JP2000173900A5 - - Google Patents

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Publication number
JP2000173900A5
JP2000173900A5 JP1998349021A JP34902198A JP2000173900A5 JP 2000173900 A5 JP2000173900 A5 JP 2000173900A5 JP 1998349021 A JP1998349021 A JP 1998349021A JP 34902198 A JP34902198 A JP 34902198A JP 2000173900 A5 JP2000173900 A5 JP 2000173900A5
Authority
JP
Japan
Prior art keywords
electron
irradiation
region
electrons
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998349021A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000173900A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10349021A priority Critical patent/JP2000173900A/ja
Priority claimed from JP10349021A external-priority patent/JP2000173900A/ja
Priority to US09/457,083 priority patent/US6465797B2/en
Publication of JP2000173900A publication Critical patent/JP2000173900A/ja
Publication of JP2000173900A5 publication Critical patent/JP2000173900A5/ja
Pending legal-status Critical Current

Links

JP10349021A 1998-12-08 1998-12-08 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置 Pending JP2000173900A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP10349021A JP2000173900A (ja) 1998-12-08 1998-12-08 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置
US09/457,083 US6465797B2 (en) 1998-12-08 1999-12-07 Electron beam illumination apparatus, electron beam exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10349021A JP2000173900A (ja) 1998-12-08 1998-12-08 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009091979A Division JP4939565B2 (ja) 2009-04-06 2009-04-06 電子ビーム露光装置

Publications (2)

Publication Number Publication Date
JP2000173900A JP2000173900A (ja) 2000-06-23
JP2000173900A5 true JP2000173900A5 (enExample) 2006-01-26

Family

ID=18400963

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10349021A Pending JP2000173900A (ja) 1998-12-08 1998-12-08 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置

Country Status (2)

Country Link
US (1) US6465797B2 (enExample)
JP (1) JP2000173900A (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7095022B2 (en) * 2000-12-12 2006-08-22 Ebara Corporation Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
JP2003031114A (ja) * 2001-07-16 2003-01-31 Denki Kagaku Kogyo Kk 電子源の製造方法
EP1482363A1 (en) * 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographic apparatus
US7176610B2 (en) * 2004-02-10 2007-02-13 Toshiba Machine America, Inc. High brightness thermionic cathode
JP2006059513A (ja) * 2004-07-22 2006-03-02 Kuresutetsuku:Kk 電子ビーム照射装置および描画装置
TWI415162B (zh) * 2005-03-03 2013-11-11 Toshiba Kk 映像投影型電子線裝置及使用該裝置之缺陷檢查系統
KR20070116260A (ko) * 2005-03-22 2007-12-07 가부시키가이샤 에바라 세이사꾸쇼 전자선장치
WO2007013398A1 (ja) * 2005-07-26 2007-02-01 Ebara Corporation 電子線装置
JP2007335125A (ja) * 2006-06-13 2007-12-27 Ebara Corp 電子線装置
US8294125B2 (en) * 2009-11-18 2012-10-23 Kla-Tencor Corporation High-sensitivity and high-throughput electron beam inspection column enabled by adjustable beam-limiting aperture
JP6087108B2 (ja) * 2012-10-30 2017-03-01 株式会社ニューフレアテクノロジー カソード選別方法
EP2779201A1 (en) * 2013-03-15 2014-09-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High brightness electron gun, system using the same, and method of operating the same
WO2018016286A1 (ja) 2016-07-19 2018-01-25 デンカ株式会社 電子源およびその製造方法
JP7295974B2 (ja) 2019-12-24 2023-06-21 株式会社日立ハイテク 電子源、電子線装置および電子源の製造方法
CN114284124A (zh) * 2021-02-02 2022-04-05 湖州超群电子科技有限公司 一种电子束辐照增强装置及其使用方法
KR20240007062A (ko) * 2022-07-07 2024-01-16 가부시키가이샤 뉴플레어 테크놀로지 실장 기판, 블랭킹 애퍼처 어레이 칩, 블랭킹 애퍼처 어레이 시스템 및 멀티 하전 입자 빔 조사 장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4167676A (en) * 1978-02-21 1979-09-11 Bell Telephone Laboratories, Incorporated Variable-spot scanning in an electron beam exposure system
US4663559A (en) * 1982-09-17 1987-05-05 Christensen Alton O Field emission device
US4904895A (en) 1987-05-06 1990-02-27 Canon Kabushiki Kaisha Electron emission device
JP3728031B2 (ja) 1996-10-25 2005-12-21 キヤノン株式会社 電子ビーム露光装置及び電子ビーム露光用マスク
JPH10294255A (ja) 1997-04-17 1998-11-04 Canon Inc 電子ビーム照明装置、および該電子ビーム照明装置を備えた露光装置
JP3658149B2 (ja) * 1997-09-04 2005-06-08 キヤノン株式会社 電子線露光装置

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