IT987402B - Procedimento di deposito di strati metallici molto sottil - Google Patents

Procedimento di deposito di strati metallici molto sottil

Info

Publication number
IT987402B
IT987402B IT2403173A IT2403173A IT987402B IT 987402 B IT987402 B IT 987402B IT 2403173 A IT2403173 A IT 2403173A IT 2403173 A IT2403173 A IT 2403173A IT 987402 B IT987402 B IT 987402B
Authority
IT
Italy
Prior art keywords
deposit
metal layers
thin metal
thin
layers
Prior art date
Application number
IT2403173A
Other languages
English (en)
Original Assignee
Cit Alcatel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cit Alcatel filed Critical Cit Alcatel
Application granted granted Critical
Publication of IT987402B publication Critical patent/IT987402B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Ceramic Capacitors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
IT2403173A 1972-05-12 1973-05-14 Procedimento di deposito di strati metallici molto sottil IT987402B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7217007A FR2183603B1 (it) 1972-05-12 1972-05-12

Publications (1)

Publication Number Publication Date
IT987402B true IT987402B (it) 1975-02-20

Family

ID=9098417

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2403173A IT987402B (it) 1972-05-12 1973-05-14 Procedimento di deposito di strati metallici molto sottil

Country Status (6)

Country Link
BE (1) BE799398A (it)
CH (1) CH572101A5 (it)
DE (1) DE2323988C2 (it)
FR (1) FR2183603B1 (it)
GB (1) GB1372167A (it)
IT (1) IT987402B (it)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2359432C3 (de) * 1973-11-29 1984-08-09 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur Herstellung von mit Aluminium beschichteten Folien für Kondensatoren und Vorrichtung zur Durchführung des Verfahrens
DE3515919A1 (de) * 1985-05-03 1986-11-06 Fried. Krupp Gmbh, 4300 Essen Verschleissfester beschichteter hartmetallkoerper und verfahren zu seiner herstellung
GB9225270D0 (en) * 1992-12-03 1993-01-27 Gec Ferranti Defence Syst Depositing different materials on a substrate
GB2273110B (en) * 1992-12-03 1996-01-24 Gec Marconi Avionics Holdings Depositing different materials on a substrate
AU2004269356A1 (en) * 2003-08-29 2005-03-10 Northrop Grumman Corporation Titanium foil metallization product and process
US6923868B2 (en) 2003-09-23 2005-08-02 Gba S.A. Installation for electron-ray coatication of coatings

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1257918B (de) * 1962-12-18 1968-01-04 Siemens Ag Integrierter Schaltkreis
US3432913A (en) * 1962-12-26 1969-03-18 Philips Corp Method of joining a semi-conductor to a base
US3371406A (en) * 1965-11-26 1968-03-05 Philips Corp Hermetic electrical lead-in assembly
US3418423A (en) * 1966-12-23 1968-12-24 Philips Corp Fluorine-resistant electrical terminal
DE1954499A1 (de) * 1969-10-29 1971-05-06 Siemens Ag Verfahren zur Herstellung von Halbleiterschaltkreisen mit Leitbahnen

Also Published As

Publication number Publication date
FR2183603B1 (it) 1974-08-30
DE2323988C2 (de) 1982-10-28
FR2183603A1 (it) 1973-12-21
GB1372167A (en) 1974-10-30
DE2323988A1 (de) 1973-11-22
CH572101A5 (it) 1976-01-30
BE799398A (fr) 1973-11-12

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