IN2012DE00855A - - Google Patents

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Publication number
IN2012DE00855A
IN2012DE00855A IN855DE2012A IN2012DE00855A IN 2012DE00855 A IN2012DE00855 A IN 2012DE00855A IN 855DE2012 A IN855DE2012 A IN 855DE2012A IN 2012DE00855 A IN2012DE00855 A IN 2012DE00855A
Authority
IN
India
Application number
Other languages
English (en)
Inventor
R Katti Romney
Original Assignee
Honeywell Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell Int Inc filed Critical Honeywell Int Inc
Publication of IN2012DE00855A publication Critical patent/IN2012DE00855A/en

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Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/30Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
    • H01F41/302Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/3218Exchange coupling of magnetic films via an antiferromagnetic interface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3286Spin-exchange coupled multilayers having at least one layer with perpendicular magnetic anisotropy
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/329Spin-exchange coupled multilayers wherein the magnetisation of the free layer is switched by a spin-polarised current, e.g. spin torque effect
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3254Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
    • H01F10/3272Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn by use of anti-parallel coupled [APC] ferromagnetic layers, e.g. artificial ferrimagnets [AFI], artificial [AAF] or synthetic [SAF] anti-ferromagnets
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/10Magnetoresistive devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Hall/Mr Elements (AREA)
IN855DE2012 2011-03-23 2012-03-23 IN2012DE00855A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/070,249 US8525602B2 (en) 2011-03-23 2011-03-23 Magnetic device with weakly exchange coupled antiferromagnetic layer

Publications (1)

Publication Number Publication Date
IN2012DE00855A true IN2012DE00855A (enrdf_load_stackoverflow) 2015-08-28

Family

ID=45999580

Family Applications (1)

Application Number Title Priority Date Filing Date
IN855DE2012 IN2012DE00855A (enrdf_load_stackoverflow) 2011-03-23 2012-03-23

Country Status (6)

Country Link
US (1) US8525602B2 (enrdf_load_stackoverflow)
EP (1) EP2503564A1 (enrdf_load_stackoverflow)
JP (1) JP2012204837A (enrdf_load_stackoverflow)
KR (1) KR20120108944A (enrdf_load_stackoverflow)
CN (1) CN102709465A (enrdf_load_stackoverflow)
IN (1) IN2012DE00855A (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5542761B2 (ja) * 2011-09-20 2014-07-09 株式会社東芝 磁気抵抗効果素子およびその製造方法
US8737023B2 (en) * 2012-10-15 2014-05-27 Seagate Technology Llc Magnetic reader with tuned anisotropy
US9047894B2 (en) 2013-10-03 2015-06-02 HGST Netherlands B.V. Magnetic write head having spin torque oscillator that is self aligned with write pole
JP6173979B2 (ja) * 2014-06-30 2017-08-02 株式会社東芝 磁気ディスク装置
US9196271B1 (en) * 2014-10-21 2015-11-24 Kabushiki Kaisha Toshiba Spin-torque oscillation element and microwave-assisted magnetic recording head using the same
CN106252503B (zh) * 2015-06-15 2019-03-19 中国科学院物理研究所 基于反铁磁材料的超高频自旋微波振荡器
US9966901B2 (en) * 2015-11-19 2018-05-08 Samsung Electronics Co., Ltd. Spin-torque oscillator based on easy-cone anisotropy
WO2017213261A1 (ja) * 2016-06-10 2017-12-14 Tdk株式会社 交換バイアス利用型磁化反転素子、交換バイアス利用型磁気抵抗効果素子、交換バイアス利用型磁気メモリ、不揮発性ロジック回路および磁気ニューロン素子
EP3961632A1 (en) * 2020-08-25 2022-03-02 Commissariat à l'Energie Atomique et aux Energies Alternatives Magnetic tunnel junction comprising an inhomogeneous granular free layer and associated spintronic devices

