IT1251393B - Procedimento per la realizzazione di strutture metrologiche particolarmente per l'analisi dell'accuratezza di strumenti di misura di allineamento su substrati processati. - Google Patents
Procedimento per la realizzazione di strutture metrologiche particolarmente per l'analisi dell'accuratezza di strumenti di misura di allineamento su substrati processati.Info
- Publication number
- IT1251393B IT1251393B ITMI912345A ITMI912345A IT1251393B IT 1251393 B IT1251393 B IT 1251393B IT MI912345 A ITMI912345 A IT MI912345A IT MI912345 A ITMI912345 A IT MI912345A IT 1251393 B IT1251393 B IT 1251393B
- Authority
- IT
- Italy
- Prior art keywords
- analysis
- accuracy
- realization
- procedure
- measuring instruments
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- 238000005259 measurement Methods 0.000 abstract 3
- 238000009826 distribution Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
- H01L22/34—Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Automation & Control Theory (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Formation Of Insulating Films (AREA)
Abstract
Procedimento per la realizzazione di strutture metrologiche particolarmente per l'analisi dell'accuratezza di strumenti di misura di allineamento su substrati processati la peculiarità del quale consiste nel fatto di realizzare strutture metrologiche presentanti profili di misura realizzati su aree di substrato e su aree processate industrialmente su un singolo wafer. I profili di misura realizzano distribuzioni statistiche rilevabili con macchine di misura per l'analisi dell'accuratezza di misura delle macchine stesse.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITMI912345A IT1251393B (it) | 1991-09-04 | 1991-09-04 | Procedimento per la realizzazione di strutture metrologiche particolarmente per l'analisi dell'accuratezza di strumenti di misura di allineamento su substrati processati. |
DE69226234T DE69226234T2 (de) | 1991-09-04 | 1992-08-25 | Verfahren zur Herstellung metrologischen Strukturen besonders geeignet für die Bestimmung der Präzision in Vorrichtungen, die den Abstand auf bearbeiteten Substraten messen |
EP92114465A EP0539686B1 (en) | 1991-09-04 | 1992-08-25 | Process for producing metrological structures particularly useful for analyzing the accuracy of instruments for measuring alignment on processed substrates |
JP4233605A JPH05259152A (ja) | 1991-09-04 | 1992-09-01 | 加工された基板上の整列を測定するための機器の正確さを特に分析するための計測学的構造を製造するための方法 |
US07/938,826 US5246539A (en) | 1991-09-04 | 1992-09-01 | Process for producing metrological structures particularly useful for analyzing the accuracy of instruments for measuring alignment on processed substrates |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITMI912345A IT1251393B (it) | 1991-09-04 | 1991-09-04 | Procedimento per la realizzazione di strutture metrologiche particolarmente per l'analisi dell'accuratezza di strumenti di misura di allineamento su substrati processati. |
Publications (3)
Publication Number | Publication Date |
---|---|
ITMI912345A0 ITMI912345A0 (it) | 1991-09-04 |
ITMI912345A1 ITMI912345A1 (it) | 1993-03-04 |
IT1251393B true IT1251393B (it) | 1995-05-09 |
Family
ID=11360608
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ITMI912345A IT1251393B (it) | 1991-09-04 | 1991-09-04 | Procedimento per la realizzazione di strutture metrologiche particolarmente per l'analisi dell'accuratezza di strumenti di misura di allineamento su substrati processati. |
Country Status (5)
Country | Link |
---|---|
US (1) | US5246539A (it) |
EP (1) | EP0539686B1 (it) |
JP (1) | JPH05259152A (it) |
DE (1) | DE69226234T2 (it) |
IT (1) | IT1251393B (it) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1248534B (it) * | 1991-06-24 | 1995-01-19 | Sgs Thomson Microelectronics | Procedimento per la realizzazione di strutture di calibrazione particolarmente per la taratura di macchine di misura del disallineamento in circuiti integrati in genere. |
IT1252539B (it) * | 1991-12-18 | 1995-06-19 | St Microelectronics Srl | Procedimento per la realizzazione di strutture metrologiche particolarmente per la misura diretta di errori introdotti da sistemi di allineamento. |
US5952247A (en) * | 1994-11-23 | 1999-09-14 | Intel Corporation | Method of accessing the circuitry on a semiconductor substrate from the bottom of the semiconductor substrate |
EP0720216B1 (en) * | 1994-12-29 | 2001-10-17 | AT&T Corp. | Linewidth metrology of integrated circuit structures |
US5904486A (en) * | 1997-09-30 | 1999-05-18 | Intel Corporation | Method for performing a circuit edit through the back side of an integrated circuit die |
