し部を
通じて処理部の外部にダウンブローの気流を形成するこ
とができる。このため、処理部に対してメンテナンス処
理を行う際に、作業者が接近したときの、外部パーティ
クルの処理部内への侵入を防止できる。According to the method for supplying clean air in the processing apparatus of the present invention, a down-blow airflow can be formed outside the processing section through the protruding blowing section. For this reason, when performing a maintenance process on the processing unit, it is possible to prevent external particles from entering the processing unit when an operator approaches.
【００３４】[0034]
【発明の実施の形態】以下、本発明の実施の形態を図面
に基づき説明するが、まず、本発明の処理装置の組み合
わせからなる、ＬＣＤ用のガラス基板上にＩＴＯの薄膜
や電極パターンを形成するフォトレジストの塗布・現像
処理システムの全体構成について説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described with reference to the drawings. First, an ITO thin film and an electrode pattern are formed on a glass substrate for LCD, which is a combination of the processing apparatus of the present invention. The overall configuration of the photoresist coating / developing processing system will be described.
【００３５】図１に示すように、この塗布・現像処理シ
ステム１の前方には、ガラス基板Ｇを、塗布・現像処理
システム１に対して搬出入するローダ・アンローダ部２
が設けられている。このローダ・アンローダ部２には、
ガラス基板Ｇを例えば２５枚ずつ収納したカセットＣを
所定位置に整列させて載置させるカセット載置台３と、
各カセットＣから処理すべきガラス基板Ｇを取り出し、
また塗布・現像処理システム１において処理の終了した
ガラス基板Ｇを各カセットＣへ戻すローダ・アンローダ
４が設けられている。図示のローダアンローダ４は、本
体５の走行によってカセットＣの配列方向に移動し、本
体５に搭載された板片状のピンセット６によって各カセ
ットＣからガラス基板Ｇを取り出し、また各カセットＣ
へガラス基板Ｇを戻すようになっている。また、ピンセ
ット６の両側には、ガラス基板Ｇの四隅を保持して位置
合わせを行う基板位置合わせ部材７が設けられている。As shown in FIG. 1, in front of the coating / developing processing system 1, a loader / unloader unit 2 for loading / unloading the glass substrate G with respect to the coating / developing processing system 1.
Is provided. This loader / unloader unit 2 includes:
A cassette mounting table 3 on which a cassette C containing, for example, 25 glass substrates G is aligned and mounted at a predetermined position;
Take out the glass substrate G to be processed from each cassette C,
Further, a loader / unloader 4 for returning the glass substrate G, which has been processed in the coating / developing processing system 1, to each cassette C is provided. The illustrated loader / unloader 4 moves in the direction in which the cassettes C are arranged by traveling of the main body 5, takes out the glass substrate G from each cassette C by the plate-like tweezers 6 mounted on the main body 5, and
The glass substrate G is returned. Further, on both sides of the tweezers 6, there are provided substrate positioning members 7 for holding and positioning the four corners of the glass substrate G.
【００３６】塗布・現像処理システム１の中央部には、
長手方向に配置された廊下状の搬送路１０、１１が第１
の受け渡し部１２を介して一直線上に設けられており、
この搬送路１０、１１の両側には、ガラス基板Ｇに対す
る各処理を行うための各種処理装置が配置されている。At the center of the coating and developing system 1,
Corridor-like transport paths 10, 11 arranged in the longitudinal direction are the first.
Are provided in a straight line via the transfer unit 12 of
Various processing apparatuses for performing each processing on the glass substrate G are arranged on both sides of the transport paths 10 and 11.
【００３７】図示の塗布・現像処理システム１にあって
は、搬送路１０の一側方に、ガラス基板Ｇをブラシ洗浄
すると共に高圧ジェット水により洗浄を施すための洗浄
装置１６が例えば２台並設されている。また、搬送路１
０を挟んで反対側に、二基の現像装置１７が並設され、
その隣りに二基の加熱装置１８が積み重ねて設けられて
いる。In the illustrated coating / developing processing system 1, for example, two cleaning devices 16 for cleaning the glass substrate G by brush and high-pressure jet water are provided on one side of the transport path 10. Has been established. In addition, transport path 1
Two developing devices 17 are arranged side by side on the opposite side with respect to 0,
Two heating devices 18 are stacked next to each other.
【００３８】また、搬送路１１の一側方に、ガラス基板
Ｇにレジスト液を塗布する前にガラス基板Ｇを疎水処理
するアドヒージョン装置２０が設けられ、このアドヒー
ジョン装置２０の下方には冷却用の清浄グ装置２１が配
置されている。また、これらアドヒージョン装置２０と
清浄グ装置２１の隣には加熱装置２２が二列に二個ずつ
積み重ねて配置されている。また、搬送路１１を挟んで
反対側に、ガラス基板Ｇの表面にレジスト液を塗布する
ことによってガラス基板Ｇの表面にレジスト膜を形成す
るレジスト塗布装置２３が配置されている。図示はしな
いが、これら塗布装置２３の側部には、第２の受け渡し
部２８を介し、ガラス基板Ｇ上に形成されたレジスト膜
に所定の微細パターンを露光するための露光装置等が設
けられる。第２の受け渡し部２８は、ガラス基板Ｇを搬
入および搬出するための搬出入ピンセット２９および受
け渡し台３０を備えている。Further, on one side of the transport path 11, an adhesion device 20 for hydrophobically treating the glass substrate G before applying the resist liquid to the glass substrate G is provided. Below the adhesion device 20, a cooling device is provided. A cleaning device 21 is provided. Further, adjacent to the adhesion device 20 and the cleaning device 21, two heating devices 22 are stacked and arranged in two rows. On the opposite side of the transport path 11, a resist coating device 23 that forms a resist film on the surface of the glass substrate G by applying a resist liquid on the surface of the glass substrate G is disposed. Although not shown, an exposure device or the like for exposing a predetermined fine pattern to a resist film formed on the glass substrate G via a second transfer unit 28 is provided on a side portion of the coating device 23. . The second transfer unit 28 includes a loading / unloading tweezers 29 for loading and unloading the glass substrate G, and a delivery table 30.
