IL267762B - 183 nm cw laser and inspection system - Google Patents

183 nm cw laser and inspection system

Info

Publication number
IL267762B
IL267762B IL267762A IL26776219A IL267762B IL 267762 B IL267762 B IL 267762B IL 267762 A IL267762 A IL 267762A IL 26776219 A IL26776219 A IL 26776219A IL 267762 B IL267762 B IL 267762B
Authority
IL
Israel
Prior art keywords
laser
inspection system
inspection
Prior art date
Application number
IL267762A
Other languages
Hebrew (he)
Other versions
IL267762A (en
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Publication of IL267762A publication Critical patent/IL267762A/en
Publication of IL267762B publication Critical patent/IL267762B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
    • H01S3/109—Frequency multiplication, e.g. harmonic generation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/3501—Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/355—Non-linear optics characterised by the materials used
    • G02F1/3551—Crystals
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/355—Non-linear optics characterised by the materials used
    • G02F1/3558—Poled materials, e.g. with periodic poling; Fabrication of domain inverted structures, e.g. for quasi-phase-matching [QPM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • H01L22/34—Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1601—Solid materials characterised by an active (lasing) ion
    • H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
    • H01S3/1608—Solid materials characterised by an active (lasing) ion rare earth erbium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1601—Solid materials characterised by an active (lasing) ion
    • H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
    • H01S3/1611—Solid materials characterised by an active (lasing) ion rare earth neodymium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1601—Solid materials characterised by an active (lasing) ion
    • H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
    • H01S3/1618—Solid materials characterised by an active (lasing) ion rare earth ytterbium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/3501—Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals
    • G02F1/3503—Structural association of optical elements, e.g. lenses, with the non-linear optical device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
    • G02F1/354—Third or higher harmonic generation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/16—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 series; tandem
IL267762A 2017-01-03 2019-07-01 183 nm cw laser and inspection system IL267762B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762441875P 2017-01-03 2017-01-03
US15/806,953 US10175555B2 (en) 2017-01-03 2017-11-08 183 nm CW laser and inspection system
PCT/US2018/012031 WO2018128963A1 (en) 2017-01-03 2018-01-02 183 nm cw laser and inspection system

Publications (2)

Publication Number Publication Date
IL267762A IL267762A (en) 2019-09-26
IL267762B true IL267762B (en) 2021-02-28

Family

ID=62711647

Family Applications (1)

Application Number Title Priority Date Filing Date
IL267762A IL267762B (en) 2017-01-03 2019-07-01 183 nm cw laser and inspection system

Country Status (8)

Country Link
US (2) US10175555B2 (en)
JP (1) JP6846525B2 (en)
KR (1) KR102325872B1 (en)
CN (1) CN110352538B (en)
DE (1) DE112018000301T5 (en)
IL (1) IL267762B (en)
TW (1) TWI748033B (en)
WO (1) WO2018128963A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9748729B2 (en) * 2014-10-03 2017-08-29 Kla-Tencor Corporation 183NM laser and inspection system
US10175555B2 (en) * 2017-01-03 2019-01-08 KLA—Tencor Corporation 183 nm CW laser and inspection system
US20200235544A1 (en) * 2019-01-22 2020-07-23 Coherent, Inc. Diode-pumped solid-state laser apparatus for laser annealing
CN110729627A (en) * 2019-12-19 2020-01-24 南京南智先进光电集成技术研究院有限公司 Optical parametric oscillator device of multi-beam pump
JP7012311B2 (en) * 2020-02-12 2022-02-14 株式会社金門光波 Ultraviolet laser device
US11237455B2 (en) 2020-06-12 2022-02-01 Kla Corporation Frequency conversion using stacked strontium tetraborate plates
TWI733588B (en) * 2020-09-11 2021-07-11 財團法人工業技術研究院 Laser processing system
FR3129243A1 (en) 2021-11-15 2023-05-19 Bruno SANGLE-FERRIERE Device for implementing nuclear fusion reactions by accelerated ions
US11567391B1 (en) 2021-11-24 2023-01-31 Kla Corporation Frequency conversion using interdigitated nonlinear crystal gratings
FR3132541A1 (en) 2022-02-09 2023-08-11 Bruno SANGLE-FERRIERE Engine comprising a device for implementing nuclear fusion reactions by accelerated ions

