JP1556433S - - Google Patents
Info
- Publication number
- JP1556433S JP1556433S JPD2015-21985F JP2015021985F JP1556433S JP 1556433 S JP1556433 S JP 1556433S JP 2015021985 F JP2015021985 F JP 2015021985F JP 1556433 S JP1556433 S JP 1556433S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2015-21985F JP1556433S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 2015-10-06 | 2015-10-06 | |
| TW105301716F TWD179672S (zh) | 2015-10-06 | 2016-03-31 | 基板保持環之部分 |
| US29/560,291 USD794585S1 (en) | 2015-10-06 | 2016-04-05 | Retainer ring for substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2015-21985F JP1556433S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 2015-10-06 | 2015-10-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1556433S true JP1556433S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 2016-08-15 |
Family
ID=56612403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JPD2015-21985F Active JP1556433S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 2015-10-06 | 2015-10-06 |
Country Status (3)
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP1544543S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 2015-05-14 | 2019-02-18 | ||
| JP1584784S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 2017-01-31 | 2017-08-28 | ||
| JP1651619S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 2019-07-11 | 2020-01-27 | ||
| JP1651618S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 2019-07-11 | 2020-01-27 | ||
| JP1651623S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 2019-07-18 | 2020-01-27 | ||
| USD931241S1 (en) | 2019-08-28 | 2021-09-21 | Applied Materials, Inc. | Lower shield for a substrate processing chamber |
| USD940670S1 (en) * | 2019-09-26 | 2022-01-11 | Willbe S&T Co., Ltd. | Retainer ring for chemical mechanical polishing device |
| JP1671171S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 2020-05-22 | 2020-10-26 | ||
| USD981459S1 (en) * | 2021-06-16 | 2023-03-21 | Ebara Corporation | Retaining ring for substrate |
| USD1086087S1 (en) * | 2023-03-30 | 2025-07-29 | Samsung Electronics Co., Ltd. | CMP (chemical mechanical planarization) retaining ring |
| USD1063595S1 (en) * | 2023-03-30 | 2025-02-25 | Samsung Electronics Co., Ltd. | CMP (chemical mechanical planarization) retaining ring |
| USD1062662S1 (en) * | 2023-03-30 | 2025-02-18 | Samsung Electronics Co., Ltd. | CMP (chemical mechanical planarization) retaining ring |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5944593A (en) * | 1997-09-01 | 1999-08-31 | United Microelectronics Corp. | Retainer ring for polishing head of chemical-mechanical polish machines |
| US6116992A (en) * | 1997-12-30 | 2000-09-12 | Applied Materials, Inc. | Substrate retaining ring |
| US6436228B1 (en) * | 1998-05-15 | 2002-08-20 | Applied Materials, Inc. | Substrate retainer |
| US6224472B1 (en) * | 1999-06-24 | 2001-05-01 | Samsung Austin Semiconductor, L.P. | Retaining ring for chemical mechanical polishing |
| US6186880B1 (en) * | 1999-09-29 | 2001-02-13 | Semiconductor Equipment Technology | Recyclable retaining ring assembly for a chemical mechanical polishing apparatus |
| US6869335B2 (en) * | 2002-07-08 | 2005-03-22 | Micron Technology, Inc. | Retaining rings, planarizing apparatuses including retaining rings, and methods for planarizing micro-device workpieces |
| EP1694464B1 (en) * | 2003-11-13 | 2010-05-26 | Applied Materials, Inc. | Retaining ring with shaped surface |
| US7029386B2 (en) * | 2004-06-10 | 2006-04-18 | R & B Plastics, Inc. | Retaining ring assembly for use in chemical mechanical polishing |
| US7029375B2 (en) * | 2004-08-31 | 2006-04-18 | Tech Semiconductor Pte. Ltd. | Retaining ring structure for edge control during chemical-mechanical polishing |
| USD559993S1 (en) * | 2005-03-30 | 2008-01-15 | Tokyo Electron Limited | Cover ring |
| US7186171B2 (en) * | 2005-04-22 | 2007-03-06 | Applied Materials, Inc. | Composite retaining ring |
| USD557226S1 (en) * | 2005-08-25 | 2007-12-11 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
| US7326105B2 (en) * | 2005-08-31 | 2008-02-05 | Micron Technology, Inc. | Retaining rings, and associated planarizing apparatuses, and related methods for planarizing micro-device workpieces |
| JP2008229790A (ja) * | 2007-03-22 | 2008-10-02 | Nec Electronics Corp | リテーナリングおよび研磨装置 |
| US8517803B2 (en) * | 2009-09-16 | 2013-08-27 | SPM Technology, Inc. | Retaining ring for chemical mechanical polishing |
| US8298046B2 (en) * | 2009-10-21 | 2012-10-30 | SPM Technology, Inc. | Retaining rings |
| JP1438745S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 2011-09-20 | 2015-04-06 | ||
| USD699200S1 (en) * | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode member for a plasma processing apparatus |
| USD734377S1 (en) * | 2013-03-28 | 2015-07-14 | Hirata Corporation | Top cover of a load lock chamber |
| USD766849S1 (en) * | 2013-05-15 | 2016-09-20 | Ebara Corporation | Substrate retaining ring |
| USD729730S1 (en) * | 2013-06-06 | 2015-05-19 | Jon Simon Gillespie-Brown | Power charging ring |
-
2015
- 2015-10-06 JP JPD2015-21985F patent/JP1556433S/ja active Active
-
2016
- 2016-03-31 TW TW105301716F patent/TWD179672S/zh unknown
- 2016-04-05 US US29/560,291 patent/USD794585S1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| USD794585S1 (en) | 2017-08-15 |
| TWD179672S (zh) | 2016-11-21 |