【００３９】以上の各処理装置１６〜１８および２０〜
２３は、何れも搬送路１０、１１の両側において、ガラ
ス基板Ｇの出入口を内側に向けて配設されている。第１
の搬送装置２５がローダ・アンローダ部２、各処理装置
１６〜１８および第１の受け渡し部１２との間でガラス
基板Ｇを搬送するために搬送路１０上を移動し、第２の
搬送装置２６が第１の受け渡し部１２、第２の受け渡し
部２８および各処理装置２０〜２３との間でガラス基板
Ｇを搬送するために搬送路１１上を移動するようになっ
ている。The above processing units 16 to 18 and 20 to
23 is disposed on both sides of the transport paths 10 and 11 with the entrance of the glass substrate G facing inward. First
Transfer device 25 moves on the transfer path 10 to transfer the glass substrate G between the loader / unloader unit 2, each of the processing devices 16 to 18, and the first transfer unit 12, and the second transfer device 26 Move on the transfer path 11 to transfer the glass substrate G between the first transfer unit 12, the second transfer unit 28, and each of the processing devices 20 to 23.
【００４０】各搬送装置２５、２６は、それぞれ上下一
対のアーム２７、２７を有しており、各処理装置１６〜
１８および２０〜２３にアクセスするときは、一方のア
ーム２７で各処理装置のチャンバから処理済みのガラス
基板Ｇを搬出し、他方のアーム２７で処理前のガラス基
板Ｇをチャンバ内に搬入するように構成されている。Each of the transfer devices 25 and 26 has a pair of upper and lower arms 27 and 27, respectively.
When accessing 18 and 20 to 23, the processed glass substrate G is unloaded from the chamber of each processing apparatus by one arm 27, and the unprocessed glass substrate G is loaded into the chamber by the other arm 27. Is configured.
【００４１】図２は図１に示した塗布・現像処理システ
ムを構成する処理装置のうち、レジスト塗布装置２３と
加熱装置２２の概略構成を示す斜視図であり、図３はそ
の断面図である。FIG. 2 is a perspective view showing a schematic configuration of a resist coating unit 23 and a heating unit 22 of the processing units constituting the coating / developing processing system shown in FIG. 1, and FIG. 3 is a sectional view thereof. .
【００４２】図に示したように、レジスト塗布装置２３
と加熱装置２２とは、通常、搬送路１１を挟んで一つの
処理ユニットを構成するように設けられている。このよ
うに一対の処理装置からなる処理ユニットが複数連接さ
れることで、レジスト塗布装置２３と加熱装置２２とが
被処理体であるガラス基板Ｇの処理枚数に応じて、必要
数配設される。すなわち、各処理装置には、下部にキャ
スター３５がそれぞれ設けられており、処理装置ごとに
移動してライン上に配置したり、ラインから外したりす
ることにより、レジスト塗布装置２３と加熱装置２２と
の配設数を調整することができる。As shown in FIG.
The heating device 22 and the heating device 22 are usually provided so as to constitute one processing unit with the transport path 11 interposed therebetween. By connecting a plurality of processing units each including a pair of processing apparatuses in this manner, a required number of resist coating apparatuses 23 and heating apparatuses 22 are provided according to the number of processed glass substrates G to be processed. . That is, each processing apparatus is provided with a caster 35 at a lower portion, and is moved for each processing apparatus to be disposed on a line or removed from the line, so that the resist coating apparatus 23 and the heating apparatus 22 Can be adjusted.
【００４３】なお、本実施の形態では、このように、レ
ジスト塗布装置２３と加熱装置２２とにより一つの処理
ユニットを構成し、後述のエア吸引機構４５とリターン
ダクト４４とは、処理装置ごとではなく処理ユニットご
とに設けている。エア吸引機構４５およびリターンダク
ト４４とも、エア吹き出し部４０およびエア回収部４３
のように各処理装置ごとに対応させて設けることもでき
るが、本実施の形態のように処理ユニットごとに設ける
と構成を簡易にすることができる。そして、各エア回収
部４３は、各ユニット毎に分離、独立しており、システ
ムに組み合わせるときにジョイントパイプ４３ｂで連結
されるようになっている。In this embodiment, as described above, one processing unit is constituted by the resist coating device 23 and the heating device 22, and the air suction mechanism 45 and the return duct 44 described later are provided separately for each processing device. And is provided for each processing unit. Both the air suction mechanism 45 and the return duct 44 include the air blowing section 40 and the air collecting section 43.
Although it can be provided corresponding to each processing device as described above, the configuration can be simplified if provided for each processing unit as in the present embodiment. The air collecting sections 43 are separated and independent for each unit, and are connected by a joint pipe 43b when combined with the system.
【００４４】本実施の形態にかかる処理装置であるレジ
スト塗布装置２３と加熱装置２２とは、搬送路１１を挟
んで一組の処理ユニットを構成しており、レジスト塗布
装置２３においては、ガラス基板Ｇが載置され、回転し
ながらガラス基板Ｇ上に吐出されるレジストを均一に広
げるスピンチャック３１が処理部に相当し、加熱装置２
２においては、載置されるガラス基板Ｇを加熱して熱処
理を行うホットプレート３２が処理部に相当する。ま
た、搬送路１１においては、レジスト塗布装置２３や加
熱装置２２にガラス基板Ｇを出し入れするために走行す
る搬送装置２６が処理部に相当する。The resist coating device 23 and the heating device 22, which are the processing devices according to the present embodiment, constitute a set of processing units with the conveyance path 11 interposed therebetween. A spin chuck 31 on which a resist is discharged and uniformly spread on the glass substrate G while being rotated corresponds to a processing unit.
In 2, the hot plate 32 that heats the mounted glass substrate G by heating is equivalent to the processing unit. In the transport path 11, a transport device 26 that travels to take the glass substrate G in and out of the resist coating device 23 and the heating device 22 corresponds to a processing unit.