Family Cites Families (247)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2672072A (en) 1951-03-15 1954-03-16 Rca Corp Color television optical system
US3755704A (en) 1970-02-06 1973-08-28 Stanford Research Inst Field emission cathode structures and devices utilizing such structures
US4178561A (en) 1978-10-02 1979-12-11 Hughes Aircraft Company Scanning arrangements for optical frequency converters
JPS58146B2 (en) 1980-10-14 1983-01-05 浜松テレビ株式会社 Flaming pipe
US4644221A (en) 1981-05-06 1987-02-17 The United States Of America As Represented By The Secretary Of The Army Variable sensitivity transmission mode negative electron affinity photocathode
US4853595A (en) 1987-08-31 1989-08-01 Alfano Robert R Photomultiplier tube having a transmission strip line photocathode and system for use therewith
US5120949A (en) 1991-01-17 1992-06-09 Burle Technologies, Inc. Semiconductor anode photomultiplier tube
JP2828221B2 (en) 1991-06-04 1998-11-25 インターナショナル・ビジネス・マシーンズ・コーポレイション Laser light wavelength converter
US5144630A (en) 1991-07-29 1992-09-01 Jtt International, Inc. Multiwavelength solid state laser using frequency conversion techniques
US5563702A (en) 1991-08-22 1996-10-08 Kla Instruments Corporation Automated photomask inspection apparatus and method
DE69208413T2 (en) 1991-08-22 1996-11-14 Kla Instr Corp Device for automatic testing of photomask
EP0532927B1 (en) 1991-08-22 1996-02-21 Kla Instruments Corporation Automated photomask inspection apparatus
JP3564705B2 (en) 1992-03-02 2004-09-15 ソニー株式会社 Laser light generator
JP3309430B2 (en) 1992-07-28 2002-07-29 ソニー株式会社 Laser light generator
US5326978A (en) 1992-12-17 1994-07-05 Intevac, Inc. Focused electron-bombarded detector
US5475227A (en) 1992-12-17 1995-12-12 Intevac, Inc. Hybrid photomultiplier tube with ion deflector
US5760809A (en) 1993-03-19 1998-06-02 Xerox Corporation Recording sheets containing phosphonium compounds
FI940740A0 (en) 1994-02-17 1994-02-17 Arto Salokatve Detector For the detection of photoners or particulates, for the production of detectors and for the production of detectors
JPH07254744A (en) 1994-03-15 1995-10-03 Sony Corp Laser light generator
US6271916B1 (en) 1994-03-24 2001-08-07 Kla-Tencor Corporation Process and assembly for non-destructive surface inspections
US5493176A (en) 1994-05-23 1996-02-20 Siemens Medical Systems, Inc. Photomultiplier tube with an avalanche photodiode, a flat input end and conductors which simulate the potential distribution in a photomultiplier tube having a spherical-type input end
JPH08241977A (en) 1995-03-03 1996-09-17 Hamamatsu Photonics Kk Manufacture of semiconductor device
US6512631B2 (en) 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
JPH09318985A (en) 1996-05-28 1997-12-12 Sony Corp Wavelength converting device
US6081325A (en) 1996-06-04 2000-06-27 Kla-Tencor Corporation Optical scanning system for surface inspection
JPH1020351A (en) 1996-07-01 1998-01-23 Sony Corp Laser beam source device and control method for the device
US5999310A (en) 1996-07-22 1999-12-07 Shafer; David Ross Ultra-broadband UV microscope imaging system with wide range zoom capability
US5742626A (en) 1996-08-14 1998-04-21 Aculight Corporation Ultraviolet solid state laser, method of using same and laser surgery apparatus
US5760899A (en) 1996-09-04 1998-06-02 Erim International, Inc. High-sensitivity multispectral sensor
US6201257B1 (en) 1996-10-10 2001-03-13 Advanced Scientific Concepts, Inc. Semiconductor X-ray photocathodes devices
US6212310B1 (en) 1996-10-22 2001-04-03 Sdl, Inc. High power fiber gain media system achieved through power scaling via multiplexing
US6064759A (en) 1996-11-08 2000-05-16 Buckley; B. Shawn Computer aided inspection machine
US6005878A (en) 1997-02-19 1999-12-21 Academia Sinica Efficient frequency conversion apparatus for use with multimode solid-state lasers
WO2005022705A2 (en) 1997-03-21 2005-03-10 Imra America, Inc. High energy optical fiber amplifier for picosecond-nanosecond pulses for advanced material processing applications
JPH10301153A (en) 1997-04-23 1998-11-13 Sony Corp Light source device and optical measuring instrument and exposure device using it
US6608676B1 (en) 1997-08-01 2003-08-19 Kla-Tencor Corporation System for detecting anomalies and/or features of a surface
US5825562A (en) 1997-08-18 1998-10-20 Novatec Corporation Method of continuous motion for prolong usage of optical elements under the irradiation of intensive laser beams
US6201601B1 (en) 1997-09-19 2001-03-13 Kla-Tencor Corporation Sample inspection system
US6181461B1 (en) 1997-10-01 2001-01-30 Sony Corporation Optical system having stable resonator
JPH11121854A (en) 1997-10-16 1999-04-30 Ushio Sogo Gijutsu Kenkyusho:Kk Light source device
WO1999046835A1 (en) 1998-03-11 1999-09-16 Nikon Corporation Ultraviolet laser apparatus and exposure apparatus comprising the ultraviolet laser apparatus
JP3997450B2 (en) 1998-03-13 2007-10-24 ソニー株式会社 Wavelength converter
US6376985B2 (en) 1998-03-31 2002-04-23 Applied Materials, Inc. Gated photocathode for controlled single and multiple electron beam emission
JPH11317567A (en) 1998-05-01 1999-11-16 Sony Corp Laser beam generating method and device
US6373869B1 (en) 1998-07-30 2002-04-16 Actinix System and method for generating coherent radiation at ultraviolet wavelengths
JP3977529B2 (en) 1998-11-18 2007-09-19 三菱電機株式会社 Wavelength conversion laser device and laser processing device
JP2000223408A (en) 1999-02-03 2000-08-11 Hitachi Ltd Semiconductor manufacturing device, and manufacture of semiconductor device
US6535531B1 (en) 2001-11-29 2003-03-18 Cymer, Inc. Gas discharge laser with pulse multiplier
EP1194804B1 (en) 1999-06-11 2003-07-30 Daniel Dr. Kopf LASER generating system
US6888855B1 (en) 1999-06-11 2005-05-03 Daniel Kopf Optical system for lasers
US6285018B1 (en) 1999-07-20 2001-09-04 Intevac, Inc. Electron bombarded active pixel sensor
US6498801B1 (en) 1999-08-05 2002-12-24 Alexander E. Dudelzak Solid state laser for microlithography
JP4719918B2 (en) 1999-08-18 2011-07-06 独立行政法人 日本原子力研究開発機構 Laser wavelength conversion method
AU6875100A (en) 1999-09-10 2001-04-17 Nikon Corporation Laser device and exposure method
EP1139521A4 (en) 1999-09-10 2006-03-22 Nikon Corp Light source and wavelength stabilization control method, exposure apparatus and exposure method, method for producing exposure apparatus, and device manufacturing method and device
US6327281B1 (en) 1999-10-09 2001-12-04 Photonics Industries International, Inc. Laser with harmonic cavity
US6369888B1 (en) 1999-11-17 2002-04-09 Applied Materials, Inc. Method and apparatus for article inspection including speckle reduction
US7838794B2 (en) 1999-12-28 2010-11-23 Gsi Group Corporation Laser-based method and system for removing one or more target link structures
US6549647B1 (en) 2000-01-07 2003-04-15 Cyberoptics Corporation Inspection system with vibration resistant video capture
JP2002033473A (en) 2000-07-17 2002-01-31 Hamamatsu Photonics Kk Semiconductor device
US6879390B1 (en) 2000-08-10 2005-04-12 Kla-Tencor Technologies Corporation Multiple beam inspection apparatus and method
JP2002099007A (en) 2000-09-21 2002-04-05 Sony Corp Laser beam generator and optical device using the same
CN1218448C (en) 2000-10-11 2005-09-07 南京大学 Biperiod superlattice and its application in laser frequency converter
US20020105995A1 (en) 2000-11-16 2002-08-08 Lambda Physik Ag Molecular fluorine laser with single spectral line and polarized output
US7184616B2 (en) 2000-11-20 2007-02-27 Aculight Corporation Method and apparatus for fiber Bragg grating production
AU2002224907A1 (en) 2000-12-01 2002-06-11 Nlg-New Laser Generetion Gmbh Uv solid state laser
DE10063977A1 (en) 2000-12-14 2002-07-25 Eckhard Zanger Optical resonant frequency converter
US6704339B2 (en) 2001-01-29 2004-03-09 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
US8208505B2 (en) 2001-01-30 2012-06-26 Board Of Trustees Of Michigan State University Laser system employing harmonic generation
US6791099B2 (en) 2001-02-14 2004-09-14 Applied Materials, Inc. Laser scanning wafer inspection using nonlinear optical phenomena
JP3939928B2 (en) 2001-02-28 2007-07-04 サイバーレーザー株式会社 Wavelength converter
US6704331B2 (en) 2001-04-11 2004-03-09 The Regents Of The University Of California Synthetic guide star generation
JP3885511B2 (en) 2001-04-11 2007-02-21 ソニー株式会社 Laser light generating apparatus and method
US6628684B2 (en) 2001-07-12 2003-09-30 National Institute Of Advanced Industrial Science And Technology Timing synchronization device of a pulsed laser and an optical synthesizer
JP3837499B2 (en) * 2001-07-12 2006-10-25 独立行政法人産業技術総合研究所 Pulse laser time synchronizer and arbitrary waveform generator
JP2003043533A (en) 2001-08-03 2003-02-13 Kitakyushu Foundation For The Advancement Of Industry Science & Technology Automatic tracking device for keeping fixed direction of second higher harmonic of laser
US20030161374A1 (en) 2001-11-21 2003-08-28 Lambda Physik Ag High-resolution confocal Fabry-Perot interferometer for absolute spectral parameter detection of excimer laser used in lithography applications
US6816520B1 (en) 2001-11-30 2004-11-09 Positive Light Solid state system and method for generating ultraviolet light
US7088443B2 (en) 2002-02-11 2006-08-08 Kla-Tencor Technologies Corporation System for detecting anomalies and/or features of a surface
JP2004086193A (en) 2002-07-05 2004-03-18 Nikon Corp Light source device and light irradiation apparatus
US6859335B1 (en) 2002-11-20 2005-02-22 Ming Lai Method of programmed displacement for prolong usage of optical elements under the irradiation of intensive laser beams
WO2004066460A1 (en) 2003-01-23 2004-08-05 Nlg - New Laser Generation Gmbh Laser resonator and frequency-converted laser
US7957066B2 (en) 2003-02-21 2011-06-07 Kla-Tencor Corporation Split field inspection system using small catadioptric objectives
JP4784930B2 (en) 2003-09-11 2011-10-05 株式会社ニコン Polymer crystal processing method, polymer crystal processing apparatus, and polymer crystal observation apparatus
US7463657B2 (en) 2003-10-09 2008-12-09 Coherent, Inc. Intracavity frequency-tripled CW laser
