JP2000105453A - Photosetting glass paste composition and fired material pattern forming method using same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a photosetting glass paste composition containing a remarkably reduced amount of an organic solvent or no organic solvent and excellent in suitability to filling into grooves and firing and to form a high definition fired material pattern with low energy consumption and good productivity at a low cost by using the composition. SOLUTION: The photosetting glass paste composition contains fine glass particles, a liquid photosetting compound, a photopolymerization initiator and a dispersant having a polar group having an affinity for the fine glass particles. The photosetting glass paste composition is applied in such a way that it is filled into the grooves 12 in a photosensitive film 10 having a prescribed pattern on a substrate 1 and the composition is photoset by exposure. The photosensitive film 10 is then removed with a removing agent and firing is carried out.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photocurable glass paste composition and a method for forming a fired product pattern using the same, and particularly to a plasma display panel (hereinafter referred to as PD).
The present invention relates to a partition rib (barrier rib) pattern, a derivative pattern, a photocurable glass paste composition useful for forming a black matrix, and a method for forming a fired product pattern.

[0002]

2. Description of the Related Art As a conventional method of forming a PDP partition,
Various methods such as a screen printing method, a sand blast method, and a lift-off method (also referred to as a dry film embedding method) are known. However, in the case of the screen printing method, it is necessary to accurately position the printing screen with respect to a lower member such as an electrode which has been printed on the back plate in advance. High aspect ratio (aspect ratio) because it is difficult to align the image with each other and the film thickness obtained by one printing is limited.
In order to form the partition walls, a number of times of superimposing printing is required. Therefore, as the screen becomes larger, the skirt of the partition walls is inevitably disturbed or height accuracy cannot be obtained, and the shape of the display cell is greatly affected by the bleeding of the partition walls, and the display quality when panelized is deteriorated. In addition to the problem, there is a problem that workability is poor. On the other hand, the sand blast method
After applying the glass paste to a predetermined thickness on the entire surface of the substrate, a photosensitive dry film having blast resistance is superimposed thereon, and then the photosensitive film is patterned into a partition shape, and then abrasive powder is sprayed on the film. This is a method of scraping off the glass paste part. in this way,
Although it is possible to form a high-definition partition wall, there is a problem that a large amount of grinding powder is generated, which deteriorates the working environment and lowers the yield. In addition, when the screen is scaled up to a large screen, it becomes difficult to obtain partition walls having the same dimensions uniformly over the entire surface, and problems such as deterioration in image quality and difficulty in obtaining a drive margin when a panel is formed arise.

In the lift-off method, even if the photosensitive dry film to be used is a thick film of about 200 μm, it is easy to pattern a large screen of a 40-inch diagonal size with a uniform size, and this feature can be used for panel production. . In the partition formation by the lift-off method, first, a photosensitive dry film having a predetermined thickness is laminated on a transparent glass substrate on which a lower member such as an electrode is formed, and then a photomask having a predetermined partition shape pattern is laminated. Thereafter, exposure and development are performed, and a portion of the photosensitive film that has not been exposed through a photomask is removed to form a groove. Next, the above-described exposure, the grooves of the photosensitive film formed by the development, coated so as to embed a glass paste, dried and heated and cured, after removing the photosensitive film and firing the glass paste,
It forms a partition. Since the partition walls formed by this method are superior in dimensional stability as compared with the above-described screen printing method and sand blast method, they are attracting attention as a method for manufacturing a high-definition partition wall for PDP with a high yield.

[0004]

The glass paste composition used in the lift-off method pastes a composition containing a very large amount of fine glass particles, and lowers the viscosity to improve the embedding property in the groove of the photosensitive film. For this purpose, an organic solvent is contained. For this reason, before the glass paste composition filled in the groove of the photosensitive film is thermally cured, a drying step for evaporating the solvent component is required. As a result, there is a problem that the working environment is deteriorated by the evaporated organic solvent. In general, prior to heat curing, embedding of the glass paste into the groove of the photosensitive film, defoaming under reduced pressure, and drying are performed. Sinking, it is necessary to repeat the embedding-defoaming-drying cycle several times, leading to a complicated process,
It is one of the factors that lowers productivity. Thereafter, a heat treatment for curing is further performed, and after the photosensitive film is peeled off with a release agent, high-temperature heating for firing is performed. Since such a large number of heating steps are required, the production steps are complicated and energy consumption is increased, which is a factor of increasing the production cost.

