IL148265A0 - Aqueous dispersion, process for its production and use - Google Patents

Aqueous dispersion, process for its production and use

Info

Publication number
IL148265A0
IL148265A0 IL14826502A IL14826502A IL148265A0 IL 148265 A0 IL148265 A0 IL 148265A0 IL 14826502 A IL14826502 A IL 14826502A IL 14826502 A IL14826502 A IL 14826502A IL 148265 A0 IL148265 A0 IL 148265A0
Authority
IL
Israel
Prior art keywords
production
aqueous dispersion
dispersion
aqueous
Prior art date
Application number
IL14826502A
Other languages
English (en)
Original Assignee
Degussa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Degussa filed Critical Degussa
Publication of IL148265A0 publication Critical patent/IL148265A0/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00—Compounds of aluminium
    • C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/50—Solid solutions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
IL14826502A 2001-02-22 2002-02-20 Aqueous dispersion, process for its production and use IL148265A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP01104269A EP1234800A1 (de) 2001-02-22 2001-02-22 Wässrige Dispersion, Verfahren zu ihrer Herstellung und Verwendung

Publications (1)

Publication Number Publication Date
IL148265A0 true IL148265A0 (en) 2002-09-12

Family

ID=8176562

Family Applications (1)

Application Number Title Priority Date Filing Date
IL14826502A IL148265A0 (en) 2001-02-22 2002-02-20 Aqueous dispersion, process for its production and use

Country Status (5)

Country Link
US (1) US7169322B2 (ja)
EP (1) EP1234800A1 (ja)
JP (1) JP2002332476A (ja)
KR (1) KR20020068960A (ja)
IL (1) IL148265A0 (ja)