【００４５】エア吹き出し部４０は、レジスト塗布装置
２３においてはスピンチャック３１の上方、加熱装置２
２においてはホットプレート３２の上方、搬送路１１に
おいては搬送装置２６の上方に設けられている。このエ
ア吹き出し部４０は、送風ファン４１と該送風ファン４
１よりも吹き出し側に配設されるフィルタ４２とを有し
て構成される。フィルタ４２は、後述のエア回収部４３
やリターンダクト４４中に配設することも可能である
が、回収されたエアがエア回収部４３やリターンダクト
４４を通過する間に、微小の浮遊パーティクルと再接触
する可能性があるため、本実施の形態のように、送風フ
ァン４１の後段、すなわち、エアの吹き出し直前に配設
することが好ましい。もちろん、このフィルタ４２のほ
かに、さらにリターンダクト４４中等にケミカルトラッ
プ６１，６２を配設することも可能である。これによ
り、より清浄なエアを供給可能になる。In the resist coating device 23, the air blowing unit 40 is located above the spin chuck 31 and the heating device 2.
2 is provided above the hot plate 32, and in the transfer path 11 is provided above the transfer device 26. The air blowing section 40 includes a blower fan 41 and the blower fan 4.
And a filter 42 disposed closer to the outlet side than the filter 42. The filter 42 includes an air recovery unit 43 described later.
Although it is possible to dispose the collected air in the return duct 44, the collected air may come into contact with minute floating particles while passing through the air collection unit 43 or the return duct 44. As in the embodiment, it is preferable to dispose it at a stage subsequent to the blower fan 41, that is, immediately before blowing out the air. Of course, in addition to the filter 42, chemical traps 61 and 62 can be further disposed in the return duct 44 or the like. This makes it possible to supply cleaner air.
【００４６】エア回収部４３は、上記したエア吹き出し
部４０と対向する位置、すなわち、スピンチャック３１
の下方、ホットプレート３２の下方、搬送装置２６の下
方にそれぞれ設けられる。エア回収部４３は、上面に複
数のエア通過孔が形成された多孔板４３ａを有してお
り、後述のエア吸引機構４５の作動により該エア通過孔
を介してエアが回収される構造である。また、本実施の
形態では、エア回収部４３が、必ずエア吹き出し部４０
に対向して、処理装置と一体に設けられている構成であ
るため、移動用のキャスタ３５は、該エア回収部４３を
形成しているフレームの下部に設けられる。また、本実
施の形態では、エア吸引機構４５およびリターンダクト
４４を一組の処理ユニットごとに設けているため、各処
理装置に設けられるエア回収部４３は相互にジョイント
パイプ４３ｂを介して接続している。The air collecting section 43 is located at a position facing the air blowing section 40, that is, the spin chuck 31.
, Below the hot plate 32, and below the transfer device 26, respectively. The air collecting section 43 has a perforated plate 43a having a plurality of air passage holes formed on an upper surface, and has a structure in which air is collected through the air passage holes by the operation of an air suction mechanism 45 described later. . Further, in the present embodiment, the air collection unit 43 is always
The moving casters 35 are provided at the lower part of the frame forming the air collecting section 43 because the moving casters 35 are provided integrally with the processing device. Further, in the present embodiment, since the air suction mechanism 45 and the return duct 44 are provided for each set of processing units, the air collection units 43 provided in each processing device are connected to each other via the joint pipe 43b. ing.
【００４７】処理装置の一つであるレジスト塗布装置２
３のスピンチャック３１の周囲には、該スピンチャック
３１を保護するための、処理部保護用のカバー部材３１
ａが設けられている。この処理部保護用のカバー部材３
１には、その側面部に、メンテナンス用の窓部３１ｂが
設けられている。本実施の形態においては、このメンテ
ナンス用の窓部３１ｂをエア通過部として用い、該窓部
３１ｂを通じて積極的に清浄エアを外部に放出し得るよ
うに設けている。これにより、処理装置内が陽圧とな
り、外部が陰圧雰囲気になるため、窓部３１ｂからの外
部パーティクルの侵入を積極的に防止している。同様
に、加熱装置２２のホットプレート３２の周囲にも処理
部保護用のカバー部材３２ａが設けられており、この処
理部保護用のカバー部材３２ａの側面部にもエア通過部
３２ｂを形成している。A resist coating device 2 which is one of the processing devices
A cover member 31 for protecting the processing unit is provided around the spin chuck 31 of No. 3 to protect the spin chuck 31.
a is provided. Cover member 3 for protecting this processing section
1 is provided with a maintenance window 31b on the side surface thereof. In the present embodiment, the maintenance window 31b is used as an air passage portion, and is provided so that clean air can be positively discharged to the outside through the window 31b. As a result, the inside of the processing apparatus becomes a positive pressure, and the outside becomes a negative pressure atmosphere. Therefore, intrusion of external particles from the window 31b is positively prevented. Similarly, a cover member 32a for protecting the processing section is provided around the hot plate 32 of the heating device 22, and an air passage section 32b is formed on the side surface of the cover member 32a for protecting the processing section. I have.
【００４８】エア吸引機構４５は、ブロワ４５ａと、該
ブロワ４５ａの保持用ケース４５ｂとを有し、保持用ケ
ース４５ｂは、処理ユニットを構成するいずれかの処理
装置のエア回収部４３に排気ダクト４５ｃを介して接続
されている。また、保持用ケース４５ｂには新鮮な外部
空気を取り込む外部空気取り入れ口４５ｄが設けられて
いると共に、排気ダクト４５ｃには、回収されたエアを
冷却するための熱交換機４５ｅが配設されている。な
お、エア吸引機構４５は、処理装置が設置される床面上
に配置してもよいが、予め、接続されるリターンダクト
４４を引き出した上で、床面下に所定数埋設しておくこ
とも可能である。The air suction mechanism 45 has a blower 45a and a case 45b for holding the blower 45a, and the holding case 45b is connected to the air collection unit 43 of any of the processing units constituting the processing unit by an exhaust duct. 45c. The holding case 45b is provided with an external air intake 45d for taking in fresh external air, and the exhaust duct 45c is provided with a heat exchanger 45e for cooling the collected air. . The air suction mechanism 45 may be disposed on the floor on which the processing apparatus is installed. However, it is necessary to draw out the return duct 44 to be connected in advance and bury the predetermined number under the floor. Is also possible.
