GB2163274B - Low temperature reduction process for photomasks - Google Patents

Low temperature reduction process for photomasks

Info

Publication number
GB2163274B
GB2163274B GB08429335A GB8429335A GB2163274B GB 2163274 B GB2163274 B GB 2163274B GB 08429335 A GB08429335 A GB 08429335A GB 8429335 A GB8429335 A GB 8429335A GB 2163274 B GB2163274 B GB 2163274B
Authority
GB
United Kingdom
Prior art keywords
photomasks
stain
low temperature
reduction process
temperature reduction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08429335A
Other versions
GB8429335D0 (en
GB2163274A (en
Inventor
Fred Martin Ernsberger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PPG Industries Inc
Original Assignee
PPG Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/323,333 external-priority patent/US4390592A/en
Priority claimed from US06/323,332 external-priority patent/US4407891A/en
Application filed by PPG Industries Inc filed Critical PPG Industries Inc
Publication of GB8429335D0 publication Critical patent/GB8429335D0/en
Publication of GB2163274A publication Critical patent/GB2163274A/en
Application granted granted Critical
Publication of GB2163274B publication Critical patent/GB2163274B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
    • C03C21/005—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to introduce in the glass such metals or metallic ions as Ag, Cu
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/007—Other surface treatment of glass not in the form of fibres or filaments by thermal treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging

Abstract

Glass photomasks having a high resolution stain pattern for use in photofabrication processes are made by migrating stain-producing ions into the surface of a glass substrate, and reducing and agglomerating the stain- producing ions in the presence of pure hydrogen under pressure at relatively low temperatures to produce a high resolution stain pattern. <IMAGE>
GB08429335A 1981-11-20 1984-11-21 Low temperature reduction process for photomasks Expired GB2163274B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/323,333 US4390592A (en) 1981-11-20 1981-11-20 Low temperature reduction process for photomasks
US06/323,332 US4407891A (en) 1981-11-20 1981-11-20 Low temperature reduction process for large photomasks

Publications (3)

Publication Number Publication Date
GB8429335D0 GB8429335D0 (en) 1985-01-03
GB2163274A GB2163274A (en) 1986-02-19
GB2163274B true GB2163274B (en) 1987-02-04

Family

ID=26983897

Family Applications (2)

Application Number Title Priority Date Filing Date
GB08233198A Expired GB2109786B (en) 1981-11-20 1982-11-22 Low temperature reduction process for photomasks
GB08429335A Expired GB2163274B (en) 1981-11-20 1984-11-21 Low temperature reduction process for photomasks

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB08233198A Expired GB2109786B (en) 1981-11-20 1982-11-22 Low temperature reduction process for photomasks

Country Status (3)

Country Link
FR (1) FR2516911B1 (en)
GB (2) GB2109786B (en)
IT (1) IT1153650B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004037882A1 (en) * 2003-12-19 2005-07-14 Boraglas Gmbh Glass substrate used as an object support for fluorescence measurements on DNA molecules comprises a glass layer containing metal nano-particles in one or more surface regions of the glass

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3508894A (en) * 1966-09-29 1970-04-28 Owens Illinois Inc Method for metailizing a glass surface
US3620795A (en) * 1968-04-29 1971-11-16 Signetics Corp Transparent mask and method for making the same
JPS5319208B2 (en) * 1972-11-27 1978-06-20
AU7016574A (en) * 1974-06-18 1975-12-18 Matvienko V Y Photomasks
GB1459722A (en) * 1975-02-28 1976-12-31 Bokov J S Method for making coloured photostencils
GB1548283A (en) * 1976-06-23 1979-07-11 Berezin G N Methods of preapring transparent artworks
DE3042553C2 (en) * 1979-11-19 1995-01-05 Corning Glass Works Photochromic glass body containing silver halide

Also Published As

Publication number Publication date
FR2516911A1 (en) 1983-05-27
IT1153650B (en) 1987-01-14
FR2516911B1 (en) 1986-10-03
IT8224351A0 (en) 1982-11-19
GB2109786B (en) 1986-12-17
IT8224351A1 (en) 1984-05-19
GB8429335D0 (en) 1985-01-03
GB2109786A (en) 1983-06-08
GB2163274A (en) 1986-02-19

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee