JP2000098094A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2000098094A5 JP2000098094A5 JP1998266130A JP26613098A JP2000098094A5 JP 2000098094 A5 JP2000098094 A5 JP 2000098094A5 JP 1998266130 A JP1998266130 A JP 1998266130A JP 26613098 A JP26613098 A JP 26613098A JP 2000098094 A5 JP2000098094 A5 JP 2000098094A5
- Authority
- JP
- Japan
- Prior art keywords
- ray
- rays
- light
- opening
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 description 83
- 238000002834 transmittance Methods 0.000 description 33
- 239000000758 substrate Substances 0.000 description 30
- 239000007789 gas Substances 0.000 description 26
- 239000000463 material Substances 0.000 description 19
- 239000000126 substance Substances 0.000 description 17
- 239000010408 film Substances 0.000 description 15
- 239000013076 target substance Substances 0.000 description 14
- 230000005469 synchrotron radiation Effects 0.000 description 12
- 239000010409 thin film Substances 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 8
- 229910052581 Si3N4 Inorganic materials 0.000 description 6
- 230000002238 attenuated effect Effects 0.000 description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000003111 delayed effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 229910052743 krypton Inorganic materials 0.000 description 3
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052727 yttrium Inorganic materials 0.000 description 3
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000284 extract Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10266130A JP2000098094A (ja) | 1998-09-21 | 1998-09-21 | Ｘ線発生装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10266130A JP2000098094A (ja) | 1998-09-21 | 1998-09-21 | Ｘ線発生装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000098094A JP2000098094A (ja) | 2000-04-07 |
| JP2000098094A5 true JP2000098094A5 (enExample) | 2005-11-04 |
Family
ID=17426756
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10266130A Pending JP2000098094A (ja) | 1998-09-21 | 1998-09-21 | Ｘ線発生装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000098094A (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002214400A (ja) * | 2001-01-12 | 2002-07-31 | Toyota Macs Inc | レーザープラズマｅｕｖ光源装置及びそれに用いられるターゲット |
| FR2823949A1 (fr) * | 2001-04-18 | 2002-10-25 | Commissariat Energie Atomique | Procede et dispositif de generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie |
| JP4699640B2 (ja) * | 2001-06-13 | 2011-06-15 | ギガフォトン株式会社 | 真空紫外レーザ装置の波長測定装置 |
| AU2003240233A1 (en) * | 2002-05-13 | 2003-11-11 | Jettec Ab | Method and arrangement for producing radiation |
| JP2005276673A (ja) * | 2004-03-25 | 2005-10-06 | Komatsu Ltd | Ｌｐｐ型ｅｕｖ光源装置 |
| US7308292B2 (en) * | 2005-04-15 | 2007-12-11 | Sensors For Medicine And Science, Inc. | Optical-based sensing devices |
| JP4710406B2 (ja) * | 2005-04-28 | 2011-06-29 | ウシオ電機株式会社 | 極端紫外光露光装置および極端紫外光光源装置 |
| US8536551B2 (en) * | 2008-06-12 | 2013-09-17 | Gigaphoton Inc. | Extreme ultra violet light source apparatus |
-
1998
- 1998-09-21 JP JP10266130A patent/JP2000098094A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Kirz et al. | Soft x‐ray microscopes | |
| Akhsakhalyan et al. | Current status and development prospects for multilayer X-ray optics at the Institute for Physics of Microstructures, Russian Academy of Sciences | |
| US8411815B2 (en) | Grazing incidence collector for laser produced plasma sources | |
| US8009350B2 (en) | Laptop-size high-order harmonic generation apparatus using near field enhancement | |
| Kirz et al. | Soft x-ray microscopy of biological specimens | |
| CN1696833B (zh) | 光刻装置及器件制造方法 | |
| Holburg et al. | Brilliance improvement of laser-produced extreme ultraviolet and soft x-ray plasmas based on pulsed gas jets | |
| JP2000098094A5 (enExample) | ||
| Schmahl | X-ray microscopy | |
| JP2000098094A (ja) | Ｘ線発生装置 | |
| KR20020052204A (ko) | 극자외선 소스를 얻는 방법, 광선의 소스 및 리소그라피공정에의 사용 | |
| Bartnik | Laser-plasma extreme ultraviolet and soft X-ray sources based on a double stream gas puff target: interaction of the radiation pulses with matter | |
| Ade | Scanning photoemission microscopy with synchrotron radiation | |
| CN111123419A (zh) | 极紫外线反射结构、极紫外线聚光器及极紫外线光罩 | |
| KR101349898B1 (ko) | 극자외선 빔을 생성하기 위한 모듈 | |
| US8101930B2 (en) | Method of increasing the operation lifetime of a collector optics arranged in an irradiation device | |
| EP0105261A4 (en) | X-RAY RADIATOR. | |
| Bajt et al. | Multilayers for next-generation x-ray sources | |
| Babin et al. | Fabrication of diffraction X-ray elements | |
| Johansson | Compact soft x-ray microscopy | |
| GB2255483A (en) | Beam-diverging multi-aperture diffraction plate | |
| Niemann et al. | X-ray microscopy: recent developments and practical applications | |
| Suzuki et al. | Free-standing subwavelength grid infrared rejection filter of 90 MM diameter for LPP EUV light source | |
| JPH0354424B2 (enExample) | ||
| Bobashev et al. | Intensive laser plasma source of quasimonochromatized soft x-ray radiation with focusing multilayer mirrors |