IN2014KN02865A - - Google Patents

Info

Publication number
IN2014KN02865A
IN2014KN02865A IN2865KON2014A IN2014KN02865A IN 2014KN02865 A IN2014KN02865 A IN 2014KN02865A IN 2865KON2014 A IN2865KON2014 A IN 2865KON2014A IN 2014KN02865 A IN2014KN02865 A IN 2014KN02865A
Authority
IN
India
Prior art keywords
layer
region
absorber
halogen
adjoining
Prior art date
Application number
Other languages
English (en)
Inventor
Jörg Palm
Stephan Pohlner
Thomas Happ
Thomas Dalibor
Stefan Jost
Roland Dietmüller
Original Assignee
Bengbu Design & Res Inst For Glass Industry
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bengbu Design & Res Inst For Glass Industry filed Critical Bengbu Design & Res Inst For Glass Industry
Publication of IN2014KN02865A publication Critical patent/IN2014KN02865A/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/12—Active materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/12—Active materials
    • H10F77/126—Active materials comprising only Group I-III-VI chalcopyrite materials, e.g. CuInSe2, CuGaSe2 or CuInGaSe2 [CIGS]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/12—Active materials
    • H10F77/127—Active materials comprising only Group IV-VI or only Group II-IV-VI chalcogenide materials, e.g. PbSnTe
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/12—Active materials
    • H10F77/128—Active materials comprising only Group I-II-IV-VI kesterite materials, e.g. Cu2ZnSnSe4 or Cu2ZnSnS4
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/169—Thin semiconductor films on metallic or insulating substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/169—Thin semiconductor films on metallic or insulating substrates
    • H10F77/1694—Thin semiconductor films on metallic or insulating substrates the films including Group I-III-VI materials, e.g. CIS or CIGS
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/541—CuInSe2 material PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Photovoltaic Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
IN2865KON2014 2012-06-20 2013-06-19 IN2014KN02865A (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP12172697 2012-06-20
PCT/EP2013/062715 WO2013189971A1 (de) 2012-06-20 2013-06-19 Schichtsystem für dünnschichtsolarzellen

Publications (1)

Publication Number Publication Date
IN2014KN02865A true IN2014KN02865A (de) 2015-05-08

Family

ID=48692471

Family Applications (1)

Application Number Title Priority Date Filing Date
IN2865KON2014 IN2014KN02865A (de) 2012-06-20 2013-06-19

Country Status (8)

Country Link
US (1) US20150325722A1 (de)
EP (1) EP2865012B1 (de)
JP (1) JP6092377B2 (de)
KR (1) KR101698659B1 (de)
CN (1) CN104521006B (de)
ES (1) ES2939962T3 (de)
IN (1) IN2014KN02865A (de)
WO (1) WO2013189971A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160359070A1 (en) * 2015-06-02 2016-12-08 International Business Machines Corporation Controllable indium doping for high efficiency czts thin-film solar cells
JP7462690B2 (ja) * 2022-01-28 2024-04-05 キヤノントッキ株式会社 成膜装置及び成膜方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4442824C1 (de) 1994-12-01 1996-01-25 Siemens Ag Solarzelle mit Chalkopyrit-Absorberschicht
JPH1126790A (ja) * 1997-07-04 1999-01-29 Yazaki Corp 半導体薄膜及びその製造方法並びに薄膜太陽電池
DE19956735B4 (de) 1999-11-25 2008-08-21 Shell Erneuerbare Energien Gmbh Dünnfilmsolarzelle mit einer Chalkopyritverbindung und einer Titan und Sauerstoff enthaltenden Verbindung
FR2820241B1 (fr) 2001-01-31 2003-09-19 Saint Gobain Substrat transparent muni d'une electrode
JP4055053B2 (ja) * 2002-03-26 2008-03-05 本田技研工業株式会社 化合物薄膜太陽電池およびその製造方法
JP2005019839A (ja) * 2003-06-27 2005-01-20 Shinko Electric Ind Co Ltd 化合物太陽電池用のcbd浴及び化合物太陽電池の製造方法
SE0400582D0 (sv) * 2004-03-05 2004-03-05 Forskarpatent I Uppsala Ab Method for in-line process control of the CIGS process
JP2007201304A (ja) * 2006-01-30 2007-08-09 Honda Motor Co Ltd 太陽電池およびその製造方法
DE102008017076B3 (de) * 2008-04-01 2009-09-03 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Chemisches Dampfabscheide-Verfahren unter Atmosphärendruck zur Herstellung einer n-halbleitenden Metallsulfid-Dünnschicht
DE102008024230A1 (de) 2008-05-19 2009-11-26 Avancis Gmbh & Co. Kg Schichtsystem für Solarzellen
CN102782853A (zh) * 2010-03-05 2012-11-14 第一太阳能有限公司 具有分级缓冲层的光伏器件
WO2012012700A1 (en) * 2010-07-23 2012-01-26 First Solar, Inc. Buffer layer formation
CN102437237A (zh) * 2011-11-29 2012-05-02 福建钧石能源有限公司 黄铜矿型薄膜太阳能电池及其制造方法

Also Published As

Publication number Publication date
EP2865012A1 (de) 2015-04-29
CN104521006B (zh) 2017-05-03
JP2015523728A (ja) 2015-08-13
ES2939962T3 (es) 2023-04-28
US20150325722A1 (en) 2015-11-12
JP6092377B2 (ja) 2017-03-08
KR101698659B1 (ko) 2017-01-20
KR20150013327A (ko) 2015-02-04
CN104521006A (zh) 2015-04-15
WO2013189971A1 (de) 2013-12-27
EP2865012B1 (de) 2023-01-18

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