The present invention has been made to solve the above-mentioned problems of the prior art, and its basic purpose is to significantly reduce the use of an organic solvent which has an adverse effect on people and the environment. Another object of the present invention is to provide a photocurable glass paste composition that is not used at all and is not a thermosetting type as in the past. Further objects of the present invention, by using such a photo-curable glass paste composition,
An object of the present invention is to provide a method capable of simplifying a complicated process by a conventional lift-off method by omitting a drying process and a heat curing process, and forming a high-definition fired product pattern with low energy consumption, low cost and high productivity.

[0006]

According to the present invention, there is provided, according to the present invention, (A) glass fine particles, (B) a liquid photocurable compound, (C) a photopolymerization initiator, and (D) a photopolymerization initiator. A photocurable glass paste composition comprising a dispersant having a polar group having an affinity for glass fine particles is provided. In a preferred embodiment, the photocurable glass paste composition further contains (E) an inorganic filler and / or (F) a solid or semi-solid binder.

Further, according to the present invention, there is provided a method for forming a fired product pattern using the photocurable glass paste composition as described above. The method includes the steps of forming a film having a predetermined pattern groove on a substrate, embedding the photocurable glass paste composition in the pattern groove of the film,
Exposing the photocurable glass paste composition in the pattern groove to light curing, exposing or baking without peeling the film, and forming a fired product having a predetermined pattern of the glass paste composition. It is characterized by including.

[0008]

BEST MODE FOR CARRYING OUT THE INVENTION The photocurable glass paste composition according to the present invention is obtained by adding a liquid photocurable compound (B) and a photopolymerization initiator (C) to a large amount of glass fine particles (A). Along with the photocurable composition, a polar group having an affinity for glass particles, such as a carboxyl group, a hydroxyl group,
It is characterized by being made into a paste by adding a dispersant having an acid ester or the like as a paste agent. As described above, conventionally, an organic solvent has been used when preparing a glass paste composition. This is because the glass powder cannot be made into a paste unless an organic solvent is used. The same is true for a composition in which a liquid photocurable compound and a photopolymerization initiator are added to a large amount of glass fine particles, and even if these components are mixed without adding an organic solvent, for example, it may be slightly wet. It becomes crumpled like soil that cannot be pasted. In addition, even if a large amount of a liquid photocurable compound is added, it becomes liquid and cannot be made into a paste, and in addition to a serious problem that a fine pattern cannot be formed due to excessive loss during firing. I do.

The present inventors have conducted intensive studies on the properties of a composition containing a large amount of glass powder. As a result, surprisingly, a large amount of glass fine particles were added to the glass fine particles together with the liquid photocurable compound and the photopolymerization initiator. The present inventors have found that a composition in a good paste state can be obtained only by adding a relatively small amount of a dispersant having an affinity polar group, thereby completing the present invention. If such a photocurable glass paste composition is used for forming a fired glass pattern by, for example, a lift-off method, a drying step for evaporating a solvent can be omitted in forming a cured glass paste,
The process is simplified, the amount of volatile components is significantly reduced, and the working environment is not deteriorated. Furthermore, since the curing reaction of the glass paste composition proceeds not by a conventional thermosetting reaction but by a photocuring reaction, it is possible to realize a reduction in curing time and energy saving.

Hereinafter, each component of the photocurable glass paste composition of the present invention will be described. As the glass fine particles (A), those mainly containing lead oxide, bismuth oxide, zinc oxide or lithium oxide can be suitably used. Further, from the viewpoint of resolution, glass fine particles having an average particle diameter of 10 μm or less are preferable. Preferable examples of the glass fine particles containing lead oxide as a main component are as follows:
PbO is 48~82%, B ₂ O ₃ is 0.5 to 22%, Si
O ₂ is ₃ to 32%, Al ₂ O ₃ is 0 to 12%, and BaO is 0.
-10%, ZnO 0-15%, TiO ₂ 0-2.5
% Bi ₂ O ₃ has a composition of 0% to 25%, the softening point is 42
An amorphous frit having a temperature of 0 to 590 ° C is exemplified.

