IT1059016B - Metodo di fabbricazione di un dispositivo semiconduttore - Google Patents

Metodo di fabbricazione di un dispositivo semiconduttore

Info

Publication number
IT1059016B
IT1059016B IT22788/76A IT2278876A IT1059016B IT 1059016 B IT1059016 B IT 1059016B IT 22788/76 A IT22788/76 A IT 22788/76A IT 2278876 A IT2278876 A IT 2278876A IT 1059016 B IT1059016 B IT 1059016B
Authority
IT
Italy
Prior art keywords
manufacture
semiconductive device
semiconductive
Prior art date
Application number
IT22788/76A
Other languages
English (en)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Application granted granted Critical
Publication of IT1059016B publication Critical patent/IT1059016B/it

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604Chemical etching
    • H01L21/30612Etching of AIIIBV compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28575Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Weting (AREA)
  • Led Devices (AREA)
IT22788/76A 1975-05-01 1976-04-28 Metodo di fabbricazione di un dispositivo semiconduttore IT1059016B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7505134A NL7505134A (nl) 1975-05-01 1975-05-01 Werkwijze voor het vervaardigen van een half- geleiderinrichting.

Publications (1)

Publication Number Publication Date
IT1059016B true IT1059016B (it) 1982-05-31

Family

ID=19823678

Family Applications (1)

Application Number Title Priority Date Filing Date
IT22788/76A IT1059016B (it) 1975-05-01 1976-04-28 Metodo di fabbricazione di un dispositivo semiconduttore

Country Status (9)

Country Link
US (1) US4049488A (it)
JP (1) JPS51134576A (it)
CA (1) CA1059242A (it)
DE (1) DE2616907C2 (it)
FR (1) FR2309977A1 (it)
GB (1) GB1543737A (it)
IT (1) IT1059016B (it)
NL (1) NL7505134A (it)
SE (1) SE409259B (it)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4145478A (en) * 1977-07-28 1979-03-20 Desoto, Inc. Calcium oxide or hydroxide to improve the charge acceptance of electrographic dielectric resins
GB1602498A (en) * 1978-05-31 1981-11-11 Secr Defence Fet devices and their fabrication
GB1603260A (en) * 1978-05-31 1981-11-25 Secr Defence Devices and their fabrication
GB1601059A (en) * 1978-05-31 1981-10-21 Secr Defence Fet devices and their fabrication
JPS55146934A (en) * 1979-05-02 1980-11-15 Agency Of Ind Science & Technol Processing of surface shape of group 3-5 compound semiconductor
JPS55153338A (en) * 1979-05-18 1980-11-29 Fujitsu Ltd Surface treatment of semiconductor substrate
GB2145558A (en) * 1983-08-23 1985-03-27 Standard Telephones Cables Ltd Field effect transistor
DE3416991C1 (de) * 1984-05-09 1986-01-30 Philips Patentverwaltung Gmbh, 2000 Hamburg AEtzloesung und Verfahren zum AEtzen von ferrimagnetischen Granatverbindungen
GB2160823B (en) * 1984-06-28 1987-05-28 Stc Plc Semiconductor devices and their fabrication
US4923564A (en) * 1989-08-24 1990-05-08 American Telephone And Telegraph Company Selective etching process
FR2667724B1 (fr) * 1990-10-09 1992-11-27 Thomson Csf Procede de realisation des metallisations d'electrodes d'un transistor.
US5110765A (en) * 1990-11-30 1992-05-05 At&T Bell Laboratories Selective etch for GaAs-containing group III-V compounds

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3772100A (en) * 1971-06-30 1973-11-13 Denki Onkyo Co Ltd Method for forming strips on semiconductor device
US3833435A (en) * 1972-09-25 1974-09-03 Bell Telephone Labor Inc Dielectric optical waveguides and technique for fabricating same
US3801391A (en) * 1972-09-25 1974-04-02 Bell Telephone Labor Inc Method for selectively etching alxga1-xas multiplier structures
US3954534A (en) * 1974-10-29 1976-05-04 Xerox Corporation Method of forming light emitting diode array with dome geometry

Also Published As

Publication number Publication date
DE2616907A1 (de) 1976-11-11
GB1543737A (en) 1979-04-04
JPS51134576A (en) 1976-11-22
US4049488A (en) 1977-09-20
SE409259B (sv) 1979-08-06
FR2309977B1 (it) 1982-08-20
NL7505134A (nl) 1976-11-03
SE7604891L (sv) 1976-11-02
DE2616907C2 (de) 1983-04-14
CA1059242A (en) 1979-07-24
JPS5642134B2 (it) 1981-10-02
FR2309977A1 (fr) 1976-11-26

Similar Documents

Publication Publication Date Title
IT1058674B (it) Metodo di fabbricazione di un dispositivo semiconduttore
IT1010871B (it) Metodo di fabbricazione di un dispositivo semiconduttore
IT1051171B (it) Dispositivo semiconduttore
SE407719B (sv) Metod for framstellning av en halvledaranordning
IT1070048B (it) Metodo di fabbriacazione di un dispositivo semiconduttore e dispositivo fabbricato con detto metodo
IT1063691B (it) Dispositivo semiconduttore
IT1037558B (it) Metodo di fabbricazione di un dispositivo smemiconduttore
SE429038B (sv) Anordning for stegvis tillverkning av somlosa burkar
IT1042598B (it) Metodo di fabbricazione di un dispositivo presentante un disegno di conduttori
JPS5239377A (en) Method of manufacturing semiconductor device
IT1059016B (it) Metodo di fabbricazione di un dispositivo semiconduttore
SE7604362L (sv) Metanordning for en massas viskositet
IT1067002B (it) Metodo di preparazione di un complesso magnesio-organico
PL193761A1 (pl) Sposob wytwarzania czteropierscieniowych chinonow
TR19184A (tr) Usul
PL193861A1 (pl) Sposob wytwarzania alfa-aminoketonow
PL192020A1 (pl) Sposob wytwarzania n-tetrahydrofurfurylo-noroksymorfonow
IT1067265B (it) Metodo di formazione di un dispositivo semiconduttore
BG26535A3 (bg) Метод за получаване на индолхинолизини
SE424281B (sv) Skeranordning
PL191156A1 (pl) Sposob wytwarzania nowych epoksyandrostanow
IT1082080B (it) Metodo di fabbricazione di un dispositivo semiconduttore
IT1063008B (it) Dispositivo semiconduttore
IT1050775B (it) Dispositivo semiconduttore
IT1051170B (it) Dispositivo semiconduttore

Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19940429