【００４９】保持用ケース４５ｂは、さらに、リターン
ダクト４４を介してエア吹き出し部４０に連結されてい
る。より具体的には、エア吹き出し部４０を構成する送
風ファン４１の手前側には、３つのエア吹き出し部４０
を相互に連通する連通ダクト４６が設けられており、リ
ターンダクト４４はこの連通ダクト４６に連結されてい
る。なお、リターンダクト４４の適宜箇所には、エア吹
き出し部４０に再供給されるエアを冷却するための冷凍
機（図示せず）を配設することもできる。The holding case 45b is further connected to the air blowing section 40 via a return duct 44. More specifically, three air blowing portions 40 are provided in front of the blower fan 41 constituting the air blowing portion 40.
Are provided with a communication duct 46 that communicates with each other. The return duct 44 is connected to the communication duct 46. In addition, a refrigerator (not shown) for cooling the air resupplied to the air blowing unit 40 may be provided at an appropriate position of the return duct 44.
【００５０】上記したように、エア吹き出し部４０とエ
ア回収部４３とは処理部の上方又は下方に対向するよう
に設けられているが、本実施の形態では、該エア吹き出
し部４０に、装置外に突出する吹き出し部４０ａを設け
ている。この突出した吹き出し部４０ａは、メンテナン
ス用の窓部３１ｂが設けられたレジスト塗布装置２３の
上方に配設されたエア吹き出し部４０に、該窓部３１ｂ
の形成面と同じ側の外方に突出するように設けられてい
る。また、この突出した吹き出し部４０ａの外側面に沿
って下方に垂下するようにプラスチックフィルム等から
なるカーテン部材４８が設けられている。メンテナンス
作業をする場合には、作業者がこのカーテン部材４８の
内側に入り、窓部３１ｂを通じて所定の作業を行うこと
になるが、このように、突出した吹き出し部４０ａを設
け、ダウンブローで清浄エアを供給することで、作業者
がカーテン部材４８の内側に入ったときの気流の乱れに
よる外部パーティクルの窓部３１ｂを通じての侵入を防
ぐことができる。As described above, the air blowing section 40 and the air collecting section 43 are provided so as to face above or below the processing section, but in the present embodiment, the air blowing section 40 is provided with the device. A blowing portion 40a protruding outside is provided. The protruding blowout portion 40a is attached to the air blowout portion 40 disposed above the resist coating device 23 provided with the maintenance window portion 31b.
Is formed so as to protrude outward on the same side as the surface on which the. Further, a curtain member 48 made of a plastic film or the like is provided so as to hang down along the outer surface of the protruding blowout portion 40a. When the maintenance work is performed, the worker enters the inside of the curtain member 48 and performs a predetermined work through the window 31b. In this manner, the protruding blowout part 40a is provided, and the cleaning is performed by down blow. By supplying air, it is possible to prevent external particles from entering through the window 31b due to turbulence in the airflow when the operator enters the inside of the curtain member 48.
【００５１】本実施の形態によれば、レジスト塗布装置
２３、加熱装置２２、および搬送路１１の各処理装置に
おいて、スピンチャック３１、ホットプレート３２又は
搬送装置２６の各上方に配置されたエア吹き出し部４０
から清浄エアが直下に向けて供給される。そして、これ
らの処理部において被処理体であるガラス基板Ｇに向か
ってパーティクルが付着しないように供給された清浄エ
アは、その後、エア吸引機構４５を構成するブロワ４５
ａの作動により吸引され、対応して配設されたエア回収
部４３を経由して回収される。また、レジスト塗布装置
２３の窓部３１ｂや加熱装置２２のエア通過部３２ｂを
通じて、エアが装置外部に排出される。このため、この
窓部３１ｂ等を通じての外部パーティクルの侵入が防止
できる。清浄エアは、このようにその一部が外部に漏れ
ることから、回収されたエア量だけでは、次に供給する
清浄エアのエア量が不足することになるが、その不足分
は、ブロワ保持用ケース４５ｂに形成された外部空気取
り入れ口４５ｄから吸引され、リターンダクト４４を通
じて、回収されたエアと共にエア吹き出し部４０に供給
され、フィルタ４２を通過することにより、清浄エアと
して処理部に向けて再度供給される。According to the present embodiment, in each of the resist coating device 23, the heating device 22, and the processing device of the transfer path 11, the air blowout disposed above each of the spin chuck 31, the hot plate 32, and the transfer device 26. Part 40
, Clean air is supplied downward. Then, in these processing units, the clean air supplied so as to prevent particles from adhering to the glass substrate G as the object to be processed is then supplied to the blower 45 constituting the air suction mechanism 45.
The air is sucked by the operation of a, and is collected via the air collection unit 43 provided correspondingly. In addition, air is discharged to the outside of the apparatus through the window 31b of the resist coating device 23 and the air passage 32b of the heating device 22. Therefore, intrusion of external particles through the window 31b and the like can be prevented. Since a part of the clean air leaks to the outside in this way, the amount of the collected clean air alone will result in a shortage of the clean air to be supplied next. The air is sucked from the external air inlet 45d formed in the case 45b, supplied to the air blowing unit 40 together with the collected air through the return duct 44, and passed through the filter 42, so that the air is cleaned again toward the processing unit as clean air. Supplied.
【００５２】以上のように、本実施の形態によれば、各
処理装置ごとにエア吹き出し部４０やエア回収部４３が
設けられている構成であるため、不要な処理装置を除去
した場合には、エア吹き出し部４０およびエア回収部４
３が一緒に除去されることから、従来のように、エア吸
引機構４５に余計な負荷がかかることを防止できる。As described above, according to the present embodiment, since the air blowing section 40 and the air collecting section 43 are provided for each processing apparatus, when an unnecessary processing apparatus is removed, Air blowing section 40 and air collecting section 4
Since 3 is removed together, it is possible to prevent an unnecessary load from being applied to the air suction mechanism 45 as in the related art.
