IN137750B - - Google Patents

Info

Publication number
IN137750B
IN137750B IN1660/CAL/1973A IN1660CA1973A IN137750B IN 137750 B IN137750 B IN 137750B IN 1660CA1973 A IN1660CA1973 A IN 1660CA1973A IN 137750 B IN137750 B IN 137750B
Authority
IN
India
Application number
IN1660/CAL/1973A
Other languages
English (en)
Inventor
R Cook
Original Assignee
Quebec Centre Rech Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Quebec Centre Rech Ind filed Critical Quebec Centre Rech Ind
Publication of IN137750B publication Critical patent/IN137750B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/525Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections
    • H01L23/5256Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections comprising fuses, i.e. connections having their state changed from conductive to non-conductive
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C29/00Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/006Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation at wafer scale level, i.e. wafer scale integration [WSI]
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C29/00Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/04Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
    • G11C29/08Functional testing, e.g. testing during refresh, power-on self testing [POST] or distributed testing
    • G11C29/12Built-in arrangements for testing, e.g. built-in self testing [BIST] or interconnection details
    • G11C29/18Address generation devices; Devices for accessing memories, e.g. details of addressing circuits
    • G11C29/26Accessing multiple arrays
    • G11C29/28Dependent multiple arrays, e.g. multi-bit arrays
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49004Electrical device making including measuring or testing of device or component part

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
IN1660/CAL/1973A 1972-07-28 1973-07-16 IN137750B (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA148,232A CA948705A (en) 1972-07-28 1972-07-28 Method for making an integrated circuit apparatus

Publications (1)

Publication Number Publication Date
IN137750B true IN137750B (es) 1975-09-13

Family

ID=4093989

Family Applications (1)

Application Number Title Priority Date Filing Date
IN1660/CAL/1973A IN137750B (es) 1972-07-28 1973-07-16

Country Status (15)

Country Link
US (1) US3810301A (es)
JP (1) JPS506294A (es)
AU (1) AU5811273A (es)
BE (1) BE802822A (es)
BR (1) BR7305732D0 (es)
CA (1) CA948705A (es)
DD (1) DD105688A5 (es)
DE (1) DE2338251A1 (es)
ES (1) ES417338A1 (es)
FR (1) FR2195070A1 (es)
GB (1) GB1436004A (es)
IL (1) IL42844A (es)
IN (1) IN137750B (es)
IT (1) IT997484B (es)
NL (1) NL7310280A (es)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038648A (en) * 1974-06-03 1977-07-26 Chesley Gilman D Self-configurable circuit structure for achieving wafer scale integration
JPS5528160B2 (es) * 1974-12-16 1980-07-25
US3969670A (en) * 1975-06-30 1976-07-13 International Business Machines Corporation Electron beam testing of integrated circuits
US4007452A (en) * 1975-07-28 1977-02-08 Intel Corporation Wafer scale integration system
US4081898A (en) * 1976-04-19 1978-04-04 Texas Instruments Incorporated Method of manufacturing an electronic calculator utilizing a flexible carrier
US4118858A (en) * 1976-04-19 1978-10-10 Texas Instruments Incorporated Method of making an electronic calculator
JPS5735342A (en) * 1980-08-13 1982-02-25 Hitachi Ltd Manufacturing method of large scale integrated circuit
DE3122984A1 (de) * 1981-06-10 1983-01-27 Siemens AG, 1000 Berlin und 8000 München Verfahren zur kennzeichnung von halbleiterchips und kennzeichenbarer helbleiterchip
US4601019B1 (en) * 1983-08-31 1997-09-30 Texas Instruments Inc Memory with redundancy
US4703436A (en) * 1984-02-01 1987-10-27 Inova Microelectronics Corporation Wafer level integration technique
JPH084110B2 (ja) * 1985-03-30 1996-01-17 株式会社日立製作所 半導体装置及びその製造方法
US4719411A (en) * 1985-05-13 1988-01-12 California Institute Of Technology Addressable test matrix for measuring analog transfer characteristics of test elements used for integrated process control and device evaluation
EP0240864A3 (en) * 1986-04-03 1989-05-24 Hewlett-Packard Company High-yield semiconductor memory devices
US4816422A (en) * 1986-12-29 1989-03-28 General Electric Company Fabrication of large power semiconductor composite by wafer interconnection of individual devices
US4855253A (en) * 1988-01-29 1989-08-08 Hewlett-Packard Test method for random defects in electronic microstructures
EP0541288B1 (en) * 1991-11-05 1998-07-08 Fu-Chieh Hsu Circuit module redundacy architecture
US5498990A (en) * 1991-11-05 1996-03-12 Monolithic System Technology, Inc. Reduced CMOS-swing clamping circuit for bus lines
US5831467A (en) * 1991-11-05 1998-11-03 Monolithic System Technology, Inc. Termination circuit with power-down mode for use in circuit module architecture
AU4798793A (en) 1992-08-10 1994-03-03 Monolithic System Technology, Inc. Fault-tolerant, high-speed bus system and bus interface for wafer-scale integration
US6246247B1 (en) 1994-11-15 2001-06-12 Formfactor, Inc. Probe card assembly and kit, and methods of using same
US20020053734A1 (en) 1993-11-16 2002-05-09 Formfactor, Inc. Probe card assembly and kit, and methods of making same
US6624648B2 (en) * 1993-11-16 2003-09-23 Formfactor, Inc. Probe card assembly
US6483328B1 (en) * 1995-11-09 2002-11-19 Formfactor, Inc. Probe card for probing wafers with raised contact elements
US6428641B1 (en) * 1998-08-31 2002-08-06 Amkor Technology, Inc. Method for laminating circuit pattern tape on semiconductor wafer
US6479887B1 (en) 1998-08-31 2002-11-12 Amkor Technology, Inc. Circuit pattern tape for wafer-scale production of chip size semiconductor packages
JP3055104B2 (ja) * 1998-08-31 2000-06-26 亜南半導体株式会社 半導体パッケ―ジの製造方法
US6738307B2 (en) * 2002-05-13 2004-05-18 Hewlett-Packard Development Company, L.P. Address structure and methods for multiple arrays of data storage memory
KR100761755B1 (ko) * 2005-02-28 2007-09-28 삼성전자주식회사 입출력 비트구조를 조절할 수 있는 반도체 메모리 장치

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3423822A (en) * 1967-02-27 1969-01-28 Northern Electric Co Method of making large scale integrated circuit
US3715735A (en) * 1970-12-14 1973-02-06 Monolithic Memories Inc Segmentized memory module and method of making same

Also Published As

Publication number Publication date
DE2338251A1 (de) 1974-02-07
US3810301A (en) 1974-05-14
JPS506294A (es) 1975-01-22
AU5811273A (en) 1975-01-16
GB1436004A (en) 1976-05-19
DD105688A5 (es) 1974-05-05
FR2195070A1 (es) 1974-03-01
BE802822A (fr) 1973-11-16
CA948705A (en) 1974-06-04
IT997484B (it) 1975-12-30
NL7310280A (es) 1974-01-30
IL42844A (en) 1976-09-30
BR7305732D0 (pt) 1974-08-29
ES417338A1 (es) 1976-03-01
IL42844A0 (en) 1973-10-25

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