IT1031868B - PROCEDURE OF DEEP DIFFUSION OF IMPEURITA IN A SUBSTRATE - Google Patents

PROCEDURE OF DEEP DIFFUSION OF IMPEURITA IN A SUBSTRATE

Info

Publication number
IT1031868B
IT1031868B IT2043175A IT2043175A IT1031868B IT 1031868 B IT1031868 B IT 1031868B IT 2043175 A IT2043175 A IT 2043175A IT 2043175 A IT2043175 A IT 2043175A IT 1031868 B IT1031868 B IT 1031868B
Authority
IT
Italy
Prior art keywords
impeurita
procedure
substrate
deep diffusion
diffusion
Prior art date
Application number
IT2043175A
Other languages
Italian (it)
Original Assignee
Silec Semi Conducteurs
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Silec Semi Conducteurs filed Critical Silec Semi Conducteurs
Application granted granted Critical
Publication of IT1031868B publication Critical patent/IT1031868B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Formation Of Insulating Films (AREA)
IT2043175A 1974-02-20 1975-02-19 PROCEDURE OF DEEP DIFFUSION OF IMPEURITA IN A SUBSTRATE IT1031868B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7405790A FR2270677B1 (en) 1974-02-20 1974-02-20

Publications (1)

Publication Number Publication Date
IT1031868B true IT1031868B (en) 1979-05-10

Family

ID=9135195

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2043175A IT1031868B (en) 1974-02-20 1975-02-19 PROCEDURE OF DEEP DIFFUSION OF IMPEURITA IN A SUBSTRATE

Country Status (5)

Country Link
BE (1) BE825484A (en)
DE (1) DE2507344A1 (en)
FR (1) FR2270677B1 (en)
GB (1) GB1490798A (en)
IT (1) IT1031868B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4050967A (en) * 1976-12-09 1977-09-27 Rca Corporation Method of selective aluminum diffusion
GB2009497B (en) * 1977-10-26 1982-06-30 Tokyo Shibaura Electric Co Method for manufacturing a semiconductor device

Also Published As

Publication number Publication date
BE825484A (en) 1975-08-13
FR2270677B1 (en) 1978-12-01
FR2270677A1 (en) 1975-12-05
GB1490798A (en) 1977-11-02
DE2507344A1 (en) 1975-08-21

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