Preferred examples of the glass fine particles containing bismuth oxide as a main component include Bi ₂ in terms of weight% on an oxide basis.
O ₃ is 35 to 88%, B ₂ O ₃ is 5 to 30%, SiO ₂ 0
To 20% Al ₂ O ₃ is 0 to 5% BaO 1 to 25%
ZnO has a composition of 1 to 20% and a softening point of 420 to 5
A noncrystalline frit that is 90 ° C.

A preferred example of the glass fine particles containing zinc oxide as a main component is as follows.
5~60%, K ₂ O is 2~15%, B ₂ O ₃ is 25 to 45
%, SiO ₂ is 1~7%, Al ₂ O ₃ is 0%, Ba
An amorphous frit having a composition of 0 to 20% of O and 0 to 10% of MgO and having a softening point of 420 to 590 ° C is exemplified.

Preferred examples of the glass fine particles containing lithium oxide as a main component include Li _{2 in} weight% on an oxide basis.
O 1 to 13%, Bi ₂ O ₃ 0 to 30%, B ₂ O ₃ 1 to 5
_{0%, SiO 2 1~50%,} Al 2 O 3 1~40%, B
An amorphous frit having a composition of aO 1 to 20% and ZnO 1 to 25% and having a softening point of 420 to 590 ° C is exemplified.

As the liquid photocurable compound (B) as a photocurable component, a monomer, oligomer and / or polymer having at least one (meth) acryloyl group in one molecule can be suitably used. Representative examples of such liquid photocurable compounds include hydroxyalkyl (meth) acrylates such as 2-hydroxyethyl (meth) acrylate and 2-hydroxypropyl (meth) acrylate; ethylene glycol and methoxytetraethylene glycol. Mono- or di (meth) acrylates of glycols, such as polyethylene glycol;
(Meth) acrylamides such as N, N-dimethyl (meth) acrylamide and N-methylol (meth) acrylamide; aminoalkyl (meth) acrylates such as N, N-dimethylaminoethyl (meth) acrylate; hexanediol, tri Polyhydric alcohols such as methylolpropane, pentaerythritol, ditrimethylolpropane, dipentaerythritol, trishydroxyethyl isocyanurate, and polyhydric (meth) of these ethylene oxide adducts or propylene oxide adducts
Acrylates; (meth) acrylates of phenols such as phenoxyethyl (meth) acrylate and polyethoxydi (meth) acrylate of bisphenol A or (meth) acrylates of propylene oxide; glycerin diglycidyl ether, trimethylolpropane triglycidyl ether (Meth) of glycidyl ethers such as triglycidyl isocyanurate
Acrylates; and melamine (meth) acrylate;
Urethane acrylates and the like can be mentioned. In this specification, the term “(meth) acrylate” is a general term for acrylate, methacrylate and mixtures thereof, and the same applies to other similar expressions.

The compounding amount of the liquid photocurable compound (B) is 5 to 100 parts by weight of the glass fine particles (A).
50 parts by weight are suitable. If the compounding amount of the liquid photocurable compound (B) is too small than the above range, it becomes difficult to obtain sufficient photocurability of the composition. As a result, the photocuring of the surface portion is accelerated, and uneven curing is likely to occur.

