IL251972B - Analysis and use of landscapes - Google Patents
Analysis and use of landscapesInfo
- Publication number
- IL251972B IL251972B IL251972A IL25197217A IL251972B IL 251972 B IL251972 B IL 251972B IL 251972 A IL251972 A IL 251972A IL 25197217 A IL25197217 A IL 25197217A IL 251972 B IL251972 B IL 251972B
- Authority
- IL
- Israel
- Prior art keywords
- landscapes
- analyzing
- utilizing
- utilizing landscapes
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462083891P | 2014-11-25 | 2014-11-25 | |
| US201562100384P | 2015-01-06 | 2015-01-06 | |
| PCT/US2015/062523 WO2016086056A1 (en) | 2014-11-25 | 2015-11-24 | Analyzing and utilizing landscapes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IL251972A0 IL251972A0 (en) | 2017-06-29 |
| IL251972B true IL251972B (en) | 2022-03-01 |
Family
ID=56075006
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL251972A IL251972B (en) | 2014-11-25 | 2017-04-27 | Analysis and use of landscapes |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10831108B2 (enExample) |
| JP (3) | JP6770958B2 (enExample) |
| KR (1) | KR102269514B1 (enExample) |
| CN (2) | CN107078074B (enExample) |
| IL (1) | IL251972B (enExample) |
| SG (1) | SG11201703585RA (enExample) |
| TW (2) | TWI719804B (enExample) |
| WO (1) | WO2016086056A1 (enExample) |
Families Citing this family (72)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3221897A1 (en) | 2014-09-08 | 2017-09-27 | The Research Foundation Of State University Of New York | Metallic gratings and measurement methods thereof |
| CN110553602B (zh) | 2014-11-26 | 2021-10-26 | Asml荷兰有限公司 | 度量方法、计算机产品和系统 |
| CN112859541A (zh) | 2015-05-19 | 2021-05-28 | 科磊股份有限公司 | 光学系统 |
| US9995689B2 (en) * | 2015-05-22 | 2018-06-12 | Nanometrics Incorporated | Optical metrology using differential fitting |
| CN107924137B (zh) * | 2015-06-17 | 2021-03-05 | Asml荷兰有限公司 | 基于配置方案间的一致性的配置方案选择 |
| WO2017099843A1 (en) | 2015-12-08 | 2017-06-15 | Kla-Tencor Corporation | Control of amplitude and phase of diffraction orders using polarizing targets and polarized illumination |
| WO2017102304A1 (en) * | 2015-12-17 | 2017-06-22 | Asml Netherlands B.V. | Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured |
| KR102738803B1 (ko) | 2016-02-24 | 2024-12-04 | 케이엘에이 코포레이션 | 광학 계측의 정확도 개선 |
| WO2017146785A1 (en) | 2016-02-25 | 2017-08-31 | Kla-Tencor Corporation | Analyzing root causes of process variation in scatterometry metrology |
| KR102188711B1 (ko) | 2016-02-26 | 2020-12-09 | 에이에스엠엘 네델란즈 비.브이. | 구조체를 측정하는 방법, 검사 장치, 리소그래피 시스템 및 디바이스 제조 방법 |
| IL262114B2 (en) | 2016-04-22 | 2023-04-01 | Asml Netherlands Bv | Determining the stack difference and correcting with the help of the stack difference |
| WO2017198422A1 (en) * | 2016-05-17 | 2017-11-23 | Asml Netherlands B.V. | Metrology robustness based on through-wavelength similarity |
| IL297496B2 (en) | 2016-07-15 | 2025-03-01 | Asml Netherlands Bv | Method and device for designing a target field for metrology |
| US10578982B2 (en) | 2016-08-17 | 2020-03-03 | Asml Netherlands B.V. | Substrate measurement recipe design of, or for, a target including a latent image |
| KR102265164B1 (ko) * | 2016-09-27 | 2021-06-15 | 에이에스엠엘 네델란즈 비.브이. | 계측 레시피 선택 |
| EP3299890A1 (en) * | 2016-09-27 | 2018-03-28 | ASML Netherlands B.V. | Metrology recipe selection |
| WO2018063625A1 (en) | 2016-09-28 | 2018-04-05 | Kla-Tencor Corporation | Direct focusing with image binning in metrology tools |
| US10527952B2 (en) * | 2016-10-25 | 2020-01-07 | Kla-Tencor Corporation | Fault discrimination and calibration of scatterometry overlay targets |
| JP6880184B2 (ja) | 2016-11-10 | 2021-06-02 | エーエスエムエル ネザーランズ ビー．ブイ． | スタック差を使用した設計及び補正 |
| JP6877541B2 (ja) | 2016-11-14 | 2021-05-26 | ケーエルエー コーポレイション | 一体型メトロロジツールを有する機能性が強化されたリソグラフィシステム |
| US10496781B2 (en) * | 2016-12-19 | 2019-12-03 | Kla Tencor Corporation | Metrology recipe generation using predicted metrology images |
| US10824079B2 (en) * | 2017-01-03 | 2020-11-03 | Kla-Tencor Corporation | Diffraction based overlay scatterometry |
| FR3062516B1 (fr) | 2017-01-30 | 2019-04-12 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Procede de mesure du desalignement entre une premiere et une seconde zones de gravure |
| WO2018217232A1 (en) * | 2017-05-22 | 2018-11-29 | Kla-Tencor Corporation | Zonal analysis for recipe optimization and measurement |
| US10996567B2 (en) | 2017-06-14 | 2021-05-04 | Asml Netherlands B.V. | Lithographic apparatus and method |
| US11112369B2 (en) * | 2017-06-19 | 2021-09-07 | Kla-Tencor Corporation | Hybrid overlay target design for imaging-based overlay and scatterometry-based overlay |
| WO2019010325A1 (en) * | 2017-07-06 | 2019-01-10 | Kla-Tencor Corporation | ESTIMATION OF AMPLITUDE AND PHASE ASYMMETRY IN IMAGING TECHNOLOGY TO OBTAIN HIGH PRECISION IN RECOVERY METROLOGY |
| US10401738B2 (en) | 2017-08-02 | 2019-09-03 | Kla-Tencor Corporation | Overlay metrology using multiple parameter configurations |
| JP6942555B2 (ja) * | 2017-08-03 | 2021-09-29 | 東京エレクトロン株式会社 | 基板処理方法、コンピュータ記憶媒体及び基板処理システム |
| US10627720B2 (en) | 2017-08-18 | 2020-04-21 | Globalfoundries Inc. | Overlay mark structures |
| CN111052328B (zh) * | 2017-08-30 | 2021-08-03 | 科磊股份有限公司 | 根据工艺变化的计量测量参数的快速调整 |
| US10699969B2 (en) | 2017-08-30 | 2020-06-30 | Kla-Tencor Corporation | Quick adjustment of metrology measurement parameters according to process variation |
| IL273145B2 (en) * | 2017-09-11 | 2024-03-01 | Asml Netherlands Bv | Metrology in lithographic processes |
| EP3462239A1 (en) * | 2017-09-27 | 2019-04-03 | ASML Netherlands B.V. | Metrology in lithographic processes |
| US10565697B2 (en) * | 2017-10-22 | 2020-02-18 | Kla-Tencor Corporation | Utilizing overlay misregistration error estimations in imaging overlay metrology |
| US11199506B2 (en) * | 2018-02-21 | 2021-12-14 | Applied Materials Israel Ltd. | Generating a training set usable for examination of a semiconductor specimen |
| WO2019182637A1 (en) | 2018-03-19 | 2019-09-26 | Kla-Tencor Corporation | Overlay measurement using multiple wavelengths |
| US12416580B2 (en) * | 2018-05-07 | 2025-09-16 | Unm Rainforest Innovations | Method and system for in-line optical scatterometry |
| KR102586405B1 (ko) * | 2018-06-14 | 2023-10-10 | 노바 엘티디. | 반도체 제조용 측정 및 공정 제어 |
