IT1255257B - Rivestimenti con pellicole sottili realizzati mediante il deposito di vapore migliorato con plasma di silossani ciclici fluorati - Google Patents

Rivestimenti con pellicole sottili realizzati mediante il deposito di vapore migliorato con plasma di silossani ciclici fluorati

Info

Publication number
IT1255257B
IT1255257B ITMI912018A ITMI912018A IT1255257B IT 1255257 B IT1255257 B IT 1255257B IT MI912018 A ITMI912018 A IT MI912018A IT MI912018 A ITMI912018 A IT MI912018A IT 1255257 B IT1255257 B IT 1255257B
Authority
IT
Italy
Prior art keywords
coatings
plasma
thin films
films made
silossane
Prior art date
Application number
ITMI912018A
Other languages
English (en)
Inventor
Agostino Riccardo D
Gerardo Caporiccio
Pietro Favia
Original Assignee
Dow Corning
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning filed Critical Dow Corning
Priority to ITMI912018A priority Critical patent/IT1255257B/it
Publication of ITMI912018A0 publication Critical patent/ITMI912018A0/it
Priority to DE69204400T priority patent/DE69204400T2/de
Priority to EP92306545A priority patent/EP0528540B1/en
Priority to JP4194166A priority patent/JPH05202478A/ja
Priority to CA002074331A priority patent/CA2074331A1/en
Publication of ITMI912018A1 publication Critical patent/ITMI912018A1/it
Priority to US08/020,491 priority patent/US5334454A/en
Application granted granted Critical
Publication of IT1255257B publication Critical patent/IT1255257B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon

Abstract

La presente invenzione si riferisce a rivestimenti prodotti mediante il deposito di film sottili realizzati mediante deposizione chimica attivata da plasma a partire da vapori di silossani ciclici fluorurati volatili di struttura [RR'SiO]x dove R è un alchile con 1-6 atomi di carbonio, R' è un alchile fluorato con 3-10 atomi di carbonio considerando che il carbonio nelle posizioni alfa e beta rispetto all'atomo di silicio è idrogenato e che x è 3 o 4. Questi particolari rivestimenti sono utili per le loro proprietà di. protezione e isolamento.
ITMI912018A 1991-07-22 1991-07-22 Rivestimenti con pellicole sottili realizzati mediante il deposito di vapore migliorato con plasma di silossani ciclici fluorati IT1255257B (it)

Priority Applications (6)

Application Number Priority Date Filing Date Title
ITMI912018A IT1255257B (it) 1991-07-22 1991-07-22 Rivestimenti con pellicole sottili realizzati mediante il deposito di vapore migliorato con plasma di silossani ciclici fluorati
DE69204400T DE69204400T2 (de) 1991-07-22 1992-07-16 Dünne Filmbeschichtungen, hergestellt unter Verwendung von plasmaaktivierter chemischer Dampfphasen-Abscheidung von fluorierten Cyclosiloxanen.
EP92306545A EP0528540B1 (en) 1991-07-22 1992-07-16 Thin-film coatings made by means of plasma-activated chemical vapor deposition of fluorinated cyclic siloxanes
JP4194166A JPH05202478A (ja) 1991-07-22 1992-07-21 基板上にコーティングを形成させる方法
CA002074331A CA2074331A1 (en) 1991-07-22 1992-07-21 Thin-film coatings made by means of plasma-activated chemical vapor deposition of fluorinated cycle siloxanes
US08/020,491 US5334454A (en) 1991-07-22 1993-02-22 Articles by plasma-activated chemical vapor deposition of fluorinated cyclic siloxanes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITMI912018A IT1255257B (it) 1991-07-22 1991-07-22 Rivestimenti con pellicole sottili realizzati mediante il deposito di vapore migliorato con plasma di silossani ciclici fluorati

Publications (3)

Publication Number Publication Date
ITMI912018A0 ITMI912018A0 (it) 1991-07-22
ITMI912018A1 ITMI912018A1 (it) 1993-01-22
IT1255257B true IT1255257B (it) 1995-10-20

Family

ID=11360395

Family Applications (1)

Application Number Title Priority Date Filing Date
ITMI912018A IT1255257B (it) 1991-07-22 1991-07-22 Rivestimenti con pellicole sottili realizzati mediante il deposito di vapore migliorato con plasma di silossani ciclici fluorati

Country Status (5)

Country Link
EP (1) EP0528540B1 (it)
JP (1) JPH05202478A (it)
CA (1) CA2074331A1 (it)
DE (1) DE69204400T2 (it)
IT (1) IT1255257B (it)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5846649A (en) * 1994-03-03 1998-12-08 Monsanto Company Highly durable and abrasion-resistant dielectric coatings for lenses
US5618619A (en) * 1994-03-03 1997-04-08 Monsanto Company Highly abrasion-resistant, flexible coatings for soft substrates
US5560800A (en) * 1994-08-31 1996-10-01 Mobil Oil Corporation Protective coating for pressure-activated adhesives
SG81281A1 (en) * 1999-05-19 2001-06-19 Tokyo Electron Ltd Plasma thin-film deposition method
US6541367B1 (en) 2000-01-18 2003-04-01 Applied Materials, Inc. Very low dielectric constant plasma-enhanced CVD films
TWI273090B (en) 2002-09-09 2007-02-11 Mitsui Chemicals Inc Method for modifying porous film, modified porous film and use of same
US6905773B2 (en) 2002-10-22 2005-06-14 Schlage Lock Company Corrosion-resistant coatings and methods of manufacturing the same
FR2847346B1 (fr) * 2002-11-15 2005-02-18 Essilor Int Procede d'obtention d'un marquage sur une lentille ophtalmique a basse energie de surface
CN100446193C (zh) * 2004-02-13 2008-12-24 松下电器产业株式会社 有机无机混合绝缘膜的形成方法
US7662726B2 (en) * 2007-09-13 2010-02-16 Infineon Technologies Ag Integrated circuit device having a gas-phase deposited insulation layer
KR102563713B1 (ko) 2017-04-26 2023-08-07 오티아이 루미오닉스 인크. 표면의 코팅을 패턴화하는 방법 및 패턴화된 코팅을 포함하는 장치

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59105637A (ja) * 1982-12-09 1984-06-19 Fujitsu Ltd レジストパタ−ン形成方法
JPH0765003B2 (ja) * 1986-09-10 1995-07-12 株式会社資生堂 表面処理粉末
JPH01124805A (ja) * 1987-11-10 1989-05-17 Sumitomo Electric Ind Ltd ポリマークラッド石英光ファイバおよびその製造方法

Also Published As

Publication number Publication date
ITMI912018A0 (it) 1991-07-22
DE69204400T2 (de) 1996-04-04
CA2074331A1 (en) 1993-01-23
EP0528540B1 (en) 1995-08-30
DE69204400D1 (de) 1995-10-05
EP0528540A2 (en) 1993-02-24
ITMI912018A1 (it) 1993-01-22
JPH05202478A (ja) 1993-08-10
EP0528540A3 (en) 1993-08-04

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