SG81281A1 - Plasma thin-film deposition method - Google Patents
Plasma thin-film deposition methodInfo
- Publication number
- SG81281A1 SG81281A1 SG9902504A SG1999002504A SG81281A1 SG 81281 A1 SG81281 A1 SG 81281A1 SG 9902504 A SG9902504 A SG 9902504A SG 1999002504 A SG1999002504 A SG 1999002504A SG 81281 A1 SG81281 A1 SG 81281A1
- Authority
- SG
- Singapore
- Prior art keywords
- deposition method
- film deposition
- plasma thin
- plasma
- thin
- Prior art date
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG9902504A SG81281A1 (en) | 1999-05-19 | 1999-05-19 | Plasma thin-film deposition method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG9902504A SG81281A1 (en) | 1999-05-19 | 1999-05-19 | Plasma thin-film deposition method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG81281A1 true SG81281A1 (en) | 2001-06-19 |
Family
ID=20430365
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG9902504A SG81281A1 (en) | 1999-05-19 | 1999-05-19 | Plasma thin-film deposition method |
Country Status (1)
Country | Link |
---|---|
SG (1) | SG81281A1 (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0528540A2 (en) * | 1991-07-22 | 1993-02-24 | Dow Corning Corporation | Thin-film coatings made by means of plasma-activated chemical vapor deposition of fluorinated cyclic siloxanes |
EP0768388A2 (en) * | 1995-10-12 | 1997-04-16 | Nec Corporation | Method and apparatus for forming amorphous carbon film |
WO1999019533A1 (en) * | 1997-10-10 | 1999-04-22 | Applied Materials, Inc. | Method of depositing an amorphous fluorocarbon film using hdp-cvd |
-
1999
- 1999-05-19 SG SG9902504A patent/SG81281A1/en unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0528540A2 (en) * | 1991-07-22 | 1993-02-24 | Dow Corning Corporation | Thin-film coatings made by means of plasma-activated chemical vapor deposition of fluorinated cyclic siloxanes |
EP0768388A2 (en) * | 1995-10-12 | 1997-04-16 | Nec Corporation | Method and apparatus for forming amorphous carbon film |
WO1999019533A1 (en) * | 1997-10-10 | 1999-04-22 | Applied Materials, Inc. | Method of depositing an amorphous fluorocarbon film using hdp-cvd |
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