IT1391029B1 - Metodo per la fabbricazione di lingotto di polisilicio di grado solare con relativo apparato ad induzione - Google Patents
Metodo per la fabbricazione di lingotto di polisilicio di grado solare con relativo apparato ad induzioneInfo
- Publication number
- IT1391029B1 IT1391029B1 ITTO2008A000540A ITTO20080540A IT1391029B1 IT 1391029 B1 IT1391029 B1 IT 1391029B1 IT TO2008A000540 A ITTO2008A000540 A IT TO2008A000540A IT TO20080540 A ITTO20080540 A IT TO20080540A IT 1391029 B1 IT1391029 B1 IT 1391029B1
- Authority
- IT
- Italy
- Prior art keywords
- polysyllic
- language
- manufacture
- induction apparatus
- solar
- Prior art date
Links
- 230000006698 induction Effects 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
- B22D7/00—Casting ingots, e.g. from ferrous metals
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/002—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/006—Controlling or regulating
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A40/00—Adaptation technologies in agriculture, forestry, livestock or agroalimentary production
- Y02A40/90—Adaptation technologies in agriculture, forestry, livestock or agroalimentary production in food processing or handling, e.g. food conservation
- Y02A40/963—Off-grid food refrigeration
- Y02A40/966—Powered by renewable energy sources
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Silicon Compounds (AREA)
- Manufacture And Refinement Of Metals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200710009238A CN100595352C (zh) | 2007-07-17 | 2007-07-17 | 太阳能级多晶硅大锭的制备方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
ITTO20080540A1 ITTO20080540A1 (it) | 2009-01-18 |
IT1391029B1 true IT1391029B1 (it) | 2011-10-27 |
Family
ID=38991172
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ITTO2008A000540A IT1391029B1 (it) | 2007-07-17 | 2008-07-15 | Metodo per la fabbricazione di lingotto di polisilicio di grado solare con relativo apparato ad induzione |
Country Status (9)
Country | Link |
---|---|
US (1) | US20090020067A1 (it) |
CN (1) | CN100595352C (it) |
BR (1) | BRPI0801205A2 (it) |
CA (1) | CA2633964A1 (it) |
DE (1) | DE102008033346A1 (it) |
FR (1) | FR2918999A1 (it) |
IT (1) | IT1391029B1 (it) |
NO (1) | NO20081902L (it) |
RU (1) | RU2008128526A (it) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100861287B1 (ko) * | 2008-01-25 | 2008-10-01 | 한국생산기술연구원 | 실리콘 분말을 이용하여 실리콘 성형체를 제조하는 방법 및 장치 |
CN101792143B (zh) * | 2010-03-24 | 2011-12-21 | 姜学昭 | 提纯硅的方法 |
CN102094238A (zh) * | 2010-09-28 | 2011-06-15 | 常州天合光能有限公司 | 降低铸锭多晶体内应力缺陷的方法 |
US8562740B2 (en) * | 2010-11-17 | 2013-10-22 | Silicor Materials Inc. | Apparatus for directional solidification of silicon including a refractory material |
US20130252011A1 (en) * | 2011-09-14 | 2013-09-26 | MEMC Singapore, Pte. Ltd. (UEN200614797D) | Multi-Crystalline Silicon Ingot And Directional Solidification Furnace |
US9352389B2 (en) * | 2011-09-16 | 2016-05-31 | Silicor Materials, Inc. | Directional solidification system and method |
JP5135467B1 (ja) * | 2011-12-22 | 2013-02-06 | シャープ株式会社 | 多結晶シリコンインゴットの製造方法 |
CN104583464A (zh) * | 2012-06-25 | 2015-04-29 | 希利柯尔材料股份有限公司 | 用于纯化硅的耐火坩埚的表面的衬里以及使用该坩埚进行熔化和进一步定向凝固以纯化硅熔融体的方法 |
