JP2000068265A5 - - Google Patents
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- Publication number
- JP2000068265A5 JP2000068265A5 JP1998255956A JP25595698A JP2000068265A5 JP 2000068265 A5 JP2000068265 A5 JP 2000068265A5 JP 1998255956 A JP1998255956 A JP 1998255956A JP 25595698 A JP25595698 A JP 25595698A JP 2000068265 A5 JP2000068265 A5 JP 2000068265A5
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- oxide insulating
- sample
- irradiating
- nitrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims 1
- 238000001816 cooling Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10255956A JP2000068265A (ja) | 1998-08-25 | 1998-08-25 | 酸化絶縁膜のアニ−ル方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10255956A JP2000068265A (ja) | 1998-08-25 | 1998-08-25 | 酸化絶縁膜のアニ−ル方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000068265A JP2000068265A (ja) | 2000-03-03 |
| JP2000068265A5 true JP2000068265A5 (https=) | 2005-11-04 |
Family
ID=17285925
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10255956A Pending JP2000068265A (ja) | 1998-08-25 | 1998-08-25 | 酸化絶縁膜のアニ−ル方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000068265A (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4449226B2 (ja) | 2000-05-22 | 2010-04-14 | 東京エレクトロン株式会社 | 金属酸化膜の改質方法、金属酸化膜の成膜方法及び熱処理装置 |
| US6828260B2 (en) * | 2002-10-29 | 2004-12-07 | Hewlett-Packard Development Company, L.P. | Ultra-violet treatment of a tunnel barrier layer through an overlayer a tunnel junction device |
| JP2006319077A (ja) * | 2005-05-12 | 2006-11-24 | Elpida Memory Inc | 金属酸化物誘電体膜の形成方法及び半導体記憶装置の製造方法 |
| JP2010212391A (ja) * | 2009-03-10 | 2010-09-24 | Hitachi Kokusai Electric Inc | 半導体装置の製造方法及び基板処理装置 |
-
1998
- 1998-08-25 JP JP10255956A patent/JP2000068265A/ja active Pending
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