US7813406B1 (en) 2003-10-15 2010-10-12 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Temporal laser pulse manipulation using multiple optical ring-cavities
JP2005156516A (en) 2003-11-05 2005-06-16 Hitachi Ltd Method of inspecting pattern defect, and apparatus of the same
JP4446300B2 (en) 2003-11-12 2010-04-07 サイバーレーザー株式会社 5th harmonic generator
US7304310B1 (en) 2003-11-21 2007-12-04 Kla-Tencor Technologies Corp. Methods and systems for inspecting a specimen using light scattered in different wavelength ranges
US7023126B2 (en) 2003-12-03 2006-04-04 Itt Manufacturing Enterprises Inc. Surface structures for halo reduction in electron bombarded devices
US7321468B2 (en) 2003-12-15 2008-01-22 Carl Zeiss Laser Optics Gmbh Method and optical arrangement for beam guiding of a light beam with beam delay
US20050157382A1 (en) 2004-01-07 2005-07-21 Kafka James D. Industrial directly diode-pumped ultrafast amplifier system
US20050169326A1 (en) 2004-01-30 2005-08-04 Jacob James J. Laser architectures for coherent short-wavelength light generation
US7313155B1 (en) 2004-02-12 2007-12-25 Liyue Mu High power Q-switched laser for soft tissue ablation
US7035012B2 (en) 2004-03-01 2006-04-25 Coherent, Inc. Optical pulse duration extender
JPWO2005085947A1 (en) 2004-03-08 2008-01-24 株式会社ニコン LASER LIGHT SOURCE DEVICE, EXPOSURE DEVICE AND MASK INSPECTION DEVICE USING THIS LASER LIGHT SOURCE DEVICE
JP2005275095A (en) 2004-03-25 2005-10-06 Nikon Corp Light source unit, semiconductor exposure device, laser medical treatment device, laser interferometer device, and laser microscope device
JP4365255B2 (en) 2004-04-08 2009-11-18 浜松ホトニクス株式会社 Luminescent body, electron beam detector, scanning electron microscope and mass spectrometer using the same
US20050254065A1 (en) 2004-05-12 2005-11-17 Stokowski Stanley E Method and apparatus for detecting surface characteristics on a mask blank
US7349079B2 (en) 2004-05-14 2008-03-25 Kla-Tencor Technologies Corp. Methods for measurement or analysis of a nitrogen concentration of a specimen
WO2005116751A1 (en) 2004-05-26 2005-12-08 Nikon Corporation Wavelength converting optical system, laser light source, exposure apparatus, mask examining apparatus, and macromolecular crystal lens machining device
US7397598B2 (en) 2004-08-20 2008-07-08 Nikon Corporation Light source unit and light irradiation unit
JP2006060162A (en) 2004-08-24 2006-03-02 Nikon Corp Laser light unit and method of controlling excited light of laser light unit
US7627007B1 (en) 2004-08-25 2009-12-01 Kla-Tencor Technologies Corporation Non-critical phase matching in CLBO to generate sub-213nm wavelengths
EP1782512A2 (en) 2004-08-26 2007-05-09 Corning Incorporated Injection locked high power laser system
ITFI20040199A1 (en) 2004-09-24 2004-12-24 Gabriele Ferrari PROCEDURE AND OPTICAL FREQUENCY MULTIPLIER FOR A FACTOR 1.5
JP4500641B2 (en) 2004-09-29 2010-07-14 株式会社日立ハイテクノロジーズ Defect inspection method and apparatus
US7609309B2 (en) 2004-11-18 2009-10-27 Kla-Tencor Technologies Corporation Continuous clocking of TDI sensors
US7952633B2 (en) 2004-11-18 2011-05-31 Kla-Tencor Technologies Corporation Apparatus for continuous clocking of TDI sensors
US7432517B2 (en) 2004-11-19 2008-10-07 Asml Netherlands B.V. Pulse modifier, lithographic apparatus, and device manufacturing method
US20060114946A1 (en) 2004-11-30 2006-06-01 Yunlong Sun Nonlinear crystal modifications for durable high-power laser wavelength conversion
US7269189B2 (en) 2005-01-21 2007-09-11 Cobolt Ab Coherent light source based on sum-frequency mixing
JP2006250845A (en) 2005-03-14 2006-09-21 Topcon Corp Method and apparatus for inspecting defect of pattern
US7593440B2 (en) 2005-03-29 2009-09-22 Coherent, Inc. MOPA laser apparatus with two master oscillators for generating ultraviolet radiation
DE102005015497B4 (en) 2005-03-31 2008-10-16 Nlg-New Laser Generation Gmbh Stabilization of cascaded optical resonators
DE602006004913D1 (en) 2005-04-28 2009-03-12 Semiconductor Energy Lab Method and device for producing semiconductors by means of laser radiation
US7345825B2 (en) 2005-06-30 2008-03-18 Kla-Tencor Technologies Corporation Beam delivery system for laser dark-field illumination in a catadioptric optical system
JP4640029B2 (en) 2005-08-08 2011-03-02 株式会社ニコン Wavelength conversion optical system, laser light source, exposure apparatus, specimen inspection apparatus, and polymer crystal processing apparatus
US7535938B2 (en) 2005-08-15 2009-05-19 Pavilion Integration Corporation Low-noise monolithic microchip lasers capable of producing wavelengths ranging from IR to UV based on efficient and cost-effective frequency conversion
CN101263201B (en) 2005-09-16 2012-10-17 松下电器产业株式会社 Composite material and optical component using the same
JP4925085B2 (en) 2005-09-20 2012-04-25 株式会社メガオプト Deep ultraviolet laser light generation method and deep ultraviolet laser device
JP2007114697A (en) * 2005-10-24 2007-05-10 Sony Corp Light source device
JP4939033B2 (en) 2005-10-31 2012-05-23 浜松ホトニクス株式会社 Photocathode
EP1952493A4 (en) 2005-11-01 2017-05-10 Cymer, LLC Laser system
US7920616B2 (en) 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US7715459B2 (en) 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US20090296755A1 (en) 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US7471705B2 (en) 2005-11-09 2008-12-30 Lockheed Martin Corporation Ultraviolet laser system and method having wavelength in the 200-nm range
JP2007133102A (en) 2005-11-09 2007-05-31 Canon Inc Optical element having reflection preventing film, and exposure apparatus having the same
US7519253B2 (en) 2005-11-18 2009-04-14 Omni Sciences, Inc. Broadband or mid-infrared fiber light sources
US7528943B2 (en) 2005-12-27 2009-05-05 Kla-Tencor Technologies Corporation Method and apparatus for simultaneous high-speed acquisition of multiple images
JP2007206452A (en) 2006-02-02 2007-08-16 Lasertec Corp Deep ultraviolet light source, mask inspection device using same, and exposure device
JP4911494B2 (en) 2006-03-18 2012-04-04 国立大学法人大阪大学 Wavelength conversion optical element, method for manufacturing wavelength conversion optical element, wavelength conversion apparatus, ultraviolet laser irradiation apparatus, and laser processing apparatus
WO2007127356A2 (en) 2006-04-28 2007-11-08 Corning Incorporated Pulsed uv and visible raman laser systems
US7113325B1 (en) 2006-05-03 2006-09-26 Mitsubishi Materials Corporation Wavelength conversion method with improved conversion efficiency
US20070263680A1 (en) 2006-05-15 2007-11-15 Andrei Starodoumov MOPA laser apparatus with two master oscillators for generating ultraviolet radiation
US7593437B2 (en) 2006-05-15 2009-09-22 Coherent, Inc. MOPA laser apparatus with two master oscillators for generating ultraviolet radiation
EP2024787A2 (en) 2006-06-02 2009-02-18 Corning Incorporated Uv and visible laser systems
US7457330B2 (en) 2006-06-15 2008-11-25 Pavilion Integration Corporation Low speckle noise monolithic microchip RGB lasers
US7970201B2 (en) 2006-07-31 2011-06-28 Applied Materials Israel, Ltd. Method and system for defect detection
JP4071806B2 (en) 2006-09-25 2008-04-02 サイバーレーザー株式会社 Wavelength converter
DE102007004235B3 (en) 2006-12-21 2008-01-03 Coherent Gmbh Light beam frequency conversion method by cesium lithium borate crystals, involves passing through of light beam with input light power along optical path interspersing cesium lithium borate crystal with output light power
US20080173903A1 (en) 2006-12-28 2008-07-24 Fujifilm Corporation Solid-state image pickup element
JP5342769B2 (en) 2006-12-28 2013-11-13 浜松ホトニクス株式会社 Photocathode, electron tube and photomultiplier tube
WO2008088838A1 (en) 2007-01-17 2008-07-24 Crystal Is, Inc. Defect reduction in seeded aluminum nitride crystal growth
US9771666B2 (en) 2007-01-17 2017-09-26 Crystal Is, Inc. Defect reduction in seeded aluminum nitride crystal growth
JP4224863B2 (en) 2007-02-02 2009-02-18 レーザーテック株式会社 Inspection apparatus, inspection method, and pattern substrate manufacturing method
JP2008209664A (en) 2007-02-27 2008-09-11 Advanced Mask Inspection Technology Kk Pattern inspection device
JP4420051B2 (en) 2007-03-28 2010-02-24 ソニー株式会社 Laser light generator
US7801188B2 (en) 2007-04-02 2010-09-21 Cobolt Ab Continuous-wave ultraviolet laser
JP2008261790A (en) 2007-04-13 2008-10-30 Hitachi High-Technologies Corp Flaw inspection device
US8755417B1 (en) 2007-04-16 2014-06-17 Kla-Tencor Corporation Coherent light generation below about two-hundred nanometers
US20110073982A1 (en) 2007-05-25 2011-03-31 Armstrong J Joseph Inspection system using back side illuminated linear sensor
US8665536B2 (en) 2007-06-19 2014-03-04 Kla-Tencor Corporation External beam delivery system for laser dark-field illumination in a catadioptric optical system
US7586108B2 (en) 2007-06-25 2009-09-08 Asml Netherlands B.V. Radiation detector, method of manufacturing a radiation detector and lithographic apparatus comprising a radiation detector
KR20100046196A (en) 2007-08-01 2010-05-06 딥 포토닉스 코포레이션 Method and apparatus for pulsed harmonic ultraviolet lasers
JP2009058782A (en) 2007-08-31 2009-03-19 Osaka Univ Laser beam generation device and laser beam generation method
US7999342B2 (en) 2007-09-24 2011-08-16 Taiwan Semiconductor Manufacturing Company, Ltd Image sensor element for backside-illuminated sensor
JP4634427B2 (en) 2007-09-27 2011-02-16 株式会社東芝 Illumination device and pattern inspection device
US7525649B1 (en) 2007-10-19 2009-04-28 Kla-Tencor Technologies Corporation Surface inspection system using laser line illumination with two dimensional imaging
US7605376B2 (en) 2007-10-29 2009-10-20 Fairchild Imaging, Inc. CMOS sensor adapted for dental x-ray imaging
JP2009145791A (en) 2007-12-18 2009-07-02 Lasertec Corp Wavelength conversion device, inspection device, and wavelength conversion method
US8298335B2 (en) 2007-12-18 2012-10-30 Kla-Tencor Technologies Corporation Enclosure for controlling the environment of optical crystals
US7885298B2 (en) 2008-01-16 2011-02-08 Deep Photonics Corporation Method and apparatus for producing arbitrary pulsetrains from a harmonic fiber laser
