IT8019449A0 - Processo per fabbricare superficidi materiale semiconduttore nonriflettenti. - Google Patents

Processo per fabbricare superficidi materiale semiconduttore nonriflettenti.

Info

Publication number
IT8019449A0
IT8019449A0 IT8019449A IT1944980A IT8019449A0 IT 8019449 A0 IT8019449 A0 IT 8019449A0 IT 8019449 A IT8019449 A IT 8019449A IT 1944980 A IT1944980 A IT 1944980A IT 8019449 A0 IT8019449 A0 IT 8019449A0
Authority
IT
Italy
Prior art keywords
semiconductor material
material surfaces
manufacturing non
reflective semiconductor
reflective
Prior art date
Application number
IT8019449A
Other languages
English (en)
Other versions
IT1150003B (it
Inventor
Hansen Thomas Adrian
Johnson Claude Jr
Wilbarg Robert Ronald
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of IT8019449A0 publication Critical patent/IT8019449A0/it
Application granted granted Critical
Publication of IT1150003B publication Critical patent/IT1150003B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0236—Special surface textures
    • H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/547—Monocrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/964—Roughened surface

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Electromagnetism (AREA)
  • Drying Of Semiconductors (AREA)
  • Photovoltaic Devices (AREA)
IT19449/80A 1979-02-05 1980-01-25 Processo per fabbricare superfici di materiale semiconduttore non riflettenti IT1150003B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/009,005 US4229233A (en) 1979-02-05 1979-02-05 Method for fabricating non-reflective semiconductor surfaces by anisotropic reactive ion etching

Publications (2)

Publication Number Publication Date
IT8019449A0 true IT8019449A0 (it) 1980-01-25
IT1150003B IT1150003B (it) 1986-12-10

Family

ID=21735015

Family Applications (1)

Application Number Title Priority Date Filing Date
IT19449/80A IT1150003B (it) 1979-02-05 1980-01-25 Processo per fabbricare superfici di materiale semiconduttore non riflettenti

Country Status (6)