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DE10123950A1 (de) * 2001-05-17 2002-11-28 Degussa Granulate auf Basis von mittels Aerosol mit Aluminiumoxid dotiertem, pyrogen hergestelltem Siliziumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung
DE10152745A1 (de) * 2001-10-25 2003-05-15 Degussa Dispersion von Aluminiumoxid
DE10205280C1 (de) 2002-02-07 2003-07-03 Degussa Dispersion zum chemisch-mechanischen Polieren
AU2003295914A1 (en) * 2002-11-27 2004-06-23 Nanoproducts Corporation Nano-engineered inks, methods for their manufacture and their applications
DE10317066A1 (de) * 2003-04-14 2004-11-11 Degussa Ag Verfahren zur Herstellung von Metalloxid- und Metalloidoxid-Dispersionen
DE10320854A1 (de) * 2003-05-09 2004-12-09 Degussa Ag Dispersion zum chemisch-mechanischen Polieren
DE102004010504B4 (de) * 2004-03-04 2006-05-04 Degussa Ag Hochtransparente lasermarkierbare und laserschweißbare Kunststoffmaterialien, deren Verwendung und Herstellung sowie Verwendung von Metallmischoxiden und Verfahren zur Kennzeichnung von Produktionsgütern
DE102004016600A1 (de) * 2004-04-03 2005-10-27 Degussa Ag Dispersion zum chemisch-mechanischen Polieren von Metalloberflächen enthaltend Metalloxidpartikel und ein kationisches Polymer
CN1980860B (zh) * 2004-05-04 2011-06-08 卡伯特公司 制备具有期望的聚集粒径的聚集的金属氧化物颗粒的分散体的方法
DE102004037118A1 (de) * 2004-07-30 2006-03-23 Degussa Ag Titandioxid enthaltende Dispersion
US7704586B2 (en) * 2005-03-09 2010-04-27 Degussa Ag Plastic molded bodies having two-dimensional and three-dimensional image structures produced through laser subsurface engraving
KR101100861B1 (ko) * 2005-04-21 2012-01-02 삼성코닝정밀소재 주식회사 금속 산화물 서스펜션 제조 방법
DE102005032427A1 (de) * 2005-07-12 2007-01-18 Degussa Ag Aluminiumoxid-Dispersion
KR101144839B1 (ko) * 2005-08-05 2012-05-11 삼성코닝정밀소재 주식회사 감마 알루미나가 표면-결합된 실리카를 포함하는 수성 연마슬러리 및 그 제조방법
US7553465B2 (en) * 2005-08-12 2009-06-30 Degussa Ag Cerium oxide powder and cerium oxide dispersion
DE102005059960A1 (de) * 2005-12-15 2007-06-28 Degussa Gmbh Hochgefüllte Übergangs-Aluminiumoxid enthaltende Dispersion
US7846492B2 (en) * 2006-04-27 2010-12-07 Guardian Industries Corp. Photocatalytic window and method of making same
DE102007021199B4 (de) * 2006-07-17 2016-02-11 Evonik Degussa Gmbh Zusammensetzungen aus organischem Polymer als Matrix und anorganischen Partikeln als Füllstoff, Verfahren zu deren Herstellung sowie deren Verwendung und damit hergestellte Formkörper
KR20100016413A (ko) * 2007-04-13 2010-02-12 솔베이(소시에떼아노님) 반도체 웨이퍼 처리를 위한 산화제의 용도, 조성물의 용도 및 그 조성물
DE102007054885A1 (de) * 2007-11-15 2009-05-20 Evonik Degussa Gmbh Verfahren zur Fraktionierung oxidischer Nanopartikel durch Querstrom-Membranfiltration
ES2644759T3 (es) * 2008-07-18 2017-11-30 Evonik Degussa Gmbh Dispersión de partículas de dióxido de silicio hidrofobizadas y granulado de la misma
JP5566723B2 (ja) * 2010-03-01 2014-08-06 古河電気工業株式会社 微粒子混合物、活物質凝集体、正極活物質材料、正極、２次電池及びこれらの製造方法
US8967472B2 (en) * 2012-05-02 2015-03-03 Disney Enterprises, Inc. High frequency antenna formed on a compound surface
DE102013101701A1 (de) * 2013-02-20 2014-08-21 Sasol Olefins & Surfactants Gmbh Fließfähige Dispersion enthaltend partikuläre Metalloxide, Metalloxidhydrate und/oder Metallhydroxide, ein Dispergiermittel und ein organisches Dispersionsmedium
US10414021B2 (en) * 2014-02-06 2019-09-17 Asahi Kasei Kogyo Co., Ltd. Polishing abrasive particle, production method therefore, polishing method, polishing device, and slurry
WO2017009035A1 (de) * 2015-07-10 2017-01-19 Evonik Degussa Gmbh Sio2 enthaltende dispersion mit hoher salzstabilität
CN107922198B (zh) * 2015-07-10 2022-03-11 赢创运营有限公司 具有高盐稳定性的含SiO2的分散体
US10920084B2 (en) * 2015-07-10 2021-02-16 Evonik Operations Gmbh Metal oxide-containing dispersion with high salt stability
DK3368633T3 (da) 2015-10-26 2020-08-17 Evonik Operations Gmbh Fremgangsmåde til opnåelse af råolie ved anvendelse af en silicafluid

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DE69611653T2 (de) * 1995-11-10 2001-05-03 Tokuyama Corp Poliersuspensionen und Verfahren zu ihrer Herstellung
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US5783489A (en) * 1996-09-24 1998-07-21 Cabot Corporation Multi-oxidizer slurry for chemical mechanical polishing
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CN1142989C (zh) * 1998-10-21 2004-03-24 格雷斯公司 用于研磨的无机氧化物颗粒淤浆及调节所述颗粒的磨蚀性的方法
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EP1148026B1 (de) * 2000-04-12 2016-08-10 Evonik Degussa GmbH Dispersionen
DE10135452A1 (de) * 2001-07-20 2003-02-06 Degussa Pyrogen hergestellte Aluminium-Silicium-Mischoxide

Also Published As

Publication number Publication date
JP2002332476A (ja) 2002-11-22
KR20020068960A (ko) 2002-08-28
EP1234800A1 (de) 2002-08-28
US7169322B2 (en) 2007-01-30
US20020121156A1 (en) 2002-09-05

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