JP2000088914A - Method for testing semiconductor integrated circuit device - Google Patents

Method for testing semiconductor integrated circuit device

Info

Publication number
JP2000088914A
JP2000088914A JP10254451A JP25445198A JP2000088914A JP 2000088914 A JP2000088914 A JP 2000088914A JP 10254451 A JP10254451 A JP 10254451A JP 25445198 A JP25445198 A JP 25445198A JP 2000088914 A JP2000088914 A JP 2000088914A
Authority
JP
Japan
Prior art keywords
integrated circuit
semiconductor integrated
current
power supply
circuit device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10254451A
Other languages
Japanese (ja)
Inventor
Ichiro Fukuzawa
一郎 福沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP10254451A priority Critical patent/JP2000088914A/en
Publication of JP2000088914A publication Critical patent/JP2000088914A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a method for testing a semiconductor integrated circuit device capable of screening according to a power source current at the time of standing still. SOLUTION: The method for testing a semiconductor integrated circuit device 1 comprises the steps of measuring a power source current at the time of standing still in two or more logic combination states of the device 1, measuring a maximum value Imax of the current and a minimum value Imin of the current by a current measuring unit 12 of a semiconductor integrated circuit device (IC tester) 10, and calculating a difference Id = ImaxImin of the value Imax and the value Imin of the current by a CPU 15 via an A-D converter 13. As a result, if the difference Id exceeds a threshold value by comparing the difference with a predetermined value (threshold value) (for example, 10 μA) previously stored in a memory 14, the device 1 is decided to be a fault in the screening.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体集積回路装
置の測定及び選別(スクリーニング:screenin
g)方法に関するものである。
[0001] 1. Field of the Invention [0002] The present invention relates to the measurement and selection (screening) of a semiconductor integrated circuit device.
g) Method.

【0002】[0002]

【従来の技術】従来、半導体集積回路装置の良品の選別
において、LSI回路内の全てのノードについて網羅し
た機能テストプログラムを作成することは困難になって
おり、通常、故障検出率90%以上を達成していれば良
い方である。この故障検出率の不足を補うため、複数の
論理組合せ状態において静止時の電源電流を測定する
と、通常の論理回路は設計的に有限の電流が流れず、リ
ーク電流のみが流れることから、異常電流が測定された
場合は該当LSIに欠陥箇所があることを示し、機能テ
ストとして良品であっても信頼性的に不具合を生ずるL
SIをスクリーニングするのに有効である。
2. Description of the Related Art Conventionally, it has been difficult to create a functional test program covering all nodes in an LSI circuit when selecting non-defective products of a semiconductor integrated circuit device. It is better if you have achieved it. When the power supply current at rest is measured in multiple logical combination states to compensate for the shortage of the fault detection rate, a normal logic circuit does not flow a finite current by design and only leak current flows. Is measured, it indicates that there is a defective portion in the corresponding LSI, and even if it is a non-defective product as a function test, L which causes a defect in reliability
It is effective for screening SI.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、回路が
静止時にも定常電源電流が流れる設計のLSIに対して
は、上記スクリーニング手法は適用できなかった。本発
明は、上記した従来の回路が静止時にも定常電源電流が
流れる設計のLSIに対して、静止時、電源電流による
スクリーニングが可能な半導体集積回路装置の試験方法
を提供することを目的とする。
However, the above screening method cannot be applied to an LSI designed to allow a steady power supply current to flow even when the circuit is at rest. It is an object of the present invention to provide a test method of a semiconductor integrated circuit device capable of screening by a power supply current when the conventional circuit is designed to allow a steady power supply current to flow even when the circuit is stationary. .

【0004】[0004]

【課題を解決するための手段】本発明は、上記目的を達
成するために、 〔1〕半導体集積回路装置の試験方法において、複数の
論理組合せ状態において静止時の電源電流を測定し、こ
の電源電流の最大値と最小値を演算し、前記最大値と最
小値の差分によって、定常電流が流れる箇所以外の静止
時リーク電流を測定するようにしたものである。
According to the present invention, there is provided a method for testing a semiconductor integrated circuit device, comprising the steps of: measuring a power supply current at rest in a plurality of logical combination states; The maximum value and the minimum value of the current are calculated, and the static leakage current other than where the steady current flows is measured based on the difference between the maximum value and the minimum value.