Country Link
US (1) US4229233A (it)
EP (1) EP0014759B1 (it)
JP (1) JPS6027195B2 (it)
CA (1) CA1141456A (it)
DE (1) DE2963280D1 (it)
IT (1) IT1150003B (it)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2463975A1 (fr) * 1979-08-22 1981-02-27 Onera (Off Nat Aerospatiale) Procede et appareil pour la gravure chimique par voie seche des circuits integres
US4344816A (en) * 1980-12-19 1982-08-17 Bell Telephone Laboratories, Incorporated Selectively etched bodies
JPS57118679A (en) * 1981-01-14 1982-07-23 Hoxan Corp Solar cell and manufacture thereof
JPS58120255A (ja) * 1981-12-31 1983-07-18 エクソン・リサ−チ・アンド・エンジニアリング・カンパニ− 平版印刷マスクの製造方法
US4431499A (en) * 1982-02-26 1984-02-14 The United States Of America As Represented By The United States Department Of Energy Method of sputter etching a surface
US4478209A (en) * 1982-06-30 1984-10-23 Guarnieri C Richard Radiant energy collector having plasma-textured polyimide exposed surface
US4554727A (en) * 1982-08-04 1985-11-26 Exxon Research & Engineering Company Method for making optically enhanced thin film photovoltaic device using lithography defined random surfaces
JPS59123279A (ja) * 1982-12-28 1984-07-17 Semiconductor Energy Lab Co Ltd 光電変換装置作製方法
JPS59127879A (ja) * 1983-01-12 1984-07-23 Semiconductor Energy Lab Co Ltd 光電変換装置およびその作製方法
DE3324232A1 (de) * 1983-07-05 1985-01-17 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von aus kristallinem silizium bestehenden koerpern mit einer die oberflaeche vergroessernden struktur, sowie deren anwendung als substrate fuer solarzellen und katalysatoren
JPS61108176A (ja) * 1984-11-01 1986-05-26 Fuji Electric Co Ltd 粗面化方法
ZA871298B (it) * 1986-02-28 1987-08-17
JPS6445176A (en) * 1987-08-14 1989-02-17 Hitachi Ltd Manufacture of solar cell element
US5106471A (en) * 1990-04-02 1992-04-21 Motorola, Inc. Reactive ion etch process for surface acoustic wave (SAW) device fabrication
US6329296B1 (en) * 2000-08-09 2001-12-11 Sandia Corporation Metal catalyst technique for texturing silicon solar cells
US20030178057A1 (en) * 2001-10-24 2003-09-25 Shuichi Fujii Solar cell, manufacturing method thereof and electrode material
JP2004235274A (ja) * 2003-01-28 2004-08-19 Kyocera Corp 多結晶シリコン基板およびその粗面化法
US20050148198A1 (en) * 2004-01-05 2005-07-07 Technion Research & Development Foundation Ltd. Texturing a semiconductor material using negative potential dissolution (NPD)
JP5064767B2 (ja) * 2005-11-29 2012-10-31 京セラ株式会社 太陽電池素子の製造方法
JP4587988B2 (ja) * 2006-06-13 2010-11-24 京セラ株式会社 太陽電池素子の製造方法
KR101038487B1 (ko) * 2008-02-13 2011-06-02 엘지전자 주식회사 금속 촉매를 이용한 태양전지의 습식 텍스처링 방법
US8894803B2 (en) * 2008-03-05 2014-11-25 Heateflex Corporation Apparatus and method for etching the surface of a semiconductor substrate
US20100126559A1 (en) * 2008-11-26 2010-05-27 Applied Materials, Inc. Semi-Transparent Thin-Film Photovoltaic Modules and Methods of Manufacture
JP2011035262A (ja) * 2009-08-04 2011-02-17 Ulvac Japan Ltd 結晶系太陽電池の製造における処理方法及び処理装置
CN102479876A (zh) * 2010-11-19 2012-05-30 金元求 太阳能电池制造方法及根据该制造方法制造的太阳能电池
WO2018106905A1 (en) 2016-12-07 2018-06-14 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Anti-reflective surface structures formed using three-dimensional etch mask

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1621511A1 (de) * 1967-04-01 1970-07-23 Siemens Ag Verfahren zum Entspiegeln von Siliziumeinkristalloberflaechen
US3615956A (en) * 1969-03-27 1971-10-26 Signetics Corp Gas plasma vapor etching process
US3971684A (en) * 1973-12-03 1976-07-27 Hewlett-Packard Company Etching thin film circuits and semiconductor chips
JPS5165774U (it) * 1974-11-20 1976-05-24
US4069096A (en) * 1975-11-03 1978-01-17 Texas Instruments Incorporated Silicon etching process
US4131488A (en) * 1975-12-31 1978-12-26 Motorola, Inc. Method of semiconductor solar energy device fabrication
US4137123A (en) * 1975-12-31 1979-01-30 Motorola, Inc. Texture etching of silicon: method
US4101351A (en) * 1976-11-15 1978-07-18 Texas Instruments Incorporated Process for fabricating inexpensive high performance solar cells using doped oxide junction and insitu anti-reflection coatings
US4104086A (en) * 1977-08-15 1978-08-01 International Business Machines Corporation Method for forming isolated regions of silicon utilizing reactive ion etching
US4147564A (en) * 1977-11-18 1979-04-03 Sri International Method of controlled surface texturization of crystalline semiconductor material

Also Published As

Publication number Publication date
US4229233A (en) 1980-10-21
EP0014759B1 (de) 1982-06-30
CA1141456A (en) 1983-02-15
DE2963280D1 (en) 1982-08-19
EP0014759A1 (de) 1980-09-03
IT1150003B (it) 1986-12-10
JPS55105382A (en) 1980-08-12
JPS6027195B2 (ja) 1985-06-27

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