JP2000019737A5 - - Google Patents
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- Publication number
- JP2000019737A5 JP2000019737A5 JP1998187597A JP18759798A JP2000019737A5 JP 2000019737 A5 JP2000019737 A5 JP 2000019737A5 JP 1998187597 A JP1998187597 A JP 1998187597A JP 18759798 A JP18759798 A JP 18759798A JP 2000019737 A5 JP2000019737 A5 JP 2000019737A5
- Authority
- JP
- Japan
- Prior art keywords
- photoresist composition
- positive photoresist
- group
- ultraviolet exposure
- conh
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 125000002723 alicyclic group Chemical group 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000004432 carbon atoms Chemical group C* 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18759798A JP3844322B2 (ja) | 1998-07-02 | 1998-07-02 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| US09/345,159 US6303265B1 (en) | 1998-07-02 | 1999-06-30 | Positive photoresist composition for exposure to far ultraviolet light |
| KR1019990026473A KR100569641B1 (ko) | 1998-07-02 | 1999-07-02 | 원자외선 노광용 포지티브 포토레지스트 조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18759798A JP3844322B2 (ja) | 1998-07-02 | 1998-07-02 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000019737A JP2000019737A (ja) | 2000-01-21 |
| JP2000019737A5 true JP2000019737A5 (US06780888-20040824-C00057.png) | 2005-02-24 |
| JP3844322B2 JP3844322B2 (ja) | 2006-11-08 |
Family
ID=16208904
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18759798A Expired - Lifetime JP3844322B2 (ja) | 1998-07-02 | 1998-07-02 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6303265B1 (US06780888-20040824-C00057.png) |
| JP (1) | JP3844322B2 (US06780888-20040824-C00057.png) |
| KR (1) | KR100569641B1 (US06780888-20040824-C00057.png) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20010054851A (ko) * | 1999-12-08 | 2001-07-02 | 윤종용 | 지환식 감광성 폴리머 및 이를 포함하는 레지스트조성물과 그 제조방법 |
| JP4166402B2 (ja) * | 2000-02-28 | 2008-10-15 | 富士フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP4414069B2 (ja) * | 2000-07-11 | 2010-02-10 | ダイセル化学工業株式会社 | フォトレジスト用高分子化合物の製造方法、及びフォトレジスト組成物の製造方法 |
| JP2002049157A (ja) * | 2000-08-03 | 2002-02-15 | Nec Corp | ポジ型化学増幅レジスト及びそのパターン形成方法 |
| US6677419B1 (en) | 2002-11-13 | 2004-01-13 | International Business Machines Corporation | Preparation of copolymers |
| TWI344966B (en) | 2003-03-10 | 2011-07-11 | Maruzen Petrochem Co Ltd | Novel thiol compound, copolymer and method for producing the copolymer |
| JP4693149B2 (ja) * | 2004-04-12 | 2011-06-01 | 三菱レイヨン株式会社 | レジスト用重合体 |
| JP4513501B2 (ja) * | 2004-10-27 | 2010-07-28 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP4911456B2 (ja) * | 2006-11-21 | 2012-04-04 | 富士フイルム株式会社 | ポジ型感光性組成物、該ポジ型感光性組成物に用いられる高分子化合物、該高分子化合物の製造方法及びポジ型感光性組成物を用いたパターン形成方法 |
| JP5162290B2 (ja) * | 2007-03-23 | 2013-03-13 | 富士フイルム株式会社 | レジスト組成物及びそれを用いたパターン形成方法 |
| US20180289821A1 (en) * | 2011-08-03 | 2018-10-11 | Anp Technologies, Inc. | Oxazoline Polymer Compositions and Use Thereof |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5580694A (en) * | 1994-06-27 | 1996-12-03 | International Business Machines Corporation | Photoresist composition with androstane and process for its use |
| KR100206664B1 (ko) * | 1995-06-28 | 1999-07-01 | 세키사와 다다시 | 화학증폭형 레지스트 조성물 및 레지스트 패턴의 형성방법 |
| JP3804138B2 (ja) * | 1996-02-09 | 2006-08-02 | Ｊｓｒ株式会社 | ＡｒＦエキシマレーザー照射用感放射線性樹脂組成物 |
| JP3700276B2 (ja) | 1996-08-09 | 2005-09-28 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP3297324B2 (ja) * | 1996-10-30 | 2002-07-02 | 富士通株式会社 | レジスト組成物、レジストパターンの形成方法及び半導体装置の製造方法 |
| JP3890357B2 (ja) * | 1997-02-07 | 2007-03-07 | 富士フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| KR100538968B1 (ko) * | 1997-02-18 | 2006-07-11 | 후지 샤신 필름 가부시기가이샤 | 포지티브감광성조성물 |
| EP0878738B1 (en) * | 1997-05-12 | 2002-01-09 | Fuji Photo Film Co., Ltd. | Positive resist composition |
| JPH1152575A (ja) * | 1997-08-04 | 1999-02-26 | Sumitomo Chem Co Ltd | 化学増幅型ポジ型フォトレジスト組成物 |
| JP3847454B2 (ja) * | 1998-03-20 | 2006-11-22 | 富士写真フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物及びパターン形成方法 |
-
1998
- 1998-07-02 JP JP18759798A patent/JP3844322B2/ja not_active Expired - Lifetime
-
1999
- 1999-06-30 US US09/345,159 patent/US6303265B1/en not_active Expired - Lifetime
- 1999-07-02 KR KR1019990026473A patent/KR100569641B1/ko not_active IP Right Cessation