The photopolymerization initiator (C) is selected from ultraviolet to
The liquid photocurable compound (B) in response to light in the visible region
Any compound can be used as long as it initiates photopolymerization of, and one or a combination of two or more conventionally known photopolymerization initiators or a combination with a photosensitizer can be used. Specific examples of typical photopolymerization initiators include benzoin and benzoin alkyl ethers such as benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, Acetophenones such as 2,2-diethoxy-2-phenylacetophenone and 1,1-dichloroacetophenone; 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl- Aminoacetophenones such as 2-dimethylamino-1- (4-morpholinophenyl) -butanone-1;
Anthraquinones such as 2-methylanthraquinone, 2-ethylanthraquinone, 2-t-butylanthraquinone and 1-chloroanthraquinone; 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2-chlorothioxanthone and 2,4-diisopropyl Thioxanthones such as thioxanthone; ketals such as acetophenone dimethyl ketal and benzyl dimethyl ketal;
Benzophenones such as benzophenone; or xanthones; (2,6-dimethoxybenzoyl) -2,4,4-
Pentylphosphine oxide, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis (2,6-dimethoxybenzoyl) -2,4,4- Trimethylpentylphosphine oxide, bis (2,6-dichlorobenzoyl) -4
-Propylbenzylphosphine oxide, 2,4
Phosphine oxides such as 6-trimethylbenzoylphenyl phosphinate or bisacylphosphine oxides; various peroxides; dimethyl titanocene, diphenyl titanocene, bis (pentafluorophenyl) titanocene, bis (η5-cyclopentadienyl) -Bis (2,6-difluoro-3- (1H-
Various titanocene-based photopolymerization initiators such as pyr-1-yl) phenyl) titanium; ferrocenium salt-based initiators;
Aluminate complex-based initiators, halogen-based initiators, bisimidazole-based initiators, peroxide ester-based initiators, ketocoumarin-based initiators, acridine-based initiators, and the like, Representative examples are leuco dyes,
N, N-dimethylaminobenzoic acid ethyl ester, N, N
Tertiary amines such as N-dimethylaminobenzoic acid isoamyl ester, pentyl-4-dimethylaminobenzoate, triethylamine and triethanolamine. The amount of the photopolymerization initiator (C) (the total amount in the case of a combination with a photosensitizer) is suitably from 0.1 to 20 parts by weight per 100 parts by weight of the glass fine particles (A).

The dispersant (D) used as a paste agent in the composition of the present invention includes a carboxyl group,
Hydroxyl groups, compounds and polymer compounds having a polar group that has an affinity for glass fine particles such as acid esters, for example, acid-containing compounds such as phosphates, and copolymers containing acid groups,
Hydroxyl-containing polycarboxylic acid esters, polysiloxanes,
A salt of a long-chain polyaminoamide and an acid ester can be used. These compounds have an acid value of 20 mg KO
H / g or more can be suitably used.
In the case of gKOH / g or more, an even higher paste effect can be obtained, and it can be particularly preferably used. The dispersant (D) is desirably used in a liquid form so that a paste effect can be obtained from the time of mixing. When the above compound is a solid, it can be used as a solution in any solvent.

Among the commercially available dispersants which can be used particularly preferably, Disperbyk (registered trademark)-
101, -103, -110, -111, -160,-
171, -174, -190, -300, Bykumen (registered trademark), BYK-P105, -P104, -P104
S, -240 (all by Big Chemie), EFK
A-polymer 150, EFKA-44, -63, -6
4, -65, -66, -71, -764, -766, N
(All manufactured by Efka). Among these, Disperbyk (registered trademark) -110, -111, BY
K-P105, -P104, -P104S, -240,
EFKA-63, -64, -65, -66, -764,
-766 has an acid value of the active ingredient excluding the solvent of 100 mgK.
OH / g or more is suitable. An appropriate amount of the dispersant (D) is 0.01 to 5 parts by weight per 100 parts by weight of the glass fine particles (A). Dispersant (D)
Is less than the above range, the effect of adding the dispersant cannot be obtained, and it becomes difficult to paste the composition. On the other hand, if it is added in excess of the above range, the proportion of the component that does not cure is increased, so that the hardness of the cured paste is reduced or the thixotropic property of the paste is increased.

