IT9019237A1 - Procedimento a bassa temperatura per la formazione di rivestimenti ceramici - Google Patents

Procedimento a bassa temperatura per la formazione di rivestimenti ceramici

Info

Publication number
IT9019237A1
IT9019237A1 IT019237A IT1923790A IT9019237A1 IT 9019237 A1 IT9019237 A1 IT 9019237A1 IT 019237 A IT019237 A IT 019237A IT 1923790 A IT1923790 A IT 1923790A IT 9019237 A1 IT9019237 A1 IT 9019237A1
Authority
IT
Italy
Prior art keywords
formation
low temperature
ceramic coatings
temperature procedure
procedure
Prior art date
Application number
IT019237A
Other languages
English (en)
Other versions
IT9019237A0 (it
IT1259407B (it
Inventor
Loren Andrew Haluska
Keith Winton Michael
Original Assignee
Dow Corning
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning filed Critical Dow Corning
Publication of IT9019237A0 publication Critical patent/IT9019237A0/it
Publication of IT9019237A1 publication Critical patent/IT9019237A1/it
Application granted granted Critical
Publication of IT1259407B publication Critical patent/IT1259407B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5025—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with ceramic materials
    • C04B41/5035—Silica
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/85—Coating or impregnation with inorganic materials
    • C04B41/87—Ceramics
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
    • C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
    • C04B2111/00844—Uses not provided for elsewhere in C04B2111/00 for electronic applications
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Formation Of Insulating Films (AREA)
IT01923790A 1989-02-21 1990-02-02 Procedimento a bassa temperatura per la formazione di rivestimenti ceramici IT1259407B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/312,457 US5336532A (en) 1989-02-21 1989-02-21 Low temperature process for the formation of ceramic coatings

Publications (3)

Publication Number Publication Date
IT9019237A0 IT9019237A0 (it) 1990-02-02
IT9019237A1 true IT9019237A1 (it) 1990-08-22
IT1259407B IT1259407B (it) 1996-03-18

Family

ID=23211539

Family Applications (1)

Application Number Title Priority Date Filing Date
IT01923790A IT1259407B (it) 1989-02-21 1990-02-02 Procedimento a bassa temperatura per la formazione di rivestimenti ceramici

Country Status (8)