KR100234292B1 (ko) * | 1997-10-08 | 1999-12-15 | 윤종용 | 광디스크 제작용 마스터 디스크 제조방법 |
US6274393B1 (en) * | 1998-04-20 | 2001-08-14 | International Business Machines Corporation | Method for measuring submicron images |
US6069089A (en) * | 1998-12-18 | 2000-05-30 | Suh; Hong C. | Defective semiconductor redistribution labeling system |
US6218200B1 (en) * | 2000-07-14 | 2001-04-17 | Motorola, Inc. | Multi-layer registration control for photolithography processes |
US7301638B1 (en) * | 2004-01-31 | 2007-11-27 | Kla Tencor, Inc. | Dimensional calibration standards |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59224123A (ja) * | 1983-05-20 | 1984-12-17 | Oki Electric Ind Co Ltd | ウエハアライメントマ−ク |
JPH0669031B2 (ja) * | 1984-07-17 | 1994-08-31 | 日本電気株式会社 | 半導体装置 |
CA1330837C (en) * | 1988-04-13 | 1994-07-19 | Yoichi Fukushima | Method of producing masks for rom type optical recording cards and method of inspecting masks |
IT1227758B (it) * | 1988-12-30 | 1991-05-06 | Sgs Thomson Microelectronics | Struttura di marca di riferimento per guidare l'allineamento tra topografie semilavorate di circuiti integrati a semiconduttore e successive maschere |
JP2897248B2 (ja) * | 1989-04-18 | 1999-05-31 | 富士通株式会社 | 半導体装置の製造方法 |
US5017512A (en) * | 1989-07-27 | 1991-05-21 | Mitsubishi Denki Kabushiki Kaisha | Wafer having a dicing area having a step region covered with a conductive layer and method of manufacturing the same |
US4992394A (en) * | 1989-07-31 | 1991-02-12 | At&T Bell Laboratories | Self aligned registration marks for integrated circuit fabrication |
JPH03139821A (ja) * | 1989-10-25 | 1991-06-14 | Toshiba Corp | 微細パターンの形成方法 |
-
1991
- 1991-09-04 IT ITMI912345A patent/IT1251393B/it active IP Right Grant
-
1992
- 1992-08-25 DE DE69226234T patent/DE69226234T2/de not_active Expired - Fee Related
- 1992-08-25 EP EP92114465A patent/EP0539686B1/en not_active Expired - Lifetime
- 1992-09-01 JP JP4233605A patent/JPH05259152A/ja not_active Withdrawn
- 1992-09-01 US US07/938,826 patent/US5246539A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5246539A (en) | 1993-09-21 |
JPH05259152A (ja) | 1993-10-08 |
EP0539686A1 (en) | 1993-05-05 |
EP0539686B1 (en) | 1998-07-15 |
ITMI912345A0 (it) | 1991-09-04 |
DE69226234T2 (de) | 1999-04-01 |
DE69226234D1 (de) | 1998-08-20 |
ITMI912345A1 (it) | 1993-03-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IT1251393B (it) | Procedimento per la realizzazione di strutture metrologiche particolarmente per l'analisi dell'accuratezza di strumenti di misura di allineamento su substrati processati. | |
SE9402610D0 (sv) | Tool center point calibration apparatus and method | |
WO2002010721A3 (en) | Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography | |
GB1429089A (en) | Method of determining misalignment between two objects | |
ATE99046T1 (de) | Verfahren zur duennschichtdickenmessung. | |
JPS6413411A (en) | Vehicle body measuring method | |
FR2679701B1 (fr) | Structure et procede d'etalonnage direct de systemes de mesure d'alignement, bases sur la topographie reelle du procede de fabrication d'une plaquette a semi-conducteur. | |
IT7967627A0 (it) | Procedimento per la preparazione della piruvato ossidasi e corredo per il suo impiego a scopo di analisi | |
ES2102297B1 (es) | Procedimiento y aparato para la medida del escuadrado de extremos de barras. | |
ITMI913385A0 (it) | Procedimento per la realizzazione di strutture metrologiche particolarmente per la misura diretta di errori introdotti da sistemi di allineamento | |
JPS641293A (en) | Aligner | |
JPS6435306A (en) | Incidence angle determining method for refractive index and film thickness measurement | |
JPS6275209A (ja) | 板状物の寸法測定方法およびその装置 | |
AU621769B2 (en) | Totalizer apparatus for flow rate measurement devices | |
JPS6449907A (en) | Method and device for measuring flatness of sheet material | |
JPS5761907A (en) | Measuring method straightness of shape steel stock | |
JPS6454305A (en) | Method and device for pattern size measurement | |
IT8920828A0 (it) | Misuratore di pendenze a bolla per la misurazione diretta della pendenza di superfici piane. | |
ES2136573B1 (es) | Procedimiento para indicar una magnitud fisica medida. | |
KR200392471Y1 (ko) | 스틸하우스용 줄자 | |
JPS6410111A (en) | Thickness measuring instrument | |
SU619782A1 (ru) | Способ измерени толщины крупногабаритных неферромагнитных изделий | |
SU1310625A1 (ru) | Устройство дл разметки поверхностей изделий | |
KR910009872U (ko) | 브라운관의 페널표면 처리상태 측정장치 | |
JPS6475935A (en) | Quantitative measurement in surface analysis and standard specimen therefor |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
0001 | Granted | ||
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19970929 |