The composition of the present invention can further contain (E) an inorganic filler in order to provide a dense glass paste composition and to increase the mechanical strength of the formed glass paste fired product. As the inorganic filler (E), any of alumina, silica, zircon, titanium oxide, etc., which can contribute to the improvement of the density inside the fired product pattern such as a partition wall, can be used. Further, when black is required for the fired product pattern, Fe, Co, Cu, Cr,
A black pigment composed of one or more metal oxides such as Mn and Al can be used as the inorganic filler. At this time, the amount of addition may be adjusted according to the required blackness. Although the glass component shrinks at the time of firing, the shrinkage ratio and the internal density can be adjusted by the amount of the inorganic filler. That is, by blending the inorganic filler in an amount of 0.1 to 50 parts by weight per 100 parts by weight of the glass fine particles (A), it is possible to obtain a fired product pattern such as a partition wall which is dense and has a small shrinkage ratio. At this time, if the amount of the inorganic filler is more than the above range, the adhesiveness to the substrate is deteriorated, which is not preferable.

The composition of the present invention may further comprise (F) a solid or semi-solid binder, preferably a glass fine particle (A) 100, in order to form a stable paste and improve coating workability. It can be contained at a ratio of 0.01 to 5 parts by weight per part by weight. Such a binder may or may not have photocurability itself, but a photocurable binder is preferable from the viewpoint of improving the photocurability of the entire composition.

Examples of the photocurable binder include resins having an ethylenically unsaturated bond such as a vinyl group, an allyl group, an acryloyl group, and a methacryloyl group and a photosensitive group such as a propargyl group. Various conventionally known photosensitive resins (photosensitive prepolymers) such as an acrylic copolymer having the above, an unsaturated carboxylic acid-modified epoxy resin or a resin to which a polybasic acid anhydride is further added can be used.

On the other hand, non-photocurable binders include acrylic polyols, polyvinyl alcohol, polyvinyl acetal, styrene-allyl alcohol resins, phenolic resins, copolymerized (meth) acrylate resins, polypropylene carbonate resins, olefinic hydroxyl group-containing polymers, A lactone-modified polymer in which a lactone is added to the hydroxyl group of these hydroxyl-containing polymers or an amino group of an amino resin, or a lactone-modified monomer in which a lactone is added to a hydroxyl group or an amino group of a monomer having both a hydroxyl group or an amino group and an unsaturated group in a molecule. And a copolymer of the lactone-modified monomer and another monomer having an unsaturated group, and a cellulose derivative such as methylcellulose, ethylcellulose, and hydroxyethylcellulose.

As described above, the photocurable glass paste composition of the present invention does not require the addition of a solvent, but may be added in a small amount as a dispersant for improving the leveling property and the bubble removal property. Further, if necessary, various additives such as an antifoaming agent, a leveling agent, an anti-blocking agent and a silane coupling agent can be added in a small amount.

Next, an example of a method for forming a partition wall of a PDP back plate according to the present invention will be described with reference to FIG. First, FIG.
As shown in (A) and (B), a photosensitive film 1 is formed on a transparent substrate 1 (generally, a glass substrate) serving as a back plate of a PDP.
0 are laminated, and a groove 12 having a predetermined pattern is formed by a photographic method. The method may be the same as the conventional method.
As shown in FIG.
Is adhered, a photomask 13 having a predetermined pattern light-transmitting portion 14 is superimposed, and then exposed and developed, and a photosensitive film not exposed through the photomask as shown in FIG. Is removed. In the case of using a transparent substrate having a predetermined pattern of electrodes formed on the substrate surface, the photomask is superposed on the photosensitive film so that the pattern transmissive portion of the photomask matches the electrode position.

Next, as shown in FIG. 1 (C), the photocurable composition of the present invention having the above-mentioned composition is formed in the groove 12 between the patterns of the photosensitive film 10 formed by the above-mentioned exposure and development, as shown in FIG. The glass paste composition 11 is applied so as to be embedded, preferably after defoaming under reduced pressure, and is exposed to light and cured. Exposure light sources include low-pressure mercury lamp, medium-pressure mercury lamp, ultra-high-pressure mercury lamp, xenon lamp, carbon arc lamp, metal halide lamp, fluorescent lamp, halogen lamp, argon ion laser, helium cadmium laser, helium neon laser, and krypton ion laser. , Various semiconductor lasers, YAG lasers,
A light emitting diode or the like can be used. Thereafter, the hardened glass paste surface is polished until the photosensitive film 10 becomes visible (FIG. 1D).

The substrate 1 thus obtained is treated with an aqueous alkaline solution as a release agent, for example, at 40 ° C., 3-5% NaO.
H aqueous solution or 10 wt% monoethanolamine aqueous solution and soaked in a release agent solution for about 15 to 20 minutes.
By immersing the photosensitive film 10 in water at about ° C for several tens of seconds, the photosensitive film 10 immediately swells and peels off. The substrate 1 from which the photosensitive film 10 was peeled off as shown in FIG.
After drying, the cured glass paste is fired at a temperature of about 380 ° C. to 600 ° C. in the air or in a nitrogen atmosphere, for example. At this time, about 30 minutes before the firing step.
It is preferable to include a step of heating to 0 to 500 ° C. and holding at that temperature for a predetermined time to remove organic components.

By such a process, the width is 30 to 100 μm.
m, a high-precision PDP partition wall 2 having a uniform height and a uniform height of about 100 to 200 μm without a disturbance can be obtained. In addition, as a material of the film which is laminated on the substrate to form a groove of a predetermined pattern, a liquid developing photosensitive resist can be used in addition to a photosensitive film (dry film). As the material of the film, a material that can be easily peeled off with an aqueous alkali solution even after the photocuring of the glass paste composition is suitably used.

In the above-mentioned method, the method of removing the photosensitive film with a chemical (release agent) has been described. Alternatively, a method of burning off the photosensitive film at the same time as firing the glass paste is also possible. . However, in the case of the method in which the photosensitive film is also burned and removed at the same time as firing the glass paste, there is a possibility that burn-out residue (leather) of the photosensitive film remains between the partition walls and black spots are formed on the image. This is a factor that greatly reduces the quality of PDP. Therefore, as a method for removing the photosensitive film, a method using a release agent as described above is preferable.

[0029]

EXAMPLES Hereinafter, the present invention will be described in detail with reference to Examples, but it goes without saying that the present invention is not limited to the following Examples.

Examples 1 to 6 and Comparative Examples 1 to 3 Preparation of photocurable glass paste compositions: Each of the components shown in the following Tables 1 and 2 was blended and thoroughly stirred and dispersed to form photocurable glass paste compositions. Was prepared. In addition, as glass fine particles, PbO 60%, B ₂ O ₃ 20%, SiO ₂ 1
It has a composition of 5% and Al ₂ O _{3 of} 5%, and has a glass transition point of 44.
Those having a temperature of 5 ° C. and an average particle size of 1.6 μm were used.

[Table 1]

[0031]

[Table 2]

Preparation of Evaluation Substrate: Using a composition in which a photosensitive resin and a photoinitiator were mixed, a pattern groove having a height of 100 μm and a width of 80 μm was formed on a glass substrate (soda lime plate) by a photographic method. A substrate which was sufficiently re-exposed to eliminate photoreactive groups was simply used as a substrate for evaluation.

Evaluation of Pasting: The pastes of Examples 1 to 6, which could be pasted, could be poured into predetermined pattern grooves of the above-mentioned evaluation substrate. on the other hand,
In the case of Comparative Examples 1 and 3, the paste could not be formed, and in the case of Comparative Example 2, it did not flow into the predetermined pattern groove portion but was pushed in, but bubbles remained.

Evaluation of partition wall formation: After scraping off excess paste on the surface of the evaluation substrate into which the paste was poured,
Using an HMW-680GW manufactured by Oak Co., Ltd., the paste was exposed to an exposure surface of the evaluation substrate at 1,000 mJ / cm ² to cure the paste, and then heated at a rate of 5 ° C./min.
The temperature was raised to 400 ° C. and maintained at that temperature for 30 minutes, and further raised to 500 ° C. and maintained at that temperature for 30 minutes to obtain a fired product. In Examples 1 to 6, good fired partition walls were obtained. On the other hand, in the case of Comparative Example 2, there were many defects in the fired product, and in the case of Comparative Examples 1 and 3, it was not possible to evaluate since it did not flow into the predetermined pattern groove.

