JP2000133563A5 - - Google Patents
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- Publication number
- JP2000133563A5 JP2000133563A5 JP1998300523A JP30052398A JP2000133563A5 JP 2000133563 A5 JP2000133563 A5 JP 2000133563A5 JP 1998300523 A JP1998300523 A JP 1998300523A JP 30052398 A JP30052398 A JP 30052398A JP 2000133563 A5 JP2000133563 A5 JP 2000133563A5
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive substrate
- exposure
- mask
- pattern
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 description 33
- 238000000034 method Methods 0.000 description 16
- 238000005286 illumination Methods 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 6
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10300523A JP2000133563A (ja) | 1998-10-22 | 1998-10-22 | 露光方法及び露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10300523A JP2000133563A (ja) | 1998-10-22 | 1998-10-22 | 露光方法及び露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000133563A JP2000133563A (ja) | 2000-05-12 |
| JP2000133563A5 true JP2000133563A5 (enExample) | 2005-10-27 |
Family
ID=17885851
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10300523A Withdrawn JP2000133563A (ja) | 1998-10-22 | 1998-10-22 | 露光方法及び露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000133563A (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002043214A (ja) | 2000-07-26 | 2002-02-08 | Toshiba Corp | 走査型露光方法 |
| US6870168B1 (en) * | 2003-11-12 | 2005-03-22 | Eastman Kodak Company | Varying feature size in resist across the chip without the artifact of “grid-snapping” from the mask writing tool |
| JP5470707B2 (ja) * | 2008-01-17 | 2014-04-16 | 株式会社ニコン | 露光方法及び装置、並びにデバイス製造方法 |
| JP5644290B2 (ja) * | 2010-09-08 | 2014-12-24 | 凸版印刷株式会社 | フォトマスクの製造方法 |
| CN114820430B (zh) * | 2022-02-18 | 2023-10-03 | 成都飞机工业（集团）有限责任公司 | 一种多光源协同曝光的3d打印无损检测方法 |
-
1998
- 1998-10-22 JP JP10300523A patent/JP2000133563A/ja not_active Withdrawn
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