【００５３】なお、図４に示すように、カーテン部材４
８が形成された側に、メンテナンス時に使うステップ台
５１を設け、このステップ台５１内にエア吸引機構とし
ての機能を持たせ、エア回収部４３のエアを吸引するよ
うにしてもよい。Note that, as shown in FIG.
A step table 51 used for maintenance may be provided on the side where 8 is formed, and a function as an air suction mechanism may be provided in the step table 51 so that the air in the air recovery section 43 may be sucked.
【００５４】また、リターンダクトを介して供給される
エアの性質を各処理ユニット毎に変えても良い。例え
ば、図４の符号５２、５３、５４で示す各処理ユニット
に対応する各リターンダクトから異なる性質のエア、例
えばリターンダクト５２から温度及び湿度がコントロー
ルされたエア、リターンダクト５３から清浄のみがなさ
れたエア、リターンダクト５４から清浄がなされ流速の
遅いエアを供給するようにしてもよい。即ち、処理部毎
に、供給される清浄エアーのクリーン度、温度、湿度等
のコントロールの有無を設定可能することで、最適でか
つ安価な装置構成をとることが可能である。Further, the nature of the air supplied through the return duct may be changed for each processing unit. For example, air having different properties from the respective return ducts corresponding to the respective processing units indicated by reference numerals 52, 53 and 54 in FIG. 4, for example, air whose temperature and humidity are controlled from the return duct 52, and only cleaning from the return duct 53 are performed. Alternatively, it is also possible to supply clean air from the return duct 54 and air with a low flow velocity. That is, it is possible to set an optimal and inexpensive apparatus configuration by setting whether or not to control the cleanness, temperature, humidity, and the like of the supplied clean air for each processing unit.
【００５５】更に、図５の符号７１、７２に示すリター
ンダクトの構成のように、スピン系、搬送系等に大きく
分けて、それぞれ例えば上記の如く制御されたエアを供
給しても構わない。Further, as in the configuration of the return ducts indicated by reference numerals 71 and 72 in FIG. 5, the air may be broadly divided into a spin system, a transport system, and the like, and the air controlled as described above, for example, may be supplied.
【００５６】また、装置の前面や側面等のオペレーショ
ン面に人が出入りしたり、処理ユニットの前面カバー等
を開けたときに、その状態を、例えば圧力センサ、風速
センサ、ドアスイッチ等により検出し、必要な部部の風
速をコントロールするように構成しても構わない。Further, when a person enters or exits an operation surface such as a front surface or a side surface of the apparatus, or when a front cover of the processing unit is opened, the state is detected by a pressure sensor, a wind speed sensor, a door switch, or the like. Alternatively, the wind speed of a necessary part may be controlled.
【００５７】上記した説明では、処理装置として、塗布
・現像処理システムを構成するレジスト塗布装置２３や
加熱装置２２にエア吹き出し部４０等を設けた場合を例
にとり説明しているが、洗浄装置１６等の他の処理装置
をこのようなエア吹き出し部４０等を設けた構成とする
ことももちろん可能である。In the above description, the case where the resist coating device 23 and the heating device 22 constituting the coating / developing processing system are provided with the air blowing section 40 and the like as the processing device is described as an example. Of course, it is also possible to adopt a configuration in which such an air blowing unit 40 or the like is provided in another processing apparatus.
【００５８】[0058]
【発明の効果】請求項１記載の本発明の処理装置によれ
ば、処理装置ごとに対応してエア吹き出し部およびエア
回収部が設けられているため、例えば、塗布・現像処理
システム中、当該処理装置が不要で、当該処理装置を省
いた際には、当該処理装置に設けられたエア吹き出し
部、エア回収部等も一緒に除去される。このため、塗布
・現像処理システムにおいて、必要な箇所（処理装置）
においてのみ清浄エアを供給でき、不要な処理装置を省
いた場合には、ブロワやファン等に余分な負荷がかから
ず、従来と比較してランニングコストを低減することが
できる。According to the processing apparatus of the present invention, the air blowing section and the air collecting section are provided for each processing apparatus. When the processing device is unnecessary and the processing device is omitted, the air blowing unit, the air recovery unit, and the like provided in the processing device are also removed. Therefore, in the coating / developing processing system, necessary parts (processing equipment)
In the case where unnecessary processing equipment is omitted, unnecessary load is not applied to the blower, the fan and the like, and the running cost can be reduced as compared with the related art.
【００５９】請求項２記載の本発明の処理装置によれ
ば、例えば、塗布・現像処理システムにおいて、必要な
箇所（処理装置）においてのみ清浄エアを供給でき、不
要な処理装置を省いた場合には、ブロワやファン等に余
分な負荷がかからず、従来と比較してランニングコスト
を低減することができると共に、被処理体に対するパー
ティクルの付着をより効果的に防止できる。According to the processing apparatus of the present invention, for example, in a coating / developing processing system, clean air can be supplied only to a necessary portion (processing apparatus), and unnecessary processing apparatuses can be omitted. In this method, no extra load is applied to the blower, the fan, etc., so that the running cost can be reduced as compared with the related art, and the adhesion of particles to the object can be more effectively prevented.
【００６０】請求項３記載の本発明の処理装置によれ
ば、エア吹き出し部から直下に向けて吹き出された清浄
エアは、当該装置内に設置された処理部を通過した後、
エア吸引機構による吸引力により、該エア吹き出し部に
対向するエア回収部を通じて回収され、リターンダクト
を介してエア吹き出し部に再度供給される。その一方、
突出した吹き出し部を通じてカーテン部材と処理部との
間にダウンブローの気流を形成することができる。この
ため、処理部に対してメンテナンス処理を行う際に、作
業者がカーテン部材内に入ったときの、外部パーティク
ルの処理部内への侵入を防止できる。According to the processing apparatus of the third aspect of the present invention, the clean air blown directly downward from the air blowing section passes through the processing section installed in the apparatus, and
Due to the suction force of the air suction mechanism, the air is recovered through the air recovery section facing the air blowing section, and is again supplied to the air blowing section via the return duct. On the other hand,
A down-blow airflow can be formed between the curtain member and the processing section through the protruding blowing section. For this reason, when performing maintenance processing on the processing unit, it is possible to prevent external particles from entering the processing unit when an operator enters the curtain member.
