IT1153650B - Procedimento di riduzione a bassa temperatura per fotomaschere - Google Patents

Procedimento di riduzione a bassa temperatura per fotomaschere

Info

Publication number
IT1153650B
IT1153650B IT24351/82A IT2435182A IT1153650B IT 1153650 B IT1153650 B IT 1153650B IT 24351/82 A IT24351/82 A IT 24351/82A IT 2435182 A IT2435182 A IT 2435182A IT 1153650 B IT1153650 B IT 1153650B
Authority
IT
Italy
Prior art keywords
photomasks
stain
low temperature
temperature reduction
reduction procedure
Prior art date
Application number
IT24351/82A
Other languages
English (en)
Other versions
IT8224351A0 (it
IT8224351A1 (it
Inventor
Fred Martin Ernsberger
Original Assignee
Ppg Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/323,333 external-priority patent/US4390592A/en
Priority claimed from US06/323,332 external-priority patent/US4407891A/en
Application filed by Ppg Industries Inc filed Critical Ppg Industries Inc
Publication of IT8224351A0 publication Critical patent/IT8224351A0/it
Publication of IT8224351A1 publication Critical patent/IT8224351A1/it
Application granted granted Critical
Publication of IT1153650B publication Critical patent/IT1153650B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
    • C03C21/005—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to introduce in the glass such metals or metallic ions as Ag, Cu
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/007—Other surface treatment of glass not in the form of fibres or filaments by thermal treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Surface Treatment Of Glass (AREA)
  • Glass Compositions (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
IT24351/82A 1981-11-20 1982-11-19 Procedimento di riduzione a bassa temperatura per fotomaschere IT1153650B (it)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/323,333 US4390592A (en) 1981-11-20 1981-11-20 Low temperature reduction process for photomasks
US06/323,332 US4407891A (en) 1981-11-20 1981-11-20 Low temperature reduction process for large photomasks

Publications (3)

Publication Number Publication Date
IT8224351A0 IT8224351A0 (it) 1982-11-19
IT8224351A1 IT8224351A1 (it) 1984-05-19
IT1153650B true IT1153650B (it) 1987-01-14

Family

ID=26983897

Family Applications (1)

Application Number Title Priority Date Filing Date
IT24351/82A IT1153650B (it) 1981-11-20 1982-11-19 Procedimento di riduzione a bassa temperatura per fotomaschere

Country Status (3)

Country Link
FR (1) FR2516911B1 (it)
GB (2) GB2109786B (it)
IT (1) IT1153650B (it)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004037882A1 (de) * 2003-12-19 2005-07-14 Boraglas Gmbh Glas mit geringer Eigenfloureszenz und hoher Strahlungsabsorption

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3508894A (en) * 1966-09-29 1970-04-28 Owens Illinois Inc Method for metailizing a glass surface
US3620795A (en) * 1968-04-29 1971-11-16 Signetics Corp Transparent mask and method for making the same
JPS5319208B2 (it) * 1972-11-27 1978-06-20
GB1429908A (en) * 1974-06-18 1976-03-31 Bokov J S Method of making coloured photomasks
GB1459722A (en) * 1975-02-28 1976-12-31 Bokov J S Method for making coloured photostencils
GB1548283A (en) * 1976-06-23 1979-07-11 Berezin G N Methods of preapring transparent artworks
DE3042553C2 (de) * 1979-11-19 1995-01-05 Corning Glass Works Silberhalogenid enthaltender photochromer Glaskörper

Also Published As

Publication number Publication date
GB2163274A (en) 1986-02-19
IT8224351A0 (it) 1982-11-19
FR2516911A1 (fr) 1983-05-27
IT8224351A1 (it) 1984-05-19
GB2109786A (en) 1983-06-08
GB8429335D0 (en) 1985-01-03
GB2109786B (en) 1986-12-17
GB2163274B (en) 1987-02-04
FR2516911B1 (fr) 1986-10-03

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