EP2083319B1 (en) 2008-01-25 2013-07-17 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Intra-cavity generation of pulsed coherent radiation in the UV or XUV wavelength range
CA2718903C (en) 2008-03-18 2013-11-19 Motoaki Tamaya Laser light source module
JP5634989B2 (en) 2008-06-17 2014-12-03 ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ Objective optical system and sample inspection device
JP2010003755A (en) 2008-06-18 2010-01-07 Mitsubishi Electric Corp Wavelength conversion laser apparatus
JP4980990B2 (en) 2008-06-25 2012-07-18 パナソニック株式会社 Movable structure and micromirror device using the same
JP4561892B2 (en) 2008-07-11 2010-10-13 ソニー株式会社 Wavelength conversion device, laser light generation device, and wavelength conversion method
JP2010054547A (en) 2008-08-26 2010-03-11 Lasertec Corp Ultraviolet laser device
US9080991B2 (en) 2008-09-29 2015-07-14 Kla-Tencor Corp. Illuminating a specimen for metrology or inspection
US9080990B2 (en) 2008-09-29 2015-07-14 Kla-Tencor Corp. Illumination subsystems of a metrology system, metrology systems, and methods for illuminating a specimen for metrology measurements
US7875948B2 (en) 2008-10-21 2011-01-25 Jaroslav Hynecek Backside illuminated image sensor
FR2938935B1 (en) 2008-11-21 2011-05-06 Eolite Systems DEVICE FOR EXTENDING THE LIFETIME OF A NON-LINEAR OPTICAL SYSTEM SUBJECTED TO RADIATION OF AN INTENSE LASER BEAM AND NON-LINEAR OPTICAL SOURCE COMPRISING SAID DEVICE
US8146498B2 (en) 2008-12-03 2012-04-03 Eastman Kodak Company Printing plate registration
US8624971B2 (en) 2009-01-23 2014-01-07 Kla-Tencor Corporation TDI sensor modules with localized driving and signal processing circuitry for high speed inspection
JP5237874B2 (en) 2009-04-24 2013-07-17 株式会社日立ハイテクノロジーズ Defect inspection method and defect inspection apparatus
JP4565207B1 (en) 2009-04-28 2010-10-20 レーザーテック株式会社 Wavelength conversion device, wavelength conversion method, and semiconductor device manufacturing method
US20100301437A1 (en) 2009-06-01 2010-12-02 Kla-Tencor Corporation Anti-Reflective Coating For Sensors Suitable For High Throughput Inspection Systems
JP2011023532A (en) 2009-07-15 2011-02-03 Nikon Corp Optical amplifier, laser device, and light source device
JP4654424B2 (en) 2009-08-19 2011-03-23 レーザーテック株式会社 Light source device
US9023152B2 (en) 2009-09-17 2015-05-05 Kla-Tencor Corporation CLBO crystal growth
CN102035085B (en) 2009-10-08 2014-03-05 群康科技(深圳)有限公司 Conducting structure and manufacturing method thereof
US8798104B2 (en) 2009-10-13 2014-08-05 Nanda Nathan Pulsed high-power laser apparatus and methods
US8629384B1 (en) 2009-10-26 2014-01-14 Kla-Tencor Corporation Photomultiplier tube optimized for surface inspection in the ultraviolet
CN101702490B (en) 2009-10-29 2011-02-09 长春理工大学 Intermediate infrared antimonide laser device structure adopting DWELL
US8559471B2 (en) 2009-11-23 2013-10-15 Guilin Mao High-power diode end-pumped solid-state UV laser
US20110134944A1 (en) 2009-12-08 2011-06-09 The Arizona Board Of Regents On Behalf Of The University Of Arizona Efficient pulse laser light generation and devices using the same
JP2011128330A (en) 2009-12-17 2011-06-30 Nikon Corp Laser device
US8711896B2 (en) 2010-01-05 2014-04-29 Kla-Tencor Corporation Alleviation of laser-induced damage in optical materials by suppression of transient color centers formation and control of phonon population
GB201001051D0 (en) 2010-01-22 2010-03-10 Fianium Ltd Optical sources
JP4590578B1 (en) 2010-04-01 2010-12-01 レーザーテック株式会社 Light source apparatus, mask inspection apparatus, and coherent light generation method
JP5914329B2 (en) 2010-05-24 2016-05-11 ギガフォトン株式会社 Solid-state laser device and laser system
US8432944B2 (en) 2010-06-25 2013-04-30 KLA-Technor Corporation Extending the lifetime of a deep UV laser in a wafer inspection tool
JP2013536581A (en) 2010-08-08 2013-09-19 ケーエルエー−テンカー コーポレイション Dynamic wavefront control of frequency conversion laser system
US8482846B2 (en) 2010-08-09 2013-07-09 Coherent Gmbh Advanced shifting algorithm for prolonging the life of an optically nonlinear crystal
US8422119B1 (en) 2010-09-20 2013-04-16 Disco Corporation Compensation of beam walkoff in nonlinear crystal using cylindrical lens
US8824514B2 (en) 2010-11-09 2014-09-02 Kla-Tencor Corporation Measuring crystal site lifetime in a non-linear optical crystal
US8711470B2 (en) 2010-11-14 2014-04-29 Kla-Tencor Corporation High damage threshold frequency conversion system
US8891079B2 (en) 2010-12-16 2014-11-18 Kla-Tencor Corp. Wafer inspection
US8669512B2 (en) 2010-12-28 2014-03-11 Technion Research & Development Foundation Limited System and method for analyzing light by three-photon counting
CN102163793A (en) 2011-02-25 2011-08-24 天津梅曼激光技术有限公司 Multiple extra-cavity frequency conversion ultraviolet laser
TW201244308A (en) 2011-03-24 2012-11-01 Nikon Corp Ultraviolet laser device
WO2012154468A2 (en) 2011-05-06 2012-11-15 Kla-Tencor Corporation Deep ultra-violet light sources for wafer and reticle inspection systems
