IL32250A - Electrophotography - Google Patents
ElectrophotographyInfo
- Publication number
- IL32250A IL32250A IL32250A IL3225069A IL32250A IL 32250 A IL32250 A IL 32250A IL 32250 A IL32250 A IL 32250A IL 3225069 A IL3225069 A IL 3225069A IL 32250 A IL32250 A IL 32250A
- Authority
- IL
- Israel
- Prior art keywords
- plate
- interlayer
- overlayer
- electrophotographic
- mixtures
- Prior art date
Links
- 239000000463 material Substances 0.000 claims description 57
- 239000000758 substrate Substances 0.000 claims description 56
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 50
- 238000000034 method Methods 0.000 claims description 48
- 239000011669 selenium Substances 0.000 claims description 47
- 229910052711 selenium Inorganic materials 0.000 claims description 47
- 239000010410 layer Substances 0.000 claims description 41
- 239000011229 interlayer Substances 0.000 claims description 28
- 239000000203 mixture Substances 0.000 claims description 27
- 238000000576 coating method Methods 0.000 claims description 18
- 238000000151 deposition Methods 0.000 claims description 18
- 239000011248 coating agent Substances 0.000 claims description 14
- 230000008021 deposition Effects 0.000 claims description 11
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 9
- 229910052785 arsenic Inorganic materials 0.000 claims description 8
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229910052714 tellurium Inorganic materials 0.000 claims description 5
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 4
- 238000003384 imaging method Methods 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- 239000011593 sulfur Substances 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- PBHRBFFOJOXGPU-UHFFFAOYSA-N cadmium Chemical compound [Cd].[Cd] PBHRBFFOJOXGPU-UHFFFAOYSA-N 0.000 claims 3
- 229910052793 cadmium Inorganic materials 0.000 claims 2
- FWBOYJOTWUDFRK-UHFFFAOYSA-N [Cd]S[Cd] Chemical compound [Cd]S[Cd] FWBOYJOTWUDFRK-UHFFFAOYSA-N 0.000 claims 1
- 230000003213 activating effect Effects 0.000 claims 1
- 125000003748 selenium group Chemical group *[Se]* 0.000 claims 1
- 239000000853 adhesive Substances 0.000 description 24
- 230000001070 adhesive effect Effects 0.000 description 23
- 238000012360 testing method Methods 0.000 description 12
- 229910001369 Brass Inorganic materials 0.000 description 10
- 239000010951 brass Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 238000005336 cracking Methods 0.000 description 8
- 239000012535 impurity Substances 0.000 description 7
- 229910001370 Se alloy Inorganic materials 0.000 description 5
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000012212 insulator Substances 0.000 description 5
- 229960002415 trichloroethylene Drugs 0.000 description 5
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 4
- 238000001771 vacuum deposition Methods 0.000 description 4
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 3
- TWZRVZOGUHURLO-UHFFFAOYSA-N N'-(2-methylpropyl)-N'-silylethane-1,2-diamine Chemical class [SiH3]N(CCN)CC(C)C TWZRVZOGUHURLO-UHFFFAOYSA-N 0.000 description 3
- QGACYAUCLLKDCV-UHFFFAOYSA-N N'-(dimethoxymethylsilyl)-N'-(2-methylpropyl)ethane-1,2-diamine Chemical compound COC(OC)[SiH2]N(CCN)CC(C)C QGACYAUCLLKDCV-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- -1 polyorganosiloxanes Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 238000002791 soaking Methods 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 108091008695 photoreceptors Proteins 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000002210 silicon-based material Substances 0.000 description 2