【００６１】請求項４記載の本発明の処理装置によれ
ば、前記エア吹き出し部を、送風ファンと、該送風ファ
ンの吹き出し側に設けられるフィルタとを有する構成と
している。したがって、吹き出し直前にフィルタにより
清浄された清浄エアが各処理装置ごと供給される。According to a fourth aspect of the present invention, the air blowing section includes a blower fan and a filter provided on the blower side of the blower fan. Therefore, clean air that has been cleaned by the filter immediately before blowing is supplied to each processing apparatus.
【００６２】請求項５記載の本発明の処理装置によれ
ば、前記エア吸引機構が熱交換機とブロワを有している
ため、前記エア回収部を経由させてエアを吸引して回収
する際、エアを冷却し、その上でリターンダクトを経由
させてエア吹き出し部に供給することができる。According to the processing apparatus of the present invention, since the air suction mechanism has a heat exchanger and a blower, when the air is sucked and collected through the air collecting section, The air can be cooled and then supplied to the air blowing section via a return duct.
【００６３】請求項６記載の本発明の処理装置によれ
ば、前記エア吸引吸引機構に外部空気取り入れ口が付設
されている。このため、装置外へ漏れたエア分を新鮮な
外部空気で補うことができる。According to the processing apparatus of the present invention, the air suction / suction mechanism is provided with an external air intake. For this reason, the air leaked out of the apparatus can be supplemented with fresh external air.
【００６４】請求項７記載の本発明の処理装置によれ
ば、前記エア吹き出し部とエア回収部との間に、ケミカ
ルトラップが配置されているので、より清浄なエアの供
給が可能である。According to the processing apparatus of the present invention, since the chemical trap is arranged between the air blowing section and the air collecting section, it is possible to supply more clean air.
【００６５】請求項８記載の本発明の処理装置によれ
ば、各エア吹き出し部から吹き出されて各処理部を通過
した清浄エアを一旦蓄積する箱形のエア回収部がリター
ンダクト等とは別個に設けられているので、均一な吸引
或いは必要に応じて分布を変えた吸引を行うことができ
る。According to the processing apparatus of the present invention, the box-shaped air recovery section for temporarily storing the clean air blown out from each air blowing section and passing through each processing section is separate from the return duct and the like. , It is possible to perform a uniform suction or a suction whose distribution is changed as required.
【００６６】請求項９記載の本発明の処理装置によれ
ば、各エアー回収部が相互にエアの流出入が可能に連結
自在であるので、増設が容易である。According to the processing apparatus of the ninth aspect of the present invention, the respective air recovery units can be connected to each other so that air can flow in and out of each other.
【００６７】請求項１０記載の本発明の処理装置によれ
ば、処理部毎に、供給される清浄エアーのクリーン度、
温度、湿度のうち少なくとも１つのコントロールの有無
を設定可能としたので、最適でかつ安価な装置構成をと
ることが可能である。According to the processing apparatus of the present invention, the cleanliness of the supplied clean air is determined for each processing section.
Since at least one control of temperature and humidity can be set, an optimal and inexpensive device configuration can be obtained.
【００６８】請求項１１記載の本発明の処理装置によれ
ば、当該処理装置に対するメンテナンス時を検出する手
段を有し、メンテナンス時が検出されたとき、各処理部
のうち所定の処理部に供給される清浄エアーの風速をコ
ントロールしているので、メンテナンス時に所定の処理
部にパーティクル等が進入するのを防止することができ
る。According to the eleventh aspect of the present invention, there is provided the processing apparatus of the present invention, which has a means for detecting a maintenance time of the processing apparatus, and when the maintenance time is detected, supplies to a predetermined processing unit among the processing units. Since the wind speed of the clean air is controlled, it is possible to prevent particles and the like from entering a predetermined processing unit during maintenance.
【００６９】請求項１２記載の本発明の処理装置におけ
る清浄エアの供給方法によれば、処理装置ごとに対応し
てエア吹き出し部およびエア回収部を設けて供給するた
め、必要な箇所（処理装置）においてのみ清浄エアを供
給でき、不要な処理装置を省いた場合には、ブロワやフ
ァン等に余分な負荷がかからず、従来と比較してランニ
ングコストを低減することができる。According to the method for supplying clean air in the processing apparatus of the present invention, since an air blowing section and an air recovery section are provided and supplied for each processing apparatus, a necessary portion (processing apparatus) is provided. 2), clean air can be supplied only when unnecessary processing equipment is omitted, and no extra load is applied to the blower, the fan, etc., and the running cost can be reduced as compared with the conventional case.
【００７０】請求項１３記載の本発明の処理装置におけ
る清浄エアの供給方法によれば、エア通過部を通じてエ
アを外部に吹き出すことにより、外部パーティクルの侵
入を防ぐ気流を形成することができる。このため、被処
理体に対するパーティクルの付着をより効果的に防止で
きる。According to the method for supplying clean air in the processing apparatus according to the thirteenth aspect of the present invention, by blowing air to the outside through the air passage section, it is possible to form an air flow for preventing intrusion of external particles. Therefore, it is possible to more effectively prevent particles from adhering to the object.
【００７１】請求項１４記載の本発明の処理装置におけ
る清浄エアの供給方法によれば、突出した吹き出し部を
通じて処理部の外部にダウンブローの気流を形成するこ
とができる。このため、処理部に対してメンテナンス処
理を行う際に、作業者が接近したときの、外部パーティ
クルの処理部内への侵入を防止できる。According to the method for supplying clean air in the processing apparatus of the present invention, it is possible to form a down-blow airflow outside the processing section through the protruding blowing section. For this reason, when performing a maintenance process on the processing unit, it is possible to prevent external particles from entering the processing unit when an operator approaches.
【図１】 本発明の一の実施の形態に係る塗布・現像処
理システムの斜視図である。FIG. 1 is a perspective view of a coating / developing processing system according to an embodiment of the present invention.
