IL75577A - Method of and apparatus for the coating of quartz crucibles with protective layers - Google Patents

Method of and apparatus for the coating of quartz crucibles with protective layers

Info

Publication number
IL75577A
IL75577A IL75577A IL7557785A IL75577A IL 75577 A IL75577 A IL 75577A IL 75577 A IL75577 A IL 75577A IL 7557785 A IL7557785 A IL 7557785A IL 75577 A IL75577 A IL 75577A
Authority
IL
Israel
Prior art keywords
coating
protective layers
quartz crucibles
crucibles
quartz
Prior art date
Application number
IL75577A
Other languages
English (en)
Other versions
IL75577A0 (en
Original Assignee
Wedtech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wedtech Corp filed Critical Wedtech Corp
Publication of IL75577A0 publication Critical patent/IL75577A0/xx
Publication of IL75577A publication Critical patent/IL75577A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Silicon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
IL75577A 1984-06-29 1985-06-19 Method of and apparatus for the coating of quartz crucibles with protective layers IL75577A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/626,055 US4565711A (en) 1984-06-29 1984-06-29 Method of and apparatus for the coating of quartz crucibles with protective layers

Publications (2)

Publication Number Publication Date
IL75577A0 IL75577A0 (en) 1985-10-31
IL75577A true IL75577A (en) 1989-02-28

Family

ID=24508767

Family Applications (1)

Application Number Title Priority Date Filing Date
IL75577A IL75577A (en) 1984-06-29 1985-06-19 Method of and apparatus for the coating of quartz crucibles with protective layers

Country Status (10)

Country Link
US (1) US4565711A (sv)
JP (1) JPS6183616A (sv)
CA (1) CA1247946A (sv)
CH (1) CH667107A5 (sv)
DE (1) DE3523090A1 (sv)
FR (1) FR2566805A1 (sv)
GB (1) GB2160899B (sv)
IL (1) IL75577A (sv)
IT (1) IT1185139B (sv)
SE (1) SE8503048L (sv)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5073241A (en) * 1986-01-31 1991-12-17 Kabushiki Kaisha Meidenshae Method for carbon film production
JP2531572B2 (ja) * 1993-08-09 1996-09-04 東芝セラミックス株式会社 石英ガラスの酸窒化方法および表面処理方法
DE4413423A1 (de) * 1994-04-18 1995-10-19 Paar Anton Kg Vorrichtung zum Aufschluß von Substanzen
US5993902A (en) * 1997-04-09 1999-11-30 Seh America, Inc. Apparatus and method for extending the lifetime of an exhaust sleeve for growing single crystal silicon by silicon nitride (SI3 N4) coating
WO1999005338A2 (en) 1997-07-24 1999-02-04 Toyo Tanso Usa, Inc. Surface converted graphite components and methods of making same
WO2002040732A1 (en) 2000-11-15 2002-05-23 G.T. Equipment Technologies Inc. A protective layer for quartz crucibles used for silicon crystallization
US20040187767A1 (en) * 2002-10-24 2004-09-30 Intel Corporation Device and method for multicrystalline silicon wafers
JP5291098B2 (ja) * 2007-08-23 2013-09-18 オブシェストボ、エス、オルガニチェンノイ、オトベトストベンノストユ、“ソーラー、エスアイ” フルオロケイ酸溶液からの多結晶シリコン製造の技術ならびにその製造のための設備
US9221709B2 (en) * 2011-03-31 2015-12-29 Raytheon Company Apparatus for producing a vitreous inner layer on a fused silica body, and method of operating same
CN102432189B (zh) * 2011-09-20 2016-06-01 沈福茂 石英坩埚钡涂层的喷涂设备
CN111837221B (zh) * 2019-02-14 2024-03-05 株式会社日立高新技术 半导体制造装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2665226A (en) * 1950-04-27 1954-01-05 Nat Res Corp Method and apparatus for vapor coating
US3036549A (en) * 1957-05-08 1962-05-29 Sumitomo Electric Industries Apparatus for vacuum evaporation of metals
GB939081A (en) * 1959-01-16 1963-10-09 Edwards High Vacuum Int Ltd Improvements in or relating to the evaporation of metal/metalloid mixtures
US3153137A (en) * 1961-10-13 1964-10-13 Union Carbide Corp Evaporation source
US3129315A (en) * 1961-12-26 1964-04-14 Lear Siegler Inc Vacuum vaporizing fixture
CH472509A (de) * 1965-07-09 1969-05-15 Ibm Verfahren zur Herstellung dünner Schichten von Chalkogeniden der Lanthaniden
DE1696614A1 (de) * 1967-05-13 1971-11-18 Telefunken Patent Verfahren zum Aufdampfen von Schichten auf einen Traegerkoerper
FR1588510A (sv) * 1968-07-08 1970-04-17

Also Published As

Publication number Publication date
IT8521347A0 (it) 1985-06-28
US4565711A (en) 1986-01-21
SE8503048L (sv) 1985-12-30
GB8516267D0 (en) 1985-07-31
GB2160899A (en) 1986-01-02
CA1247946A (en) 1989-01-03
JPH0114170B2 (sv) 1989-03-09
JPS6183616A (ja) 1986-04-28
SE8503048D0 (sv) 1985-06-19
CH667107A5 (de) 1988-09-15
IT1185139B (it) 1987-11-04
IL75577A0 (en) 1985-10-31
DE3523090A1 (de) 1986-01-09
FR2566805A1 (fr) 1986-01-03
GB2160899B (en) 1988-05-11

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