IL139723A0 - Apparatus and method for recovering photoresist developers and strippers - Google Patents
Apparatus and method for recovering photoresist developers and strippersInfo
- Publication number
- IL139723A0 IL139723A0 IL13972399A IL13972399A IL139723A0 IL 139723 A0 IL139723 A0 IL 139723A0 IL 13972399 A IL13972399 A IL 13972399A IL 13972399 A IL13972399 A IL 13972399A IL 139723 A0 IL139723 A0 IL 139723A0
- Authority
- IL
- Israel
- Prior art keywords
- strippers
- photoresist developers
- recovering
- recovering photoresist
- developers
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D37/00—Processes of filtration
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Physical Water Treatments (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/081,839 US6074561A (en) | 1995-10-23 | 1998-05-19 | Apparatus and method for recovering photoresist developers and strippers |
PCT/US1999/010925 WO1999059693A1 (en) | 1998-05-19 | 1999-05-18 | Apparatus and method for recovering photoresist developers and strippers |
Publications (1)
Publication Number | Publication Date |
---|---|
IL139723A0 true IL139723A0 (en) | 2002-02-10 |
Family
ID=22166727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL13972399A IL139723A0 (en) | 1998-05-19 | 1999-05-18 | Apparatus and method for recovering photoresist developers and strippers |
Country Status (8)
Country | Link |
---|---|
US (1) | US6074561A (ja) |
EP (1) | EP1089799A4 (ja) |
JP (1) | JP2002515318A (ja) |
KR (1) | KR20010071297A (ja) |
BR (1) | BR9910529A (ja) |
CA (1) | CA2332245A1 (ja) |
IL (1) | IL139723A0 (ja) |
WO (1) | WO1999059693A1 (ja) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6699400B1 (en) * | 1999-06-04 | 2004-03-02 | Arne W. Ballantine | Etch process and apparatus therefor |
US6861371B2 (en) * | 2001-11-05 | 2005-03-01 | Tokyo Electron Limited | Substrate processing system and substrate processing method |
US7404926B2 (en) * | 2003-12-30 | 2008-07-29 | Rhoades Frank G | Water treatment system |
JP4393910B2 (ja) * | 2004-04-08 | 2010-01-06 | 東京応化工業株式会社 | ホトレジスト組成物の製造方法、ろ過装置、塗布装置及びホトレジスト組成物 |
JP4696593B2 (ja) * | 2005-02-25 | 2011-06-08 | 凸版印刷株式会社 | 限外濾過フィルタの使用方法、及び限外濾過フィルタ再生機構付ウェット現像装置 |
US20070089902A1 (en) * | 2005-10-25 | 2007-04-26 | Tourne Joseph A | Circuit board having a multi-signal via |
KR20070099827A (ko) * | 2006-04-05 | 2007-10-10 | 삼성전자주식회사 | Pr 스트리핑 장치, 이를 이용한 pr 스트리퍼 재사용방법 및 박막 트랜지스터 어레이 기판의 제조 방법 |
US8083947B2 (en) * | 2009-02-24 | 2011-12-27 | Eastman Kodak Company | Polymer-containing solvent purifying process |
CN102345138A (zh) * | 2010-07-30 | 2012-02-08 | 中芯国际集成电路制造(上海)有限公司 | 用于显影装置的显影液喷头的清洗装置和清洗方法 |
TWI535494B (zh) * | 2011-12-23 | 2016-06-01 | 友達光電股份有限公司 | 光阻剝離液的供應系統及其供應方法 |
JP6045283B2 (ja) * | 2012-10-11 | 2016-12-14 | 日本リファイン株式会社 | レジスト剥離液の再生方法および再生装置 |
KR101437334B1 (ko) * | 2014-02-07 | 2014-09-04 | 주식회사 씨엔디플러스 | 포토레지스트 제거 시스템용 메탈 회수 장치 |
EP3133175A1 (en) * | 2015-08-19 | 2017-02-22 | Enthone, Inc. | System and process for recovering catalytic precious metal from aqueous galvanic processing solution |
CN107744678B (zh) * | 2017-10-27 | 2021-04-30 | 武汉华星光电技术有限公司 | 用于线性涂布机中的清洗液过滤装置、方法及线性涂布机 |
CN109091924B (zh) * | 2018-09-03 | 2020-12-04 | 阜阳市鑫源建材有限公司 | 一种稀土颗粒分离系统 |
CN109260810A (zh) * | 2018-11-21 | 2019-01-25 | 合肥新汇成微电子有限公司 | 一种化学药剂残留药液回收装置 |
KR20200107298A (ko) * | 2019-03-07 | 2020-09-16 | 캡시스템(주) | 네거티브 포토레지스트용 현상액 재생 시스템 |
KR102234732B1 (ko) * | 2019-03-07 | 2021-04-01 | 캡시스템(주) | 네거티브 포토레지스트용 현상액 재생 시스템 |
US11189504B2 (en) * | 2020-02-11 | 2021-11-30 | Tcl China Star Optoelectronics Technology Co., Ltd. | Photoresist stripping device and photoresist stripping method |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4069157A (en) * | 1975-11-20 | 1978-01-17 | E. I. Du Pont De Nemours And Company | Ultrafiltration device |
US4083758A (en) * | 1976-09-27 | 1978-04-11 | Criterion | Process for regenerating and for recovering metallic copper from chloride-containing etching solutions |
US4784169A (en) * | 1984-01-13 | 1988-11-15 | Chemcut Corporation | Apparatus for treating articles with solution to remove solids and then filtering the solution |
US4786417A (en) * | 1986-07-23 | 1988-11-22 | Sumitomo Heavy Industries Ltd. | Management of photoresist materials containing waste solution |
US4760014A (en) * | 1986-08-01 | 1988-07-26 | Great Lakes Chemical Corporation | Method for treating mixtures containing photopolymeric resin and compositions therefor |
DE3873070T2 (de) * | 1988-03-17 | 1993-01-21 | Ceramiques Tech Soc D | Verfahren zur behandlung verunreinigter oel-in-wasser-emulsionen oder-mikroemulsionen. |
JPH0264646A (ja) * | 1988-08-31 | 1990-03-05 | Toshiba Corp | レジストパターンの現像方法及びこの方法に使用する現像装置 |
DE3833242A1 (de) * | 1988-09-30 | 1990-04-05 | Hoellmueller Maschbau H | Verfahren zum aetzen von kupferhaltigen werkstuecken sowie aetzanlage zur durchfuehrung des verfahrens |
US5112491A (en) * | 1991-03-01 | 1992-05-12 | E. I. Du Pont De Nemours And Company | Management of waste solution containing photoresist materials |
US5366584A (en) * | 1992-02-11 | 1994-11-22 | Rayzist Photomask, Inc. | Removing uncured emulsion from stencils during photomask production |
US5205937A (en) * | 1992-04-30 | 1993-04-27 | U.S. Filter Membralox | Recovery and reuse of water-based cleaners |
JP3622227B2 (ja) * | 1993-05-26 | 2005-02-23 | 住友化学株式会社 | フォトレジスト含有廃液の濃縮方法 |
JP3355837B2 (ja) * | 1993-12-27 | 2002-12-09 | 三菱化学株式会社 | 感光性材料用現像液の再生方法及び感光性材料の現像装置 |
US5531889A (en) * | 1994-03-08 | 1996-07-02 | Atotech Usa, Inc. | Method and apparatus for removing resist particles from stripping solutions for printed wireboards |
WO1996020434A1 (en) * | 1994-12-27 | 1996-07-04 | Mitsubishi Chemical Corporation | Method and apparatus for treating developer for pigment-containing nonsilver photosensitive material, and automatic developing machine |
US5753135A (en) * | 1995-10-23 | 1998-05-19 | Jablonsky; Julius James | Apparatus and method for recovering photoresist developers and strippers |
DE29517588U1 (de) * | 1995-11-06 | 1996-02-08 | Cimatec GmbH Produkte für Leiterplatten, 67292 Kirchheimbolanden | Maschine zur Flüssigkeitsbehandlung von Gegenständen, insbesondere Platinen in der Leiterplattenfertigung |
DE19646945A1 (de) * | 1996-11-13 | 1998-05-14 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zur Aufarbeitung oder Regenerierung von Ätzbädern |
JPH10137550A (ja) * | 1996-11-15 | 1998-05-26 | Kansai Paint Co Ltd | レジスト現像廃液の再使用方法 |
-
1998
- 1998-05-19 US US09/081,839 patent/US6074561A/en not_active Expired - Fee Related
-
1999
- 1999-05-18 CA CA002332245A patent/CA2332245A1/en not_active Abandoned
- 1999-05-18 IL IL13972399A patent/IL139723A0/xx unknown
- 1999-05-18 BR BR9910529-2A patent/BR9910529A/pt not_active IP Right Cessation
- 1999-05-18 WO PCT/US1999/010925 patent/WO1999059693A1/en not_active Application Discontinuation
- 1999-05-18 EP EP99923173A patent/EP1089799A4/en not_active Withdrawn
- 1999-05-18 JP JP2000549350A patent/JP2002515318A/ja active Pending
- 1999-05-18 KR KR1020007013010A patent/KR20010071297A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JP2002515318A (ja) | 2002-05-28 |
EP1089799A4 (en) | 2002-11-13 |
US6074561A (en) | 2000-06-13 |
EP1089799A1 (en) | 2001-04-11 |
KR20010071297A (ko) | 2001-07-28 |
WO1999059693A1 (en) | 1999-11-25 |
CA2332245A1 (en) | 1999-11-25 |
BR9910529A (pt) | 2002-01-02 |
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