IT1138389B - Dispositivo epitassiale a numero di dislocazioni ridotto - Google Patents

Dispositivo epitassiale a numero di dislocazioni ridotto

Info

Publication number
IT1138389B
IT1138389B IT22301/81A IT2230181A IT1138389B IT 1138389 B IT1138389 B IT 1138389B IT 22301/81 A IT22301/81 A IT 22301/81A IT 2230181 A IT2230181 A IT 2230181A IT 1138389 B IT1138389 B IT 1138389B
Authority
IT
Italy
Prior art keywords
displacement
reduced number
epitaxial device
epitaxial
reduced
Prior art date
Application number
IT22301/81A
Other languages
English (en)
Italian (it)
Other versions
IT8122301A0 (it
Inventor
Mahajan Subhash
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of IT8122301A0 publication Critical patent/IT8122301A0/it
Application granted granted Critical
Publication of IT1138389B publication Critical patent/IT1138389B/it

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/20Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
    • H01L29/207Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds further characterised by the doping material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005Processes
    • H01L33/0062Processes for devices with an active region comprising only III-V compounds

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)
  • Recrystallisation Techniques (AREA)
  • Light Receiving Elements (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
IT22301/81A 1980-06-16 1981-06-12 Dispositivo epitassiale a numero di dislocazioni ridotto IT1138389B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US16002880A 1980-06-16 1980-06-16

Publications (2)

Publication Number Publication Date
IT8122301A0 IT8122301A0 (it) 1981-06-12
IT1138389B true IT1138389B (it) 1986-09-17

Family

ID=22575182

Family Applications (1)

Application Number Title Priority Date Filing Date
IT22301/81A IT1138389B (it) 1980-06-16 1981-06-12 Dispositivo epitassiale a numero di dislocazioni ridotto

Country Status (7)

Country Link
JP (1) JPS5727025A (de)
CA (1) CA1165851A (de)
DE (1) DE3123228A1 (de)
FR (1) FR2484706B1 (de)
GB (1) GB2080619B (de)
IT (1) IT1138389B (de)
NL (1) NL8102870A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5863183A (ja) * 1981-10-09 1983-04-14 Semiconductor Res Found 2−6族間化合物の結晶成長法
US4596626A (en) * 1983-02-10 1986-06-24 The United States Of America As Represented By The United States National Aeronautics And Space Administration Method of making macrocrystalline or single crystal semiconductor material
FR2555811B1 (fr) * 1983-11-30 1986-09-05 Radiotechnique Compelec Procede de realisation de diodes electroluminescentes a faible largeur spectrale, et diodes obtenues par ce procede
DE3421215A1 (de) * 1984-06-07 1985-12-12 Aeg-Telefunken Ag, 1000 Berlin Und 6000 Frankfurt Verfahren zur erzeugung von ingaasp und ingaas - doppelheterostrukturlasern und -led's mittels fluessigphasenepitaxie fuer einen wellenlaengenbereich von (lambda) = 1,2 (my)m bis 1,7 (my)m

Also Published As

Publication number Publication date
NL8102870A (nl) 1982-01-18
CA1165851A (en) 1984-04-17
DE3123228A1 (de) 1982-03-25
GB2080619A (en) 1982-02-03
IT8122301A0 (it) 1981-06-12
FR2484706A1 (fr) 1981-12-18
JPS5727025A (en) 1982-02-13
FR2484706B1 (fr) 1985-12-06
GB2080619B (en) 1984-09-12

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