[0035]

As described above, according to the present invention, by using a dispersant having a polar group which has an affinity for glass fine particles, the content of an organic solvent which has an adverse effect on the environment is significantly reduced. Alternatively, even if it is not contained at all, a photo-curable glass paste composition which exhibits appropriate fluidity, can be filled into a predetermined pattern groove portion with good workability, and has excellent photo-curing properties, particularly excellent in deep-part curability, is provided. . In addition, the photocurable glass paste composition of the present invention has a relatively small content of an organic component and is excellent in firing property. Therefore, the photocurable glass paste composition of the present invention is useful for forming various fired glass patterns, and is particularly used for forming a partition wall of a PDP back plate by a lift-off method.
The drying step and the heat curing step can be omitted to simplify the complicated steps by the conventional lift-off method, a high-definition fired product pattern can be formed with low energy consumption, low cost and high productivity. It does not degrade health and work environment.

[Brief description of the drawings]

FIG. 1 is a process explanatory view showing a PDP partition wall forming method according to the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Transparent substrate 2 Partition wall 10 Photosensitive film 11 Photocurable glass paste composition 12 Groove part 13 Photomask 14 Pattern translucent part

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁷ Identification FI FI Theme Court ゛ (Reference) H01J 11/02 H01J 11/02 B (72) Inventor Nobuyuki Yanagida 388 Ookura Oaza, Arashiyama-cho, Hiki-gun, Saitama Inside the Arashiyama Plant of Yo Ink Manufacturing Co., Ltd. (72) Inventor Masahisa Kakinuma, Okura 388, Oaza, Arashiyama-cho, Hiki-gun, Saitama Prefecture Tai Ink Manufacturing Co., Ltd. Address: Taiyo Ink Manufacturing Co., Ltd., Arashiyama Plant

Claims (10)

[Claims] 1. A method comprising: (A) glass fine particles, (B) a liquid photocurable compound, (C) a photopolymerization initiator, and (D) a dispersant having a polar group having an affinity for the glass fine particles. A photocurable glass paste composition characterized by the following: 2. The composition according to claim 1, further comprising (E) an inorganic filler. 3. The composition according to claim 1, further comprising (F) a solid or semi-solid binder. 4. The glass fine particle (A) according to claim 1, wherein the glass fine particles (A) are a low-melting glass mainly composed of lead oxide, bismuth oxide, zinc oxide or lithium oxide. A composition as described. 5. The liquid photocurable compound (B) is a monomer, oligomer and / or polymer having at least one (meth) acryloyl group in one molecule. A composition according to any one of the preceding claims. 6. The photopolymerization initiator (C) is a compound that starts photopolymerization of the liquid photocurable compound (B) in response to light in the ultraviolet to visible region. The composition according to any one of claims 1 to 5. 7. A liquid photocurable compound (B) of 5 to 50 parts by weight, a photopolymerization initiator (C) of 0.1 to 20 parts by weight, and a dispersant (100 parts by weight) per 100 parts by weight of the glass fine particles (A). D) is contained in an amount of 0.01 to 5 parts by weight.
The composition according to any one of claims 1 to 6. 8. The composition according to claim 2, wherein the composition contains 0.1 to 50 parts by weight of an inorganic filler (E) per 100 parts by weight of the glass fine particles (A). object. 9. A solid or semi-solid binder (F) is used in an amount of 0.01 to 100 parts by weight of the glass fine particles (A).
The composition according to any one of claims 3 to 8, comprising 5 parts by weight. 10. A step of forming a film having a predetermined pattern groove on a substrate, a step of embedding the photocurable glass paste composition according to any one of claims 1 to 9 in a pattern groove of the film. Exposing the photocurable glass paste composition in the pattern groove to light curing, exposing or baking without peeling the film, and forming a fired product having a predetermined pattern of the glass paste composition. A method for forming a fired product pattern, comprising: