IN165165B - - Google Patents
Info
- Publication number
- IN165165B IN165165B IN709/DEL/85A IN709DE1985A IN165165B IN 165165 B IN165165 B IN 165165B IN 709DE1985 A IN709DE1985 A IN 709DE1985A IN 165165 B IN165165 B IN 165165B
- Authority
- IN
- India
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
- G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Printing Plates And Materials Therefor (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Materials For Medical Uses (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB848405549A GB8405549D0 (en) | 1984-03-02 | 1984-03-02 | Screen printing compositions |
PCT/GB1985/000086 WO1985004028A1 (en) | 1984-03-02 | 1985-03-01 | Screen printing compositions |
Publications (1)
Publication Number | Publication Date |
---|---|
IN165165B true IN165165B (pt) | 1989-08-19 |
Family
ID=10557493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IN709/DEL/85A IN165165B (pt) | 1984-03-02 | 1985-08-29 |
Country Status (11)
Country | Link |
---|---|
US (1) | US4960671A (pt) |
EP (2) | EP0173708B1 (pt) |
JP (1) | JPS61501596A (pt) |
AU (1) | AU569379B2 (pt) |
BR (1) | BR8505535A (pt) |
DE (1) | DE3563658D1 (pt) |
DK (1) | DK503685A (pt) |
GB (2) | GB8405549D0 (pt) |
IN (1) | IN165165B (pt) |
NO (1) | NO854370L (pt) |
WO (1) | WO1985004028A1 (pt) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5264318A (en) * | 1987-06-15 | 1993-11-23 | Sanyo-Kokusaku Pulp Co., Ltd. | Positive type photosensitive composition developable with water comprising a photocrosslinking agent, a water-soluble resin and an aqueous synthetic resin |
JPH0693118B2 (ja) * | 1987-06-15 | 1994-11-16 | 日本製紙株式会社 | 感光性シート |
US5879792A (en) * | 1994-02-28 | 1999-03-09 | Riso Kagaku Corporation | Stencil printing sheet and process for stencil making the same |
JPH07237367A (ja) * | 1994-02-28 | 1995-09-12 | Riso Kagaku Corp | 孔版印刷用原紙および製版方法 |
US20040213974A1 (en) * | 2001-11-16 | 2004-10-28 | Thomas Hicks | Textured window film |
KR20020077948A (ko) | 2001-04-03 | 2002-10-18 | 삼성에스디아이 주식회사 | 칼라음극선관용 포토레지스트 제조용 단량체,칼라음극선관용 포토레지스트 중합체, 칼라음극선관용포토레지스트 조성물 및 칼라음극선관용 형광막 조성물 |
US20040237814A1 (en) * | 2003-05-29 | 2004-12-02 | Benjamin Caplan | Printing stencil and method for preparation thereof |
US10334840B2 (en) | 2004-05-13 | 2019-07-02 | Artscape Inc. | Bird anti-collision window film |
US7468203B2 (en) * | 2004-05-13 | 2008-12-23 | Artscape, Inc. | Textured window film |
EP1783552B1 (de) | 2005-11-03 | 2015-10-07 | Kissel & Wolf GmbH | Photopolymerisierbare Zusammensetzung zur Herstellung von Druckformen |
EP2185976B1 (en) * | 2007-09-07 | 2013-04-24 | Kiian S.p.A. Socio Unico | Photosensitive compositions containing polyvinyl alcohol and their use in printing processes |
WO2014049882A1 (ja) * | 2012-09-25 | 2014-04-03 | 株式会社サンタイプ | スクリーン印刷用感光性樹脂組成物、感光性フイルム及びスクリーン版 |
US9278577B2 (en) | 2013-11-15 | 2016-03-08 | Artscape, Inc. | Decorative coverings |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3100150A (en) * | 1960-11-02 | 1963-08-06 | Owens Illinois Glass Co | Stencil screen coating comprising polyvinyl alcohol, polyvinyl acetate, and a light sensitizing agent |
DE1985474U (de) * | 1968-02-06 | 1968-05-16 | Albert Rose Zweigniederlassung | Druckschablone. |
US4021243A (en) * | 1970-08-20 | 1977-05-03 | Hoechst Aktiengesellschaft | Diazo light-sensitive copying composition and process of using in the manufacture of screen printing stencils |
DE2057473C2 (de) * | 1970-11-23 | 1982-04-08 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Gemisch |
