IL311467A - A production method for the substrate and a sublimation drying method - Google Patents

A production method for the substrate and a sublimation drying method

Info

Publication number
IL311467A
IL311467A IL311467A IL31146724A IL311467A IL 311467 A IL311467 A IL 311467A IL 311467 A IL311467 A IL 311467A IL 31146724 A IL31146724 A IL 31146724A IL 311467 A IL311467 A IL 311467A
Authority
IL
Israel
Prior art keywords
sublimable
solvent
film
substrate
film formation
Prior art date
Application number
IL311467A
Other languages
English (en)
Hebrew (he)
Inventor
Yoshiharu Terui
Ayaka Yoshida
Original Assignee
Central Glass Co Ltd
Yoshiharu Terui
Ayaka Yoshida
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd, Yoshiharu Terui, Ayaka Yoshida filed Critical Central Glass Co Ltd
Publication of IL311467A publication Critical patent/IL311467A/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/20—Cleaning during device manufacture
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/04—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum
    • F26B5/041—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum for drying flowable materials, e.g. suspensions, bulk goods, in a continuous operation, e.g. with locks or other air tight arrangements for charging/discharging

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Solid Materials (AREA)
IL311467A 2021-09-15 2022-09-08 A production method for the substrate and a sublimation drying method IL311467A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021150186 2021-09-15
PCT/JP2022/033662 WO2023042736A1 (ja) 2021-09-15 2022-09-08 基板の製造方法および昇華乾燥方法

Publications (1)

Publication Number Publication Date
IL311467A true IL311467A (en) 2024-05-01

Family

ID=85602156

Family Applications (1)

Application Number Title Priority Date Filing Date
IL311467A IL311467A (en) 2021-09-15 2022-09-08 A production method for the substrate and a sublimation drying method

Country Status (7)

Country Link
US (1) US20240371627A1 (cg-RX-API-DMAC7.html)
EP (1) EP4404243A4 (cg-RX-API-DMAC7.html)
JP (1) JPWO2023042736A1 (cg-RX-API-DMAC7.html)
KR (1) KR20240067920A (cg-RX-API-DMAC7.html)
IL (1) IL311467A (cg-RX-API-DMAC7.html)
TW (1) TW202332994A (cg-RX-API-DMAC7.html)
WO (1) WO2023042736A1 (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025125474A (ja) * 2024-02-15 2025-08-27 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法、基板処理装置及び基板処理液

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5681560B2 (ja) * 2011-05-17 2015-03-11 東京エレクトロン株式会社 基板乾燥方法及び基板処理装置
JP6022829B2 (ja) * 2012-07-03 2016-11-09 株式会社Ｓｃｒｅｅｎホールディングス 基板乾燥方法および基板乾燥装置
JP6592303B2 (ja) * 2015-08-14 2019-10-16 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄方法および基板洗浄装置
JP7265879B2 (ja) * 2019-02-14 2023-04-27 株式会社Ｓｃｒｅｅｎホールディングス 基板乾燥方法および基板処理装置
KR102741585B1 (ko) * 2019-03-19 2024-12-12 샌트랄 글래스 컴퍼니 리미티드 요철 패턴 건조용 조성물, 및 표면에 요철 패턴을 가지는 기판의 제조 방법
JP2021150186A (ja) 2020-03-19 2021-09-27 東芝ライテック株式会社 推定装置、推定システム、推定方法および推定プログラム

Also Published As

Publication number Publication date
JPWO2023042736A1 (cg-RX-API-DMAC7.html) 2023-03-23
US20240371627A1 (en) 2024-11-07
KR20240067920A (ko) 2024-05-17
EP4404243A4 (en) 2025-09-24
EP4404243A1 (en) 2024-07-24
TW202332994A (zh) 2023-08-16
WO2023042736A1 (ja) 2023-03-23

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