CN103072996B (zh) * | 2013-02-04 | 2014-09-10 | 福建兴朝阳硅材料股份有限公司 | 一种电泳辅助的太阳能级多晶硅提纯方法 |
TWI643983B (zh) | 2013-03-14 | 2018-12-11 | 美商希利柯爾材料股份有限公司 | 定向凝固系統及方法 |
CN103395789B (zh) * | 2013-08-06 | 2015-05-06 | 青岛隆盛晶硅科技有限公司 | 多晶硅介质熔炼后初步定向凝固工艺 |
EP3247504B1 (fr) | 2015-01-23 | 2018-12-19 | Jacques Gerbron | Dispositif de délivrance d'un produit par pulvérisation |
RU2631372C1 (ru) * | 2016-04-04 | 2017-09-21 | Федеральное государственное бюджетное учреждение науки Институт физики твердого тела Российской академии наук (ИФТТ РАН) | Способ получения кремниевых мишеней для магнетронного распыления |
CN109319744A (zh) * | 2017-07-31 | 2019-02-12 | 成都中建材光电材料有限公司 | 一种4n碲的制备方法 |
CN109052407A (zh) * | 2018-08-22 | 2018-12-21 | 昆明理工大学 | 一种硅切割废料的回收与提纯方法 |
CN109292779A (zh) * | 2018-10-19 | 2019-02-01 | 东北大学 | 一种用高硅废料造渣精炼生产高纯硅/硅合金的方法 |
CN109321975B (zh) * | 2018-11-19 | 2020-09-08 | 永平县泰达废渣开发利用有限公司 | 单晶硅定向凝固引晶模块 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4101624A (en) * | 1974-03-06 | 1978-07-18 | Ppg Industries, Inc. | Method of casting silicon |
US4195067A (en) * | 1977-11-21 | 1980-03-25 | Union Carbide Corporation | Process for the production of refined metallurgical silicon |
CA2017719C (en) * | 1990-05-29 | 1999-01-19 | Zarlink Semiconductor Inc. | Moisture-free sog process |
CN1083396C (zh) * | 1995-07-14 | 2002-04-24 | 昭和电工株式会社 | 高纯度硅的制造方法 |
CN1143605A (zh) * | 1995-08-22 | 1997-02-26 | 李忠莆 | 精炼硅生产工艺 |
CA2232777C (en) * | 1997-03-24 | 2001-05-15 | Hiroyuki Baba | Method for producing silicon for use in solar cells |
GB9726191D0 (en) * | 1997-12-11 | 1998-02-11 | Philips Electronics Nv | Ion implantation process |
JP4159994B2 (ja) * | 2002-02-04 | 2008-10-01 | シャープ株式会社 | シリコンの精製方法、シリコン精製用スラグおよび精製されたシリコン |
CN1221470C (zh) * | 2002-11-26 | 2005-10-05 | 郑智雄 | 高纯度硅的生产方法 |
CN1299983C (zh) * | 2003-07-22 | 2007-02-14 | 龚炳生 | 光电级硅的制造方法 |
JP4632769B2 (ja) * | 2004-12-09 | 2011-02-16 | シャープ株式会社 | シリコンの精製方法 |
JP4689373B2 (ja) * | 2005-07-04 | 2011-05-25 | シャープ株式会社 | シリコンの再利用方法 |
-
2007
- 2007-07-17 CN CN200710009238A patent/CN100595352C/zh not_active Expired - Fee Related
-
2008
- 2008-03-17 US US12/049,449 patent/US20090020067A1/en not_active Abandoned
- 2008-04-21 NO NO20081902A patent/NO20081902L/no not_active Application Discontinuation
- 2008-04-25 BR BRPI0801205-9A patent/BRPI0801205A2/pt not_active IP Right Cessation
- 2008-05-28 CA CA002633964A patent/CA2633964A1/en not_active Abandoned
- 2008-07-15 RU RU2008128526/02A patent/RU2008128526A/ru not_active Application Discontinuation
- 2008-07-15 IT ITTO2008A000540A patent/IT1391029B1/it active
- 2008-07-16 DE DE102008033346A patent/DE102008033346A1/de not_active Withdrawn
- 2008-07-17 FR FR0854878A patent/FR2918999A1/fr not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
US20090020067A1 (en) | 2009-01-22 |
CN100595352C (zh) | 2010-03-24 |
CA2633964A1 (en) | 2009-01-17 |
NO20081902L (no) | 2009-01-19 |
RU2008128526A (ru) | 2010-01-20 |
CN101092741A (zh) | 2007-12-26 |
ITTO20080540A1 (it) | 2009-01-18 |
DE102008033346A1 (de) | 2009-05-07 |
FR2918999A1 (fr) | 2009-01-23 |
BRPI0801205A2 (pt) | 2010-04-20 |
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