| US10962951B2 (en) | 2018-06-20 | 2021-03-30 | Kla-Tencor Corporation | Process and metrology control, process indicators and root cause analysis tools based on landscape information |
| NL2021852A (en) | 2018-08-01 | 2018-11-09 | Asml Netherlands Bv | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
| US11410111B1 (en) * | 2018-08-08 | 2022-08-09 | Wells Fargo Bank, N.A. | Generating predicted values based on data analysis using machine learning |
| US11118903B2 (en) * | 2018-10-17 | 2021-09-14 | Kla Corporation | Efficient illumination shaping for scatterometry overlay |
| SG11202104681RA (en) | 2018-11-21 | 2021-06-29 | Kla Tencor Corp | Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s) |
| US11119417B2 (en) * | 2018-11-21 | 2021-09-14 | Kla-Tencor Corporation | Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s) |
| US11062928B2 (en) | 2019-10-07 | 2021-07-13 | Kla Corporation | Process optimization using design of experiments and response surface models |
| US11249400B2 (en) | 2018-12-14 | 2022-02-15 | Kla Corporation | Per-site residuals analysis for accurate metrology measurements |
| US11333982B2 (en) * | 2019-01-28 | 2022-05-17 | Kla Corporation | Scaling metric for quantifying metrology sensitivity to process variation |
| WO2020176117A1 (en) | 2019-02-22 | 2020-09-03 | Kla-Tencor Corporation | Method of measuring misregistration of semiconductor devices |
| CN114174927B (zh) * | 2019-07-04 | 2025-05-13 | Asml荷兰有限公司 | 光刻工艺及关联设备的子场控制 |
| KR102517587B1 (ko) * | 2019-07-10 | 2023-04-03 | 케이엘에이 코포레이션 | 데이터 기반 오정렬 파라미터 구성 및 측정 시스템 및 방법 |
| US11360397B2 (en) * | 2019-09-17 | 2022-06-14 | Kla Corporation | System and method for application of harmonic detectivity as a quality indicator for imaging-based overlay measurements |
| CN114556223A (zh) * | 2019-10-14 | 2022-05-27 | Asml控股股份有限公司 | 量测标记结构和确定量测标记结构的方法 |
| US12399120B2 (en) | 2019-11-01 | 2025-08-26 | Unm Rainforest Innovations | In-line angular optical multi-point scatterometry for nanomanufacturing systems |
| KR20220107006A (ko) * | 2019-11-28 | 2022-08-01 | 케이엘에이 코포레이션 | 계측 랜드스케이프에 기초한 계측 최적화를 위한 시스템 및 방법 |
| US12283503B2 (en) * | 2020-07-22 | 2025-04-22 | Applied Materials, Inc. | Substrate measurement subsystem |
| USD977504S1 (en) | 2020-07-22 | 2023-02-07 | Applied Materials, Inc. | Portion of a display panel with a graphical user interface |
| US11688616B2 (en) | 2020-07-22 | 2023-06-27 | Applied Materials, Inc. | Integrated substrate measurement system to improve manufacturing process performance |
| US11454894B2 (en) * | 2020-09-14 | 2022-09-27 | Kla Corporation | Systems and methods for scatterometric single-wavelength measurement of misregistration and amelioration thereof |
| US20220357674A1 (en) * | 2021-05-04 | 2022-11-10 | Kla Corporation | Oblique illumination for overlay metrology |
| US12406891B2 (en) | 2021-09-30 | 2025-09-02 | International Business Machines Corporation | Characterization of asymmetric material deposition for metrology |
| WO2023096704A1 (en) * | 2021-11-27 | 2023-06-01 | Kla Corporation | Improved targets for diffraction-based overlay error metrology |
