FR2545949B1 - Structure de masque pour la lithographie par rayonnement ultraviolet - Google Patents

Structure de masque pour la lithographie par rayonnement ultraviolet

Info

Publication number
FR2545949B1
FR2545949B1 FR8407120A FR8407120A FR2545949B1 FR 2545949 B1 FR2545949 B1 FR 2545949B1 FR 8407120 A FR8407120 A FR 8407120A FR 8407120 A FR8407120 A FR 8407120A FR 2545949 B1 FR2545949 B1 FR 2545949B1
Authority
FR
France
Prior art keywords
ultraviolet radiation
mask structure
radiation lithography
lithography
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8407120A
Other languages
English (en)
Other versions
FR2545949A1 (fr
Inventor
Harold Gene Craighead
Richard Edwin Howard
Lawrence David Jackel
Jonathan Curtis White
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
American Telephone and Telegraph Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Telephone and Telegraph Co Inc filed Critical American Telephone and Telegraph Co Inc
Publication of FR2545949A1 publication Critical patent/FR2545949A1/fr
Application granted granted Critical
Publication of FR2545949B1 publication Critical patent/FR2545949B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
FR8407120A 1983-05-13 1984-05-09 Structure de masque pour la lithographie par rayonnement ultraviolet Expired FR2545949B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US49506483A 1983-05-13 1983-05-13

Publications (2)

Publication Number Publication Date
FR2545949A1 FR2545949A1 (fr) 1984-11-16
FR2545949B1 true FR2545949B1 (fr) 1986-10-10

Family

ID=23967113

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8407120A Expired FR2545949B1 (fr) 1983-05-13 1984-05-09 Structure de masque pour la lithographie par rayonnement ultraviolet

Country Status (6)

Country Link
JP (1) JPS59214856A (fr)
DE (1) DE3417888A1 (fr)
FR (1) FR2545949B1 (fr)
GB (1) GB2139781B (fr)
IT (1) IT1174089B (fr)
NL (1) NL8401525A (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2189903A (en) * 1986-04-01 1987-11-04 Plessey Co Plc An etch technique for metal mask definition
US4780175A (en) * 1986-10-27 1988-10-25 Sharp Kabushiki Kaisha Method for the production of an optical phase-shifting board
JPH02166447A (ja) * 1988-12-20 1990-06-27 Fujitsu Ltd 露光用マスクおよびその製造方法
JPH11237503A (ja) * 1997-12-03 1999-08-31 Canon Inc 回折光学素子及びそれを有する光学系
DE19808461A1 (de) * 1998-03-02 1999-09-09 Zeiss Carl Fa Retikel mit Kristall-Trägermaterial

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2658623C2 (de) * 1976-12-23 1982-07-29 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Aufzeichnungsträger und Verfahren zu seiner Herstellung

Also Published As

Publication number Publication date
IT8420877A1 (it) 1985-11-10
IT8420877A0 (it) 1984-05-10
FR2545949A1 (fr) 1984-11-16
JPS59214856A (ja) 1984-12-04
IT1174089B (it) 1987-07-01
DE3417888A1 (de) 1984-11-15
GB8411765D0 (en) 1984-06-13
NL8401525A (nl) 1984-12-03
GB2139781B (en) 1986-09-10
GB2139781A (en) 1984-11-14

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Legal Events

Date Code Title Description
ST Notification of lapse