【0005】〔2〕上記〔1〕記載の半導体集積回路装
置の試験方法において、前記静止時の電源電流は、商用
電源周波数の周期内に複数回測定し、平均を演算するこ
とによって求めるようにしたものである。したがって、
商用周波数に起因するノイズの影響をなくすことができ
る。
[2] In the test method for a semiconductor integrated circuit device according to the above [1], the power supply current at the time of rest is measured a plurality of times within a cycle of a commercial power supply frequency, and is obtained by calculating an average. It was done. Therefore,
The effect of noise caused by the commercial frequency can be eliminated.

【0006】[0006]

【発明の実施の形態】以下、本発明の実施の形態につい
て詳細に説明する。図1は本発明の第1実施例を示すL
SIの試験システムの概略構成図である。図1におい
て、1は複数の論理組合せ回路からなる半導体集積回路
装置(供試装置)であり、電源Vcc端子2、論理端子
3,4,5、GND端子6などが設けられている。
Embodiments of the present invention will be described below in detail. FIG. 1 shows a first embodiment of the present invention.
FIG. 1 is a schematic configuration diagram of an SI test system. In FIG. 1, reference numeral 1 denotes a semiconductor integrated circuit device (test device) comprising a plurality of logic combination circuits, which is provided with a power supply Vcc terminal 2, logic terminals 3, 4, 5, a GND terminal 6, and the like.

【0007】また、半導体集積回路装置試験装置(IC
試験装置)10は、電源11、電流測定装置12、A/
Dコンバータ13、メモリ14、CPU(中央処理装
置)15、計時回路16、インタフェース回路(I/
F)17、表示装置18などを有している。このよう
に、複数の論理組合せ回路からなる半導体集積回路装置
1には半導体集積回路装置試験装置10が接続される。
A semiconductor integrated circuit device test apparatus (IC)
The test device 10 includes a power supply 11, a current measuring device 12, an A /
D converter 13, memory 14, CPU (central processing unit) 15, clock circuit 16, interface circuit (I /
F) 17, a display device 18, and the like. As described above, the semiconductor integrated circuit device test apparatus 10 is connected to the semiconductor integrated circuit device 1 including a plurality of logic combination circuits.

【0008】そこで、半導体集積回路装置1の2個以上
の論理組合せ状態において、静止時の電源電流を測定
し、この電源電流の最大値Imax と電源電流の最小値I
min とを半導体集積回路装置試験装置10の電流測定装
置12で測定し、A/Dコンバータ13を介して、CP
U15において電源電流の最大値Imax と電源電流の最
小値Imin との差分Id =Imax −Imin の演算を行
う。
Therefore, in the state of two or more logical combinations of the semiconductor integrated circuit device 1, the power supply current at rest is measured, and the maximum value Imax of the power supply current and the minimum value Imax of the power supply current are measured.
min is measured by the current measuring device 12 of the semiconductor integrated circuit device testing device 10, and the CP is measured via the A / D converter 13.
In U15, the difference Id = Imax-Imin between the maximum value Imax of the power supply current and the minimum value Imin of the power supply current is calculated.

【0009】その結果、差分Id がメモリ14に予め記
憶されている一定の値(閾値)(例えば、10μA)と
比較して、その閾値を越える場合には、その半導体集積
回路装置1はスクリーニング不良とする。図2は本発明
の第1実施例を示す半導体集積回路装置のスクリーニン
グのフローチャートである。
As a result, if the difference Id exceeds a predetermined value (threshold) (for example, 10 μA) stored in the memory 14 and exceeds the threshold, the semiconductor integrated circuit device 1 has a screening failure. And FIG. 2 is a flowchart for screening a semiconductor integrated circuit device according to the first embodiment of the present invention.

