IT1174089B - Struttura di maschera per litografia a radiazione ultravioletta sottovuoto - Google Patents
Struttura di maschera per litografia a radiazione ultravioletta sottovuotoInfo
- Publication number
- IT1174089B IT1174089B IT20877/84A IT2087784A IT1174089B IT 1174089 B IT1174089 B IT 1174089B IT 20877/84 A IT20877/84 A IT 20877/84A IT 2087784 A IT2087784 A IT 2087784A IT 1174089 B IT1174089 B IT 1174089B
- Authority
- IT
- Italy
- Prior art keywords
- vacuum ultraviolet
- mask structure
- lithography mask
- ultraviolet lithography
- vacuum
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US49506483A | 1983-05-13 | 1983-05-13 |
Publications (3)
Publication Number | Publication Date |
---|---|
IT8420877A0 IT8420877A0 (it) | 1984-05-10 |
IT8420877A1 IT8420877A1 (it) | 1985-11-10 |
IT1174089B true IT1174089B (it) | 1987-07-01 |
Family
ID=23967113
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT20877/84A IT1174089B (it) | 1983-05-13 | 1984-05-10 | Struttura di maschera per litografia a radiazione ultravioletta sottovuoto |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS59214856A (it) |
DE (1) | DE3417888A1 (it) |
FR (1) | FR2545949B1 (it) |
GB (1) | GB2139781B (it) |
IT (1) | IT1174089B (it) |
NL (1) | NL8401525A (it) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2189903A (en) * | 1986-04-01 | 1987-11-04 | Plessey Co Plc | An etch technique for metal mask definition |
US4780175A (en) * | 1986-10-27 | 1988-10-25 | Sharp Kabushiki Kaisha | Method for the production of an optical phase-shifting board |
JPH02166447A (ja) * | 1988-12-20 | 1990-06-27 | Fujitsu Ltd | 露光用マスクおよびその製造方法 |
JPH11237503A (ja) * | 1997-12-03 | 1999-08-31 | Canon Inc | 回折光学素子及びそれを有する光学系 |
DE19808461A1 (de) | 1998-03-02 | 1999-09-09 | Zeiss Carl Fa | Retikel mit Kristall-Trägermaterial |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2658623C2 (de) * | 1976-12-23 | 1982-07-29 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | Aufzeichnungsträger und Verfahren zu seiner Herstellung |
-
1984
- 1984-05-09 FR FR8407120A patent/FR2545949B1/fr not_active Expired
- 1984-05-09 GB GB08411765A patent/GB2139781B/en not_active Expired
- 1984-05-10 IT IT20877/84A patent/IT1174089B/it active
- 1984-05-11 NL NL8401525A patent/NL8401525A/nl not_active Application Discontinuation
- 1984-05-11 JP JP59093094A patent/JPS59214856A/ja active Pending
- 1984-05-14 DE DE19843417888 patent/DE3417888A1/de not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
NL8401525A (nl) | 1984-12-03 |
JPS59214856A (ja) | 1984-12-04 |
FR2545949A1 (fr) | 1984-11-16 |
GB8411765D0 (en) | 1984-06-13 |
GB2139781A (en) | 1984-11-14 |
GB2139781B (en) | 1986-09-10 |
IT8420877A0 (it) | 1984-05-10 |
FR2545949B1 (fr) | 1986-10-10 |
DE3417888A1 (de) | 1984-11-15 |
IT8420877A1 (it) | 1985-11-10 |
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