IT1031868B - Procedimento di diffusione profonda di impeurita in un substrato - Google Patents
Procedimento di diffusione profonda di impeurita in un substratoInfo
- Publication number
- IT1031868B IT1031868B IT2043175A IT2043175A IT1031868B IT 1031868 B IT1031868 B IT 1031868B IT 2043175 A IT2043175 A IT 2043175A IT 2043175 A IT2043175 A IT 2043175A IT 1031868 B IT1031868 B IT 1031868B
- Authority
- IT
- Italy
- Prior art keywords
- impeurita
- procedure
- substrate
- deep diffusion
- diffusion
- Prior art date
Links
- 238000009792 diffusion process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7405790A FR2270677B1 (nl) | 1974-02-20 | 1974-02-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
IT1031868B true IT1031868B (it) | 1979-05-10 |
Family
ID=9135195
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT2043175A IT1031868B (it) | 1974-02-20 | 1975-02-19 | Procedimento di diffusione profonda di impeurita in un substrato |
Country Status (5)
Country | Link |
---|---|
BE (1) | BE825484A (nl) |
DE (1) | DE2507344A1 (nl) |
FR (1) | FR2270677B1 (nl) |
GB (1) | GB1490798A (nl) |
IT (1) | IT1031868B (nl) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4050967A (en) * | 1976-12-09 | 1977-09-27 | Rca Corporation | Method of selective aluminum diffusion |
DE2846671C2 (de) * | 1977-10-26 | 1982-09-09 | Tokyo Shibaura Denki K.K., Kawasaki, Kanagawa | Verfahren zur Herstellung einer Halbleitervorrichtung |
-
1974
- 1974-02-20 FR FR7405790A patent/FR2270677B1/fr not_active Expired
-
1975
- 1975-02-13 BE BE153318A patent/BE825484A/xx unknown
- 1975-02-19 IT IT2043175A patent/IT1031868B/it active
- 1975-02-19 GB GB695875A patent/GB1490798A/en not_active Expired
- 1975-02-20 DE DE19752507344 patent/DE2507344A1/de active Pending
Also Published As
Publication number | Publication date |
---|---|
GB1490798A (en) | 1977-11-02 |
DE2507344A1 (de) | 1975-08-21 |
FR2270677A1 (nl) | 1975-12-05 |
FR2270677B1 (nl) | 1978-12-01 |
BE825484A (fr) | 1975-08-13 |
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