IL130051A0 - Plasma thin-film deposition method - Google Patents

Plasma thin-film deposition method

Info

Publication number
IL130051A0
IL130051A0 IL13005199A IL13005199A IL130051A0 IL 130051 A0 IL130051 A0 IL 130051A0 IL 13005199 A IL13005199 A IL 13005199A IL 13005199 A IL13005199 A IL 13005199A IL 130051 A0 IL130051 A0 IL 130051A0
Authority
IL
Israel
Prior art keywords
deposition method
film deposition
plasma thin
plasma
thin
Prior art date
Application number
IL13005199A
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to IL13005199A priority Critical patent/IL130051A0/en
Publication of IL130051A0 publication Critical patent/IL130051A0/en

Links

IL13005199A 1999-05-19 1999-05-19 Plasma thin-film deposition method IL130051A0 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
IL13005199A IL130051A0 (en) 1999-05-19 1999-05-19 Plasma thin-film deposition method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL13005199A IL130051A0 (en) 1999-05-19 1999-05-19 Plasma thin-film deposition method

Publications (1)

Publication Number Publication Date
IL130051A0 true IL130051A0 (en) 2000-02-29

Family

ID=11072828

Family Applications (1)

Application Number Title Priority Date Filing Date
IL13005199A IL130051A0 (en) 1999-05-19 1999-05-19 Plasma thin-film deposition method

Country Status (1)

Country Link
IL (1) IL130051A0 (en)

Similar Documents

Publication Publication Date Title
AU1660601A (en) Method and apparatus for ionized physical vapor deposition
SG93857A1 (en) Accelerated plasma clean
AUPR129900A0 (en) Plasma electroplating
EP1118880A4 (en) Method of organic film deposition
AU1042201A (en) Deposition monitoring system
AU1387401A (en) Coating process
EP1143496A4 (en) Plasma etching method
AU2597800A (en) Methods for coating metallic articles
AU3394400A (en) Chemical vapor deposition system and method
GB2400613B (en) Plasma deposition method
AU2002218592A1 (en) Method for multiple task searching
SG93272A1 (en) Improved coil for sputter deposition
GB2350374B (en) Deposition apparatus
AU2001279897A1 (en) Plasma coating method
SG97876A1 (en) Method for enhancing plasma processing performance
AU7123400A (en) Method for reducing costs associated with inebriation
EP1091396A3 (en) Plasma processing method
AU1196001A (en) Method and apparatus for etching and deposition using micro-plasmas
HUP0102016A3 (en) Method for copperplating substrates
IL130051A0 (en) Plasma thin-film deposition method
SG81992A1 (en) Plasma thin-film deposition method
SG81281A1 (en) Plasma thin-film deposition method
IL130115A0 (en) Plasma thin-film deposition method
GB9915851D0 (en) Coating method
GB0205398D0 (en) Vacuum deposition method