IN2014MN02229A - - Google Patents

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Publication number
IN2014MN02229A
IN2014MN02229A IN2229MUN2014A IN2014MN02229A IN 2014MN02229 A IN2014MN02229 A IN 2014MN02229A IN 2229MUN2014 A IN2229MUN2014 A IN 2229MUN2014A IN 2014MN02229 A IN2014MN02229 A IN 2014MN02229A
Authority
IN
India
Prior art keywords
plasma
discharge chamber
cathode discharge
confinement device
electron extraction
Prior art date
Application number
Other languages
English (en)
Inventor
Mattias Svensson
Ulric Ljungblad
Original Assignee
Arcam Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arcam Ab filed Critical Arcam Ab
Publication of IN2014MN02229A publication Critical patent/IN2014MN02229A/en

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/141—Processes of additive manufacturing using only solid materials
    • B29C64/153—Processes of additive manufacturing using only solid materials using layers of powder being selectively joined, e.g. by selective laser sintering or melting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/52—Arrangements for controlling intensity of ray or beam, e.g. for modulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/077—Electron guns using discharge in gases or vapours as electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/043—Beam blanking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3128—Melting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31732—Depositing thin layers on selected microareas

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Powder Metallurgy (AREA)
IN2229MUN2014 2012-05-09 2013-04-25 IN2014MN02229A (cs)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261644513P 2012-05-09 2012-05-09
US13/828,112 US9064671B2 (en) 2012-05-09 2013-03-14 Method and apparatus for generating electron beams
PCT/EP2013/058652 WO2013167391A2 (en) 2012-05-09 2013-04-25 Method and apparatus for generating electron beams

Publications (1)

Publication Number Publication Date
IN2014MN02229A true IN2014MN02229A (cs) 2015-07-24

Family

ID=49548107

Family Applications (1)

Application Number Title Priority Date Filing Date
IN2229MUN2014 IN2014MN02229A (cs) 2012-05-09 2013-04-25

Country Status (9)

Country Link
US (1) US9064671B2 (cs)
EP (1) EP2847782B1 (cs)
JP (1) JP2015525428A (cs)
KR (2) KR102046560B1 (cs)
CN (1) CN104272425B (cs)
BR (1) BR112014027632A2 (cs)
IN (1) IN2014MN02229A (cs)
RU (1) RU2637509C2 (cs)
WO (1) WO2013167391A2 (cs)

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Also Published As

Publication number Publication date
EP2847782B1 (en) 2016-03-16
US20130300286A1 (en) 2013-11-14
JP2015525428A (ja) 2015-09-03
RU2014141566A (ru) 2016-06-27
KR102137351B1 (ko) 2020-07-23
KR20150010946A (ko) 2015-01-29
WO2013167391A2 (en) 2013-11-14
BR112014027632A2 (pt) 2018-04-17
WO2013167391A3 (en) 2014-01-03
KR20190130062A (ko) 2019-11-20
KR102046560B1 (ko) 2019-11-19
RU2637509C2 (ru) 2017-12-05
CN104272425B (zh) 2016-10-26
CN104272425A (zh) 2015-01-07
EP2847782A2 (en) 2015-03-18
US9064671B2 (en) 2015-06-23

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