IT201700084504A1 - Bagno galvanico, procedimento di elettrodeposizione utilizzante detto bagno galvanico e lega metallica ottenibile tramite detto procedimento - Google Patents

Bagno galvanico, procedimento di elettrodeposizione utilizzante detto bagno galvanico e lega metallica ottenibile tramite detto procedimento

Info

Publication number
IT201700084504A1
IT201700084504A1 IT102017000084504A IT201700084504A IT201700084504A1 IT 201700084504 A1 IT201700084504 A1 IT 201700084504A1 IT 102017000084504 A IT102017000084504 A IT 102017000084504A IT 201700084504 A IT201700084504 A IT 201700084504A IT 201700084504 A1 IT201700084504 A1 IT 201700084504A1
Authority
IT
Italy
Prior art keywords
procedure
galvanic
electrodeptification
bathroom
metallic alloy
Prior art date
Application number
IT102017000084504A
Other languages
English (en)
Inventor
Samuele Bussetti
Ester Falletta
Pace Ivan Del
Original Assignee
Valmet Plating S R L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Valmet Plating S R L filed Critical Valmet Plating S R L
Priority to IT102017000084504A priority Critical patent/IT201700084504A1/it
Publication of IT201700084504A1 publication Critical patent/IT201700084504A1/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
    • C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
IT102017000084504A 2017-07-25 2017-07-25 Bagno galvanico, procedimento di elettrodeposizione utilizzante detto bagno galvanico e lega metallica ottenibile tramite detto procedimento IT201700084504A1 (it)

Priority Applications (1)

Application Number Priority Date Filing Date Title
IT102017000084504A IT201700084504A1 (it) 2017-07-25 2017-07-25 Bagno galvanico, procedimento di elettrodeposizione utilizzante detto bagno galvanico e lega metallica ottenibile tramite detto procedimento

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT102017000084504A IT201700084504A1 (it) 2017-07-25 2017-07-25 Bagno galvanico, procedimento di elettrodeposizione utilizzante detto bagno galvanico e lega metallica ottenibile tramite detto procedimento

Publications (1)

Publication Number Publication Date
IT201700084504A1 true IT201700084504A1 (it) 2019-01-25

Family

ID=60451054

Family Applications (1)

Application Number Title Priority Date Filing Date
IT102017000084504A IT201700084504A1 (it) 2017-07-25 2017-07-25 Bagno galvanico, procedimento di elettrodeposizione utilizzante detto bagno galvanico e lega metallica ottenibile tramite detto procedimento

Country Status (1)

Country Link
IT (1) IT201700084504A1 (it)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3972787A (en) * 1974-06-14 1976-08-03 Lea-Ronal, Inc. Palladium electrolyte baths utilizing quaternized pyridine compounds as brighteners
GB1509865A (en) * 1975-06-13 1978-05-04 Lea Ronal Inc Electrodeposition of palladium
EP0048929A1 (en) * 1980-09-25 1982-04-07 Nippon Mining Company Limited Rhodium-plated article with black or blue color, process for making the same and bath therefor
US4416742A (en) * 1980-09-25 1983-11-22 Nippon Mining Co., Ltd. Process and electrolytic bath for making a rhodium-plated article having a black or blue color
US6159623A (en) * 1997-05-30 2000-12-12 Matsushita Electric Industrial Co., Ltd. Palladium plating solution, palladium plating film formed using the solution and lead frame for semiconductor apparatuses having the palladium plating film
EP1892320A1 (de) * 2006-08-22 2008-02-27 Enthone, Incorporated Elektrolytzusammensetzung und Verfahren zur elektrolytischen Abscheidung von palladiumhaltigen Schichten
WO2016035645A1 (ja) * 2014-09-04 2016-03-10 日本高純度化学株式会社 パラジウムめっき液及びそれを用いて得られたパラジウム皮膜

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3972787A (en) * 1974-06-14 1976-08-03 Lea-Ronal, Inc. Palladium electrolyte baths utilizing quaternized pyridine compounds as brighteners
GB1509865A (en) * 1975-06-13 1978-05-04 Lea Ronal Inc Electrodeposition of palladium
EP0048929A1 (en) * 1980-09-25 1982-04-07 Nippon Mining Company Limited Rhodium-plated article with black or blue color, process for making the same and bath therefor
US4416742A (en) * 1980-09-25 1983-11-22 Nippon Mining Co., Ltd. Process and electrolytic bath for making a rhodium-plated article having a black or blue color
US6159623A (en) * 1997-05-30 2000-12-12 Matsushita Electric Industrial Co., Ltd. Palladium plating solution, palladium plating film formed using the solution and lead frame for semiconductor apparatuses having the palladium plating film
EP1892320A1 (de) * 2006-08-22 2008-02-27 Enthone, Incorporated Elektrolytzusammensetzung und Verfahren zur elektrolytischen Abscheidung von palladiumhaltigen Schichten
WO2016035645A1 (ja) * 2014-09-04 2016-03-10 日本高純度化学株式会社 パラジウムめっき液及びそれを用いて得られたパラジウム皮膜

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