US9793673B2 (en) 2011-06-13 2017-10-17 Kla-Tencor Corporation Semiconductor inspection and metrology system using laser pulse multiplier
CN202167755U (en) 2011-06-27 2012-03-14 中国电子科技集团公司第三十四研究所 Outside-cavity resonant ultraviolet laser generating device
JP5731444B2 (en) 2011-07-07 2015-06-10 富士フイルム株式会社 Radiation detector, radiation image capturing apparatus, and radiation image capturing system
US9920438B2 (en) 2011-07-07 2018-03-20 Massachusetts Institute Of Technology Methods and apparatus for ultrathin catalyst layer for photoelectrode
US9279774B2 (en) 2011-07-12 2016-03-08 Kla-Tencor Corp. Wafer inspection
ITTO20110649A1 (en) 2011-07-19 2013-01-20 St Microelectronics Srl PHOTORELECTRIC DEVICE WITH PROTECTIVE AND ANTI-REFLECTIVE COVER, AND RELATIVE MANUFACTURING METHOD
US8873596B2 (en) 2011-07-22 2014-10-28 Kla-Tencor Corporation Laser with high quality, stable output beam, and long life high conversion efficiency non-linear crystal
US9755039B2 (en) 2011-07-28 2017-09-05 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device having a metal gate electrode stack
US8817827B2 (en) 2011-08-17 2014-08-26 Veralas, Inc. Ultraviolet fiber laser system
WO2013036576A1 (en) 2011-09-07 2013-03-14 Kla-Tencor Corporation Transmissive-reflective photocathode
US8748828B2 (en) 2011-09-21 2014-06-10 Kla-Tencor Corporation Interposer based imaging sensor for high-speed image acquisition and inspection systems
US20130077086A1 (en) 2011-09-23 2013-03-28 Kla-Tencor Corporation Solid-State Laser And Inspection System Using 193nm Laser
US8872159B2 (en) 2011-09-29 2014-10-28 The United States Of America, As Represented By The Secretary Of The Navy Graphene on semiconductor detector
US9250178B2 (en) 2011-10-07 2016-02-02 Kla-Tencor Corporation Passivation of nonlinear optical crystals
US9389166B2 (en) 2011-12-16 2016-07-12 Kla-Tencor Corporation Enhanced high-speed logarithmic photo-detector for spot scanning system
US8754972B2 (en) 2012-02-01 2014-06-17 Kla-Tencor Corporation Integrated multi-channel analog front end and digitizer for high speed imaging applications
US9496425B2 (en) 2012-04-10 2016-11-15 Kla-Tencor Corporation Back-illuminated sensor with boron layer
US20130313440A1 (en) 2012-05-22 2013-11-28 Kla-Tencor Corporation Solid-State Laser And Inspection System Using 193nm Laser
US8953869B2 (en) 2012-06-14 2015-02-10 Kla-Tencor Corporation Apparatus and methods for inspecting extreme ultra violet reticles
US8976343B2 (en) 2012-06-21 2015-03-10 Kla-Tencor Corporation Laser crystal degradation compensation
US8964798B2 (en) 2012-07-12 2015-02-24 Kla-Tencor Corporation Reducing the spectral bandwidth of lasers
US9601299B2 (en) 2012-08-03 2017-03-21 Kla-Tencor Corporation Photocathode including silicon substrate with boron layer
US9042006B2 (en) 2012-09-11 2015-05-26 Kla-Tencor Corporation Solid state illumination source and inspection system
NL2011568A (en) 2012-10-31 2014-05-06 Asml Netherlands Bv Sensor and lithographic apparatus.
US9151940B2 (en) 2012-12-05 2015-10-06 Kla-Tencor Corporation Semiconductor inspection and metrology system using laser pulse multiplier
US9426400B2 (en) 2012-12-10 2016-08-23 Kla-Tencor Corporation Method and apparatus for high speed acquisition of moving images using pulsed illumination
US8929406B2 (en) 2013-01-24 2015-01-06 Kla-Tencor Corporation 193NM laser and inspection system
US9529182B2 (en) 2013-02-13 2016-12-27 KLA—Tencor Corporation 193nm laser and inspection system
US9608399B2 (en) 2013-03-18 2017-03-28 Kla-Tencor Corporation 193 nm laser and an inspection system using a 193 nm laser
US9478402B2 (en) 2013-04-01 2016-10-25 Kla-Tencor Corporation Photomultiplier tube, image sensor, and an inspection system using a PMT or image sensor
US11180866B2 (en) 2013-04-10 2021-11-23 Kla Corporation Passivation of nonlinear optical crystals
US9509112B2 (en) * 2013-06-11 2016-11-29 Kla-Tencor Corporation CW DUV laser with improved stability
US9293882B2 (en) 2013-09-10 2016-03-22 Kla-Tencor Corporation Low noise, high stability, deep ultra-violet, continuous wave laser
US9347890B2 (en) 2013-12-19 2016-05-24 Kla-Tencor Corporation Low-noise sensor and an inspection system using a low-noise sensor
US9748294B2 (en) 2014-01-10 2017-08-29 Hamamatsu Photonics K.K. Anti-reflection layer for back-illuminated sensor
US9804101B2 (en) 2014-03-20 2017-10-31 Kla-Tencor Corporation System and method for reducing the bandwidth of a laser and an inspection system and method using a laser
US9525265B2 (en) 2014-06-20 2016-12-20 Kla-Tencor Corporation Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms
US9748729B2 (en) * 2014-10-03 2017-08-29 Kla-Tencor Corporation 183NM laser and inspection system
CN104486759B (en) 2014-12-15 2018-11-23 北京极科极客科技有限公司 A kind of method of accessible access wireless network
US9696568B2 (en) 2015-05-13 2017-07-04 Lasertec Corporation Light source apparatus and inspection apparatus
US10175555B2 (en) * 2017-01-03 2019-01-08 KLA—Tencor Corporation 183 nm CW laser and inspection system