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US6542341B1 (en) * 1999-11-18 2003-04-01 International Business Machines Corporation Magnetic sensors having an antiferromagnetic layer exchange-coupled to a free layer
JP3657875B2 (ja) * 2000-11-27 2005-06-08 Tdk株式会社 トンネル磁気抵抗効果素子
JP3916908B2 (ja) 2001-09-28 2007-05-23 株式会社東芝 磁気抵抗効果素子、磁気メモリ及び磁気ヘッド
US6765770B2 (en) * 2001-10-11 2004-07-20 Storage Technology Corporation Apparatus and method of making a stabilized MR/GMR spin valve read element using longitudinal ferromagnetic exchange interactions
US7035062B1 (en) 2001-11-29 2006-04-25 Seagate Technology Llc Structure to achieve sensitivity and linear density in tunneling GMR heads using orthogonal magnetic alignments
JP3974587B2 (ja) 2003-04-18 2007-09-12 アルプス電気株式会社 Cpp型巨大磁気抵抗効果ヘッド
US7053430B2 (en) * 2003-11-12 2006-05-30 Honeywell International Inc. Antiferromagnetic stabilized storage layers in GMRAM storage devices
EP1548702A1 (en) 2003-12-24 2005-06-29 Interuniversitair Microelektronica Centrum Vzw Method for ultra-fast controlling of a magnetic cell and related devices
US7105372B2 (en) 2004-01-20 2006-09-12 Headway Technologies, Inc. Magnetic tunneling junction film structure with process determined in-plane magnetic anisotropy
US7110287B2 (en) * 2004-02-13 2006-09-19 Grandis, Inc. Method and system for providing heat assisted switching of a magnetic element utilizing spin transfer
US7230844B2 (en) 2004-10-12 2007-06-12 Nve Corporation Thermomagnetically assisted spin-momentum-transfer switching memory
US7556870B2 (en) 2005-08-15 2009-07-07 Hitachi Global Storage Technologies Netherlands B.V. Antiferromagnetically coupled media for magnetic recording with weak coupling layer
JP2007080904A (ja) * 2005-09-12 2007-03-29 Tdk Corp 磁気抵抗効果素子及びその製造方法
US7859034B2 (en) 2005-09-20 2010-12-28 Grandis Inc. Magnetic devices having oxide antiferromagnetic layer next to free ferromagnetic layer
JP4886268B2 (ja) 2005-10-28 2012-02-29 株式会社東芝 高周波発振素子、ならびにそれを用いた車載レーダー装置、車間通信装置および情報端末間通信装置
FR2892871B1 (fr) * 2005-11-02 2007-11-23 Commissariat Energie Atomique Oscillateur radio frequence a courant elelctrique polarise en spin
KR100706806B1 (ko) 2006-01-27 2007-04-12 삼성전자주식회사 자기 메모리 소자 및 그 제조 방법
EP1852874B1 (en) 2006-05-04 2010-04-28 Hitachi Ltd. Magnetic memory device
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US7616412B2 (en) 2006-07-21 2009-11-10 Carnegie Melon University Perpendicular spin-torque-driven magnetic oscillator
JP2008042103A (ja) 2006-08-10 2008-02-21 Tdk Corp 交換結合膜、磁気抵抗効果素子、薄膜磁気ヘッド、ヘッドジンバルアセンブリ、ヘッドアームアセンブリおよび磁気ディスク装置
JP2009080904A (ja) * 2007-09-26 2009-04-16 Toshiba Corp 磁気記録装置
US7855435B2 (en) * 2008-03-12 2010-12-21 Qimonda Ag Integrated circuit, method of manufacturing an integrated circuit, and memory module
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US8432644B2 (en) 2009-06-25 2013-04-30 HGST Netherlands B.V. Spin torque oscillator sensor enhanced by magnetic anisotropy
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Also Published As

Publication number Publication date
CN102709465A (zh) 2012-10-03
US20120242416A1 (en) 2012-09-27
US8525602B2 (en) 2013-09-03
KR20120108944A (ko) 2012-10-05
JP2012204837A (ja) 2012-10-22
EP2503564A1 (en) 2012-09-26

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