Country Link
US (1) US5336532A (it)
AU (1) AU649215B1 (it)
CA (1) CA2007726A1 (it)
DE (1) DE4005472C2 (it)
FR (1) FR2704355B1 (it)
GB (1) GB2280203B (it)
IT (1) IT1259407B (it)
NL (1) NL194796C (it)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0749500B1 (en) * 1994-10-18 1998-05-27 Koninklijke Philips Electronics N.V. Method of manufacturing a thin silicon-oxide layer
US5530293A (en) * 1994-11-28 1996-06-25 International Business Machines Corporation Carbon-free hydrogen silsesquioxane with dielectric constant less than 3.2 annealed in hydrogen for integrated circuits
US5508238A (en) * 1995-05-11 1996-04-16 Dow Corning Corporation Monolithic ceramic bodies using modified hydrogen silsesquioxane resin
US5616202A (en) * 1995-06-26 1997-04-01 Dow Corning Corporation Enhanced adhesion of H-resin derived silica to gold
JP3070450B2 (ja) * 1995-07-14 2000-07-31 ヤマハ株式会社 多層配線形成法
JP3149739B2 (ja) * 1995-07-14 2001-03-26 ヤマハ株式会社 多層配線形成法
US5661092A (en) * 1995-09-01 1997-08-26 The University Of Connecticut Ultra thin silicon oxide and metal oxide films and a method for the preparation thereof
DE69606942T2 (de) * 1995-09-25 2000-10-05 Dow Corning Verwendung von präkeramischen Polymeren als Klebstoffe für Elektronik
US5609925A (en) * 1995-12-04 1997-03-11 Dow Corning Corporation Curing hydrogen silsesquioxane resin with an electron beam
US6323549B1 (en) * 1996-08-29 2001-11-27 L. Pierre deRochemont Ceramic composite wiring structures for semiconductor devices and method of manufacture
JP3123449B2 (ja) * 1996-11-01 2001-01-09 ヤマハ株式会社 多層配線形成法
JP3082688B2 (ja) * 1996-11-05 2000-08-28 ヤマハ株式会社 配線形成法
JP3225872B2 (ja) 1996-12-24 2001-11-05 ヤマハ株式会社 酸化シリコン膜形成法
JP2001507867A (ja) * 1996-12-30 2001-06-12 デロシェモント，エル．ピエール 半導体装置用セラミックコンポジットワイヤ構造体及び製造方法
JPH10247686A (ja) * 1996-12-30 1998-09-14 Yamaha Corp 多層配線形成法
US5707681A (en) * 1997-02-07 1998-01-13 Dow Corning Corporation Method of producing coatings on electronic substrates
US6743856B1 (en) 1997-04-21 2004-06-01 Honeywell International Inc. Synthesis of siloxane resins
US6143855A (en) 1997-04-21 2000-11-07 Alliedsignal Inc. Organohydridosiloxane resins with high organic content
US6043330A (en) * 1997-04-21 2000-03-28 Alliedsignal Inc. Synthesis of siloxane resins
US6218497B1 (en) 1997-04-21 2001-04-17 Alliedsignal Inc. Organohydridosiloxane resins with low organic content
US6015457A (en) * 1997-04-21 2000-01-18 Alliedsignal Inc. Stable inorganic polymers
US6218020B1 (en) 1999-01-07 2001-04-17 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with high organic content
US6177199B1 (en) 1999-01-07 2001-01-23 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with low organic content
US5935638A (en) * 1998-08-06 1999-08-10 Dow Corning Corporation Silicon dioxide containing coating
US6440550B1 (en) * 1999-10-18 2002-08-27 Honeywell International Inc. Deposition of fluorosilsesquioxane films
US6472076B1 (en) 1999-10-18 2002-10-29 Honeywell International Inc. Deposition of organosilsesquioxane films
JP3794562B2 (ja) * 1999-11-01 2006-07-05 Ｔｄｋ株式会社 積層型セラミック電子部品
JP3530938B2 (ja) * 2001-03-27 2004-05-24 独立行政法人産業技術総合研究所 シルセスキオキサン系ポリマーを含む耐熱性樹脂組成物、該組成物を用いて形成された被膜、及びその被膜の作成方法
JP3913638B2 (ja) * 2001-09-03 2007-05-09 東京エレクトロン株式会社 熱処理方法及び熱処理装置
FR2830856B1 (fr) * 2001-10-15 2004-07-30 Pechiney Aluminium Precurseur de revetement et procede pour revetir un substrat d'une couche refractaire
SE521977C2 (sv) * 2002-06-20 2003-12-23 Mobile Media Group Stockholm A Metod och apparat för att formatera en webbtjänst
JP3924286B2 (ja) * 2003-10-31 2007-06-06 Ｔｄｋ株式会社 積層セラミック電子部品の製造方法
US20050215713A1 (en) * 2004-03-26 2005-09-29 Hessell Edward T Method of producing a crosslinked coating in the manufacture of integrated circuits
DE102004058305B3 (de) * 2004-12-02 2006-05-18 Infineon Technologies Ag Halbleiterbauteil mit einem eine Passivierungsschicht aufweisenden Halbleiterchip sowie Verfahren zur Herstellung desselben
US10022889B2 (en) 2013-03-14 2018-07-17 Stratasys, Inc. Ceramic support structure
CN106542850B (zh) * 2016-09-26 2019-11-22 德化恒忆陶瓷艺术股份有限公司 复合多层保温陶瓷及其制备方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3834939A (en) * 1970-02-19 1974-09-10 Ibm Method of forming doped silicon oxide layers on substrates and paint-on compositions useful in such methods
US3987530A (en) * 1975-04-11 1976-10-26 International Business Machines Corporation Heat fuser roll and method of manufacture
US4411931A (en) * 1982-09-29 1983-10-25 Armstrong World Industries, Inc. Multiple step UV curing process for providing accurately controlled surface texture
JPS59111333A (ja) * 1982-12-09 1984-06-27 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション ＳｉＯ領域をＳｉＯ↓２領域に変換してＳｉＯ↓２領を形成する方法
US4472510A (en) * 1982-12-23 1984-09-18 Dow Corning Corporation Carbon-containing monolithic glasses and ceramics prepared by a sol-gel process
JPS6177695A (ja) * 1984-09-20 1986-04-21 Applied Material Japan Kk 気相成長方法
US4756977A (en) * 1986-12-03 1988-07-12 Dow Corning Corporation Multilayer ceramics from hydrogen silsesquioxane
US4822697A (en) * 1986-12-03 1989-04-18 Dow Corning Corporation Platinum and rhodium catalysis of low temperature formation multilayer ceramics
US4749631B1 (en) * 1986-12-04 1993-03-23 Multilayer ceramics from silicate esters
US4753855A (en) * 1986-12-04 1988-06-28 Dow Corning Corporation Multilayer ceramic coatings from metal oxides for protection of electronic devices
US4911992A (en) * 1986-12-04 1990-03-27 Dow Corning Corporation Platinum or rhodium catalyzed multilayer ceramic coatings from hydrogen silsesquioxane resin and metal oxides
US4808653A (en) * 1986-12-04 1989-02-28 Dow Corning Corporation Coating composition containing hydrogen silsesquioxane resin and other metal oxide precursors
JP2624254B2 (ja) * 1987-05-22 1997-06-25 東京応化工業株式会社 シリカ系被膜の膜質改善方法
US5003185A (en) * 1988-11-17 1991-03-26 Burgio Joseph T Jr System and method for photochemically curing a coating on a substrate

Also Published As

Publication number Publication date
DE4005472A1 (de) 1994-11-10
AU649215B1 (en) 1994-05-19
IT9019237A0 (it) 1990-02-02
NL194796B (nl) 2002-11-01
FR2704355B1 (fr) 1996-05-31
DE4005472C2 (de) 1995-04-13
CA2007726A1 (en) 1994-05-27
GB2280203B (en) 1995-06-28
GB2280203A (en) 1995-01-25
IT1259407B (it) 1996-03-18
FR2704355A1 (fr) 1994-10-28
NL194796C (nl) 2003-03-04
NL9000320A (nl) 2001-02-01
GB9002497D0 (en) 1994-10-26
US5336532A (en) 1994-08-09

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19980225