【図２】 図２は図１に示した塗布・現像処理システム
を構成する処理装置のうち、レジスト塗布装置と加熱装
置の概略構成を示す斜視図である。FIG. 2 is a perspective view showing a schematic configuration of a resist coating device and a heating device among processing devices constituting the coating / developing processing system shown in FIG.
【図３】 図３は図２の断面図である。FIG. 3 is a sectional view of FIG. 2;
【図４】 本発明の他の実施形態に係るレジスト塗布装
置と加熱装置の断面図である。FIG. 4 is a cross-sectional view of a resist coating device and a heating device according to another embodiment of the present invention.
【図５】 本発明の他の実施形態に係る塗布・現像処理
システムの断面図である。FIG. 5 is a sectional view of a coating / developing processing system according to another embodiment of the present invention.
２６ 搬送装置 ３１ スピンチャック ３１ａ カバー部材 ３２ ホットプレート ３２ａ カバー部材 ４０ エア吹き出し部 ４０ａ 突出したエア引き出し部 ４１ 送風ファン ４２ フィルタ ４３ エア回収部 ４４ リターンダクト ４５ エア吸引機構 ４５ａ ブロワ ４５ｄ 外部空気取り入れ口 ４５ｅ 熱交換機 ４８ カーテン部材 Ｇ ガラス基板 26 Conveying device 31 Spin chuck 31a Cover member 32 Hot plate 32a Cover member 40 Air blow-out part 40a Protruding air draw-out part 41 Blower fan 42 Filter 43 Air recovery part 44 Return duct 45 Air suction mechanism 45a Blower 45d External air intake 45e Heat Exchanger 48 Curtain member G Glass substrate
Claims (14)
部と、 前記各処理部に対応して、該処理部の上方に設けられ、
清浄エアを直下に向けて吹き出すエア吹き出し部と、 前記各処理部に対応して、該処理部の下方に、前記エア
吹き出し部に対向して設けられ、エア吸引機構の吸引力
により、リターンダクトを通じて前記エア吹き出し部に
エアを再供給するため、処理部を通過したエアを回収す
るエア回収部と、 を具備することを特徴とする処理装置。1. A plurality of processing units for performing predetermined processing on an object to be processed, and provided above the processing units corresponding to the processing units,
An air blowing section for blowing clean air directly downward, corresponding to each processing section, provided below the processing section and opposed to the air blowing section, and provided with a return duct by a suction force of an air suction mechanism. And an air recovery unit that recovers air that has passed through the processing unit in order to resupply the air to the air blowing unit through the air processing unit.
き出すためのエア通過部が形成された処理部保護用のカ
バー部材と、 前記処理部に対応して、該処理部の上方に設けられ、清
浄エアを直下に向けて吹き出すエア吹き出し部と、 前記処理部に対応して、該処理部の下方に、前記エア吹
き出し部に対向して設けられ、エア吸引機構の吸引力に
より、リターンダクトを通じて前記エア吹き出し部にエ
アを再供給するため、処理部を通過したエアを回収する
エア回収部と、を具備することを特徴とする処理装置。2. A processing unit for performing a predetermined processing on an object to be processed, and a cover member for protecting the processing unit, the processing unit surrounding the processing unit and having an air passage formed on a side surface for blowing air to the outside. Corresponding to the processing unit, an air blowing unit provided above the processing unit and blowing clean air directly downward, and corresponding to the processing unit, the air blowing below the processing unit. An air collection unit that is provided to face the unit and collects air that has passed through the processing unit in order to resupply air to the air blowing unit through a return duct by a suction force of an air suction mechanism. Characteristic processing device.
浄エアを直下に向けて吹き出し可能であると共に、前記
処理部の外方においても清浄エアを直下に向けて吹き出
すことができる突出した吹き出し部を有するエア吹き出
し部と、 前記突出した吹き出し部の外側縁に沿って設けられるカ
ーテン部材と、 前記処理部に対応して、該処理部の下方に、前記エア吹
き出し部のうち、処理部外へ突出した吹き出し部を除い
たエア吹き出し部に対向して設けられ、エア吸引機構の
吸引力により、リターンダクトを通じて前記エア吹き出
し部にエアを再供給するため、処理部を通過したエアを
回収するエア回収部と、 を具備することを特徴とする処理装置。A processing unit for performing predetermined processing on the object to be processed; a processing unit provided above the processing unit corresponding to the processing unit, and capable of blowing clean air directly below the processing unit; An air blowing portion having a protruding blowing portion that can blow clean air directly downward even outside the portion, a curtain member provided along an outer edge of the protruding blowing portion, Then, below the processing unit, the air blowing unit is provided to face the air blowing unit excluding the blowing unit protruding outside the processing unit, and the suction force of the air suction mechanism causes the return unit to pass through the return duct. A processing apparatus comprising: an air recovery unit that recovers air that has passed through the processing unit in order to resupply air to the air blowing unit.
装置であって、前記エア吹き出し部が、送風ファンと、
該送風ファンの吹き出し側に設けられるフィルタとを有
して構成されることを特徴とする処理装置。4. The processing apparatus according to claim 1, wherein the air blowing unit includes a blower fan,
A processing device, comprising: a filter provided on a blowing side of the blower fan.
装置であって、前記エア吸引機構が、吸引されたエアを
冷却する熱交換機と、前記エア回収部を経由させてエア
を吸引すると共に、前記リターンダクトを経由させてエ
ア吹き出し部に回収されたエアを供給するブロワとを有
して構成されることを特徴とする処理装置。5. The processing apparatus according to claim 1, wherein the air suction mechanism removes the air through a heat exchanger that cools the sucked air and the air recovery unit. A processing apparatus, comprising: a blower that sucks air and supplies the collected air to the air blowing unit via the return duct.
装置であって、前記エア吸引機構に外部空気取り入れ口
が付設されていることを特徴とする処理装置。6. The processing apparatus according to claim 1, wherein an external air intake is provided to the air suction mechanism.
装置であって、前記エア吹き出し部とエア回収部との間
に、ケミカルトラップが配置されていることを特徴とす
る処理装置。7. The processing apparatus according to claim 1, wherein a chemical trap is disposed between the air blowing section and the air recovery section. .
