JP2000098094A - Ｘ線発生装置 - Google Patents

Ｘ線発生装置

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Publication number
JP2000098094A
JP2000098094A JP10266130A JP26613098A JP2000098094A JP 2000098094 A JP2000098094 A JP 2000098094A JP 10266130 A JP10266130 A JP 10266130A JP 26613098 A JP26613098 A JP 26613098A JP 2000098094 A JP2000098094 A JP 2000098094A
Authority
JP
Japan
Prior art keywords
ray
group
minute
light
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10266130A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000098094A5 (enExample
Inventor
Hiroyuki Kondo
洋行 近藤
Hideki Komatsuda
秀基 小松田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10266130A priority Critical patent/JP2000098094A/ja
Publication of JP2000098094A publication Critical patent/JP2000098094A/ja
Publication of JP2000098094A5 publication Critical patent/JP2000098094A5/ja
Pending legal-status Critical Current

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  • X-Ray Techniques (AREA)
JP10266130A 1998-09-21 1998-09-21 Ｘ線発生装置 Pending JP2000098094A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10266130A JP2000098094A (ja) 1998-09-21 1998-09-21 Ｘ線発生装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10266130A JP2000098094A (ja) 1998-09-21 1998-09-21 Ｘ線発生装置

Publications (2)

Publication Number Publication Date
JP2000098094A true JP2000098094A (ja) 2000-04-07
JP2000098094A5 JP2000098094A5 (enExample) 2005-11-04

Family

ID=17426756

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10266130A Pending JP2000098094A (ja) 1998-09-21 1998-09-21 Ｘ線発生装置

Country Status (1)

Country Link
JP (1) JP2000098094A (enExample)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002214400A (ja) * 2001-01-12 2002-07-31 Toyota Macs Inc レーザープラズマｅｕｖ光源装置及びそれに用いられるターゲット
WO2002085080A1 (fr) * 2001-04-18 2002-10-24 Commissariat A L'energie Atomique Procede et dispositif de generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie
JP2002365141A (ja) * 2001-06-13 2002-12-18 Gigaphoton Inc 真空紫外レーザ装置の波長測定装置
JP2005276673A (ja) * 2004-03-25 2005-10-06 Komatsu Ltd Ｌｐｐ型ｅｕｖ光源装置
JP2006310520A (ja) * 2005-04-28 2006-11-09 Ushio Inc 極端紫外光露光装置および極端紫外光光源装置
CN100366129C (zh) * 2002-05-13 2008-01-30 杰特克公司 用于产生辐射的方法和装置
JP2008535623A (ja) * 2005-04-15 2008-09-04 センサーズ・フォー・メデセン・アンド・サイエンス・インコーポレーテッド 光学的検知装置
JP2010021543A (ja) * 2008-06-12 2010-01-28 Komatsu Ltd 極端紫外光源装置

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002214400A (ja) * 2001-01-12 2002-07-31 Toyota Macs Inc レーザープラズマｅｕｖ光源装置及びそれに用いられるターゲット
WO2002085080A1 (fr) * 2001-04-18 2002-10-24 Commissariat A L'energie Atomique Procede et dispositif de generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie
FR2823949A1 (fr) * 2001-04-18 2002-10-25 Commissariat Energie Atomique Procede et dispositif de generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie
JP2002365141A (ja) * 2001-06-13 2002-12-18 Gigaphoton Inc 真空紫外レーザ装置の波長測定装置
CN100366129C (zh) * 2002-05-13 2008-01-30 杰特克公司 用于产生辐射的方法和装置
JP2005276673A (ja) * 2004-03-25 2005-10-06 Komatsu Ltd Ｌｐｐ型ｅｕｖ光源装置
JP2008535623A (ja) * 2005-04-15 2008-09-04 センサーズ・フォー・メデセン・アンド・サイエンス・インコーポレーテッド 光学的検知装置
JP2012118086A (ja) * 2005-04-15 2012-06-21 Sensors For Medicine & Science Inc 光電検知装置
JP2006310520A (ja) * 2005-04-28 2006-11-09 Ushio Inc 極端紫外光露光装置および極端紫外光光源装置
EP1717638B1 (en) * 2005-04-28 2016-08-24 Ushio Denki Kabushiki Kaisha Extreme UV radiation exposure apparatus and extreme UV radiation source
JP2010021543A (ja) * 2008-06-12 2010-01-28 Komatsu Ltd 極端紫外光源装置

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