Also Published As

Publication number Publication date
CN110352538A (en) 2019-10-18
CN110352538B (en) 2021-08-03
JP2020514795A (en) 2020-05-21
US20180188633A1 (en) 2018-07-05
TW201830809A (en) 2018-08-16
US20190107766A1 (en) 2019-04-11
US10429719B2 (en) 2019-10-01
TWI748033B (en) 2021-12-01
DE112018000301T5 (en) 2019-09-12
IL267762A (en) 2019-09-26
KR20190095505A (en) 2019-08-14
WO2018128963A1 (en) 2018-07-12
US10175555B2 (en) 2019-01-08
KR102325872B1 (en) 2021-11-11
JP6846525B2 (en) 2021-03-24

Similar Documents

Publication Publication Date Title
IL267762B (en) 183 nm cw laser and inspection system
IL275570A (en) 183nm laser and inspection system
HK1252484A1 (en) Pulsed laser and bioanalytic system
SG10201913912PA (en) Inspection system and management system
HK1250414A1 (en) Inspection system and inspection device
IL251965A0 (en) Real time inspection and correction techniques for direct writing systems
WO2017042402A3 (en) Laser scanner
PL3364176T3 (en) Multi-view backscatter inspection system and multi-view backscatter inspection method
GB201716780D0 (en) Laser system
PL2907471T3 (en) Laser system and method for operating the laser system
PL3188194T3 (en) Collimator and inspection system having the same
PL2963455T3 (en) X-ray backscattering safety inspection system having distributed x-ray source and method using the same
GB201612517D0 (en) Pipleline maintenance and inspection vehicle
EP3405937A4 (en) Integrated security inspection system
IL278602A (en) Laser beams methods and systems
IL261287B (en) Illumination system and metrology system
EP3561501A4 (en) Rail inspection system
EP3508776A4 (en) Ventilation member and inspection method
SG10202103723UA (en) Lithography optics adjustment and monitoring
SG10201701084YA (en) Inspecting apparatus and laser processing apparatus
IL255849B (en) Techniques for forming waveguides for use in laser systems or other systems and associated devices
EP3542143C0 (en) Rheometer and method for the use thereof
EP3477294A4 (en) Rail inspection system
EP3201605A4 (en) Laser beam stop elements and spectroscopy systems including the same
SG10201601639WA (en) Processed egg and method for identifying the same

Legal Events

Date Code Title Description
FF Patent granted
KB Patent renewed