部と、 前記各処理部に対応して、該処理部の上方に設けられ、
清浄エアを直下に向けて吹き出すエア吹き出し部と、 前記各処理部に対応して、該処理部の下方に、前記エア
吹き出し部に対向してそれぞれ設けられ、前記各エア吹
き出し部から吹き出されて前記各処理部を通過した清浄
エアを一旦蓄積する箱形のエア回収部と、 前記各エア回収部に蓄積された清浄エアを引力し、前記
エア吹き出し部に再供給するためのエア吸引機構及びリ
ターンダクトとを具備することを特徴とする処理装置。8. A plurality of processing units for performing predetermined processing on the object to be processed, and provided above the processing units corresponding to the processing units,
An air blowing section for blowing clean air directly downward, corresponding to each of the processing sections, provided below the processing section, opposite to the air blowing section, and blown from each of the air blowing sections. A box-shaped air collection unit that temporarily accumulates the clean air that has passed through each of the processing units; and an air suction mechanism for attracting the clean air accumulated in each of the air collection units and re-supplying the air to the air blowing unit. A processing device, comprising: a return duct.
結自在であることを特徴とする処理装置。9. The processing apparatus according to claim 8, wherein each of the air recovery units is freely connectable so that air can flow in and out of each other.
ーを供給する供給手段とを有する処理装置であって、 前記処理部毎に、供給される清浄エアーのクリーン度、
温度、湿度のうち少なくとも１つのコントロールの有無
を設定可能としたことを特徴する処理装置。10. A processing apparatus comprising: a plurality of processing units; and a supply unit for supplying clean air to each processing unit, wherein the cleanliness of the supplied clean air is determined for each of the processing units.
A processing apparatus characterized in that the presence or absence of at least one of temperature and humidity can be set.
ーを供給する供給手段とを有する処理装置であって、 当該処理装置に対するメンテナンス時を検出する手段
と、 前記メンテナンス時が検出されたとき、各処理部のうち
所定の処理部に供給される清浄エアーの風速をコントロ
ールすることを特徴とする処理装置。11. A processing apparatus comprising: a plurality of processing units; and a supply unit for supplying clean air to each processing unit, wherein: a unit for detecting a maintenance time for the processing unit; A processing device for controlling a wind speed of clean air supplied to a predetermined processing unit among the processing units.
とに対応させて、該処理部の上方にエア吹き出し部を設
け、該エア吹き出し部から清浄エアを直下に向けて吹き
出した後、処理部を通過したエアを、エア吸引機構の吸
引力により、前記処理部ごとに対応させて、前記処理部
の下方に設けたエア回収部を通じて回収し、リターンダ
クトを介してエア吹き出し部に再度供給することを特徴
とする処理装置における清浄エアの供給方法。12. An air blowing unit is provided above the processing unit in correspondence with each processing unit that performs a predetermined process on the object to be processed, and after the clean air is blown from the air blowing unit directly downward, The air that has passed through the processing unit is collected by an air collection unit provided below the processing unit by the suction force of the air suction mechanism, and is returned to the air blowing unit via a return duct. A method for supplying clean air in a processing apparatus, characterized by supplying.
上方にエア吹き出し部を設け、該エア吹き出し部から清
浄エアを直下に向けて吹き出した後、処理部を通過した
エアを、エア吸引機構の吸引力により、前記処理部ごと
に対応させて、前記処理部の下方に設けたエア回収部を
通じて回収し、リターンダクトを介してエア吹き出し部
に再度供給する一方、前記処理部を囲繞する処理部保護
用のカバー部材の側面部にエア通過部を形成し、該エア
通過部を通じてエアを外部に吹き出すことにより、外部
パーティクルの侵入を防ぐ気流を形成することを特徴と
する処理装置における清浄エアの供給方法。13. An air blowing section is provided above a processing section for performing a predetermined processing on the object to be processed, and after the clean air is blown downward from the air blowing section, air passing through the processing section is removed by the air. By the suction force of the suction mechanism, corresponding to each of the processing units, the air is recovered through an air recovery unit provided below the processing unit and supplied again to the air blowing unit via a return duct, while surrounding the processing unit. Forming an air passage on the side surface of the cover member for protecting the processing unit, and blowing air to the outside through the air passage to form an airflow preventing entry of external particles. How to supply clean air.
上方に処理部の外方に突出した吹き出し部を有するエア
吹き出し部を設け、該エア吹き出し部から清浄エアを直
下に向けて吹き出した後、処理部を通過したエアを、エ
ア吸引機構の吸引力により、前記処理部ごとに対応させ
て、前記処理部の下方に設けたエア回収部を通じて回収
し、リターンダクトを介してエア吹き出し部に再度供給
する一方、前記処理部外へ突出した吹き出し部から処理
部の外方においても清浄エアを直下に向けて吹き出すこ
とにより、外部パーティクルの侵入を防ぐ気流を形成す
ることを特徴とする処理装置における清浄エアの供給方
法。14. An air blowing section having a blowing section protruding outward from the processing section is provided above a processing section for performing a predetermined processing on the object to be processed, and clean air is blown from the air blowing section directly downward. After that, the air that has passed through the processing unit is collected by an air collecting mechanism provided below the processing unit by the suction force of an air suction mechanism, and the air is blown out through a return duct. While supplying the air again to the processing unit, the cleaning air is blown out from the blowing unit protruding out of the processing unit to the outside of the processing unit just below, thereby forming an airflow that prevents intrusion of external particles. A method for supplying clean air in a processing apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP37558598A JP3375294B2 (en) | 1998-12-17 | 1998-12-17 | Processing apparatus, processing system, and method for supplying clean air in the apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP37558598A JP3375294B2 (en) | 1998-12-17 | 1998-12-17 | Processing apparatus, processing system, and method for supplying clean air in the apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000182949A true JP2000182949A (en) | 2000-06-30 |
| JP3375294B2 JP3375294B2 (en) | 2003-02-10 |
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ID=18505754
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|---|---|---|---|
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