- 238000004901 spalling Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- 241000905957 Channa melasoma Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- BTHCBXJLLCHNMS-UHFFFAOYSA-N acetyloxysilicon Chemical compound CC(=O)O[Si] BTHCBXJLLCHNMS-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000004103 aminoalkyl group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004532 chromating Methods 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- PGWFQHBXMJMAPN-UHFFFAOYSA-N ctk4b5078 Chemical compound [Cd].OS(=O)(=O)[Se]S(O)(=O)=O PGWFQHBXMJMAPN-UHFFFAOYSA-N 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000004924 electrostatic deposition Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000001815 facial effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 125000005375 organosiloxane group Chemical class 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- JPJALAQPGMAKDF-UHFFFAOYSA-N selenium dioxide Chemical compound O=[Se]=O JPJALAQPGMAKDF-UHFFFAOYSA-N 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/142—Inert intermediate layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US73174368A | 1968-05-24 | 1968-05-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IL32250A0 IL32250A0 (en) | 1969-07-30 |
| IL32250A true IL32250A (en) | 1973-03-30 |
Family
ID=24940780
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL32250A IL32250A (en) | 1968-05-24 | 1969-05-20 | Electrophotography |
Country Status (19)
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4148637A (en) * | 1973-09-04 | 1979-04-10 | Ricoh Co., Ltd. | Silane coupling agent in protective layer of photoconductive element |
| JPH03503810A (ja) * | 1988-12-14 | 1991-08-22 | タゼンコフ，ボリス アファナシエウィッチ | 電子写真像キャリア |
| JP3264119B2 (ja) * | 1994-12-14 | 2002-03-11 | 富士ゼロックス株式会社 | 画像形成方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3041166A (en) * | 1958-02-12 | 1962-06-26 | Xerox Corp | Xerographic plate and method |
| US3312547A (en) * | 1964-07-02 | 1967-04-04 | Xerox Corp | Xerographic plate and processes of making and using same |
| US3447957A (en) * | 1964-08-19 | 1969-06-03 | Xerox Corp | Method of making a smooth surfaced adhesive binder xerographic plate |
| US3453106A (en) * | 1965-06-21 | 1969-07-01 | Owens Illinois Inc | Compositions exhibiting persistent internal polarization where a photoconductive material is dispersed in a polysiloxane resin derived from trifunctional monomers |
-
1968
- 1968-05-24 US US731743A patent/US3619153A/en not_active Expired - Lifetime
-
1969
- 1969-04-30 BR BR208479/69A patent/BR6908479D0/pt unknown
- 1969-05-19 PL PL1969133693A patent/PL80007B1/pl unknown
- 1969-05-20 LU LU58678D patent/LU58678A1/xx unknown
- 1969-05-20 IL IL32250A patent/IL32250A/en unknown
- 1969-05-20 AT AT478569A patent/AT305764B/de not_active IP Right Cessation
- 1969-05-20 SE SE7076/69A patent/SE341926B/xx unknown
- 1969-05-21 GB GB1229559D patent/GB1229559A/en not_active Expired
- 1969-05-21 NO NO2065/69A patent/NO125557B/no unknown
- 1969-05-21 IE IE698/69A patent/IE33281B1/xx unknown
- 1969-05-21 BE BE733402D patent/BE733402A/xx unknown
- 1969-05-22 CS CS3655A patent/CS165333B2/cs unknown
- 1969-05-22 DK DK279169A patent/DK131833C/da active
- 1969-05-22 DE DE19691926056 patent/DE1926056A1/de active Pending
- 1969-05-23 NL NL6907912A patent/NL6907912A/xx unknown
- 1969-05-23 FR FR6917079A patent/FR2009297A1/fr not_active Withdrawn
- 1969-05-23 BG BG012309A patent/BG17353A3/xx unknown
- 1969-05-23 ES ES367618A patent/ES367618A1/es not_active Expired
- 1969-05-23 CH CH794369A patent/CH511461A/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| NL6907912A (enrdf_load_stackoverflow) | 1969-11-26 |
| BR6908479D0 (pt) | 1973-01-18 |
| CS165333B2 (enrdf_load_stackoverflow) | 1975-12-22 |
| IE33281L (en) | 1969-11-24 |
| BG17353A3 (bg) | 1973-07-25 |
| DK131833B (da) | 1975-09-08 |
| IL32250A0 (en) | 1969-07-30 |
| NO125557B (enrdf_load_stackoverflow) | 1972-09-25 |
| DE1926056A1 (de) | 1969-12-04 |
| IE33281B1 (en) | 1974-05-15 |
| AT305764B (de) | 1973-03-12 |
| BE733402A (enrdf_load_stackoverflow) | 1969-11-21 |
| SE341926B (enrdf_load_stackoverflow) | 1972-01-17 |
| PL80007B1 (enrdf_load_stackoverflow) | 1975-08-30 |
| CH511461A (de) | 1971-08-15 |
| FR2009297A1 (enrdf_load_stackoverflow) | 1970-01-30 |
| GB1229559A (enrdf_load_stackoverflow) | 1971-04-28 |
| ES367618A1 (es) | 1971-07-16 |
| DK131833C (da) | 1976-02-16 |
| US3619153A (en) | 1971-11-09 |
| LU58678A1 (enrdf_load_stackoverflow) | 1970-01-13 |
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