【0010】以下、図2を用いてスクリーニング方法を
詳細に説明する。 (1)まず、半導体集積回路装置1と半導体集積回路装
置試験装置10を接続する(ステップS1)。 (2)次に、2個以上の論理組合せ状態において、静止
時の電源電流の最大値Imax と電源電流の最小値Imin
とを測定する(ステップS2)。
Hereinafter, the screening method will be described in detail with reference to FIG. (1) First, the semiconductor integrated circuit device 1 and the semiconductor integrated circuit device test device 10 are connected (step S1). (2) Next, in the state of two or more logical combinations, the maximum value Imax of the power supply current at rest and the minimum value Imin of the power supply current
Is measured (step S2).

【0011】(3)次に、電源電流の最大値Imax と電
源電流の最小値Imin との差分Idを演算する(ステッ
プS3)。 (4)その差分Id が閾値ITH(例えば、10μA)よ
り大きいか否かをチェックする(ステップS4)。 (5)ステップS4においてYESの場合には、スクリ
ーニング不良品として表示装置18に表示する(ステッ
プS5)。
(3) Next, a difference Id between the maximum value Imax of the power supply current and the minimum value Imin of the power supply current is calculated (step S3). (4) It is checked whether the difference Id is larger than a threshold value I TH (for example, 10 μA) (step S4). (5) If YES in step S4, display as a defective screening product on the display device 18 (step S5).

【0012】(6)ステップS4においてNOの場合に
は、スクリーニング良品として表示装置18に表示する
(ステップS6)。 このように、2個以上の論理組合せ状態において、静止
時の電源電流を測定することにより、LSI回路内に定
常電流が流れる経路があっても、特定動作状態で生じる
リーク電流は、該当箇所にリーク電流が流れない動作状
態における電源電流値との差分として検出することがで
きる。
(6) If NO in step S4, a non-defective product is displayed on the display device 18 (step S6). As described above, by measuring the power supply current at rest in the state of two or more logical combinations, even if there is a path through which a steady current flows in the LSI circuit, the leakage current generated in the specific operation state is not It can be detected as a difference from a power supply current value in an operation state in which no leak current flows.

【0013】したがって、この実施例によれば、LSI
内部にある欠陥箇所をリーク電流によって検出し、除去
することにより、故障検出率の不備による潜在的な出荷
時不良の混入率を1/10以下にすることができる。次
に、本発明の第2実施例について説明する。この実施例
では、電源電流を精密に測定するために、電源の商用電
源周波数を50Hz(周期20msec)とした場合、
電源電流を、図1に示す計時回路16によって、20m
secの周期内に複数回(例えば、50回)測定し、そ
の平均を演算する。
Therefore, according to this embodiment, the LSI
By detecting and removing the defective portion inside by the leak current, the mixing ratio of a potential shipping defect due to an insufficient defect detection ratio can be reduced to 1/10 or less. Next, a second embodiment of the present invention will be described. In this embodiment, in order to accurately measure the power supply current, when the commercial power supply frequency of the power supply is 50 Hz (period: 20 msec),
The power supply current is increased by 20 m by the timing circuit 16 shown in FIG.
The measurement is performed a plurality of times (for example, 50 times) within a cycle of sec, and the average is calculated.

【0014】このように、第2実施例によれば、上記第
1実施例の効果に加えて、電源電流を商用電源周波数の
周期内で複数回測定することにより、商用電源からの誘
導ノイズの影響を除去することができる。なお、上記実
施例においては、電流値を測定することにより、リーク
電流を検出するようにしたが、これに代えて、電圧、抵
抗を測定することによって、リーク電流を検出するよう
にしてもよい。また、LSI以外にも応用であることは
言うまでもない。
As described above, according to the second embodiment, in addition to the effect of the first embodiment, by measuring the power supply current a plurality of times within the cycle of the commercial power supply frequency, the noise induced from the commercial power supply can be reduced. The effect can be eliminated. In the above embodiment, the leak current is detected by measuring the current value. Alternatively, the leak current may be detected by measuring the voltage and the resistance. . Needless to say, the present invention can be applied to other than the LSI.