| US12235624B2 (en) | 2021-12-21 | 2025-02-25 | Applied Materials, Inc. | Methods and mechanisms for adjusting process chamber parameters during substrate manufacturing |
| US12148647B2 (en) | 2022-01-25 | 2024-11-19 | Applied Materials, Inc. | Integrated substrate measurement system |
| US12339645B2 (en) | 2022-01-25 | 2025-06-24 | Applied Materials, Inc. | Estimation of chamber component conditions using substrate measurements |
| US12216455B2 (en) | 2022-01-25 | 2025-02-04 | Applied Materials, Inc. | Chamber component condition estimation using substrate measurements |
| CN115327857A (zh) * | 2022-05-30 | 2022-11-11 | 上海华力集成电路制造有限公司 | 一种量测方法、激光套刻装置、计算机存储介质及模组 |
| IL293633B2 (en) * | 2022-06-06 | 2024-06-01 | Nova Ltd | A system and method for building a library and using it in measurements on designed buildings |
| US12092966B2 (en) * | 2022-11-23 | 2024-09-17 | Kla Corporation | Device feature specific edge placement error (EPE) |
| US20240337953A1 (en) * | 2023-04-04 | 2024-10-10 | Kla Corporation | System and method for tracking real-time position for scanning overlay metrology |
| US20240402615A1 (en) * | 2023-06-02 | 2024-12-05 | Kla Corporation | Single grab pupil landscape via broadband illumination |
| EP4538794A1 (en) * | 2023-10-13 | 2025-04-16 | ASML Netherlands B.V. | Metrology method and associated metrology device |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7317531B2 (en) | 2002-12-05 | 2008-01-08 | Kla-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
| US7330279B2 (en) | 2002-07-25 | 2008-02-12 | Timbre Technologies, Inc. | Model and parameter selection for optical metrology |
| US7352453B2 (en) | 2003-01-17 | 2008-04-01 | Kla-Tencor Technologies Corporation | Method for process optimization and control by comparison between 2 or more measured scatterometry signals |
| KR101682838B1 (ko) | 2005-11-18 | 2016-12-12 | 케이엘에이-텐코 코포레이션 | 검사 데이터와 조합하여 설계 데이터를 활용하는 방법 및 시스템 |
| US7528941B2 (en) | 2006-06-01 | 2009-05-05 | Kla-Tencor Technolgies Corporation | Order selected overlay metrology |
| US7573584B2 (en) * | 2006-09-25 | 2009-08-11 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
| US7656518B2 (en) * | 2007-03-30 | 2010-02-02 | Asml Netherlands B.V. | Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus |
| NL2006700A (en) * | 2010-06-04 | 2011-12-06 | Asml Netherlands Bv | Method and apparatus for measuring a structure on a substrate, computer program products for implementing such methods & apparatus. |
| KR101793538B1 (ko) * | 2010-07-19 | 2017-11-03 | 에이에스엠엘 네델란즈 비.브이. | 오버레이 오차를 결정하는 장치 및 방법 |
| US8666703B2 (en) * | 2010-07-22 | 2014-03-04 | Tokyo Electron Limited | Method for automated determination of an optimally parameterized scatterometry model |
| WO2012062858A1 (en) * | 2010-11-12 | 2012-05-18 | Asml Netherlands B.V. | Metrology method and apparatus, lithographic system and device manufacturing method |
| EP2694983B1 (en) * | 2011-04-06 | 2020-06-03 | KLA-Tencor Corporation | Method and system for providing a quality metric for improved process control |
| US9310296B2 (en) * | 2011-06-20 | 2016-04-12 | Kla-Tencor Corporation | Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology |
| US8681413B2 (en) | 2011-06-27 | 2014-03-25 | Kla-Tencor Corporation | Illumination control |
| NL2009294A (en) * | 2011-08-30 | 2013-03-04 | Asml Netherlands Bv | Method and apparatus for determining an overlay error. |
| US20130110477A1 (en) * | 2011-10-31 | 2013-05-02 | Stilian Pandev | Process variation-based model optimization for metrology |
| US10255385B2 (en) * | 2012-03-28 | 2019-04-09 | Kla-Tencor Corporation | Model optimization approach based on spectral sensitivity |
| US9329033B2 (en) * | 2012-09-05 | 2016-05-03 | Kla-Tencor Corporation | Method for estimating and correcting misregistration target inaccuracy |
| WO2014062972A1 (en) * | 2012-10-18 | 2014-04-24 | Kla-Tencor Corporation | Symmetric target design in scatterometry overlay metrology |
| JP5992110B2 (ja) * | 2012-11-05 | 2016-09-14 | エーエスエムエル ネザーランズ ビー．ブイ． | ミクロ構造の非対称性を測定する方法および装置、位置測定方法、位置測定装置、リソグラフィ装置およびデバイス製造方法 |
| US10242290B2 (en) * | 2012-11-09 | 2019-03-26 | Kla-Tencor Corporation | Method, system, and user interface for metrology target characterization |
| NL2011816A (en) * | 2012-11-30 | 2014-06-04 | Asml Netherlands Bv | Method of determining dose and focus, inspection apparatus, patterning device, substrate and device manufacturing method. |
| US9341769B2 (en) | 2012-12-17 | 2016-05-17 | Kla-Tencor Corporation | Spectral control system |
| US9512985B2 (en) | 2013-02-22 | 2016-12-06 | Kla-Tencor Corporation | Systems for providing illumination in optical metrology |
| US9910953B2 (en) * | 2013-03-04 | 2018-03-06 | Kla-Tencor Corporation | Metrology target identification, design and verification |
| WO2014138522A1 (en) * | 2013-03-08 | 2014-09-12 | Kla-Tencor Corporation | Pupil plane calibration for scatterometry overlay measurement |
| US9909982B2 (en) * | 2013-03-08 | 2018-03-06 | Kla-Tencor Corporation | Pupil plane calibration for scatterometry overlay measurement |
| KR102124204B1 (ko) * | 2013-08-07 | 2020-06-18 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 방법 및 장치, 리소그래피 시스템 및 디바이스 제조 방법 |
| WO2015031337A1 (en) * | 2013-08-27 | 2015-03-05 | Kla-Tencor Corporation | Removing process-variation-related inaccuracies from scatterometry measurements |
| US9518916B1 (en) * | 2013-10-18 | 2016-12-13 | Kla-Tencor Corporation | Compressive sensing for metrology |
| WO2015089231A1 (en) * | 2013-12-11 | 2015-06-18 | Kla-Tencor Corporation | Target and process sensitivity analysis to requirements |
| US10365230B1 (en) * | 2014-03-19 | 2019-07-30 | Kla-Tencor Corporation | Scatterometry overlay based on reflection peak locations |
| US9851300B1 (en) * | 2014-04-04 | 2017-12-26 | Kla-Tencor Corporation | Decreasing inaccuracy due to non-periodic effects on scatterometric signals |
| WO2016037003A1 (en) * | 2014-09-03 | 2016-03-10 | Kla-Tencor Corporation | Optimizing the utilization of metrology tools |
| WO2016123552A1 (en) * | 2015-01-30 | 2016-08-04 | Kla-Tencor Corporation | Device metrology targets and methods |
| US9903711B2 (en) * | 2015-04-06 | 2018-02-27 | KLA—Tencor Corporation | Feed forward of metrology data in a metrology system |