US3853561A (en) * | 1970-11-26 | 1974-12-10 | Hoechst Ag | Process for the preparation of screen printing stencils using intermediate support for light sensitive layer |
DE2058178C2 (de) * | 1970-11-26 | 1982-04-01 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung von Siebdruckformen |
DE2332799A1 (de) * | 1973-06-28 | 1975-01-16 | Kalle Ag | Lichtempfindliches kopiermaterial und verfahren zur herstellung von siebdruckschablonen |
JPS51114122A (en) * | 1975-03-31 | 1976-10-07 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resinous liquid |
US4154614A (en) * | 1975-07-02 | 1979-05-15 | Nippon Paint Co., Ltd. | Photosensitive diazo composition with graft copolymer for use in printing screen |
JPS5917414B2 (ja) * | 1975-10-07 | 1984-04-21 | 村上スクリ−ン (株) | スクリ−ン版用感光性組成物及び感光膜 |
JPS54135526A (en) * | 1978-04-12 | 1979-10-20 | Kansai Paint Co Ltd | Screen processing photosensitive resin composition |
DE2834059A1 (de) * | 1978-08-03 | 1980-02-14 | Hoechst Ag | Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung |
DE2941960A1 (de) * | 1979-10-17 | 1981-04-30 | Hoechst Ag, 6000 Frankfurt | Entwicklergemisch und verfahren zum entwickeln von von belichteten lichtempfindlichen kopierschichten |
JPS5785048A (en) * | 1980-11-17 | 1982-05-27 | Daicel Chem Ind Ltd | Exposed photosensitive diazo film for making screen plate |
US4339529A (en) * | 1981-06-02 | 1982-07-13 | Rca Corporation | Etching method using a PVA stencil containing N-methylol acrylamide |
EP0083835A3 (en) * | 1982-01-12 | 1984-03-07 | Autotype International Limited | Stabilization of diazo-resin sensitisers |
JPS58137833A (ja) * | 1982-02-09 | 1983-08-16 | Kuraray Co Ltd | 感光性の組成物 |
GB2137626B (en) * | 1983-03-31 | 1986-10-15 | Sericol Group Ltd | Water based photopolymerisable compositions and their use |
JPS59216137A (ja) * | 1983-05-24 | 1984-12-06 | Daicel Chem Ind Ltd | プラスチツクフイルム塗布用感光性エマルジヨン |
US4789621A (en) * | 1985-03-05 | 1988-12-06 | Advance Process Supply Company | Screen emulsions comprised of diacetone acrylamide |
-
1984
- 1984-03-02 GB GB848405549A patent/GB8405549D0/en active Pending
-
1985
- 1985-03-01 BR BR8505535A patent/BR8505535A/pt unknown
- 1985-03-01 WO PCT/GB1985/000086 patent/WO1985004028A1/en active IP Right Grant
- 1985-03-01 DE DE8585901043T patent/DE3563658D1/de not_active Expired
- 1985-03-01 EP EP85901043A patent/EP0173708B1/en not_active Expired
- 1985-03-01 EP EP85301427A patent/EP0156534A1/en active Pending
- 1985-03-01 JP JP60500932A patent/JPS61501596A/ja active Pending
- 1985-03-01 GB GB08505353A patent/GB2155191B/en not_active Expired
- 1985-03-01 AU AU39952/85A patent/AU569379B2/en not_active Ceased
- 1985-08-29 IN IN709/DEL/85A patent/IN165165B/en unknown
- 1985-11-01 DK DK503685A patent/DK503685A/da unknown
- 1985-11-01 NO NO854370A patent/NO854370L/no unknown
-
1989
- 1989-11-22 US US07/440,311 patent/US4960671A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
BR8505535A (pt) | 1986-02-18 |
WO1985004028A1 (en) | 1985-09-12 |
AU3995285A (en) | 1985-09-24 |
JPS61501596A (ja) | 1986-07-31 |
NO854370L (no) | 1985-11-01 |
GB8405549D0 (en) | 1984-04-04 |
DK503685D0 (da) | 1985-11-01 |
GB2155191A (en) | 1985-09-18 |
GB2155191B (en) | 1987-04-23 |
DK503685A (da) | 1985-11-01 |
EP0173708A1 (en) | 1986-03-12 |
US4960671A (en) | 1990-10-02 |
GB8505353D0 (en) | 1985-04-03 |
DE3563658D1 (en) | 1988-08-11 |
EP0156534A1 (en) | 1985-10-02 |
AU569379B2 (en) | 1988-01-28 |
EP0173708B1 (en) | 1988-07-06 |