JP2000017422A5 - - Google Patents

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Publication number
JP2000017422A5
JP2000017422A5 JP1998191769A JP19176998A JP2000017422A5 JP 2000017422 A5 JP2000017422 A5 JP 2000017422A5 JP 1998191769 A JP1998191769 A JP 1998191769A JP 19176998 A JP19176998 A JP 19176998A JP 2000017422 A5 JP2000017422 A5 JP 2000017422A5
Authority
JP
Japan
Prior art keywords
conductive film
patterning mask
unevenness
mask according
film patterning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998191769A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000017422A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP19176998A priority Critical patent/JP2000017422A/ja
Priority claimed from JP19176998A external-priority patent/JP2000017422A/ja
Publication of JP2000017422A publication Critical patent/JP2000017422A/ja
Publication of JP2000017422A5 publication Critical patent/JP2000017422A5/ja
Pending legal-status Critical Current

Links

JP19176998A 1998-07-07 1998-07-07 導電膜パターン化用マスク Pending JP2000017422A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19176998A JP2000017422A (ja) 1998-07-07 1998-07-07 導電膜パターン化用マスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19176998A JP2000017422A (ja) 1998-07-07 1998-07-07 導電膜パターン化用マスク

Publications (2)

Publication Number Publication Date
JP2000017422A JP2000017422A (ja) 2000-01-18
JP2000017422A5 true JP2000017422A5 (enExample) 2005-10-27

Family

ID=16280222

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19176998A Pending JP2000017422A (ja) 1998-07-07 1998-07-07 導電膜パターン化用マスク

Country Status (1)

Country Link
JP (1) JP2000017422A (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6264804B1 (en) * 2000-04-12 2001-07-24 Ske Technology Corp. System and method for handling and masking a substrate in a sputter deposition system
JP4519416B2 (ja) * 2003-04-21 2010-08-04 日鉱金属株式会社 薄膜形成装置用汚染防止装置
JPWO2007055030A1 (ja) * 2005-11-14 2009-04-30 日立プラズマディスプレイ株式会社 Ｃｖｄ装置を用いる成膜方法およびマスキングのためのマスク
WO2007055031A1 (ja) * 2005-11-14 2007-05-18 Fujitsu Hitachi Plasma Display Limited Ｃｖｄ装置を用いる成膜方法およびマスキングのためのマスク
JP4669017B2 (ja) * 2008-02-29 2011-04-13 富士フイルム株式会社 成膜装置、ガスバリアフィルムおよびガスバリアフィルムの製造方法
JP5450557B2 (ja) * 2011-10-17 2014-03-26 株式会社日本製鋼所 マスキング成膜方法
CN103911585A (zh) * 2013-01-08 2014-07-09 旭晖应用材料股份有限公司 遮罩
WO2015188879A1 (en) * 2014-06-13 2015-12-17 Applied Materials, Inc. Flat edge design for better uniformity and increased edge lifetime
JP7075214B2 (ja) * 2015-04-24 2022-05-25 エルジー イノテック カンパニー リミテッド 金属基板およびこれを用いた蒸着用マスク
JP6681739B2 (ja) * 2016-02-25 2020-04-15 株式会社ジャパンディスプレイ シャドーマスクの製造方法及び表示装置の製造方法
JP2017150038A (ja) * 2016-02-25 2017-08-31 株式会社ジャパンディスプレイ シャドーマスク及び表示装置の製造方法
JP6906652B2 (ja) * 2016-02-25 2021-07-21 株式会社ジャパンディスプレイ 蒸着マスク
JP7013320B2 (ja) * 2018-05-11 2022-01-31 大日本印刷株式会社 蒸着マスク及び蒸着方法

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