| WO2017099843A1 (en) * | 2015-12-08 | 2017-06-15 | Kla-Tencor Corporation | Control of amplitude and phase of diffraction orders using polarizing targets and polarized illumination |
-
2015
- 2015-11-24 CN CN201580060081.7A patent/CN107078074B/zh active Active
- 2015-11-24 KR KR1020177017380A patent/KR102269514B1/ko active Active
- 2015-11-24 SG SG11201703585RA patent/SG11201703585RA/en unknown
- 2015-11-24 CN CN202011580664.1A patent/CN112698551B/zh active Active
- 2015-11-24 WO PCT/US2015/062523 patent/WO2016086056A1/en not_active Ceased
- 2015-11-24 JP JP2017528095A patent/JP6770958B2/ja active Active
- 2015-11-25 TW TW109101242A patent/TWI719804B/zh active
- 2015-11-25 TW TW104139220A patent/TWI711096B/zh active
-
2016
- 2016-06-30 US US15/198,902 patent/US10831108B2/en active Active
-
2017
- 2017-04-27 IL IL251972A patent/IL251972B/en unknown
-
2020
- 2020-09-28 JP JP2020162494A patent/JP7023337B2/ja active Active
-
2022
- 2022-02-08 JP JP2022018205A patent/JP2022065040A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2017537317A (ja) | 2017-12-14 |
| CN107078074B (zh) | 2021-05-25 |
| SG11201703585RA (en) | 2017-06-29 |
| TW202018836A (zh) | 2020-05-16 |
| WO2016086056A1 (en) | 2016-06-02 |
| US10831108B2 (en) | 2020-11-10 |
| KR102269514B1 (ko) | 2021-06-25 |
| CN107078074A (zh) | 2017-08-18 |
| JP2022065040A (ja) | 2022-04-26 |
| JP6770958B2 (ja) | 2020-10-21 |
| KR20170088403A (ko) | 2017-08-01 |
| IL251972A0 (en) | 2017-06-29 |
| JP7023337B2 (ja) | 2022-02-21 |
| CN112698551A (zh) | 2021-04-23 |
| TW201633419A (zh) | 2016-09-16 |
| US20160313658A1 (en) | 2016-10-27 |
| JP2020201293A (ja) | 2020-12-17 |
| CN112698551B (zh) | 2024-04-23 |
| TWI711096B (zh) | 2020-11-21 |
| TWI719804B (zh) | 2021-02-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| IL251972B (en) | Analysis and use of landscapes | |
| IL259433B (en) | eif4-a inhibitory compounds and related methods | |
| IL252216B (en) | Difluoromethyl-aminopyridines and difluoromethyl-aminopyrimidines | |
| PL3215147T3 (pl) | Związki norketaminy osłabiającej działanie układu nerwowego i sposoby | |
| IL247014A0 (en) | 6-heteroaryloxy and 6-aryloxy-quinoline-2-carboxamides and their use | |
| IL297057B2 (en) | Conjunctions and their uses | |
| IL259743B (en) | Bioreactor apparatus and methods | |
| PT2980420T (pt) | Montagem de painel com inserto e método | |
| SG11201704473WA (en) | New methods and uses | |
| GB201603311D0 (en) | New uses and methods | |
| IL251107A0 (en) | Compounds and methods | |
| GB201514381D0 (en) | Kit and Method | |
| GB201416293D0 (en) | Methods and preparations | |
| GB201612858D0 (en) | New uses and methods | |
| IL251335A0 (en) | Piperidinylpyrazolopyrimidinones and their use | |
| GB2548839B (en) | New uses and methods | |
| IL254241A0 (en) | Etv2 and its uses | |
| GB201517786D0 (en) | Methods and materials | |
| GB201408091D0 (en) | Methods and uses | |
| GB201513590D0 (en) | Devices and methods | |
| PL3134581T3 (pl) | Sposób i środek do stabilizacji gruntu | |
| GB201416082D0 (en) | Method and uses | |
| GB201416073D0 (en) | Methods and uses | |
| GB201416086D0 (en) | Methods and uses | |
| PL3229772T3 (pl) | 6-arylo-9-glikozylopuryny i ich zastosowanie |