BE825484A - Procede de diffusion profonde d'impuretes dans un substrat - Google Patents

Procede de diffusion profonde d'impuretes dans un substrat

Info

Publication number
BE825484A
BE825484A BE153318A BE153318A BE825484A BE 825484 A BE825484 A BE 825484A BE 153318 A BE153318 A BE 153318A BE 153318 A BE153318 A BE 153318A BE 825484 A BE825484 A BE 825484A
Authority
BE
Belgium
Prior art keywords
impurities
substrate
diffusion process
deep diffusion
deep
Prior art date
Application number
BE153318A
Other languages
English (en)
French (fr)
Inventor
G Dumas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE825484A publication Critical patent/BE825484A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Formation Of Insulating Films (AREA)
BE153318A 1974-02-20 1975-02-13 Procede de diffusion profonde d'impuretes dans un substrat BE825484A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7405790A FR2270677B1 (xx) 1974-02-20 1974-02-20

Publications (1)

Publication Number Publication Date
BE825484A true BE825484A (fr) 1975-08-13

Family

ID=9135195

Family Applications (1)

Application Number Title Priority Date Filing Date
BE153318A BE825484A (fr) 1974-02-20 1975-02-13 Procede de diffusion profonde d'impuretes dans un substrat

Country Status (5)

Country Link
BE (1) BE825484A (xx)
DE (1) DE2507344A1 (xx)
FR (1) FR2270677B1 (xx)
GB (1) GB1490798A (xx)
IT (1) IT1031868B (xx)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4050967A (en) * 1976-12-09 1977-09-27 Rca Corporation Method of selective aluminum diffusion
DE2857837C2 (de) * 1977-10-26 1983-07-14 Tokyo Shibaura Denki K.K., Kawasaki, Kanagawa Verfahren zur Herstellung einer Halbleitervorrichtung

Also Published As

Publication number Publication date
FR2270677B1 (xx) 1978-12-01
DE2507344A1 (de) 1975-08-21
FR2270677A1 (xx) 1975-12-05
GB1490798A (en) 1977-11-02
IT1031868B (it) 1979-05-10

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