【0015】また、本発明は上記実施例に限定されるも
のではなく、本発明の趣旨に基づいて種々の変形が可能
であり、これらを本発明の範囲から排除するものではな
い。
The present invention is not limited to the above-described embodiment, and various modifications are possible based on the spirit of the present invention, and these are not excluded from the scope of the present invention.

【0016】[0016]

【発明の効果】以上、詳細に説明したように、本発明に
よれば、以下のような効果を奏することができる。 (A)請求項1記載の発明によれば、LSI内部にある
欠陥箇所をリーク電流によって検出し除去することによ
り、故障検出率の不備による潜在的な出荷時不良の混入
率を1/10以下にすることができる。 (B)請求項2記載の発明によれば、上記(A)の効果
に加えて、電源電流を商用電源周波数の周期内で複数回
測定することにより、商用電源からの誘導ノイズの影響
を除去することができる。
As described above, according to the present invention, the following effects can be obtained. (A) According to the first aspect of the present invention, by detecting and removing a defective portion inside the LSI by a leak current, the mixing ratio of a potential shipping defect due to an insufficient failure detection ratio is 1/10 or less. Can be (B) According to the second aspect of the invention, in addition to the effect of the above (A), the influence of induced noise from the commercial power supply is removed by measuring the power supply current a plurality of times within the cycle of the commercial power supply frequency. can do.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1実施例を示すLSIの試験システ
ムの概略構成図である。
FIG. 1 is a schematic configuration diagram of an LSI test system showing a first embodiment of the present invention.

【図2】本発明の第1実施例を示す半導体集積回路装置
のスクリーニングのフローチャートである。
FIG. 2 is a flowchart of the screening of the semiconductor integrated circuit device according to the first embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 半導体集積回路装置(供試装置) 2 電源Vcc端子 3,4,5 論理端子 6 GND端子 10 半導体集積回路装置試験装置(IC試験装置) 11 電源 12 電流測定装置 13 A/Dコンバータ 14 メモリ 15 CPU(中央処理装置) 16 計時回路 17 インタフェース回路(I/F) 18 表示装置 DESCRIPTION OF SYMBOLS 1 Semiconductor integrated circuit device (test device) 2 Power supply Vcc terminal 3,4,5 Logic terminal 6 GND terminal 10 Semiconductor integrated circuit device test device (IC test device) 11 Power supply 12 Current measuring device 13 A / D converter 14 Memory 15 CPU (Central Processing Unit) 16 Clock circuit 17 Interface circuit (I / F) 18 Display device

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】(a)複数の論理組合せ状態において静止
時の電源電流を測定し、該電源電流の最大値と最小値を
演算し、(b)前記最大値と最小値の差分によって、定
常電流が流れる箇所以外の静止時リーク電流を測定する
ことを特徴とする半導体集積回路装置の試験方法。
1. A power supply current in a static state is measured in a plurality of logical combination states, a maximum value and a minimum value of the power supply current are calculated, and a constant value is calculated based on a difference between the maximum value and the minimum value. A test method for a semiconductor integrated circuit device, comprising measuring a static leakage current other than where a current flows.
【請求項2】 請求項1記載の半導体集積回路装置の試
験方法において、前記静止時の電源電流は、商用電源周
波数の周期内に複数回測定し、平均を演算することによ
って求めることを特徴とする半導体集積回路装置の試験
方法。
2. The test method for a semiconductor integrated circuit device according to claim 1, wherein the power supply current at rest is measured a plurality of times within a cycle of a commercial power supply frequency, and is obtained by calculating an average. For testing semiconductor integrated circuit devices.
JP10254451A 1998-09-09 1998-09-09 Method for testing semiconductor integrated circuit device Pending JP2000088914A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10254451A JP2000088914A (en) 1998-09-09 1998-09-09 Method for testing semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10254451A JP2000088914A (en) 1998-09-09 1998-09-09 Method for testing semiconductor integrated circuit device

