IT201900020172A1 - Bagno galvanico per la deposizione elettrochimica di leghe rodio-bismuto - Google Patents

Bagno galvanico per la deposizione elettrochimica di leghe rodio-bismuto

Info

Publication number
IT201900020172A1
IT201900020172A1 IT102019000020172A IT201900020172A IT201900020172A1 IT 201900020172 A1 IT201900020172 A1 IT 201900020172A1 IT 102019000020172 A IT102019000020172 A IT 102019000020172A IT 201900020172 A IT201900020172 A IT 201900020172A IT 201900020172 A1 IT201900020172 A1 IT 201900020172A1
Authority
IT
Italy
Prior art keywords
bismuto
rhodium
alloys
electrochemical deposition
galvanic bath
Prior art date
Application number
IT102019000020172A
Other languages
English (en)
Inventor
Giovanni Bersaglio
Paolo Bersaglio
Gloria Mercurio
Original Assignee
Berkem Srl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Berkem Srl filed Critical Berkem Srl
Priority to IT102019000020172A priority Critical patent/IT201900020172A1/it
Publication of IT201900020172A1 publication Critical patent/IT201900020172A1/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
IT102019000020172A 2019-10-31 2019-10-31 Bagno galvanico per la deposizione elettrochimica di leghe rodio-bismuto IT201900020172A1 (it)

Priority Applications (1)

Application Number Priority Date Filing Date Title
IT102019000020172A IT201900020172A1 (it) 2019-10-31 2019-10-31 Bagno galvanico per la deposizione elettrochimica di leghe rodio-bismuto

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT102019000020172A IT201900020172A1 (it) 2019-10-31 2019-10-31 Bagno galvanico per la deposizione elettrochimica di leghe rodio-bismuto

Publications (1)

Publication Number Publication Date
IT201900020172A1 true IT201900020172A1 (it) 2021-05-01

Family

ID=69743859

Family Applications (1)

Application Number Title Priority Date Filing Date
IT102019000020172A IT201900020172A1 (it) 2019-10-31 2019-10-31 Bagno galvanico per la deposizione elettrochimica di leghe rodio-bismuto

Country Status (1)

Country Link
IT (1) IT201900020172A1 (it)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56169790A (en) * 1980-05-31 1981-12-26 Komorimiya Kingin Kogyo Kk Bath for electrodeposition of bright rhodium
CN108070886A (zh) * 2017-11-30 2018-05-25 沈阳工业大学 一种双金属Cu-Bi电催化反硝化电极的制备方法及用途

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56169790A (en) * 1980-05-31 1981-12-26 Komorimiya Kingin Kogyo Kk Bath for electrodeposition of bright rhodium
CN108070886A (zh) * 2017-11-30 2018-05-25 沈阳工业大学 一种双金属Cu-Bi电催化反硝化电极的制备方法及用途

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