IT8521347A0 - Metodo e apparecchiatura per il rivestimento di crogiuoli di quarzo con strati protettivi. - Google Patents

Metodo e apparecchiatura per il rivestimento di crogiuoli di quarzo con strati protettivi.

Info

Publication number
IT8521347A0
IT8521347A0 IT8521347A IT2134785A IT8521347A0 IT 8521347 A0 IT8521347 A0 IT 8521347A0 IT 8521347 A IT8521347 A IT 8521347A IT 2134785 A IT2134785 A IT 2134785A IT 8521347 A0 IT8521347 A0 IT 8521347A0
Authority
IT
Italy
Prior art keywords
equipment
protective layers
quartz crucibles
coating quartz
coating
Prior art date
Application number
IT8521347A
Other languages
English (en)
Other versions
IT1185139B (it
Inventor
Eduard Pinkhasov
Original Assignee
Wedtech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wedtech Corp filed Critical Wedtech Corp
Publication of IT8521347A0 publication Critical patent/IT8521347A0/it
Application granted granted Critical
Publication of IT1185139B publication Critical patent/IT1185139B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
IT21347/85A 1984-06-29 1985-06-28 Metodo e apparecchiatura per il rivestimento di crogiuoli di quarzo con strati protettivi IT1185139B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/626,055 US4565711A (en) 1984-06-29 1984-06-29 Method of and apparatus for the coating of quartz crucibles with protective layers

Publications (2)

Publication Number Publication Date
IT8521347A0 true IT8521347A0 (it) 1985-06-28
IT1185139B IT1185139B (it) 1987-11-04

Family

ID=24508767

Family Applications (1)

Application Number Title Priority Date Filing Date
IT21347/85A IT1185139B (it) 1984-06-29 1985-06-28 Metodo e apparecchiatura per il rivestimento di crogiuoli di quarzo con strati protettivi

Country Status (10)

Country Link
US (1) US4565711A (it)
JP (1) JPS6183616A (it)
CA (1) CA1247946A (it)
CH (1) CH667107A5 (it)
DE (1) DE3523090A1 (it)
FR (1) FR2566805A1 (it)
GB (1) GB2160899B (it)
IL (1) IL75577A (it)
IT (1) IT1185139B (it)
SE (1) SE8503048L (it)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5073241A (en) * 1986-01-31 1991-12-17 Kabushiki Kaisha Meidenshae Method for carbon film production
JP2531572B2 (ja) * 1993-08-09 1996-09-04 東芝セラミックス株式会社 石英ガラスの酸窒化方法および表面処理方法
DE4413423A1 (de) * 1994-04-18 1995-10-19 Paar Anton Kg Vorrichtung zum Aufschluß von Substanzen
US5993902A (en) * 1997-04-09 1999-11-30 Seh America, Inc. Apparatus and method for extending the lifetime of an exhaust sleeve for growing single crystal silicon by silicon nitride (SI3 N4) coating
WO1999005338A2 (en) 1997-07-24 1999-02-04 Toyo Tanso Usa, Inc. Surface converted graphite components and methods of making same
WO2002040732A1 (en) 2000-11-15 2002-05-23 G.T. Equipment Technologies Inc. A protective layer for quartz crucibles used for silicon crystallization
US20040187767A1 (en) * 2002-10-24 2004-09-30 Intel Corporation Device and method for multicrystalline silicon wafers
KR101140076B1 (ko) * 2007-08-23 2012-04-30 오브스체스트보 에스 오그라니체노이 오트베츠트벤노스츄 ＇솔라르 씨＇ 다결정 실리콘 제조 방법
US9221709B2 (en) * 2011-03-31 2015-12-29 Raytheon Company Apparatus for producing a vitreous inner layer on a fused silica body, and method of operating same
CN102432189B (zh) * 2011-09-20 2016-06-01 沈福茂 石英坩埚钡涂层的喷涂设备
US11380523B2 (en) * 2019-02-14 2022-07-05 Hitachi High-Tech Corporation Semiconductor manufacturing apparatus

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2665226A (en) * 1950-04-27 1954-01-05 Nat Res Corp Method and apparatus for vapor coating
US3036549A (en) * 1957-05-08 1962-05-29 Sumitomo Electric Industries Apparatus for vacuum evaporation of metals
GB939081A (en) * 1959-01-16 1963-10-09 Edwards High Vacuum Int Ltd Improvements in or relating to the evaporation of metal/metalloid mixtures
US3153137A (en) * 1961-10-13 1964-10-13 Union Carbide Corp Evaporation source
US3129315A (en) * 1961-12-26 1964-04-14 Lear Siegler Inc Vacuum vaporizing fixture
CH472509A (de) * 1965-07-09 1969-05-15 Ibm Verfahren zur Herstellung dünner Schichten von Chalkogeniden der Lanthaniden
DE1696614A1 (de) * 1967-05-13 1971-11-18 Telefunken Patent Verfahren zum Aufdampfen von Schichten auf einen Traegerkoerper
FR1588510A (it) * 1968-07-08 1970-04-17

Also Published As

Publication number Publication date
GB2160899A (en) 1986-01-02
CA1247946A (en) 1989-01-03
SE8503048D0 (sv) 1985-06-19
JPS6183616A (ja) 1986-04-28
SE8503048L (sv) 1985-12-30
GB2160899B (en) 1988-05-11
GB8516267D0 (en) 1985-07-31
DE3523090A1 (de) 1986-01-09
CH667107A5 (de) 1988-09-15
IL75577A (en) 1989-02-28
US4565711A (en) 1986-01-21
FR2566805A1 (fr) 1986-01-03
IL75577A0 (en) 1985-10-31
IT1185139B (it) 1987-11-04
JPH0114170B2 (it) 1989-03-09

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