Publications (1)

Publication Number Publication Date
JP2000088914A true JP2000088914A (en) 2000-03-31

Family

ID=17265204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10254451A Pending JP2000088914A (en) 1998-09-09 1998-09-09 Method for testing semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JP2000088914A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6563323B2 (en) * 1999-07-07 2003-05-13 Mitsubishi Denki Kabushiki Kaisha Method for testing a semiconductor integrated circuit
WO2008133040A1 (en) * 2007-04-12 2008-11-06 Renesas Technology Corp. Semiconductor device
JP2010181261A (en) * 2009-02-05 2010-08-19 Renesas Electronics Corp Analysis iddq test module and iddq test method
JP2011237418A (en) * 2010-04-16 2011-11-24 Semiconductor Energy Lab Co Ltd Current measurement method, semiconductor device inspection method, semiconductor device and characteristic evaluation circuit
CN105739338A (en) * 2016-03-10 2016-07-06 中国人民解放军军械工程学院 Integrated circuit bypass signal difference amplification sampling system and acquisition method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6563323B2 (en) * 1999-07-07 2003-05-13 Mitsubishi Denki Kabushiki Kaisha Method for testing a semiconductor integrated circuit
US6674300B2 (en) * 1999-07-07 2004-01-06 Mitsubishi Denki Kabushiki Kaisha Method for testing a semiconductor integrated circuit when a difference between two consecutive current exceeds a threshold value
WO2008133040A1 (en) * 2007-04-12 2008-11-06 Renesas Technology Corp. Semiconductor device
JP2010181261A (en) * 2009-02-05 2010-08-19 Renesas Electronics Corp Analysis iddq test module and iddq test method
JP2011237418A (en) * 2010-04-16 2011-11-24 Semiconductor Energy Lab Co Ltd Current measurement method, semiconductor device inspection method, semiconductor device and characteristic evaluation circuit
CN105739338A (en) * 2016-03-10 2016-07-06 中国人民解放军军械工程学院 Integrated circuit bypass signal difference amplification sampling system and acquisition method

Similar Documents

Publication Publication Date Title
US6756804B2 (en) Semiconductor integrated circuit device
McEuen IDDq benefits (digital CMOS testing)
US5889408A (en) Delta IDDQ testing
McEuen Reliability benefits of I DDQ
Stopjaková et al. On-chip transient current monitor for testing of low-voltage CMOS IC
JP2000088914A (en) Method for testing semiconductor integrated circuit device
US7539589B2 (en) Testing radio frequency and analogue circuits
JP4493597B2 (en) Hot-switchable voltage bus for IDDQ current measurement
US6239605B1 (en) Method to perform IDDQ testing in the presence of high background leakage current
US6531885B1 (en) Method and apparatus for testing supply connections
US7127690B2 (en) Method and system for defect evaluation using quiescent power plane current (IDDQ) voltage linearity
JP3372488B2 (en) Test device for semiconductor CMOS integrated circuit
JP2907278B2 (en) Semiconductor device and test method thereof
JPH11142471A (en) Burn-in test method and burn-in test device
JP2004257815A (en) Inspection method of semiconductor integrated circuit and semiconductor integrated circuit device
JP4043743B2 (en) Semiconductor test equipment
JP2966185B2 (en) Failure detection method
de Jong et al. Power pin testing: making the test coverage complete
EP1107013B1 (en) A method and an apparatus for testing supply connections
EP1367403B1 (en) A method for detecting faults in electronic devices, based on quiescent current measurements
JP2007064645A (en) Semi-conductor inspection method
JP3043716B2 (en) Semiconductor device test result determination circuit and test result determination method
JPH04213849A (en) Semiconductor device and method of detecting initial failure thereof
JPS60177277A (en) Testing method of characteristic of integrated circuit
KR100850192B1 (en) Hot switchable voltage bus for iddq current measurements

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20030819